CN102059117A - 甲基氯硅烷合成用的两种铜催化剂及其制备方法 - Google Patents
甲基氯硅烷合成用的两种铜催化剂及其制备方法 Download PDFInfo
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- CN102059117A CN102059117A CN 201010550893 CN201010550893A CN102059117A CN 102059117 A CN102059117 A CN 102059117A CN 201010550893 CN201010550893 CN 201010550893 CN 201010550893 A CN201010550893 A CN 201010550893A CN 102059117 A CN102059117 A CN 102059117A
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- copper
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- oxide
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- 239000003054 catalyst Substances 0.000 title claims abstract description 62
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- 230000002194 synthesizing effect Effects 0.000 title abstract description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 65
- 239000010949 copper Substances 0.000 claims abstract description 47
- 229910052802 copper Inorganic materials 0.000 claims abstract description 37
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims abstract description 32
- 238000006243 chemical reaction Methods 0.000 claims abstract description 27
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 claims abstract description 16
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229940112669 cuprous oxide Drugs 0.000 claims abstract description 16
- 239000012535 impurity Substances 0.000 claims abstract description 16
- 239000002994 raw material Substances 0.000 claims abstract description 16
- 230000008859 change Effects 0.000 claims abstract description 11
- 239000000470 constituent Substances 0.000 claims abstract description 10
- 230000003647 oxidation Effects 0.000 claims description 32
- 238000007254 oxidation reaction Methods 0.000 claims description 32
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 28
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 23
- 229910052760 oxygen Inorganic materials 0.000 claims description 23
- 239000001301 oxygen Substances 0.000 claims description 23
- 239000001257 hydrogen Substances 0.000 claims description 20
- 229910052739 hydrogen Inorganic materials 0.000 claims description 20
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 19
- 230000009467 reduction Effects 0.000 claims description 17
- 229960004643 cupric oxide Drugs 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 239000000843 powder Substances 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 239000013078 crystal Substances 0.000 claims description 11
- 238000009826 distribution Methods 0.000 claims description 8
- 230000002902 bimodal effect Effects 0.000 claims description 7
- 238000004364 calculation method Methods 0.000 claims description 7
- 238000012545 processing Methods 0.000 claims description 6
- 238000002425 crystallisation Methods 0.000 claims description 5
- 230000008025 crystallization Effects 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 4
- 238000006722 reduction reaction Methods 0.000 abstract description 19
- 238000000034 method Methods 0.000 abstract description 17
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 239000000126 substance Substances 0.000 abstract description 7
- 238000003786 synthesis reaction Methods 0.000 abstract description 4
- 230000008901 benefit Effects 0.000 abstract description 3
- 230000003197 catalytic effect Effects 0.000 abstract description 3
- 238000005265 energy consumption Methods 0.000 abstract description 3
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract 3
- 229910052751 metal Inorganic materials 0.000 abstract 3
- 239000005751 Copper oxide Substances 0.000 abstract 2
- 229910000431 copper oxide Inorganic materials 0.000 abstract 2
- 230000001590 oxidative effect Effects 0.000 abstract 2
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000000047 product Substances 0.000 description 31
- 238000012856 packing Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 4
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 239000003595 mist Substances 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- AOSFMYBATFLTAQ-UHFFFAOYSA-N 1-amino-3-(benzimidazol-1-yl)propan-2-ol Chemical compound C1=CC=C2N(CC(O)CN)C=NC2=C1 AOSFMYBATFLTAQ-UHFFFAOYSA-N 0.000 description 1
- YXLXNENXOJSQEI-UHFFFAOYSA-L Oxine-copper Chemical compound [Cu+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 YXLXNENXOJSQEI-UHFFFAOYSA-L 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Abstract
Description
Claims (6)
Priority Applications (1)
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CN 201010550893 CN102059117B (zh) | 2010-11-19 | 2010-11-19 | 甲基氯硅烷合成用的两种铜催化剂及其制备方法 |
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CN 201010550893 CN102059117B (zh) | 2010-11-19 | 2010-11-19 | 甲基氯硅烷合成用的两种铜催化剂及其制备方法 |
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CN102059117A true CN102059117A (zh) | 2011-05-18 |
CN102059117B CN102059117B (zh) | 2013-02-27 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103143358A (zh) * | 2013-03-15 | 2013-06-12 | 金川集团股份有限公司 | 一种有机硅单体合成用的三元铜系催化剂及其制备方法 |
CN110218222A (zh) * | 2019-05-30 | 2019-09-10 | 鲁西化工集团股份有限公司 | 一种延长流化床运行周期提高运行质量的方法 |
CN114749176A (zh) * | 2022-04-21 | 2022-07-15 | 昆明冶金研究院有限公司 | 一种用于合成甲基氯硅烷的铜催化剂及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN85103904A (zh) * | 1984-05-08 | 1986-11-05 | Scm公司 | 卤化硅烷催化剂及其制备方法 |
CN87104211A (zh) * | 1987-06-09 | 1988-12-21 | 化学工业部晨光化工研究院一分院 | 直接法合成甲基氯硅烷用铜催化剂及其制备 |
SU1701633A1 (ru) * | 1989-04-04 | 1991-12-30 | Тбилисский Государственный Университет | Способ получени смеси порошков меди и оксида меди |
-
2010
- 2010-11-19 CN CN 201010550893 patent/CN102059117B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN85103904A (zh) * | 1984-05-08 | 1986-11-05 | Scm公司 | 卤化硅烷催化剂及其制备方法 |
CN87104211A (zh) * | 1987-06-09 | 1988-12-21 | 化学工业部晨光化工研究院一分院 | 直接法合成甲基氯硅烷用铜催化剂及其制备 |
SU1701633A1 (ru) * | 1989-04-04 | 1991-12-30 | Тбилисский Государственный Университет | Способ получени смеси порошков меди и оксида меди |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103143358A (zh) * | 2013-03-15 | 2013-06-12 | 金川集团股份有限公司 | 一种有机硅单体合成用的三元铜系催化剂及其制备方法 |
CN110218222A (zh) * | 2019-05-30 | 2019-09-10 | 鲁西化工集团股份有限公司 | 一种延长流化床运行周期提高运行质量的方法 |
CN114749176A (zh) * | 2022-04-21 | 2022-07-15 | 昆明冶金研究院有限公司 | 一种用于合成甲基氯硅烷的铜催化剂及其制备方法 |
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Effective date of registration: 20161019 Address after: 610399 No. 1 Golden North Road, Qingbaijiang District, Sichuan, Chengdu Patentee after: Chengdu Longsheng Chemical Co.,Ltd. Address before: 610041, No. 2, unit 4, building 47, Bauhinia East Road, Chengdu hi tech Zone, Sichuan, 8 Patentee before: Han Shuquan |
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Address after: 610399 No. 1 Golden North Road, Qingbaijiang District, Sichuan, Chengdu Patentee after: Chengdu Longsheng new materials Limited by Share Ltd. Address before: 610399 No. 1 Golden North Road, Qingbaijiang District, Sichuan, Chengdu Patentee before: Chengdu Longsheng Chemical Co.,Ltd. |
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Effective date of registration: 20231130 Address after: 408403 Shuijiang Cluster of Industrial Park in Nanchuan District, Chongqing Patentee after: Chongqing Longteng Metal Material Co.,Ltd. Address before: No. 1 Huangjin North Road, Qingbaijiang District, Chengdu City, Sichuan Province, 610399 Patentee before: Chengdu Longsheng new materials Limited by Share Ltd. |