CN101868863A - 用于衬底剥离的鲁棒led结构 - Google Patents
用于衬底剥离的鲁棒led结构 Download PDFInfo
- Publication number
- CN101868863A CN101868863A CN200880112484A CN200880112484A CN101868863A CN 101868863 A CN101868863 A CN 101868863A CN 200880112484 A CN200880112484 A CN 200880112484A CN 200880112484 A CN200880112484 A CN 200880112484A CN 101868863 A CN101868863 A CN 101868863A
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- Prior art keywords
- tube core
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- described led
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 title claims abstract description 107
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 19
- 238000005530 etching Methods 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 12
- 230000003287 optical effect Effects 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 22
- 229910052594 sapphire Inorganic materials 0.000 claims description 7
- 239000010980 sapphire Substances 0.000 claims description 7
- 239000000945 filler Substances 0.000 claims description 6
- 239000011265 semifinished product Substances 0.000 claims 1
- 238000005516 engineering process Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 206010040844 Skin exfoliation Diseases 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000035618 desquamation Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 241000193935 Araneus diadematus Species 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0041—Processes relating to semiconductor body packages relating to wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0095—Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/505—Wavelength conversion elements characterised by the shape, e.g. plate or foil
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Device Packages (AREA)
- Led Devices (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/876,404 | 2007-10-22 | ||
US11/876,404 US7687810B2 (en) | 2007-10-22 | 2007-10-22 | Robust LED structure for substrate lift-off |
PCT/IB2008/054362 WO2009053916A1 (en) | 2007-10-22 | 2008-10-22 | Robust led structure for substrate lift-off |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101868863A true CN101868863A (zh) | 2010-10-20 |
CN101868863B CN101868863B (zh) | 2012-05-30 |
Family
ID=40350027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008801124841A Active CN101868863B (zh) | 2007-10-22 | 2008-10-22 | 用于衬底剥离的鲁棒led结构 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7687810B2 (zh) |
EP (1) | EP2206165B8 (zh) |
JP (1) | JP5313256B2 (zh) |
KR (1) | KR101468905B1 (zh) |
CN (1) | CN101868863B (zh) |
RU (1) | RU2477906C2 (zh) |
TW (1) | TWI437724B (zh) |
WO (1) | WO2009053916A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102709451A (zh) * | 2011-03-28 | 2012-10-03 | 日东电工株式会社 | 发光二极管装置及其制造方法 |
CN103066195A (zh) * | 2013-01-25 | 2013-04-24 | 中国科学院半导体研究所 | 应用石墨烯作为导热层的倒装结构发光二极管 |
CN104465966A (zh) * | 2014-12-17 | 2015-03-25 | 江苏稳润光电有限公司 | 一种白光led封装结构及其封装方法 |
CN108292109A (zh) * | 2015-12-15 | 2018-07-17 | Asml荷兰有限公司 | 衬底保持器、光刻设备及制造器件的方法 |
CN110970536A (zh) * | 2018-09-28 | 2020-04-07 | 丰田合成株式会社 | 发光装置 |
Families Citing this family (39)
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US20100294338A1 (en) * | 2009-02-20 | 2010-11-25 | Solaria Corporation | Large Area Concentrator Lens Structure and Method |
US8587017B2 (en) | 2009-07-05 | 2013-11-19 | Industrial Technology Research Institute | Light emitting device and method of fabricating a light emitting device |
US8471280B2 (en) * | 2009-11-06 | 2013-06-25 | Koninklijke Philips Electronics N.V. | Silicone based reflective underfill and thermal coupler |
WO2011069242A1 (en) * | 2009-12-09 | 2011-06-16 | Cooledge Lighting Inc. | Semiconductor dice transfer-enabling apparatus and method for manufacturing transfer-enabling apparatus |
US20110151588A1 (en) * | 2009-12-17 | 2011-06-23 | Cooledge Lighting, Inc. | Method and magnetic transfer stamp for transferring semiconductor dice using magnetic transfer printing techniques |
US8334152B2 (en) * | 2009-12-18 | 2012-12-18 | Cooledge Lighting, Inc. | Method of manufacturing transferable elements incorporating radiation enabled lift off for allowing transfer from host substrate |
JP5882910B2 (ja) | 2010-01-19 | 2016-03-09 | エルジー イノテック カンパニー リミテッド | パッケージおよびその製造方法 |
KR101118040B1 (ko) | 2010-03-17 | 2012-02-24 | 엘지이노텍 주식회사 | Led 패키지 및 그 제조방법 |
KR20170091167A (ko) * | 2010-02-09 | 2017-08-08 | 니치아 카가쿠 고교 가부시키가이샤 | 발광 장치 |
JP5017399B2 (ja) * | 2010-03-09 | 2012-09-05 | 株式会社東芝 | 半導体発光装置および半導体発光装置の製造方法 |
KR101118042B1 (ko) * | 2010-03-17 | 2012-02-24 | 엘지이노텍 주식회사 | 완충층이 형성된 led 패키지 및 그 제조 방법 |
TW201145614A (en) * | 2010-06-03 | 2011-12-16 | Toshiba Kk | Method for manufacturing light-emitting device and light-emitting device manufactured by the same |
JP4875185B2 (ja) * | 2010-06-07 | 2012-02-15 | 株式会社東芝 | 光半導体装置 |
US8754440B2 (en) * | 2011-03-22 | 2014-06-17 | Tsmc Solid State Lighting Ltd. | Light-emitting diode (LED) package systems and methods of making the same |
KR20120119350A (ko) * | 2011-04-21 | 2012-10-31 | 삼성전자주식회사 | 발광소자 모듈 및 이의 제조방법 |
JP2012243822A (ja) * | 2011-05-16 | 2012-12-10 | Citizen Electronics Co Ltd | Led発光装置とその製造方法 |
US8518748B1 (en) | 2011-06-29 | 2013-08-27 | Western Digital (Fremont), Llc | Method and system for providing a laser submount for an energy assisted magnetic recording head |
KR101933549B1 (ko) | 2011-07-06 | 2018-12-28 | 삼성전자주식회사 | 레이저를 이용한 반도체 칩의 제거장치 및 그의 제거방법 |
US8288204B1 (en) | 2011-08-30 | 2012-10-16 | Western Digital (Fremont), Llc | Methods for fabricating components with precise dimension control |
JP5205502B2 (ja) * | 2011-11-07 | 2013-06-05 | 株式会社東芝 | 半導体発光装置 |
US8962392B2 (en) * | 2012-03-13 | 2015-02-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Underfill curing method using carrier |
US10347609B2 (en) | 2012-05-04 | 2019-07-09 | Micron Technology, Inc. | Solid-state transducer assemblies with remote converter material for improved light extraction efficiency and associated systems and methods |
US8785326B2 (en) | 2012-05-29 | 2014-07-22 | Micron Technology, Inc. | Methods of separating solid state transducers from substrates and associated devices and systems |
US9337405B2 (en) | 2012-08-31 | 2016-05-10 | Nichia Corporation | Light emitting device and method for manufacturing the same |
JP6089507B2 (ja) * | 2012-08-31 | 2017-03-08 | 日亜化学工業株式会社 | 発光装置およびその製造方法 |
US9475151B1 (en) | 2012-10-30 | 2016-10-25 | Western Digital (Fremont), Llc | Method and apparatus for attaching a laser diode and a slider in an energy assisted magnetic recording head |
JP6155932B2 (ja) * | 2013-07-19 | 2017-07-05 | 日亜化学工業株式会社 | 発光装置 |
KR102123039B1 (ko) | 2013-07-19 | 2020-06-15 | 니치아 카가쿠 고교 가부시키가이샤 | 발광 장치 및 그 제조 방법 |
KR102411905B1 (ko) | 2013-12-02 | 2022-06-22 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 및 그 제조방법 |
CN105448904B (zh) * | 2014-09-02 | 2019-02-19 | 展晶科技(深圳)有限公司 | 发光二极管封装结构及其制造方法 |
JP6447018B2 (ja) * | 2014-10-31 | 2019-01-09 | 日亜化学工業株式会社 | 発光装置及び発光装置の製造方法 |
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JP4947569B2 (ja) * | 2006-01-26 | 2012-06-06 | シチズン電子株式会社 | 半導体発光素子及びその製造方法 |
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JP2008140873A (ja) * | 2006-11-30 | 2008-06-19 | Toyoda Gosei Co Ltd | フリップチップ実装されたiii−v族半導体素子およびその製造方法 |
-
2007
- 2007-10-22 US US11/876,404 patent/US7687810B2/en active Active
-
2008
- 2008-10-21 TW TW097140392A patent/TWI437724B/zh active
- 2008-10-22 WO PCT/IB2008/054362 patent/WO2009053916A1/en active Application Filing
- 2008-10-22 CN CN2008801124841A patent/CN101868863B/zh active Active
- 2008-10-22 JP JP2010529493A patent/JP5313256B2/ja active Active
- 2008-10-22 KR KR1020107011173A patent/KR101468905B1/ko active IP Right Grant
- 2008-10-22 EP EP08841335.6A patent/EP2206165B8/en active Active
- 2008-10-22 RU RU2010120566/28A patent/RU2477906C2/ru active
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102709451A (zh) * | 2011-03-28 | 2012-10-03 | 日东电工株式会社 | 发光二极管装置及其制造方法 |
CN103066195A (zh) * | 2013-01-25 | 2013-04-24 | 中国科学院半导体研究所 | 应用石墨烯作为导热层的倒装结构发光二极管 |
CN104465966A (zh) * | 2014-12-17 | 2015-03-25 | 江苏稳润光电有限公司 | 一种白光led封装结构及其封装方法 |
CN108292109A (zh) * | 2015-12-15 | 2018-07-17 | Asml荷兰有限公司 | 衬底保持器、光刻设备及制造器件的方法 |
US10895808B2 (en) | 2015-12-15 | 2021-01-19 | Asml Netherlands B.V. | Substrate holder, a lithographic apparatus and method of manufacturing devices |
US11579533B2 (en) | 2015-12-15 | 2023-02-14 | Asml Netherlands B.V. | Substrate holder, a lithographic apparatus and method of manufacturing devices |
CN110970536A (zh) * | 2018-09-28 | 2020-04-07 | 丰田合成株式会社 | 发光装置 |
CN110970536B (zh) * | 2018-09-28 | 2023-06-09 | 丰田合成株式会社 | 发光装置 |
Also Published As
Publication number | Publication date |
---|---|
KR101468905B1 (ko) | 2014-12-04 |
US7687810B2 (en) | 2010-03-30 |
TW200937682A (en) | 2009-09-01 |
TWI437724B (zh) | 2014-05-11 |
JP2011501428A (ja) | 2011-01-06 |
JP5313256B2 (ja) | 2013-10-09 |
RU2477906C2 (ru) | 2013-03-20 |
WO2009053916A1 (en) | 2009-04-30 |
EP2206165B8 (en) | 2018-08-29 |
KR20100085121A (ko) | 2010-07-28 |
RU2010120566A (ru) | 2011-11-27 |
US20090101929A1 (en) | 2009-04-23 |
CN101868863B (zh) | 2012-05-30 |
EP2206165A1 (en) | 2010-07-14 |
EP2206165B1 (en) | 2017-12-13 |
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