CN101523289A - 包含苯甲酰甲酸酯型光引发剂的可光固化组合物 - Google Patents

包含苯甲酰甲酸酯型光引发剂的可光固化组合物 Download PDF

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Publication number
CN101523289A
CN101523289A CNA2007800368558A CN200780036855A CN101523289A CN 101523289 A CN101523289 A CN 101523289A CN A2007800368558 A CNA2007800368558 A CN A2007800368558A CN 200780036855 A CN200780036855 A CN 200780036855A CN 101523289 A CN101523289 A CN 101523289A
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China
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alkyl
phenyl
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composition
compound
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Pending
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English (en)
Chinese (zh)
Inventor
J·罗杰斯
J·本克霍夫
K·鲍威尔
T·琼
K·迪特利克
P·海奥茨
J·-L·伯鲍姆
T·沃格尔
R·休斯勒
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BASF Schweiz AG
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Ciba SC Holding AG
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Publication of CN101523289A publication Critical patent/CN101523289A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/40—Unsaturated compounds
    • C07C59/76—Unsaturated compounds containing keto groups
    • C07C59/90—Unsaturated compounds containing keto groups containing singly bound oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
    • C07C2601/10—Systems containing only non-condensed rings with a five-membered ring the ring being unsaturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Detergent Compositions (AREA)
CNA2007800368558A 2006-10-03 2007-09-24 包含苯甲酰甲酸酯型光引发剂的可光固化组合物 Pending CN101523289A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06121655.2 2006-10-03
EP06121655 2006-10-03

Publications (1)

Publication Number Publication Date
CN101523289A true CN101523289A (zh) 2009-09-02

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CNA2007800368558A Pending CN101523289A (zh) 2006-10-03 2007-09-24 包含苯甲酰甲酸酯型光引发剂的可光固化组合物

Country Status (5)

Country Link
US (1) US20100022676A1 (https=)
EP (1) EP2069866A2 (https=)
JP (1) JP2010505977A (https=)
CN (1) CN101523289A (https=)
WO (1) WO2008040650A2 (https=)

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CN102002022A (zh) * 2010-10-29 2011-04-06 苏州凯康化工科技有限公司 一种月桂酸改性环氧丙烯酸酯及其制备方法和应用
WO2011160262A1 (zh) * 2010-06-25 2011-12-29 北京英力科技发展有限公司 低挥发性苯甲酰基甲酸酯
CN102442909A (zh) * 2010-06-25 2012-05-09 北京英力科技发展有限公司 低挥发低迁移性苯甲酰基甲酸酯
CN102746785A (zh) * 2011-04-19 2012-10-24 比亚迪股份有限公司 一种双重固化涂料组合物及其固化方法
CN104423156A (zh) * 2013-09-05 2015-03-18 东友精细化工有限公司 非显示部遮光图案形成用感光性树脂组合物
CN104755507A (zh) * 2012-10-22 2015-07-01 蓝宝迪有限公司 用于led光固化的3-酮香豆素
CN106957618A (zh) * 2015-12-10 2017-07-18 科络普拉斯特弗里茨米勒有限公司 耐高温的彩色特别是橙色胶粘带以及用于制备其的方法和载体及具有此类胶粘带的电缆束
CN107239002A (zh) * 2017-07-07 2017-10-10 深圳市华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法
CN109503735A (zh) * 2017-09-15 2019-03-22 常州强力先端电子材料有限公司 光引发剂、包含其的光固化组合物及其应用
CN117865923A (zh) * 2024-01-08 2024-04-12 湖北固润科技股份有限公司 甲酰甲酸香豆素化合物、其制备方法和用途以及包含其的光引发剂组合物和可光固化组合物
WO2025228451A1 (zh) * 2024-04-30 2025-11-06 常州强力先端电子材料有限公司 一种光引发剂及其制备方法和应用
WO2025228453A1 (zh) * 2024-04-30 2025-11-06 常州强力先端电子材料有限公司 一种光固化组合物及其应用

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US7943080B2 (en) * 2005-12-23 2011-05-17 Asml Netherlands B.V. Alignment for imprint lithography
WO2010077132A1 (en) 2008-12-31 2010-07-08 Draka Comteq B.V. Uvled apparatus for curing glass-fiber coatings
EP2388239B1 (en) 2010-05-20 2017-02-15 Draka Comteq B.V. Curing apparatus employing angled UV-LEDs
US8871311B2 (en) 2010-06-03 2014-10-28 Draka Comteq, B.V. Curing method employing UV sources that emit differing ranges of UV radiation
EP2418183B1 (en) 2010-08-10 2018-07-25 Draka Comteq B.V. Method for curing coated glass fibres providing increased UVLED intensitiy
JP2013014534A (ja) * 2011-07-04 2013-01-24 Daicel Corp ベンゾイルギ酸化合物、及びその製造方法
ITVA20120010A1 (it) * 2012-05-03 2013-11-04 Lamberti Spa Alfa-dichetoni per fotopolimerizzazioni tramite led
US8771787B2 (en) * 2012-05-17 2014-07-08 Xerox Corporation Ink for digital offset printing applications
US8916334B2 (en) 2013-01-28 2014-12-23 Hewlett-Packard Development Company, L.P. Micro-composite material for three-dimensional printing
WO2015018466A1 (de) * 2013-04-05 2015-02-12 Fischerwerke Gmbh & Co. Kg Kunstharz-verklebungsmittel mit biogenen reaktiven verdünnern und harzen
US9422436B2 (en) * 2014-01-13 2016-08-23 Xerox Corporation Methods for producing inks
MX2016016627A (es) 2014-06-23 2017-06-06 Carbon Inc Metodos de produccion de objetos tridimensionales a partir de materiales que tienen multiples mecanismos de endurecimiento.
KR101685520B1 (ko) 2014-12-10 2016-12-12 고오 가가쿠고교 가부시키가이샤 액상 솔더 레지스트 조성물 및 피복 프린트 배선판
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
CN109456242B (zh) * 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
US11674030B2 (en) 2017-11-29 2023-06-13 Corning Incorporated Highly loaded inorganic filled aqueous resin systems
EP3597669A1 (en) 2018-07-20 2020-01-22 Clariant International Ltd Photo-curable resin composition for 3d printing
EP3597668A1 (en) 2018-07-20 2020-01-22 Clariant International Ltd Photo-curable resin composition for 3d printing
KR102406534B1 (ko) * 2019-03-08 2022-06-07 조병묵 낚시용 축광 도료 조성물
EP4041719A1 (en) 2019-10-11 2022-08-17 IGM Resins Italia S.r.l. Coumarin glyoxylates for led photocuring
CN110804337A (zh) * 2019-11-06 2020-02-18 甘肃天后光学科技有限公司 隐形眼镜彩色油墨、所用光亮剂及其制备方法
DE102022000134A1 (de) 2022-01-15 2023-07-20 Polystal Composites Gmbh Verfahren zur Härtung eines Glasfasercompositmaterials

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JPH0576837A (ja) * 1991-09-25 1993-03-30 Sekisui Chem Co Ltd 光硬化型樹脂組成物の硬化方法
CN1244190A (zh) * 1997-01-30 2000-02-09 西巴特殊化学品控股有限公司 非挥发性苯基乙醛酸酯
US6562464B1 (en) * 1999-03-24 2003-05-13 Basf Aktiengesellschaft Utilization of phenylglyoxalic acid esters as photoinitiators
CN1447844A (zh) * 2000-08-14 2003-10-08 西巴特殊化学品控股有限公司 采用表面活性的光致引发剂的涂料的制备方法
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Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011160262A1 (zh) * 2010-06-25 2011-12-29 北京英力科技发展有限公司 低挥发性苯甲酰基甲酸酯
CN102442909A (zh) * 2010-06-25 2012-05-09 北京英力科技发展有限公司 低挥发低迁移性苯甲酰基甲酸酯
CN102442909B (zh) * 2010-06-25 2013-10-30 北京英力科技发展有限公司 低挥发低迁移性苯甲酰基甲酸酯
CN102002022A (zh) * 2010-10-29 2011-04-06 苏州凯康化工科技有限公司 一种月桂酸改性环氧丙烯酸酯及其制备方法和应用
CN102002022B (zh) * 2010-10-29 2013-05-08 苏州凯康化工科技有限公司 一种月桂酸改性环氧丙烯酸酯及其制备方法和应用
CN102746785A (zh) * 2011-04-19 2012-10-24 比亚迪股份有限公司 一种双重固化涂料组合物及其固化方法
CN102746785B (zh) * 2011-04-19 2014-12-17 比亚迪股份有限公司 一种双重固化涂料组合物及其固化方法
CN104755507B (zh) * 2012-10-22 2017-10-03 意大利艾坚蒙树脂有限公司 用于led光固化的3‑酮香豆素
CN104755507A (zh) * 2012-10-22 2015-07-01 蓝宝迪有限公司 用于led光固化的3-酮香豆素
CN104423156B (zh) * 2013-09-05 2019-04-26 东友精细化工有限公司 非显示部遮光图案形成用感光性树脂组合物
CN104423156A (zh) * 2013-09-05 2015-03-18 东友精细化工有限公司 非显示部遮光图案形成用感光性树脂组合物
CN106957618A (zh) * 2015-12-10 2017-07-18 科络普拉斯特弗里茨米勒有限公司 耐高温的彩色特别是橙色胶粘带以及用于制备其的方法和载体及具有此类胶粘带的电缆束
CN107239002B (zh) * 2017-07-07 2019-12-06 深圳市华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法
CN107239002A (zh) * 2017-07-07 2017-10-10 深圳市华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法
CN110658679A (zh) * 2017-07-07 2020-01-07 深圳市华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法
CN110673439A (zh) * 2017-07-07 2020-01-10 深圳市华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法
CN110737172A (zh) * 2017-07-07 2020-01-31 深圳市华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法
CN110673439B (zh) * 2017-07-07 2023-05-02 Tcl华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法
CN110658679B (zh) * 2017-07-07 2023-05-02 Tcl华星光电技术有限公司 Uv固化粉末光阻组合物及其制作方法、彩膜基板的制作方法
CN109503735A (zh) * 2017-09-15 2019-03-22 常州强力先端电子材料有限公司 光引发剂、包含其的光固化组合物及其应用
CN117865923A (zh) * 2024-01-08 2024-04-12 湖北固润科技股份有限公司 甲酰甲酸香豆素化合物、其制备方法和用途以及包含其的光引发剂组合物和可光固化组合物
WO2025228451A1 (zh) * 2024-04-30 2025-11-06 常州强力先端电子材料有限公司 一种光引发剂及其制备方法和应用
WO2025228453A1 (zh) * 2024-04-30 2025-11-06 常州强力先端电子材料有限公司 一种光固化组合物及其应用

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WO2008040650A3 (en) 2009-01-08
WO2008040650A2 (en) 2008-04-10
US20100022676A1 (en) 2010-01-28
EP2069866A2 (en) 2009-06-17
JP2010505977A (ja) 2010-02-25

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