CN102077051B - 厚度或表面形貌检测方法 - Google Patents

厚度或表面形貌检测方法 Download PDF

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Publication number
CN102077051B
CN102077051B CN2009801248181A CN200980124818A CN102077051B CN 102077051 B CN102077051 B CN 102077051B CN 2009801248181 A CN2009801248181 A CN 2009801248181A CN 200980124818 A CN200980124818 A CN 200980124818A CN 102077051 B CN102077051 B CN 102077051B
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China
Prior art keywords
thickness
thin layer
peak value
waveform
interference signal
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Expired - Fee Related
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CN2009801248181A
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English (en)
Chinese (zh)
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CN102077051A (zh
Inventor
朴喜载
安祐正
金星龙
李焌赫
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SNU Precision Co Ltd
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SNU Precision Co Ltd
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
CN2009801248181A 2008-06-30 2009-01-16 厚度或表面形貌检测方法 Expired - Fee Related CN102077051B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020080062382A KR101010189B1 (ko) 2008-06-30 2008-06-30 두께 또는 표면형상 측정방법
KR10-2008-0062382 2008-06-30
PCT/KR2009/000250 WO2010002085A1 (ko) 2008-06-30 2009-01-16 두께 또는 표면형상 측정방법

Publications (2)

Publication Number Publication Date
CN102077051A CN102077051A (zh) 2011-05-25
CN102077051B true CN102077051B (zh) 2012-11-28

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CN2009801248181A Expired - Fee Related CN102077051B (zh) 2008-06-30 2009-01-16 厚度或表面形貌检测方法

Country Status (6)

Country Link
US (1) US8947673B2 (ja)
JP (1) JP5369357B2 (ja)
KR (1) KR101010189B1 (ja)
CN (1) CN102077051B (ja)
TW (1) TWI410603B (ja)
WO (1) WO2010002085A1 (ja)

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US9360306B2 (en) * 2011-09-09 2016-06-07 Inspecto Inc. Three-dimensional profile measurement apparatus and method using amplitude size of projection grid
CN103975220A (zh) * 2011-12-07 2014-08-06 柯尼卡美能达株式会社 形状测定装置
JP5808667B2 (ja) * 2011-12-27 2015-11-10 株式会社Sumco シリカガラスルツボの三次元形状測定方法
US20130289900A1 (en) * 2012-04-26 2013-10-31 Areva Np Inc. Gap Measurement Tool and Method of Use
TWI477736B (zh) * 2013-12-05 2015-03-21 Nat Applied Res Laboratories 多工物件參數光學量測整合裝置與方法
CN105091787B (zh) * 2014-05-06 2018-01-16 北京智朗芯光科技有限公司 实时快速检测晶片基底二维形貌的装置
JP6389081B2 (ja) * 2014-08-07 2018-09-12 Ntn株式会社 形状測定装置、塗布装置および形状測定方法
US9766365B2 (en) 2014-10-27 2017-09-19 Schlumberger Technology Corporation Compensated deep measurements using a tilted antenna
CN105698964A (zh) * 2014-11-26 2016-06-22 北京智朗芯光科技有限公司 一种单透镜型晶片基底温度测量装置
KR101650319B1 (ko) * 2015-03-06 2016-08-24 에스엔유 프리시젼 주식회사 컬러 카메라를 이용한 두께 측정방법 및 두께 측정장치
JP6677407B2 (ja) * 2015-10-20 2020-04-08 国立大学法人 和歌山大学 断層構造の観測方法、観測装置、及びコンピュータプログラム
JP6800800B2 (ja) * 2017-04-06 2020-12-16 株式会社ニューフレアテクノロジー 成長速度測定装置および成長速度検出方法
CN108225209A (zh) * 2017-12-04 2018-06-29 中国特种飞行器研究所 一种立体视觉腐蚀形貌检测装置及检测方法
JP2019152570A (ja) * 2018-03-05 2019-09-12 東芝メモリ株式会社 測定装置
KR102541847B1 (ko) * 2018-07-27 2023-06-14 스카이버스 테크놀로지 씨오., 엘티디. 발광 장치, 광학 검출 시스템, 광학 검출 장치 및 광학 검출 방법
CN109084678B (zh) * 2018-09-03 2021-09-28 深圳中科飞测科技股份有限公司 一种光学检测装置和光学检测方法
CN108917626A (zh) * 2018-08-01 2018-11-30 深圳中科飞测科技有限公司 一种检测装置及检测方法
CN112902880A (zh) * 2021-01-22 2021-06-04 大连理工大学 一种平面构件平行度的测量方法和装置
CN112902900A (zh) * 2021-01-22 2021-06-04 大连理工大学 一种弱刚性平面构件的平行度测量方法
CN112964200A (zh) * 2021-02-02 2021-06-15 西安工业大学 一种透明平板夹角的快速测量方法

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KR100490325B1 (ko) * 2001-09-21 2005-05-17 케이맥(주) 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법
CN1664493A (zh) * 2004-03-04 2005-09-07 大日本网目版制造株式会社 膜厚测定方法和装置
EP1604169A2 (en) * 2003-03-06 2005-12-14 Zygo Corporation Characterizing and profiling complex surface structures using scanning interferometry
CN1784587A (zh) * 2003-03-06 2006-06-07 齐戈股份有限公司 使用扫描干涉测量形成复杂表面结构的轮廓

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JP2002107119A (ja) * 2000-07-26 2002-04-10 Nippi:Kk 被測定物の厚さ測定方法及びその装置
JP2003240515A (ja) 2002-02-15 2003-08-27 Toray Ind Inc 膜厚測定方法およびシートの製造方法
JP2004144544A (ja) 2002-10-23 2004-05-20 Sumitomo Chem Co Ltd 膜厚の検査方法
JP2004340680A (ja) * 2003-05-14 2004-12-02 Toray Eng Co Ltd 表面形状および／または膜厚測定方法及びその装置
TWI331211B (en) * 2003-09-15 2010-10-01 Zygo Corp Optical system,method of analyzing a measured object, and system for determining a spatial property of a measured object
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JP2006170847A (ja) 2004-12-16 2006-06-29 Canon Inc 形状と材質の測定方法
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WO2007069457A1 (ja) * 2005-12-14 2007-06-21 Nikon Corporation 表面検査装置および表面検査方法
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Patent Citations (5)

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KR100490325B1 (ko) * 2001-09-21 2005-05-17 케이맥(주) 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법
JP2004138519A (ja) * 2002-10-18 2004-05-13 Dainippon Screen Mfg Co Ltd 膜厚測定装置、反射率測定装置、異物検査装置、反射率測定方法および異物検査方法
EP1604169A2 (en) * 2003-03-06 2005-12-14 Zygo Corporation Characterizing and profiling complex surface structures using scanning interferometry
CN1784587A (zh) * 2003-03-06 2006-06-07 齐戈股份有限公司 使用扫描干涉测量形成复杂表面结构的轮廓
CN1664493A (zh) * 2004-03-04 2005-09-07 大日本网目版制造株式会社 膜厚测定方法和装置

Also Published As

Publication number Publication date
TWI410603B (zh) 2013-10-01
JP5369357B2 (ja) 2013-12-18
CN102077051A (zh) 2011-05-25
JP2011526692A (ja) 2011-10-13
US8947673B2 (en) 2015-02-03
US20110188048A1 (en) 2011-08-04
WO2010002085A1 (ko) 2010-01-07
TW201000848A (en) 2010-01-01
KR20100002477A (ko) 2010-01-07
KR101010189B1 (ko) 2011-01-21

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