CN101479233B - 可辐射固化的氨基(甲基)丙烯酸酯 - Google Patents

可辐射固化的氨基(甲基)丙烯酸酯 Download PDF

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Publication number
CN101479233B
CN101479233B CN2007800244254A CN200780024425A CN101479233B CN 101479233 B CN101479233 B CN 101479233B CN 2007800244254 A CN2007800244254 A CN 2007800244254A CN 200780024425 A CN200780024425 A CN 200780024425A CN 101479233 B CN101479233 B CN 101479233B
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CN
China
Prior art keywords
acrylate
methyl
meth
amino
amine
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CN2007800244254A
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English (en)
Chinese (zh)
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CN101479233A (zh
Inventor
弗朗西斯·伯杰尔斯
蒂埃里·朗杜
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Allnex Belgium NV SA
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UCB SA
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C229/30—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and unsaturated
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
CN2007800244254A 2006-06-29 2007-06-22 可辐射固化的氨基(甲基)丙烯酸酯 Active CN101479233B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP20060013453 EP1876166A1 (en) 2006-06-29 2006-06-29 Radiation curable amino(meth)acrylates
EP06013453.3 2006-06-29
PCT/EP2007/056238 WO2008000696A1 (en) 2006-06-29 2007-06-22 Radiation curable amino(meth)acrylates

Publications (2)

Publication Number Publication Date
CN101479233A CN101479233A (zh) 2009-07-08
CN101479233B true CN101479233B (zh) 2013-11-13

Family

ID=37559336

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800244254A Active CN101479233B (zh) 2006-06-29 2007-06-22 可辐射固化的氨基(甲基)丙烯酸酯

Country Status (6)

Country Link
US (1) US9067866B2 (enExample)
EP (2) EP1876166A1 (enExample)
JP (1) JP5242562B2 (enExample)
KR (1) KR101390617B1 (enExample)
CN (1) CN101479233B (enExample)
WO (1) WO2008000696A1 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
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EP2143748A1 (en) 2008-07-10 2010-01-13 Cytec Surface Specialties, S.A. Aqueous radiation curable polyurethane compositions
CA2741157C (en) 2008-10-21 2016-11-15 Sun Chemical B.V. Acrylated epoxy-amine oligomers
GB201005060D0 (en) * 2010-03-25 2010-05-12 Davidson Robert S Synergists
EP2383254A1 (en) * 2010-04-19 2011-11-02 Cytec Surface Specialties, S.A. Radiation curable amino(meth)acrylates
EP2508574A1 (en) 2011-04-05 2012-10-10 Cytec Surface Specialties, S.A. Radiation curable compositions
WO2012136593A1 (en) 2011-04-05 2012-10-11 Cytec Surface Specialties, S.A. Radiation curable compositions
EP2508575A1 (en) 2011-04-05 2012-10-10 Cytec Surface Specialties, S.A. Radiation curable compositions
CA2850657C (en) * 2011-10-05 2017-03-21 Arkema France Polyhydroxyl - substituted amino compounds, polymers containing, and their use
EP2644634A1 (en) 2012-03-30 2013-10-02 Cytec Surface Specialties, S.A. Radiation curable (meth)acrylated compounds
EP2921536A1 (en) 2014-03-20 2015-09-23 ALLNEX AUSTRIA GmbH Radiation curable composition comprising inert resins
FR3022544B1 (fr) * 2014-06-23 2018-01-05 Arkema France Oligomeres acryles multifonctionnels de structure ramifiee, par polyaddition entre amines et acrylates multifonctionnels.
EP3248066B1 (en) 2015-01-19 2022-04-20 HP Indigo B.V. Liquid electrophotographic varnish composition
US10626329B2 (en) 2015-04-21 2020-04-21 United States Of America As Represented By The Secretary Of The Air Force Methods of making voxelated liquid crystal elastomers
WO2016179213A1 (en) * 2015-05-07 2016-11-10 Sun Chemical Corporation Energy curable inkjet inks for the production of layered composites
US20180127606A1 (en) * 2015-05-15 2018-05-10 Sun Chemical Corporation Energy curable inkjet inks and coating compositions
KR20180057719A (ko) 2015-10-16 2018-05-30 바스프 에스이 에너지 경화성의 고 반응성 다중 비닐에테르 또는 아크릴레이트 작용성 수지
WO2017160784A1 (en) * 2016-03-18 2017-09-21 Sun Chemical Corporation Energy curable compositions comprising polymeric aminoacrylates
WO2019086793A1 (fr) 2017-10-30 2019-05-09 Compagnie Generale Des Etablissements Michelin Composition de caoutchouc comprenant une amine specifique et un systeme de reticulation a base de peroxyde et d'un derive d'acrylate
CN111328338A (zh) 2017-11-29 2020-06-23 米其林集团总公司 交联体系包含过氧化物共混物和丙烯酸酯衍生物的橡胶组合物
FR3085167B1 (fr) 2018-08-23 2020-07-31 Michelin & Cie Pneumatique muni d'une composition comprenant un elastomere riche en ethylene, un peroxyde et un derive d'acrylate specifique
FR3085165B1 (fr) 2018-08-23 2020-07-17 Compagnie Generale Des Etablissements Michelin Pneumatique muni d'une composition comprenant un elastomere riche en ethylene, un peroxyde et un derive d'acrylate specifique
FR3085166B1 (fr) 2018-08-23 2020-07-17 Compagnie Generale Des Etablissements Michelin Pneumatique muni d'une composition comprenant un elastomere riche en ethylene, un peroxyde et un derive d'acrylate specifique
FR3095447B1 (fr) 2019-04-26 2021-12-24 Michelin & Cie Bandage pour roue de véhicule transportable manuellement
ES2974489T3 (es) * 2020-06-22 2024-06-27 ALLNEX Belgium SA Amino(met)acrilato polimérico
CN116376352B (zh) * 2023-04-28 2023-10-24 常州市正文印刷有限公司 一种uv油墨及其印刷工艺

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6300388B1 (en) * 1998-10-29 2001-10-09 Agfa-Gevaert Ink compositions for ink jet printing
US6706821B1 (en) * 2000-07-18 2004-03-16 Fmc Corporation Michael addition products of amine terminated polyolefins and polyfunctional acrylates

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US3844916A (en) * 1972-09-18 1974-10-29 Desoto Inc Radiation curable non-gelled michael addition reaction products
DE4415624A1 (de) * 1994-05-04 1995-11-09 Basf Ag Verfahren zur Herstellung von strahlungshärtbaren Acrylaten
JPH09143431A (ja) * 1995-11-22 1997-06-03 Nippon Zeon Co Ltd 紫外線硬化性組成物、それを用いた接着方法、および接着物
US6172129B1 (en) 1999-01-29 2001-01-09 Sartomer Technologies, Inc. Cyclic amine acrylate monomers and polymers
DE19933741A1 (de) * 1999-07-19 2001-01-25 Basf Ag Verfahren zur Haftungsverbesserung von Acrylatharzen
US6372074B1 (en) * 2000-06-14 2002-04-16 Avery Dennison Corporation Method of forming a protective coating for color filters
CN1215131C (zh) * 2000-06-22 2005-08-17 Dsmip财产有限公司 可辐射熟化的有色涂料组合物
US20050245636A1 (en) * 2004-04-29 2005-11-03 Ashland Inc. Radiation-curable coatings for wood substrates from multifunctional acrylate oligomers
ES2426004T3 (es) * 2004-05-02 2013-10-18 Ashland Licensing And Intellectual Property Llc Revestimientos curables por radiación para sustratos metálicos de oligómeros multifuncionales de acrilato

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6300388B1 (en) * 1998-10-29 2001-10-09 Agfa-Gevaert Ink compositions for ink jet printing
US6706821B1 (en) * 2000-07-18 2004-03-16 Fmc Corporation Michael addition products of amine terminated polyolefins and polyfunctional acrylates

Also Published As

Publication number Publication date
JP2009541553A (ja) 2009-11-26
CN101479233A (zh) 2009-07-08
EP2044000B1 (en) 2018-08-08
US20090318611A1 (en) 2009-12-24
WO2008000696A1 (en) 2008-01-03
EP2044000A1 (en) 2009-04-08
JP5242562B2 (ja) 2013-07-24
US9067866B2 (en) 2015-06-30
KR20090023586A (ko) 2009-03-05
KR101390617B1 (ko) 2014-05-13
EP1876166A1 (en) 2008-01-09

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Owner name: ALLNEX BELGIUM S. A.

Free format text: FORMER NAME: UCB SA

CP01 Change in the name or title of a patent holder

Address after: Brussels

Patentee after: Allnex Belgium, S.A.

Address before: Brussels

Patentee before: UCB SA