CN101768381B - 自清洁物及其制备工艺 - Google Patents
自清洁物及其制备工艺 Download PDFInfo
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- CN101768381B CN101768381B CN2009102610754A CN200910261075A CN101768381B CN 101768381 B CN101768381 B CN 101768381B CN 2009102610754 A CN2009102610754 A CN 2009102610754A CN 200910261075 A CN200910261075 A CN 200910261075A CN 101768381 B CN101768381 B CN 101768381B
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Abstract
本发明提供一种用于形成光催化涂覆层的组合物,制备所述组合物的工艺,包括包含所述组合物的光催化涂覆层的自清洁物以及制备所述自清洁物的工艺。根据本发明的组合物可通过一次涂覆和干燥过程而不需要多次涂覆和干燥过程来制备具有优秀的耐腐蚀性和可加工性的自清洁物。
Description
技术领域
本发明涉及一种用于形成光催化涂覆层的组合物、一种用于制备所述组合物的工艺、一种包括包含所述组合物的光催化涂覆层的自清洁物以及所述自清洁物的制备工艺。
背景技术
总是暴露于外部环境的外部建筑的表面外观容易由于污染因素(例如,灰尘或尘埃以及雨或雪)而被弄脏,从而为了清洁需要日常管理。因此,为了最大程度地减小管理开支的增加,相关产业已经进行了持续的研究。
对于用于基本上在室内使用的家用电器(与暴露到外部的建筑材料相反)的钢板,它们基本上与污染因素隔断,不需要清洁物质,从而缺乏相关的研究。然而,对于放置在外部的空调器,它们同样暴露于污染环境,使得它们的外观容易被弄脏。因此,相关产业已经对改善污染的计划进行了持续的研究,以将应用到建筑材料的自清洁性质与用于空调器的钢板相结合。
自清洁钢板是被提供有利用雨水等来为它们自身清洁涂覆的膜上污染源的功能的钢板,并且可根据自清洁原理而被宽泛地分为亲水自清洁钢板、光催化亲水自清洁钢板、疏水自清洁钢板等。
亲水自清洁钢板是这样的钢板,即,通过减小水在涂覆层表面的接触角(接触角:40度或更小,表面张力:30mN/m或更大)来使雨水等在涂覆的膜的整个表面上均匀地散开,并利用亲水有机聚合物为1μm至2μm的涂覆层的表面提供亲水性。所述亲水有机聚合物可包括聚烷基硅酸盐、全氢聚硅氮烷等。
光催化亲水自清洁钢板是利用具有光活化效应的TiO2等来使有机物降解并随后利用涂覆层自身的亲水性来为其提供自清洁性质的钢板。
疏水自清洁钢板是通过增大水在涂覆层表面的接触角(接触角:120度或更大,表面张力:15mN/m或更小)来排斥雨水并使雨水滚下,从而清洁涂覆膜表面上的污染源的钢板。根据构造方法,存在疏水涂覆(氟基涂覆等)、纳米结构涂覆、等离子体表面改性法等等。所述疏水涂覆是将诸如氟基材料的具有高疏水性的材料聚集在涂覆层的表面以为其提供疏水性,所述纳米结构涂覆是利用荷花中的叶子结构的涂覆,该叶子结构提供具有纳米尺寸的纤毛结构的微小尺寸的突起来表现出超疏水性,所述等离子体表面改性法是通过等离子体处理来为表面提供疏水性的方法。
涂覆有亲水有机聚合物的自清洁钢板是在涂覆膜的表面上聚集亲水厚膜(厚度为大约20μm)形式的有机树脂,从而利用雨水等来清洗并清洁污染物的钢板。其优点在于它便宜并容易确保耐腐蚀和防静电效果,然而,其缺点在于需要至少5μm厚度的膜来确保其它物理特性。
另外,利用TiO2的光催化亲水自清洁钢板是通过紫外线利用光催化剂的表面氧化反应来将污染物降解并进行清洁的钢板,光催化剂能够被形成为薄膜(<1μm)并且在去除NOx、SOx等方面有用,然而,其缺点在于仅在紫外线照射下经过光反应来表现出自清洁性质。
此外,应该注意的是,光催化亲水自清洁钢板利用多孔硅石-金属纳米复合材料来表现出超亲水性。所述表现出超亲水性的自清洁钢板可在不照射紫外线的情况下表现出超亲水性。因此,其优点在于可以应用到室内应用领域和室外应用领域,然而,其缺点在于需要开发可应用到涂覆钢板的技术。
疏水自清洁钢板的氟基疏水自清洁钢板是表面上的氟化合物为其提供疏水性,从而用水去除污染物的钢板。其优点在于污染物的沉积少,然而,其缺点在于氟基化合物难以在表面上聚集,并且在油污的污染环境中的冲洗能力被降低。此外,具有纳米突起结构的疏水自清洁钢板是形成了疏水纳米突起,从而用水去除污染物的钢板。其优点在于污染物的沉积少并且冲洗能力好,然而,其缺点在于在加工之后难以保持纳米突起结构,即,耐久性差。
此外,除了上面描述的各个缺点,由于上面描述的传统自清洁钢板仅考虑了自清洁性质,所以它们还存在被应用到需要好的耐腐蚀性和可加工性的应用领域时受到限制的问题。
发明内容
技术问题
因此,本发明意图提供一种具有优良的耐腐蚀性和可加工性以及优良的自清洁性质的自清洁物及其制备工艺。
技术方案
本发明提供一种组合物,其特征在于该组合物包含SiO2溶胶、硅烷和TiO2溶胶的共水解缩合物(cohydrolysis condensate),其中,所述共水解缩合物包含-Si-O-Ti-单元。本发明提供一种制备所述组合物的工艺、包括包含所述组合物的光催化涂覆层的自清洁物以及用于制备所述自清洁物的工艺。
根据本发明的一方面,提供了一种组合物,其特征在于包含SiO2溶胶、硅烷和TiO2溶胶的共水解缩合物,其中,所述共水解缩合物包含下面的式1中的单元:
[式1]
-Si-O-Ti-
根据本发明的另一方面,提供了一种制备SiO2溶胶、硅烷和TiO2溶胶的共水解缩合物的工艺,所述工艺包括以下步骤:制备硅烷溶液的步骤;将SiO2溶胶和TiO2溶胶的混合溶液与所述硅烷溶液混合,以进行SiO2溶胶、硅烷和TiO2溶胶的溶胶-凝胶反应的步骤。
根据本发明的又一方面,提供了一种SiO2溶胶、硅烷和TiO2溶胶的共水解缩合物,其中,所述共水解缩合物由根据本发明的工艺来制备。
根据本发明的又一方面,提供了一种自清洁物,所述自清洁物包括:基底;涂覆层,包含涂覆到所述基底上的组合物,其中,所述组合物为根据本发明的组合物。
有益效果
根据本发明的组合物可通过一次涂覆和干燥过程而不需要多个涂覆和干燥过程来制备具有优良的耐腐蚀性和可加工性的自清洁物。
附图说明
图1是本发明的涂覆层的横截面的SEM照片。
图2是本发明的涂覆层的XPS分析结果。
图3是本发明的涂覆层的水接触角测试的结果。
图4是本发明的涂覆层的室外暴露测试的结果。
图5是本发明的涂覆层的耐腐蚀性测试的结果。
图6是根据对比示例的涂覆层的耐腐蚀性测试的结果。
图7是本发明的涂覆层的涂覆粘合测试的结果。
图8是本发明的涂覆层的有机物降解测试的结果。
图9是根据本发明的组合物的溶解状态对比测试的结果。
具体实施方式
本发明提供一种组合物,其特征在于该组合物包含SiO2溶胶、硅烷和TiO2溶胶的共水解缩合物,其中,所述共水解缩合物包含下面的式1的单元:
[式1]
-Si-O-Ti-
本发明的特征在于为了形成自清洁涂覆层,没有使用分别制备SiO2溶胶和TiO2溶胶然后简单地且物理地混合的组合物,而是使用了这样一种组合物,其中,通过利用硅烷、SiO2溶胶和TiO2溶胶一起进行溶胶-凝胶反应来使硅烷和SiO2溶胶中存在的Si和TiO2溶胶中存在的Ti化学结合。
本组合物使用SiO2溶胶。SiO2溶胶被用于增强本组合物的耐腐蚀性和稳定性。
在一个实施例中,所述SiO2溶胶不特别限定,而是可以是将纳米尺寸的硅石分散在水中得到的SiO2溶胶。如果使用了纳米尺寸的硅石,可提高溶液的耐腐蚀性、稳定性以及膜的耐刮擦性。在一方面,纳米尺寸的硅石可以是直径为5nm至20nm的硅石。包含在SiO2溶胶中的硅石的含量比例可以是按重量计20%至40%,然而不限于此。将硅石以水分散SiO2溶胶的形式引入是因为被用作硅石的分散介质的水可被用作硅烷、SiO2溶胶和TiO2溶胶的溶胶-凝胶反应中出现的硅烷的共水解浓缩所需的水。
在另一实施例中,所述SiO2溶胶可以是酸性或中性SiO2溶胶。在本发明中,优选地,在酸性条件下进行硅烷、SiO2溶胶和TiO2溶胶的溶胶-凝胶反应。这是因为所述溶胶-凝胶反应中出现的共水解浓缩需要酸性催化剂。如果使用了碱性SiO2溶胶,不仅需要执行通过进一步添加酸来控制pH的二次处理过程,而且在引入酸时还会使与碱稳定的硅石颗粒的稳定性降低,从而使硅石沉淀。然而,与碱性的SiO2溶胶相比,酸性的SiO2溶胶具有良好的与基底的反应性和粘附性。因此,当使用酸性的SiO2溶胶时,提高了溶液的稳定性和涂覆之后的膜的透明度。
在其它实施例中,相对于组合物的总重量为100份,可基于硅石的固体组分包含按重量计1份至20份所述SiO2溶胶。
如果包含按重量计小于1份的量的SiO2溶胶,则本组合物的耐腐蚀性和稳定性降低。如果包含按重量计大于20份的量的SiO2溶胶,则利用本组合物形成的膜的透明度降低,并且膜在处理基底的时候易碎。
本组合物还包含硅烷。硅烷用作将要涂覆自清洁涂覆层的组件与硅石之间(或硅石与硅石之间)的结合物。
在本发明的一个实施例中,所述硅烷可以是从由以下物质组成的组中选择的一种组分或至少两种组分的共水解缩合物:四甲氧基硅烷、四乙氧基硅烷、甲基三甲氧基硅烷、甲基三乙氧基硅烷、二甲基二甲氧基硅烷、二甲基二乙氧基硅烷、苯基三甲氧基硅烷、二苯基二甲氧基硅烷、癸基三甲氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、2-(3,4-环氧环己基)-乙基三甲氧基硅烷、3-环氧丙氧基丙基三甲氧基硅烷、3-环氧丙氧基丙基甲基二乙氧基硅烷、3-环氧丙氧基丙基三乙氧基硅烷、3-甲基丙烯酰氧基丙基甲基二甲氧基硅烷、3-甲基丙烯酰氧基丙基甲基二乙氧基硅烷、3-甲基丙烯酰氧基丙基三甲氧基硅烷、3-甲基丙烯酰氧基丙基三乙氧基硅烷、N-(2-氨乙基)-3-氨丙基甲基二甲氧基硅烷、N-(2-氨乙基)-3-氨丙基三甲氧基硅烷、N-(2-氨乙基)-3-氨丙基三乙氧基硅烷、3-氨丙基三甲氧基硅烷、3-氨丙基三乙氧基硅烷。
硅烷是形成膜的主要成分。为了提高膜的形成和干燥速度,优选地,使用四官能团硅烷和三官能团硅烷的组合物。如果只使用四官能团硅烷,则膜易碎且溶液的分子量被最大化,稳定性较低。如果只使用三官能团硅烷,则干燥速度和后固化速度不够,导致硅烷粘结到线带辊(line strip roll)的现象,这容易在堆叠时导致堵塞现象。
在一个实施例中,优选地,相对于组合物的总重量为100份,可包含按重量计1份至30份的量的所述硅烷。在上述范围内,膜可以满足例如硬度、干燥速度、后固化速度的优选的物理特性。
本组合物还包含TiO2溶胶。TiO2溶胶是通过光催化性能来为涂覆有本组合物的构件提供自清洁效果的成分。
光催化剂表现出光催化反应的波长是具有大约40nm波长的近紫外线。光催化反应是反应部位被限制在催化剂的表面的多相催化反应。
当光催化剂TiO2被光照时,下面的三个反应同时发生。
1)产生电子(e-)和空穴(h+)来与空气中的H2O反应,其中进行了空气中的O2与e-的反应以及H2O与h+的反应。
2)在TiO2的表面上产生两种活性氧,过氧化物阴离子(O2-)和氢氧根(OH-)。
3)Ti和H2O反应来形成具有与TiO2的表面上的水有非常好的亲和力的Ti-OH。
所有这些光催化反应的反应率在某种程度上与光强度成比例,在光强度为250W/m2或更强时与光强度的平方根成比例。
光催化反应表现出的特性被宽泛地分为两类,即,氧化降解性质和超亲水性。
光催化剂的氧化降解性质有利于强氧化性能。光催化剂中作为氧化能力的来源的氢氧根的氧化能力是臭氧或氯之类的氧化剂的氧化能力的大约2倍,因此,通过光催化反应来使附着到表面的污染物、细菌、异味、NOx等降解来提供自清洁效果。
光催化剂的超亲水性表现出高的亲水性,当TiO2表面照射有紫外线并被润湿时,使其具有5°或更小的水接触角,接触角表现出亲水性的测量结果。如果条件是最佳的,可以表现出接近0°的接触角。当光照停止时,反应维持几小时至一星期,然后逐渐返回光照之前的疏水条件。如果再次光照,则表现出亲水性并成为半永久条件。这种利用光催化剂的超亲水性允许水在表面上分散,使得污染物难以附着到表面上,并且如果污染物附着到表面上,则容易利用雨水等来冲洗。因此,组合物表现出自清洁效果。
本组合物可通过一次涂敷而不需要分别涂敷Si基膜和TiO2膜来形成表现出耐腐蚀性、可加工性和自清洁性质的膜。Si具有与钢板的粘合性,而Ti不附着到钢板。因此,虽然在通过溶胶-凝胶反应的组合物中存在混合的Ti和Si,但是大部分Ti位于膜的表面上,形成光催化自清洁膜。
在本发明的一个实施例中,TiO2溶胶可以是酸性或中性TiO2。
通常,如果粉末形式的TiO2简单地与诸如SiO2等的粘合剂混合,则混合不好。具体地说,如果添加很多的TiO2,则不仅难以将其与主树脂混合,而且难以获得稳定的溶液。此外,即使将它们混合,涂覆之后的表面外观变得模糊并且粘合效果降低而导致碎裂现象。结果,没有形成坚硬的膜,并因此导致耐腐蚀性和自清洁性质下降。如果使用简单混合的TiO2溶胶与SiO2溶胶,则它们的混合溶液表现出过粘的状态,使得难以涂覆,而且当将其涂覆到物体上时,由于它的粘合性低并且耐腐蚀性低,所以也难以涂覆为涂覆层。为了避免这些问题,这里将分散到水中的TiO2溶胶(而不是粉末形式的TiO2)来与硅烷和SiO2溶胶一起进行溶胶-凝胶反应。以分散到水中的TiO2溶胶的形式来引入TiO2的另一个原因是被用作TiO2的分散介质的水可被用作硅烷、SiO2溶胶和TiO2溶胶的溶胶-凝胶反应中进行的硅烷的共水解浓缩所需的水。
特别地,如果使用酸性TiO2溶胶,则可期望由于对金属表面的侵蚀作用而提高粘合性。此外,优选地,不需要额外为硅烷、SiO2溶胶和TiO2溶胶的溶胶-凝胶反应引入酸。即,酸性TiO2溶胶可用作对硅烷、SiO2溶胶和TiO2溶胶的溶胶-凝胶反应中进行的硅烷的共水解浓缩的酸性催化剂的替代物。
在一个实施例中,相对于组合物的总重量为100份,可包含按重量计5份至60份的量的所述TiO2溶胶。如果包含的TiO2溶胶的量按重量计小于5份的量,则光催化反应不充分。如果包含的TiO2溶胶的量按重量计大于60份的量,则粘性效果太弱以至于不形成膜。
本组合物还可包含从由有机酸盐、无机酸盐和金属氢氧化物组成的组中选择的至少一种用于耐腐蚀的添加剂。
在本发明的一个实施例中,优选地,所述金属与Si化学地结合(与Ti相似),以包含由下面的式2表示的单元。
[式2]
-Si-O-M-
其中,M表示金属。
所述金属可以是从由Al、Ti、Mo、V、Mn、Mg和Zr组成的组中选择的至少一种金属。
在其它实施例中,所述金属可以是从由Ti、Zr、V和Mn组成的组中选择的至少一种金属。
例如,本组合物中使用的用于耐腐蚀的添加剂可以是从由所述至少一种金属的磷酸盐、硝酸盐、碳酸盐、醋酸盐和氢氧化物组成的组中选择的至少一种组分。优选地,使用Ti、Zr、V和Mn的无机酸盐和改性磷酸盐的组合物。
在本发明的一个实施例中,相对于组合物的总重量为100份,可包含按重量计0.1份至5份的量的所述用于耐腐蚀的添加剂。如果包含按重量计少于0.1份的量的所述用于耐腐蚀的添加剂,则对提高膜的耐腐蚀性没有帮助。如果包含按重量计多于5份的量的所述用于耐腐蚀的添加剂,则溶液稳定性降低,使得溶液会凝胶化。
本组合物还可包含有机溶剂、用于形成表面的添加剂、水等。
所述有机溶剂可包括但不限于:例如,醇类,例如甲醇、乙醇、异丙醇、正-丁醇或亲水有机溶剂,如乙二醇、丙二醇、丁基溶纤剂、乙基溶纤剂、双丙酮醇、乙酰丙酮。优选地,相对于组合物的总重量为100份,可包含按重量计5份至30份的量的亲水有机溶剂。如果包含按重量计少于5份的量的有机溶剂,则溶液稳定性降低并且溶液干燥速度变慢。此外,如果包含按重量计大于30份的量的有机溶剂,则溶剂的蒸发导致在辊工作时的可操作性出现许多问题,并且在固化时蒸发的溶剂导致有害的蒸汽等问题。
关于用于形成表面的所述添加剂,可以添加消泡剂、均染剂等,并且相对于组合物的总重量为100份,可包含按重量计1份至10份的量的用于形成表面的添加剂。
此外,相对于组合物的总重量为100份,可包含按重量计30份至90份的量的水和按重量计5份至50份的量的固体组分(solid content)。
基于固体组分的浓度,根据本发明的组合物具有按质量计5%至50%的浓度。
此外,本发明提供一种用于制备SiO2溶胶、硅烷和TiO2溶胶的共水解缩合物的工艺,该工艺包括以下步骤:
制备硅烷溶液的步骤;
将SiO2溶胶和TiO2溶胶的混合溶液与所述硅烷溶液混合的步骤,以进行SiO2溶胶、硅烷和TiO2溶胶的溶胶-凝胶反应,以及SiO2溶胶、硅烷和TiO2溶胶的共水解浓缩,其特征在于按照该工艺来制备所述共水解缩合物。
如上所述,Si和Ti可通过进行SiO2溶胶、硅烷和TiO2溶胶的溶胶-凝胶反应来使Si和Ti化学地结合。与将SiO2和TiO2简单地混合来得到不好的SiO2和TiO2的混合物的光催化涂覆的组合物不同,可以更好地涂覆通过上述工艺制备的组合物,且由于Si和Ti之间的化学结合而不使固体组分凝固。
优选地,通过搅拌硅烷和从由金属的有机酸盐、无机酸盐和氢氧化物组成的组中选择的至少一种用于耐腐蚀的添加剂来制备所述硅烷溶液。在这种情况下,金属可与Si形成以上如式2的化学键来提高耐腐蚀性。
此外,本发明提供一种自清洁物,所述自清洁物包括:基底;涂覆层,包含涂覆在所述基底上的根据本发明的组合物。
传统的由有机涂覆层、包含SiO2的无机底层和光催化自清洁层组成的光催化自清洁物需要几个层的涂覆和固化工艺,而根据本发明的自清洁物的特征在于通过一次涂覆来形成膜,以具有耐腐蚀性、可加工性和自清洁性质。
更具体地说,根据本发明的一方面,其特征在于所述涂覆层是通过在基底上顺序地形成包含[-Si-O-]单元的用于提高粘合性的层、包含[-Si-O-M-]单元的用于提高耐腐蚀性的层(其中,M表示金属)、包含[-Si-O-Ti-]单元的自清洁层来获得的。
即,在根据本发明的涂覆层中,在一个涂覆层中顺序地形成用于提高粘合性的层、用于提高耐腐蚀性的层和自清洁层。
因此,如从下面的示例可知的,涂覆有本组合物的自清洁物表现出优良的自清洁性质、超亲水性、耐腐蚀性、涂覆粘合性和有机物降解性质。
在一个实施例中,所述自清洁物可以是钢板。在一方面中,所述钢板可以是镀锌钢板。这里,镀锌钢板包括例如电镀锌钢板、热浸镀锌钢板、除了锌以外混合镀覆铝和/或硅的钢板等。
此外,本发明提供一种制备自清洁物的工艺,该工艺包括将所述组合物涂覆到基底的表面上并随后进行固化。
在一个实施例中,可通过在20℃至110℃固化并空气冷却或在110℃至300℃固化并水冷却来执行所述固化。更优选地,可通过在30℃至110℃固化并空气冷却或在200℃至250℃固化并水冷却来执行所述固化。
不具体地限定所述固化温度,而是如果需要可以随意地选择。然而,优选地,在20℃至110℃固化并进行空气冷却。如果在这样的低温固化之后水冷却,应该理解的是,未固化部分中的无机组分将被冲走。
在其它实施例中,可执行少于1小时的所述固化。优选地,可执行小于30分钟,更优选地,执行小于10分钟,最优选地,执行少于一分钟,或者,执行几秒钟,即,执行1秒至10秒的很短的时间的固化。
将参照如下详细解释的示例来明白本发明的好处和特征以及获得它们的方法。然而,本发明不限于下面公开的示例,而是以各种彼此不同的构造来实施,其限制是提供这些实施例仅仅是为了完全公开本发明,并使本发明所属技术领域的技术人员知道本发明的范围。本发明仅由权利要求书的范围来限定。
示例
[示例1]
在固定有搅拌器、回流冷凝器、温度计、滴液漏斗和氮引入器的4口瓶中,相对于总溶液,将0.2份四丁氧基锆、6份氨丙基甲基二甲氧基硅烷和6份四乙氧基硅烷充分搅拌,然后混合16份TiO2溶胶(pH:2,颗粒直径:10nm,TiO2含量:20%)、8份SiO2溶胶(pH:4,颗粒直径:20nm,SiO2含量:20%)和6份去离子水,TiO2溶胶、SiO2溶胶和水在室温滴入并在放热变化的情况下充分搅拌。结果,获得了光催化剂、硅石和硅烷的透明共聚物。将44份去离子水、10份乙醇和1份偏钒酸铵、0.3份六氟锆酸和0.5份磷酸、均染剂和消泡剂引入到合成的溶液中,充分搅拌,然后用30微米过滤器进行包装。
[示例2]
在固定有搅拌器、回流冷凝器、温度计、滴液漏斗和氮引入器的4口瓶中,相对于总溶液,将0.2份四丁氧基锆、6份N-(2-氨乙基)-3-氨丙基三甲氧基硅烷和6份甲基三甲氧基硅烷充分搅拌,然后混合16份TiO2溶胶(pH:2,颗粒直径:10nm,TiO2含量:20%)、8份SiO2溶胶(pH:4,颗粒直径:20nm,SiO2含量:20%)和6份去离子水,TiO2溶胶、SiO2溶胶和水在室温滴入并在放热变化的情况下充分搅拌。结果,获得了光催化剂、硅石和硅烷的透明共聚物。将44份去离子水、10份乙醇和0.7份偏钒酸铵、0.28份六氟锆酸和0.5份磷酸、均染剂和消泡剂引入到合成的溶液中,充分搅拌,然后用30微米过滤器进行包装。
[示例3]
在固定有搅拌器、回流冷凝器、温度计、滴液漏斗和氮引入器的4口瓶中,相对于总溶液,将0.2份四丁氧基锆、6份N-(2-氨乙基)-3-氨丙基三乙氧基硅烷和6份四乙氧基硅烷充分搅拌,然后混合16份TiO2溶胶(pH:2,颗粒直径:10nm,TiO2含量:20%)、8份SiO2溶胶(pH:4,颗粒直径:20nm,SiO2含量:20%)和6份去离子水,TiO2溶胶、SiO2溶胶和水在室温滴入并在放热变化的情况下充分搅拌。结果,获得了光催化剂、硅石和硅烷的透明共聚物。将44份去离子水、10份乙醇和0.7份偏钒酸铵、0.28份六氟锆酸和0.5份磷酸、均染剂和消泡剂引入到合成的溶液中,充分搅拌,然后用30微米过滤器进行包装。
[示例4]
在固定有搅拌器、回流冷凝器、温度计、滴液漏斗和氮引入器的4口瓶中,相对于总溶液,将0.2份四丁氧基锆、6份氨丙基三甲氧基硅烷和6份四乙氧基硅烷充分搅拌,然后混合16份TiO2溶胶(pH:2,颗粒直径:10nm,TiO2含量:20%)、8份SiO2溶胶(pH:4,颗粒直径:20nm,SiO2含量:20%)和6份去离子水,TiO2溶胶、SiO2溶胶和水在室温滴入并在放热变化的情况下充分搅拌。结果,获得了光催化剂、硅石和硅烷的透明共聚物。将44份去离子水、10份乙醇和0.7份偏钒酸铵、0.28份六氟锆酸和0.5份磷酸、均染剂和消泡剂引入到合成的溶液中,充分搅拌,然后用30微米过滤器进行包装。
[示例5]
在固定有搅拌器、回流冷凝器、温度计、滴液漏斗和氮引入器的4口瓶中,相对于总溶液,将0.2份四丁氧基锆、6份氨丙基三甲氧基硅烷和6份四乙氧基硅烷充分搅拌,然后混合16份TiO2溶胶(pH:2,颗粒直径:10nm,TiO2含量:20%)、6份SiO2溶胶(pH:4,颗粒直径:20nm,SiO2含量:20%)和6份去离子水,TiO2溶胶、SiO2溶胶和水在室温滴入并在放热变化的情况下充分搅拌。结果,获得了光催化剂、硅石和硅烷的透明共聚物。将44份去离子水、10份乙醇和0.7份偏钒酸铵、0.28份六氟锆酸和0.5份磷酸、均染剂和消泡剂引入到合成的溶液中,充分搅拌,然后用30微米过滤器进行包装。
[示例6]
在固定有搅拌器、回流冷凝器、温度计、滴液漏斗和氮引入器的4口瓶中,相对于总溶液,将0.2份四丁氧基锆、6份氨丙基三甲氧基硅烷和6份四甲氧基硅烷充分搅拌,然后混合16份TiO2溶胶(pH:2,颗粒直径:10nm,TiO2含量:20%)、8份SiO2溶胶(pH:4,颗粒直径:20nm,SiO2含量:20%)和6份去离子水,TiO2溶胶、SiO2溶胶和水在室温滴入并在放热变化的情况下充分搅拌。结果,获得了光催化剂、硅石和硅烷的透明共聚物。将44份去离子水、10份乙醇和0.7份偏钒酸铵、0.28份六氟锆酸和0.5份磷酸、均染剂和消泡剂引入到合成的溶液中,充分搅拌,然后用30微米过滤器进行包装。
对比示例
[对比示例1]
将16份TiO2溶胶(pH:2,颗粒直径:10nm,TiO2含量:20%)、8份SiO2溶胶(pH:4,颗粒直径:20nm,SiO2含量:20%)和60份去离子水混合,在室温充分搅拌,然后引入10份乙醇和0.7份偏钒酸铵、0.28份六氟锆酸和0.5份磷酸、均染剂和消泡剂,充分搅拌,然后用30微米过滤器进行包装。
[对比示例2]
在固定有搅拌器、回流冷凝器、温度计、滴液漏斗和氮引入器的4口瓶中,相对于总溶液,将0.2份四丁氧基锆、6份氨丙基三甲氧基硅烷和6份四乙氧基硅烷充分搅拌30分钟,然后在室温下在2小时内混合并缓慢滴入40份去离子水和2份醋酸。在滴入之后,混合物在室温下搅拌24小时。获得了透明的硅烷共聚物。将16份TiO2溶胶(pH:2,颗粒直径:10nm,TiO2含量:20%)、8份SiO2溶胶(pH:4,颗粒直径:20nm,SiO2含量:20%)和4份去离子水、10份乙醇和0.7份偏钒酸铵、0.28份六氟锆酸和0.5份磷酸、均染剂和消泡剂引入到合成的溶液中并充分搅拌30分钟,然后用30微米过滤器进行包装。
试验示例
1、自清洁涂覆层的形成
基于一面的涂覆量为60g/m2的热浸镀锌钢板(GI)被用作在其上涂覆表面处理组合物的素材钢板(板厚=0.5mm)。所述热浸镀锌钢板利用硅酸盐碱脱脂剂在20g/L以及温度为60℃的条件下放置2分钟,然后在去离子水中清洗2分钟,然后将热空气干燥过的板用作样本板。
对于示例1中制备的自清洁树脂组合物的涂覆,利用连续滚涂覆模拟器将树脂组合物以2μm或小于2μm的厚度涂覆到样本的上部,在20℃至110℃的PMT条件下固化并然后空气冷却,或者在110℃至300℃的PMT条件下固化并水冷却。膜的涂覆量为500mg/m2至1100mg/m2。
利用扫描电子显微镜(JEOL JSM-7001F)来测量涂覆样本的剖面。结果,如从图1可见,确定树脂层的厚度为大约0.89μm。
2、XPS分析(X-射线光电子能谱)
随着时间过去沿深度方向利用XPS(PHI Quantera SXM,Bema size:9μm,Anode type:monochromated Al kα)来测量涂覆层的组分。结果,如从图2可见,初始的TiO2树脂的量高,然而随着时间过去,Zn层的量增多同时TiO2减少。因此,可以确定TiO2涂覆层存在于涂覆层表面的最上部分。
3、测量接触角
在涂覆有自清洁溶液的钢板表面上测试水接触角。通过接触角测量仪(Drop Shape Analysis System KRUSS DSA100S)在水滴从微量调节注射器滴落到样本表面上之后的10秒内来测量水接触角。结果,如从图3可见,涂覆有本发明的自清洁树脂组合物的钢板的水接触角在UV照射之前是12°,在UV照射后是9°,从而表现出超亲水性。然而,用于对比的其它自清洁钢板(商品名:BeckeryFresh)的水接触角为60°~70°,POSCO GI无铬钢板(商品名:POS-G-Green)的水接触角为50°。
4、室外暴露测试
利用炭黑、氧化铁、烟灰和标记笔污染的钢板暴露到室外4个月,以观测自清洁效果。结果,如从图4可见,与GI未处理钢板和无铬钢板相比,光催化自清洁钢板具有更好的表面清洁度。
5、耐腐蚀性试验
在平坦部位的喷盐测试(S.S.T.)中,将涂覆的样本储存在5%的NaCl和35℃下测试72小时来观察白锈。另外,在处理部位的S.S.T.测试中,接着执行Erichsen测试(6mm),在5%的NaCl和35℃下测试24小时来观察白锈。结果,如图5所示,能够确定涂覆有本发明的示例1中的光催化树脂组合物的钢板表现出等于或超过与无铬钢板相比的耐腐蚀性,并且处理部位也具有优良的耐腐蚀性。然而,作为观察如对比示例2所制备的涂覆有将TiO2溶胶和SiO2溶胶简单地混合的树脂组合物的钢板的耐腐蚀性结果,如从图6可见,可以确定其具有差的耐腐蚀性,从24小时开始产生白锈并且在72小时内长满白锈。
6、涂覆粘合试验
涂覆膜经受交叉锉纹剥离测试(在执行交叉锉纹Erichsen测试(6mm)后进行胶带剥离测试)。在膜上刻划11条间隔1mm的到达基底的水平和垂直线,已形成100个1mm2的图案,将胶带附着到图案上并快速移除。结果,如从图7可见,涂覆有根据本发明的示例1的树脂组合物的钢板表现出优良的涂覆粘合性。
7、有机物降解测试
将10mg/l的亚甲蓝溶液滴落到涂覆钢板上,并用UV光照射10分钟来观察着色。结果,如从图8可见,通过亚甲蓝的颜色随着时间过去而逐渐变浅,确定根据本发明的涂覆层表现出降解有机物的性能。
8、树脂组合物溶液的对比状态的测试
在溶液状态方面将根据本发明的树脂组合物溶液与根据对比示例1的将TiO2溶胶和SiO2溶胶的简单混合的情况进行对比。结果,如从图9可见,能够确定TiO2溶胶和SiO2溶胶的简单混合溶液(左侧)表现出不透明的颜色和粘附态,从而不适于涂覆。
Claims (14)
1.一种自清洁物,所述自清洁物包括:
基底;
涂覆层,涂覆到所述基底上,
其中,所述涂覆层包括包含SiO2溶胶、硅烷和TiO2溶胶的共水解缩合物的组合物,
其中,所述共水解缩合物包含下面的式1中的单元:
[式1]
-Si-O-Ti-
其中,所述涂覆层是通过在基底上顺序形成包含[-Si-O-]单元的用于提高粘合性的层、包含[-Si-O-M-]单元的用于提高耐腐蚀性的层、包含[-Si-O-Ti-]单元的自清洁层来获得的层,其中,M表示金属。
2.如权利要求1所述的自清洁物,其中,所述基底为钢板。
3.如权利要求2所述的自清洁物,其中,所述钢板为镀锌钢板。
4.如权利要求1所述的自清洁物,其中,所述SiO2溶胶是将纳米尺寸的硅石分散到水中得到的溶胶。
5.如权利要求1所述的自清洁物,其中,所述SiO2溶胶是酸性或中性SiO2溶胶。
6.如权利要求1所述的自清洁物,其中,相对于组合物的总重量为100份,包含按重量计1份至20份的量的所述SiO2溶胶。
7.如权利要求1所述的自清洁物,其中,所述硅烷是从由以下物质组成的组中选择的一种组分或至少两种组分的共水解缩合物:四甲氧基硅烷、四乙氧基硅烷、甲基三甲氧基硅烷、甲基三乙氧基硅烷、二甲基二甲氧基硅烷、二甲基二乙氧基硅烷、苯基三甲氧基硅烷、二苯基二甲氧基硅烷、癸基三甲氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、2-(3,4-环氧环己基)-乙基三甲氧基硅烷、3-环氧丙氧基丙基三甲氧基硅烷、3-环氧丙氧基丙基甲基二乙氧基硅烷、3-环氧丙氧基丙基三乙氧基硅烷、3-甲基丙烯酰氧基丙基甲基二甲氧基硅烷、3-甲基丙烯酰氧基丙基甲基二乙氧基硅烷、3-甲基丙烯酰氧基丙基三甲氧基硅烷、3-甲基丙烯酰氧基丙基三乙氧基硅烷、N-(2-氨乙基)-3-氨丙基甲基二甲氧基硅烷、N-(2-氨乙基)-3-氨丙基三甲氧基硅烷、N-(2-氨乙基)-3-氨丙基三乙氧基硅烷、3-氨丙基三甲氧基硅烷、3-氨丙基三乙氧基硅烷。
8.如权利要求1所述的自清洁物,其中,相对于组合物的总重量为100份,包含按重量计1份至30份的量的所述硅烷。
9.如权利要求1所述的自清洁物,其中,所述TiO2溶胶是酸性或中性TiO2溶胶。
10.如权利要求1所述的自清洁物,相对于组合物的总重量为100份,包含按重量计5份至60份的量的所述TiO2。
11.如权利要求1所述的自清洁物,所述组合物还包括从由金属的有机酸盐、无机酸盐和氢氧化物组成的组中选择的用于耐腐蚀的至少一种添加剂。
12.如权利要求11所述的自清洁物,所述组合物包含由式2表示的单元:
[式2]
-Si-O-M-
其中,M表示金属。
13.如权利要求11所述的自清洁物,其中,所述金属是从由Al、Ti、Mo、V、Mn、Mg和Zr组成的组中选择的至少一种金属。
14.如权利要求11所述的自清洁物,其中,相对于组合物的总重量为100份,包含按重量计0.1份至5份的量的用于耐腐蚀的所述添加剂。
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Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100748300B1 (ko) * | 2005-08-23 | 2007-08-09 | 가부시키가이샤 니프코 | 연료이송펌프 |
US9239558B2 (en) * | 2009-03-11 | 2016-01-19 | Xerox Corporation | Self-releasing nanoparticle fillers in fusing members |
KR100970462B1 (ko) * | 2010-02-09 | 2010-07-16 | 엘베스트지에이티 주식회사 | 에너지 절감형 방식용 금속도막 조성물 및 그 제조방법 |
CN104685099A (zh) | 2012-08-29 | 2015-06-03 | Ppg工业俄亥俄公司 | 含锂的锆预处理组合物,处理金属基材的相关方法,和相关的经涂覆的金属基材 |
AU2013309270B2 (en) | 2012-08-29 | 2016-03-17 | Ppg Industries Ohio, Inc. | Zirconium pretreatment compositions containing molybdenum, associated methods for treating metal substrates, and related coated metal substrates |
CN102888588B (zh) * | 2012-09-20 | 2014-08-06 | 北京航空航天大学 | 一种超双疏金属表面及其制备方法 |
CN102924985B (zh) * | 2012-11-01 | 2015-09-09 | 长沙皇美涂料有限公司 | 无烟无味无机纳米耐高温防腐耐磨涂料及其制备方法 |
RU2674057C2 (ru) * | 2012-12-25 | 2018-12-04 | Акцо Нобель Коатингс Интернэшнл Б.В. | Покрывная композиция, способ ее получения и ее применение |
KR101723329B1 (ko) * | 2013-04-26 | 2017-04-04 | 니혼 파커라이징 가부시키가이샤 | 수성 친수화 표면 처리제, 친수성 피막 및 친수화 표면 처리 방법 |
CN103691414B (zh) * | 2013-12-02 | 2015-06-10 | 南京倍立达新材料系统工程股份有限公司 | 一种用于水泥基材料的高稳定中性光触媒溶胶制备方法 |
US9688866B2 (en) | 2013-12-27 | 2017-06-27 | Industrial Technology Research Institute | Method of manufacturing hydrophobic antifouling coating material and method of forming hydrophobic antifouling coating film |
KR101696035B1 (ko) * | 2014-11-14 | 2017-01-13 | 주식회사 포스코 | 환경 호르몬 분해 조성물, 이를 이용한 코팅 강판 및 제조 방법 |
RU2729485C1 (ru) | 2016-08-24 | 2020-08-07 | Ппг Индастриз Огайо, Инк. | Железосодержащая композиция очистителя |
JP7148237B2 (ja) * | 2017-11-02 | 2022-10-05 | 株式会社放電精密加工研究所 | アルマイト材の代替材料に用いることができる表面被覆基材、その基板表面にトップコート層を形成するための塗料組成物 |
CN110317476B (zh) * | 2018-03-28 | 2021-08-06 | 新材料与产业技术北京研究院 | 纳米功能涂料及其制备方法和应用 |
CN108659581A (zh) * | 2018-04-27 | 2018-10-16 | 成都今天化工有限公司 | 一种制备超耐磨纳米钛瓷涂料的方法 |
CN109021823A (zh) * | 2018-08-23 | 2018-12-18 | 上海金力泰化工股份有限公司 | 一种具有真石效果的陶瓷涂料及其应用方法 |
CN109433174B (zh) * | 2018-10-16 | 2021-11-12 | 上海申得欧有限公司 | 硅酸盐包覆二氧化钛光触媒粉体及其制备方法 |
CN111117328A (zh) * | 2018-10-30 | 2020-05-08 | 3M创新有限公司 | 一种具有光催化性能的抗污组合物的制备方法 |
KR102265628B1 (ko) | 2019-08-06 | 2021-06-16 | 충남대학교산학협력단 | 가시광 조사에 의한 내오염성 및 발수성을 갖는 자기세정용 조성물 |
CN115368025B (zh) * | 2022-06-17 | 2024-06-14 | 苏州京程材料有限公司 | 一种抗污自洁的玻璃基材及其制备方法 |
CN115466420A (zh) * | 2022-09-30 | 2022-12-13 | 陕西科技大学 | 一种自清洁反光膜及其制备方法 |
EP4442771A1 (en) * | 2023-04-05 | 2024-10-09 | Papadopoulos Nikolaos-Xafakis Sotirios G.P. | Antifouling and antistatic coatings through automated application |
CN116694228A (zh) * | 2023-05-17 | 2023-09-05 | 国网山东省电力公司微山县供电公司 | 一种抗老化防污闪涂料及其使用方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1375615A2 (en) * | 2002-06-18 | 2004-01-02 | Shin-Etsu Chemical Co., Ltd. | Hardcoat compositions and hardcoated articles |
CN101288835A (zh) * | 2008-06-02 | 2008-10-22 | 大连工业大学 | TiO2-SiO2复合气凝胶及其制备方法 |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1081490C (zh) * | 1995-06-19 | 2002-03-27 | 日本曹达株式会社 | 载有光催化剂的构件和光催化剂涂敷材料 |
JPH09231821A (ja) * | 1995-12-22 | 1997-09-05 | Toto Ltd | 照明器具及び照度維持方法 |
JP2943681B2 (ja) * | 1996-01-12 | 1999-08-30 | 株式会社神戸製鋼所 | 耐食性および外観に優れた白色クロメート処理鋼板 |
JPH1067543A (ja) * | 1996-06-18 | 1998-03-10 | Toto Ltd | 光触媒性親水性部材 |
JP2000271491A (ja) * | 1999-01-22 | 2000-10-03 | Nissan Motor Co Ltd | 光触媒膜及びその製造方法 |
JP3868405B2 (ja) | 1999-11-08 | 2007-01-17 | 平岡織染株式会社 | 雨筋汚れ防止性に優れたテント用防汚性シート |
JP3371099B2 (ja) * | 1999-12-20 | 2003-01-27 | 日新製鋼株式会社 | 耐食性及び耐汚染性に優れた無機塗装金属板及びその製造方法 |
JP2003292896A (ja) * | 2002-04-04 | 2003-10-15 | Seiko Epson Corp | コーティング用組成物および積層体 |
US7449245B2 (en) * | 2002-07-09 | 2008-11-11 | Leibniz-Institut Fuer Neue Materialien Gemeinnuetzige Gmbh | Substrates comprising a photocatalytic TiO2 layer |
DE10245729A1 (de) * | 2002-10-01 | 2004-04-15 | Bayer Ag | Beschichtungszusammensetzung und Verfahren zu deren Herstellung |
JP4291022B2 (ja) * | 2003-03-18 | 2009-07-08 | 日本パーカライジング株式会社 | 金属材料用表面処理剤及び表面処理方法 |
JP4344155B2 (ja) * | 2003-03-20 | 2009-10-14 | 株式会社神戸製鋼所 | 表面処理亜鉛めっき鋼板および表面処理液 |
JP2004359902A (ja) | 2003-06-06 | 2004-12-24 | Matsushita Electric Works Ltd | 光触媒塗料 |
JP3952197B2 (ja) * | 2003-07-17 | 2007-08-01 | 日本ペイント株式会社 | 金属表面処理方法及び亜鉛めっき鋼板 |
DE602004014296D1 (de) * | 2003-08-15 | 2008-07-17 | Inst Tech Precision Elect | Chromfreies Mittel zur Behandlung von Metalloberflächen |
JP2005097719A (ja) | 2003-08-15 | 2005-04-14 | Hoden Seimitsu Kako Kenkyusho Ltd | 亜鉛めっき製品用非クロム表面処理剤 |
JP4526859B2 (ja) | 2004-04-13 | 2010-08-18 | 中国塗料株式会社 | 複合体、その複合体からなる塗膜で被覆された基材、塗膜付き基材の製造方法 |
US7959980B2 (en) * | 2004-05-28 | 2011-06-14 | Ppg Industries Ohio, Inc. | Hydrophilic compositions, methods for their production, and substrates coated with such compositions |
JP4776458B2 (ja) * | 2005-07-22 | 2011-09-21 | 新日本製鐵株式会社 | 耐食性、耐熱性、耐指紋性、導電性、塗装性および加工時の耐黒カス性に優れたクロメートフリー表面処理金属材 |
JP5108222B2 (ja) * | 2005-11-25 | 2012-12-26 | 宇部日東化成株式会社 | 非晶質酸化チタン含有複合膜形成用コーティング組成物、その製造方法および用途 |
JP2007144864A (ja) * | 2005-11-29 | 2007-06-14 | Sanyo Electric Co Ltd | 積層構造体およびそれを用いた冷凍装置 |
TWI340770B (en) * | 2005-12-06 | 2011-04-21 | Nippon Steel Corp | Composite coated metal sheet, treatment agent and method of manufacturing composite coated metal sheet |
CN101346493B (zh) * | 2005-12-27 | 2013-01-09 | Posco公司 | 用于油箱的经表面处理的无Cr钢板其制造方法和所用的处理组合物 |
JP5313432B2 (ja) * | 2005-12-28 | 2013-10-09 | 日本ペイント株式会社 | 金属表面処理用組成物、金属表面処理方法及び表面処理された亜鉛めっき鋼板 |
DE102006003957A1 (de) * | 2006-01-26 | 2007-08-02 | Degussa Gmbh | Wasserverdünnbare Sol-Gel-Zusammensetzung |
JP5213308B2 (ja) | 2006-03-08 | 2013-06-19 | 日本ペイント株式会社 | 金属用表面処理剤 |
CA2668700C (en) * | 2006-11-09 | 2015-10-13 | Akzo Nobel N.V. | Pigment dispersion |
JP4341752B2 (ja) * | 2006-12-11 | 2009-10-07 | 平岡織染株式会社 | 遮熱性防汚膜材 |
JP4823045B2 (ja) * | 2006-12-12 | 2011-11-24 | 旭化成ケミカルズ株式会社 | 水系光触媒組成物 |
US20090181256A1 (en) * | 2008-01-14 | 2009-07-16 | Guardian Industries Corp. | Methods of making silica-titania coatings, and products containing the same |
US9987621B2 (en) * | 2012-01-12 | 2018-06-05 | Nitto Denko Corporation | Transparent photocatalyst coating |
-
2008
- 2008-12-31 KR KR1020080138310A patent/KR101104262B1/ko active IP Right Grant
-
2009
- 2009-12-16 US US12/639,652 patent/US9322099B2/en not_active Expired - Fee Related
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- 2009-12-18 EP EP09015748.8A patent/EP2208808B1/en not_active Not-in-force
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1375615A2 (en) * | 2002-06-18 | 2004-01-02 | Shin-Etsu Chemical Co., Ltd. | Hardcoat compositions and hardcoated articles |
CN101288835A (zh) * | 2008-06-02 | 2008-10-22 | 大连工业大学 | TiO2-SiO2复合气凝胶及其制备方法 |
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EP2208808A1 (en) | 2010-07-21 |
EP2208808B1 (en) | 2016-04-06 |
CN101768381A (zh) | 2010-07-07 |
KR101104262B1 (ko) | 2012-01-11 |
JP6084760B2 (ja) | 2017-02-22 |
US20100167066A1 (en) | 2010-07-01 |
JP2010163615A (ja) | 2010-07-29 |
KR20100079749A (ko) | 2010-07-08 |
US9322099B2 (en) | 2016-04-26 |
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