CN101416327B - 制备限制的层的方法和用该方法制造的装置 - Google Patents

制备限制的层的方法和用该方法制造的装置 Download PDF

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Publication number
CN101416327B
CN101416327B CN2007800120800A CN200780012080A CN101416327B CN 101416327 B CN101416327 B CN 101416327B CN 2007800120800 A CN2007800120800 A CN 2007800120800A CN 200780012080 A CN200780012080 A CN 200780012080A CN 101416327 B CN101416327 B CN 101416327B
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China
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layer
rsa
radiation
organic
exposed
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Expired - Fee Related
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CN2007800120800A
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English (en)
Chinese (zh)
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CN101416327A (zh
Inventor
D·D·勒克罗克斯
E·M·史密斯
G·A·约翰松
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EIDP Inc
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EI Du Pont de Nemours and Co
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
  • Thin Film Transistor (AREA)
  • Solid State Image Pick-Up Elements (AREA)
CN2007800120800A 2006-04-10 2007-04-10 制备限制的层的方法和用该方法制造的装置 Expired - Fee Related CN101416327B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/401,151 US8124172B2 (en) 2006-03-02 2006-04-10 Process for making contained layers and devices made with same
US11/401,151 2006-04-10
PCT/US2007/008830 WO2007120654A2 (en) 2006-04-10 2007-04-10 Process for making contained layers and devices made with same

Publications (2)

Publication Number Publication Date
CN101416327A CN101416327A (zh) 2009-04-22
CN101416327B true CN101416327B (zh) 2011-01-19

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CN2007800120800A Expired - Fee Related CN101416327B (zh) 2006-04-10 2007-04-10 制备限制的层的方法和用该方法制造的装置

Country Status (6)

Country Link
US (3) US8124172B2 (https=)
EP (1) EP2005498A4 (https=)
JP (1) JP2009533251A (https=)
KR (1) KR101391082B1 (https=)
CN (1) CN101416327B (https=)
WO (1) WO2007120654A2 (https=)

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US20090142556A1 (en) * 2007-11-29 2009-06-04 E. I. Du Pont De Nemours And Company Process for forming an organic electronic device including an organic device layer
US8040048B2 (en) * 2007-12-12 2011-10-18 Lang Charles D Process for forming an organic electronic device including an organic device layer
JP2011509498A (ja) 2007-12-14 2011-03-24 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 電子デバイス用のバックプレーン構造体
WO2009097377A1 (en) * 2008-02-01 2009-08-06 E. I. Du Pont De Nemours And Company Structure for making solution processed electronic devices
TW201005813A (en) 2008-05-15 2010-02-01 Du Pont Process for forming an electroactive layer
TW201011114A (en) * 2008-05-19 2010-03-16 Du Pont Apparatus and method of vapor coating in an electronic device
US8759818B2 (en) 2009-02-27 2014-06-24 E I Du Pont De Nemours And Company Deuterated compounds for electronic applications
EP2404315A4 (en) 2009-03-06 2012-08-08 Du Pont METHOD FOR FORMING AN ELECTROACTIVE LAYER
CN102362338A (zh) 2009-03-09 2012-02-22 E.I.内穆尔杜邦公司 形成电活性层的方法
JP2012519950A (ja) 2009-03-09 2012-08-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 電気活性層の形成方法
EP2414481A4 (en) * 2009-04-03 2013-02-20 Du Pont ELECTROACTIVE MATERIALS
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US8592239B2 (en) * 2009-07-27 2013-11-26 E I Du Pont De Nemours And Company Process and materials for making contained layers and devices made with same
TWI385185B (zh) * 2009-07-29 2013-02-11 Ind Tech Res Inst 聚合物及包含其之光學元件及光電裝置
GB0913456D0 (en) 2009-08-03 2009-09-16 Cambridge Entpr Ltd Printed electronic device
KR101790854B1 (ko) 2009-09-29 2017-10-26 이 아이 듀폰 디 네모아 앤드 캄파니 발광 응용을 위한 중수소화된 화합물
US20110101312A1 (en) 2009-10-29 2011-05-05 E. I. Du Pont De Nemours And Company Deuterated compounds for electronic applications
JP5727038B2 (ja) 2010-12-20 2015-06-03 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 電子技術応用のための組成物
US9444050B2 (en) 2013-01-17 2016-09-13 Kateeva, Inc. High resolution organic light-emitting diode devices, displays, and related method
US9614191B2 (en) 2013-01-17 2017-04-04 Kateeva, Inc. High resolution organic light-emitting diode devices, displays, and related methods
KR102472642B1 (ko) 2015-06-16 2022-11-30 삼성디스플레이 주식회사 유기 발광 표시 장치 및 이의 제조 방법
KR102431626B1 (ko) 2015-10-06 2022-08-11 삼성디스플레이 주식회사 발광 표시 장치 및 그 제조 방법
CN111081901A (zh) * 2018-11-26 2020-04-28 中国科学院苏州纳米技术与纳米仿生研究所 印刷电子器件的制备方法
WO2021251302A1 (ja) * 2020-06-10 2021-12-16 ダイキン工業株式会社 含フッ素化合物

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Also Published As

Publication number Publication date
KR20090034804A (ko) 2009-04-08
EP2005498A2 (en) 2008-12-24
EP2005498A4 (en) 2012-04-18
US20070218582A1 (en) 2007-09-20
US20070205409A1 (en) 2007-09-06
US20110183268A1 (en) 2011-07-28
WO2007120654A3 (en) 2008-08-28
JP2009533251A (ja) 2009-09-17
KR101391082B1 (ko) 2014-04-30
US8124172B2 (en) 2012-02-28
WO2007120654A2 (en) 2007-10-25
US8383192B2 (en) 2013-02-26
CN101416327A (zh) 2009-04-22

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Granted publication date: 20110119

Termination date: 20160410