CN1017182B - 在真空炉中控制气流的装置 - Google Patents

在真空炉中控制气流的装置

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Publication number
CN1017182B
CN1017182B CN90101713A CN90101713A CN1017182B CN 1017182 B CN1017182 B CN 1017182B CN 90101713 A CN90101713 A CN 90101713A CN 90101713 A CN90101713 A CN 90101713A CN 1017182 B CN1017182 B CN 1017182B
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CN
China
Prior art keywords
fan
heating clamber
heating
flow
vacuum drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CN90101713A
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English (en)
Other versions
CN1046218A (zh
Inventor
卡尔海因茨·诺帕克
考特·劳德
盖尔哈德·威尔茨格
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Degussa GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa GmbH filed Critical Degussa GmbH
Publication of CN1046218A publication Critical patent/CN1046218A/zh
Publication of CN1017182B publication Critical patent/CN1017182B/zh
Expired legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • C21D1/767—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material with forced gas circulation; Reheating thereof
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • C21D1/773—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material under reduced pressure or vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B5/16—Arrangements of air or gas supply devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B2005/062—Cooling elements
    • F27B2005/064—Cooling elements disposed in the furnace, around the chamber, e.g. coils
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B5/14—Arrangements of heating devices
    • F27B2005/143—Heating rods disposed in the chamber
    • F27B2005/146—Heating rods disposed in the chamber the heating rods being in the tubes which conduct the heating gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B5/16—Arrangements of air or gas supply devices
    • F27B2005/161—Gas inflow or outflow
    • F27B2005/164—Air supply through a set of tubes with openings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B5/16—Arrangements of air or gas supply devices
    • F27B2005/166—Means to circulate the atmosphere
    • F27B2005/167—Means to circulate the atmosphere the atmosphere being recirculated through the treatment chamber by a turbine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Furnace Details (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Drying Of Solid Materials (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Separation By Low-Temperature Treatments (AREA)
  • Vertical, Hearth, Or Arc Furnaces (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

采用二同心圆筒可控制用于加热和冷却真空炉中被处理件的气体流动。此二圆筒彼此间可作相对运动，它们沿炉子的中心线安装在加热室和风扇之间。

Description

本发明涉及真空炉中控制气流的装置，在炉中的加热室中，被处理件被加热至大约750℃温度并由一风扇搅动的气体冷却。
这类真空炉通常包括一圆柱状压力炉壳，内中有一由隔热体围成的加热室，一热交换器和一用于搅动加热和冷却气体的风扇。较可取的是，在冷却和在装炉件藉助对流加热的两个阶段中，气体是通过沿轴向装置在圆柱体状加热室表面和具有指向被处理件的喷嘴的管状加热导体被送入到加热室中的。此外，用同一个风扇搅动二处理阶段的气体。在DE-PS3736502中对此种炉作了说明。
为了确保用同样的气体既加热又冷却装炉件，真空炉需要装有一控制装置，藉助此装置可在二种气体流动方式之间切换由风扇搅动的气流。这样，在一种情况下，气体仅在真空炉的隔热加热区内部流动，而在另一种情况下，气体则通过热交换器管道流动。这些管子装置在隔热层和炉壁之间。
为实现此目的，在DE-PS3736502所说明的炉体中，在加热室和风扇的抽气一侧之间装有一箱体，此箱体装在气体分配器之中，它的多个开口指向加热室，还指向隔热层和炉壁之间的环形空间，并装有热交换管。此箱体有一滑动阀，它可由一与炉体轴线呈横向的活塞杆推动。此滑动阀按其所在位置，或者将指向加热室的开口打开，或者将指向隔热层和炉壁之间的环形空间的开口打开，与此同时将其他开口关闭。
这种结构的缺点是，滑动阀仅能密封住断面积小的开口，因而对气流将造成很大的压力损失。还有，气流对风扇是不对称的，因而使加热管周围的气流分布是不均匀的。另一种缺点是，滑动阀在它的二个极端位置之间的行程很长。需要有一个很长的致动筒，它凸出于炉壳外侧很长，从而不大可能安装在炉体内，本发明的目的是在真空炉中安装一个可控制气流的装置，在加热室中的被处理件是由一风扇搅动的气体进行加热和冷却的。此装置能使风扇的抽气口依次地与加热室或者与隔热层和装有热交换管的炉壁之间的环形空间相通。气流在径向方向上必须是完全对称的，压力损失必须极小，同时，执行装置的行程必须短。
根据本发明的目的，在加热室和风扇之间装有二个彼此可作相对运动的同心圆筒，外圆筒永久性地固定在加热室上，内圆筒藉一联杆机构，可在风扇抽气口和一固定在加热室中的挡风板之间作轴向运动。
图1至图4是根据本发明提出的控制装置的一实施例。图1和图2所示为在一真空炉中的二个极端位置上的控制装置，如DE-PS3736502所述，图3和4所示为放大的极端位置。
真空炉是由炉壳11构成的，其内部为一由隔热层12围成的，并由加热管14进行加热同时供气的加热室13。在炉壳11和隔热层12之间安装有热交换器15。
控制装置是由二同心圆筒组成的，外圆筒1永久性地固定在面对风扇的加热室13的壁2上。外圆筒是内圆筒3的导向件、内圆筒插入到外圆筒1之中，它们之间的间隙极小。内圆筒3可藉一联杆机构，在加热室13中的一挡风板5（藉助柱状螺栓4固定于加热室壁2上）和风扇周围的气体分配器7的壁之间滑动。此装置最好是由插入到炉壳内，并对炉体的中心线呈横向的轴8操作。在此轴上固定一个拨叉9，它与一杆件10咬合，此杆件横向插进内圆筒3中，并与其固定在一起。为了藉助杆件10使内圆筒3滑动，静止的外圆筒1上加工有槽。按此实施例，将轴8转动几度之后，而可使可滑动圆筒在图3和4所示的二极端位置之间滑动。
在图3所示的位置上，内圆筒3的端面紧压在气体分配器7的壁上，这样，隔热层外的炉室便与风扇抽气口隔绝了。与此同时，在挡风板5和加热室壁2之间便形成了一环形进气通气。这样，风扇6便可通过内圆筒3的中空内腔，从加热室12中将气体抽走。
在图4所示的位置，内圆筒3的另一端面紧压 在挡风板5上，从而封住了加热室13。在风扇抽气口处，一个环形气流通道便将在隔热层外的炉腔部分形成。
二个圆筒1和3最好是由硬石墨毡制成，在全部外表面上覆有石墨薄片。这种材料是耐温的。由于圆筒的重量轻，并且石墨间的摩擦力小，因而操作所需的力是小的。
环形气流通道可使流向风扇6的气流在二种工艺过程中完全是径向对称的。如果将环形间隙调整等于风扇6抽气口的横断面积，则气流的压力损失可减少至最小。可通过转动动作，例如由一小型的旋转气缸操作轴8，此气缸决不会增大安置真空炉所需的面积。

Claims (1)

1、用于控制真空炉中气流的装置，其中的真空炉包括加热室和风扇。由风扇来搅动气体对加热室中的被处理件进行加热和冷却，其特征是在加热室(13)和风扇(6)之间设置了二个同心圆筒(1，3)，它们彼此间可相对运动，外圆筒(1)永久性地固定在加热室(13)中，在风扇抽气口和固定于加热室(13)上的一挡风板(5)之间设置一联杆机构，内圆筒(3)可在联杆机构的作用下沿轴向运动。
CN90101713A 1989-03-30 1990-03-28 在真空炉中控制气流的装置 Expired CN1017182B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3910234A DE3910234C1 (zh) 1989-03-30 1989-03-30
DEP3910234.3 1989-03-30

Publications (2)

Publication Number Publication Date
CN1046218A CN1046218A (zh) 1990-10-17
CN1017182B true CN1017182B (zh) 1992-06-24

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ID=6377430

Family Applications (1)

Application Number Title Priority Date Filing Date
CN90101713A Expired CN1017182B (zh) 1989-03-30 1990-03-28 在真空炉中控制气流的装置

Country Status (20)

Country Link
US (1) US5035611A (zh)
EP (1) EP0389889B1 (zh)
JP (1) JPH02298214A (zh)
CN (1) CN1017182B (zh)
AT (1) ATE85420T1 (zh)
BG (1) BG51162A3 (zh)
BR (1) BR9001374A (zh)
CA (1) CA2013083A1 (zh)
CS (1) CS9001227A3 (zh)
DD (1) DD299673A5 (zh)
DE (2) DE3910234C1 (zh)
DK (1) DK0389889T3 (zh)
ES (1) ES2037490T3 (zh)
HR (1) HRP920580A2 (zh)
HU (1) HU207155B (zh)
PL (1) PL161410B1 (zh)
RO (1) RO105580B1 (zh)
RU (1) RU1836612C (zh)
YU (1) YU47220B (zh)
ZA (1) ZA901722B (zh)

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Also Published As

Publication number Publication date
ATE85420T1 (de) 1993-02-15
ZA901722B (en) 1990-12-28
DE3910234C1 (zh) 1990-04-12
DE59000830D1 (de) 1993-03-18
DD299673A5 (de) 1992-04-30
PL161410B1 (pl) 1993-06-30
CA2013083A1 (en) 1990-09-30
HU902027D0 (en) 1990-08-28
ES2037490T3 (es) 1993-06-16
CN1046218A (zh) 1990-10-17
DK0389889T3 (da) 1993-06-01
US5035611A (en) 1991-07-30
RU1836612C (ru) 1993-08-23
JPH02298214A (ja) 1990-12-10
BG51162A3 (en) 1993-02-15
YU57790A (en) 1992-05-28
EP0389889A1 (de) 1990-10-03
BR9001374A (pt) 1991-04-02
CS275173B2 (en) 1992-02-19
EP0389889B1 (de) 1993-02-03
HU207155B (en) 1993-03-01
HRP920580A2 (en) 1995-06-30
YU47220B (sh) 1995-01-31
CS9001227A3 (en) 1992-02-19
RO105580B1 (ro) 1992-09-25

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