CN102077051B - 厚度或表面形貌检测方法 - Google Patents
厚度或表面形貌检测方法 Download PDFInfo
- Publication number
- CN102077051B CN102077051B CN2009801248181A CN200980124818A CN102077051B CN 102077051 B CN102077051 B CN 102077051B CN 2009801248181 A CN2009801248181 A CN 2009801248181A CN 200980124818 A CN200980124818 A CN 200980124818A CN 102077051 B CN102077051 B CN 102077051B
- Authority
- CN
- China
- Prior art keywords
- thickness
- thin layer
- peak value
- waveform
- interference signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080062382A KR101010189B1 (ko) | 2008-06-30 | 2008-06-30 | 두께 또는 표면형상 측정방법 |
KR10-2008-0062382 | 2008-06-30 | ||
PCT/KR2009/000250 WO2010002085A1 (ko) | 2008-06-30 | 2009-01-16 | 두께 또는 표면형상 측정방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102077051A CN102077051A (zh) | 2011-05-25 |
CN102077051B true CN102077051B (zh) | 2012-11-28 |
Family
ID=41466144
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009801248181A Expired - Fee Related CN102077051B (zh) | 2008-06-30 | 2009-01-16 | 厚度或表面形貌检测方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8947673B2 (ja) |
JP (1) | JP5369357B2 (ja) |
KR (1) | KR101010189B1 (ja) |
CN (1) | CN102077051B (ja) |
TW (1) | TWI410603B (ja) |
WO (1) | WO2010002085A1 (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9360306B2 (en) * | 2011-09-09 | 2016-06-07 | Inspecto Inc. | Three-dimensional profile measurement apparatus and method using amplitude size of projection grid |
CN103975220A (zh) * | 2011-12-07 | 2014-08-06 | 柯尼卡美能达株式会社 | 形状测定装置 |
JP5808667B2 (ja) * | 2011-12-27 | 2015-11-10 | 株式会社Sumco | シリカガラスルツボの三次元形状測定方法 |
US20130289900A1 (en) * | 2012-04-26 | 2013-10-31 | Areva Np Inc. | Gap Measurement Tool and Method of Use |
TWI477736B (zh) * | 2013-12-05 | 2015-03-21 | Nat Applied Res Laboratories | 多工物件參數光學量測整合裝置與方法 |
CN105091787B (zh) * | 2014-05-06 | 2018-01-16 | 北京智朗芯光科技有限公司 | 实时快速检测晶片基底二维形貌的装置 |
JP6389081B2 (ja) * | 2014-08-07 | 2018-09-12 | Ntn株式会社 | 形状測定装置、塗布装置および形状測定方法 |
US9766365B2 (en) | 2014-10-27 | 2017-09-19 | Schlumberger Technology Corporation | Compensated deep measurements using a tilted antenna |
CN105698964A (zh) * | 2014-11-26 | 2016-06-22 | 北京智朗芯光科技有限公司 | 一种单透镜型晶片基底温度测量装置 |
KR101650319B1 (ko) * | 2015-03-06 | 2016-08-24 | 에스엔유 프리시젼 주식회사 | 컬러 카메라를 이용한 두께 측정방법 및 두께 측정장치 |
JP6677407B2 (ja) * | 2015-10-20 | 2020-04-08 | 国立大学法人 和歌山大学 | 断層構造の観測方法、観測装置、及びコンピュータプログラム |
JP6800800B2 (ja) * | 2017-04-06 | 2020-12-16 | 株式会社ニューフレアテクノロジー | 成長速度測定装置および成長速度検出方法 |
CN108225209A (zh) * | 2017-12-04 | 2018-06-29 | 中国特种飞行器研究所 | 一种立体视觉腐蚀形貌检测装置及检测方法 |
JP2019152570A (ja) * | 2018-03-05 | 2019-09-12 | 東芝メモリ株式会社 | 測定装置 |
KR102541847B1 (ko) * | 2018-07-27 | 2023-06-14 | 스카이버스 테크놀로지 씨오., 엘티디. | 발광 장치, 광학 검출 시스템, 광학 검출 장치 및 광학 검출 방법 |
CN109084678B (zh) * | 2018-09-03 | 2021-09-28 | 深圳中科飞测科技股份有限公司 | 一种光学检测装置和光学检测方法 |
CN108917626A (zh) * | 2018-08-01 | 2018-11-30 | 深圳中科飞测科技有限公司 | 一种检测装置及检测方法 |
CN112902880A (zh) * | 2021-01-22 | 2021-06-04 | 大连理工大学 | 一种平面构件平行度的测量方法和装置 |
CN112902900A (zh) * | 2021-01-22 | 2021-06-04 | 大连理工大学 | 一种弱刚性平面构件的平行度测量方法 |
CN112964200A (zh) * | 2021-02-02 | 2021-06-15 | 西安工业大学 | 一种透明平板夹角的快速测量方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004138519A (ja) * | 2002-10-18 | 2004-05-13 | Dainippon Screen Mfg Co Ltd | 膜厚測定装置、反射率測定装置、異物検査装置、反射率測定方法および異物検査方法 |
KR100490325B1 (ko) * | 2001-09-21 | 2005-05-17 | 케이맥(주) | 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법 |
CN1664493A (zh) * | 2004-03-04 | 2005-09-07 | 大日本网目版制造株式会社 | 膜厚测定方法和装置 |
EP1604169A2 (en) * | 2003-03-06 | 2005-12-14 | Zygo Corporation | Characterizing and profiling complex surface structures using scanning interferometry |
CN1784587A (zh) * | 2003-03-06 | 2006-06-07 | 齐戈股份有限公司 | 使用扫描干涉测量形成复杂表面结构的轮廓 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0654217B2 (ja) * | 1987-08-28 | 1994-07-20 | 株式会社日立製作所 | 干渉膜厚測定方法 |
US5555472A (en) * | 1993-12-22 | 1996-09-10 | Integrated Process Equipment Corp. | Method and apparatus for measuring film thickness in multilayer thin film stack by comparison to a reference library of theoretical signatures |
JP4246326B2 (ja) | 1999-08-27 | 2009-04-02 | 東レエンジニアリング株式会社 | 表面形状測定方法及びその装置 |
JP2001144544A (ja) * | 1999-11-15 | 2001-05-25 | Advantest Corp | 同調周波数フィルタ付き周波数逓倍器 |
JP2002107119A (ja) * | 2000-07-26 | 2002-04-10 | Nippi:Kk | 被測定物の厚さ測定方法及びその装置 |
JP2003240515A (ja) | 2002-02-15 | 2003-08-27 | Toray Ind Inc | 膜厚測定方法およびシートの製造方法 |
JP2004144544A (ja) | 2002-10-23 | 2004-05-20 | Sumitomo Chem Co Ltd | 膜厚の検査方法 |
JP2004340680A (ja) * | 2003-05-14 | 2004-12-02 | Toray Eng Co Ltd | 表面形状および/または膜厚測定方法及びその装置 |
TWI331211B (en) * | 2003-09-15 | 2010-10-01 | Zygo Corp | Optical system,method of analyzing a measured object, and system for determining a spatial property of a measured object |
US7522289B2 (en) * | 2004-10-13 | 2009-04-21 | Solvision, Inc. | System and method for height profile measurement of reflecting objects |
JP2006170847A (ja) | 2004-12-16 | 2006-06-29 | Canon Inc | 形状と材質の測定方法 |
EP1931941A1 (de) * | 2005-09-22 | 2008-06-18 | Robert Bosch Gmbh | Interferometrische schichtdickenbestimmung |
WO2007069457A1 (ja) * | 2005-12-14 | 2007-06-21 | Nikon Corporation | 表面検査装置および表面検査方法 |
JP2008014696A (ja) * | 2006-07-04 | 2008-01-24 | Dainippon Screen Mfg Co Ltd | ムラ検査装置、画像表示装置、ムラ検査方法および画像表示方法 |
-
2008
- 2008-06-30 KR KR1020080062382A patent/KR101010189B1/ko active IP Right Grant
-
2009
- 2009-01-15 TW TW098101317A patent/TWI410603B/zh active
- 2009-01-16 WO PCT/KR2009/000250 patent/WO2010002085A1/ko active Application Filing
- 2009-01-16 US US12/993,301 patent/US8947673B2/en active Active
- 2009-01-16 CN CN2009801248181A patent/CN102077051B/zh not_active Expired - Fee Related
- 2009-01-16 JP JP2011516101A patent/JP5369357B2/ja not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100490325B1 (ko) * | 2001-09-21 | 2005-05-17 | 케이맥(주) | 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법 |
JP2004138519A (ja) * | 2002-10-18 | 2004-05-13 | Dainippon Screen Mfg Co Ltd | 膜厚測定装置、反射率測定装置、異物検査装置、反射率測定方法および異物検査方法 |
EP1604169A2 (en) * | 2003-03-06 | 2005-12-14 | Zygo Corporation | Characterizing and profiling complex surface structures using scanning interferometry |
CN1784587A (zh) * | 2003-03-06 | 2006-06-07 | 齐戈股份有限公司 | 使用扫描干涉测量形成复杂表面结构的轮廓 |
CN1664493A (zh) * | 2004-03-04 | 2005-09-07 | 大日本网目版制造株式会社 | 膜厚测定方法和装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI410603B (zh) | 2013-10-01 |
JP5369357B2 (ja) | 2013-12-18 |
CN102077051A (zh) | 2011-05-25 |
JP2011526692A (ja) | 2011-10-13 |
US8947673B2 (en) | 2015-02-03 |
US20110188048A1 (en) | 2011-08-04 |
WO2010002085A1 (ko) | 2010-01-07 |
TW201000848A (en) | 2010-01-01 |
KR20100002477A (ko) | 2010-01-07 |
KR101010189B1 (ko) | 2011-01-21 |
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PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
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CF01 | Termination of patent right due to non-payment of annual fee | ||
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Granted publication date: 20121128 Termination date: 20220116 |