JP2009533251A5 - - Google Patents
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- Publication number
- JP2009533251A5 JP2009533251A5 JP2009505432A JP2009505432A JP2009533251A5 JP 2009533251 A5 JP2009533251 A5 JP 2009533251A5 JP 2009505432 A JP2009505432 A JP 2009505432A JP 2009505432 A JP2009505432 A JP 2009505432A JP 2009533251 A5 JP2009533251 A5 JP 2009533251A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- rsa
- surfactant composition
- reactive surfactant
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/401,151 US8124172B2 (en) | 2006-03-02 | 2006-04-10 | Process for making contained layers and devices made with same |
| PCT/US2007/008830 WO2007120654A2 (en) | 2006-04-10 | 2007-04-10 | Process for making contained layers and devices made with same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009533251A JP2009533251A (ja) | 2009-09-17 |
| JP2009533251A5 true JP2009533251A5 (https=) | 2015-03-12 |
Family
ID=38610130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009505432A Pending JP2009533251A (ja) | 2006-04-10 | 2007-04-10 | 閉じ込められた層の製造方法、およびそれを使用して製造されたデバイス |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US8124172B2 (https=) |
| EP (1) | EP2005498A4 (https=) |
| JP (1) | JP2009533251A (https=) |
| KR (1) | KR101391082B1 (https=) |
| CN (1) | CN101416327B (https=) |
| WO (1) | WO2007120654A2 (https=) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080286487A1 (en) * | 2007-05-18 | 2008-11-20 | Lang Charles D | Process for making contained layers |
| WO2009052085A1 (en) * | 2007-10-15 | 2009-04-23 | E. I. Du Pont De Nemours And Company | Solution processed electronic devices |
| KR20100096105A (ko) * | 2007-10-23 | 2010-09-01 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 발광 응용을 위한 3중 발광 층 |
| KR20100094475A (ko) * | 2007-10-26 | 2010-08-26 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자 |
| US20090142556A1 (en) * | 2007-11-29 | 2009-06-04 | E. I. Du Pont De Nemours And Company | Process for forming an organic electronic device including an organic device layer |
| US8040048B2 (en) * | 2007-12-12 | 2011-10-18 | Lang Charles D | Process for forming an organic electronic device including an organic device layer |
| JP2011509498A (ja) | 2007-12-14 | 2011-03-24 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 電子デバイス用のバックプレーン構造体 |
| WO2009097377A1 (en) * | 2008-02-01 | 2009-08-06 | E. I. Du Pont De Nemours And Company | Structure for making solution processed electronic devices |
| TW201005813A (en) | 2008-05-15 | 2010-02-01 | Du Pont | Process for forming an electroactive layer |
| TW201011114A (en) * | 2008-05-19 | 2010-03-16 | Du Pont | Apparatus and method of vapor coating in an electronic device |
| US8759818B2 (en) | 2009-02-27 | 2014-06-24 | E I Du Pont De Nemours And Company | Deuterated compounds for electronic applications |
| EP2404315A4 (en) | 2009-03-06 | 2012-08-08 | Du Pont | METHOD FOR FORMING AN ELECTROACTIVE LAYER |
| CN102362338A (zh) | 2009-03-09 | 2012-02-22 | E.I.内穆尔杜邦公司 | 形成电活性层的方法 |
| JP2012519950A (ja) | 2009-03-09 | 2012-08-30 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 電気活性層の形成方法 |
| EP2414481A4 (en) * | 2009-04-03 | 2013-02-20 | Du Pont | ELECTROACTIVE MATERIALS |
| GB0912034D0 (en) | 2009-07-10 | 2009-08-19 | Cambridge Entpr Ltd | Patterning |
| US8592239B2 (en) * | 2009-07-27 | 2013-11-26 | E I Du Pont De Nemours And Company | Process and materials for making contained layers and devices made with same |
| TWI385185B (zh) * | 2009-07-29 | 2013-02-11 | Ind Tech Res Inst | 聚合物及包含其之光學元件及光電裝置 |
| GB0913456D0 (en) | 2009-08-03 | 2009-09-16 | Cambridge Entpr Ltd | Printed electronic device |
| KR101790854B1 (ko) | 2009-09-29 | 2017-10-26 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 발광 응용을 위한 중수소화된 화합물 |
| US20110101312A1 (en) | 2009-10-29 | 2011-05-05 | E. I. Du Pont De Nemours And Company | Deuterated compounds for electronic applications |
| JP5727038B2 (ja) | 2010-12-20 | 2015-06-03 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company | 電子技術応用のための組成物 |
| US9444050B2 (en) | 2013-01-17 | 2016-09-13 | Kateeva, Inc. | High resolution organic light-emitting diode devices, displays, and related method |
| US9614191B2 (en) | 2013-01-17 | 2017-04-04 | Kateeva, Inc. | High resolution organic light-emitting diode devices, displays, and related methods |
| KR102472642B1 (ko) | 2015-06-16 | 2022-11-30 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 이의 제조 방법 |
| KR102431626B1 (ko) | 2015-10-06 | 2022-08-11 | 삼성디스플레이 주식회사 | 발광 표시 장치 및 그 제조 방법 |
| CN111081901A (zh) * | 2018-11-26 | 2020-04-28 | 中国科学院苏州纳米技术与纳米仿生研究所 | 印刷电子器件的制备方法 |
| WO2021251302A1 (ja) * | 2020-06-10 | 2021-12-16 | ダイキン工業株式会社 | 含フッ素化合物 |
Family Cites Families (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5416203A (en) * | 1977-07-07 | 1979-02-06 | Nippon Paint Co Ltd | Dry making method of photosensitive resin plate |
| US5435887A (en) | 1993-11-03 | 1995-07-25 | Massachusetts Institute Of Technology | Methods for the fabrication of microstructure arrays |
| DE19500912A1 (de) | 1995-01-13 | 1996-07-18 | Basf Ag | Elektrolumineszierende Anordnung |
| JPH09203803A (ja) * | 1996-01-25 | 1997-08-05 | Asahi Glass Co Ltd | カラーフィルタの製造方法及びそれを用いた液晶表示素子 |
| US6495624B1 (en) | 1997-02-03 | 2002-12-17 | Cytonix Corporation | Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same |
| JP4413035B2 (ja) * | 1997-08-08 | 2010-02-10 | 大日本印刷株式会社 | パターン形成体およびパターン形成方法 |
| US6303238B1 (en) | 1997-12-01 | 2001-10-16 | The Trustees Of Princeton University | OLEDs doped with phosphorescent compounds |
| US6736985B1 (en) * | 1999-05-05 | 2004-05-18 | Agere Systems Inc. | High-resolution method for patterning a substrate with micro-printing |
| CN101312235B (zh) | 1999-05-13 | 2010-06-09 | 普林斯顿大学理事会 | 基于电致磷光的极高效有机发光器件 |
| JP3980801B2 (ja) * | 1999-09-16 | 2007-09-26 | 株式会社東芝 | 三次元構造体およびその製造方法 |
| JP4357781B2 (ja) | 1999-12-01 | 2009-11-04 | ザ、トラスティーズ オブ プリンストン ユニバーシティ | 有機led用燐光性ドーパントとしての式l2mxの錯体 |
| KR20010085420A (ko) * | 2000-02-23 | 2001-09-07 | 기타지마 요시토시 | 전계발광소자와 그 제조방법 |
| JP2001237069A (ja) * | 2000-02-23 | 2001-08-31 | Dainippon Printing Co Ltd | El素子およびその製造方法 |
| US7074640B2 (en) * | 2000-06-06 | 2006-07-11 | Simon Fraser University | Method of making barrier layers |
| US6670645B2 (en) | 2000-06-30 | 2003-12-30 | E. I. Du Pont De Nemours And Company | Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds |
| JP4442533B2 (ja) * | 2000-08-29 | 2010-03-31 | ダイキン工業株式会社 | 含フッ素不飽和化合物 |
| US6875523B2 (en) | 2001-07-05 | 2005-04-05 | E. I. Du Pont De Nemours And Company | Photoactive lanthanide complexes with phosphine oxides, phosphine oxide-sulfides, pyridine N-oxides, and phosphine oxide-pyridine N-oxides, and devices made with such complexes |
| KR20040018467A (ko) | 2001-07-18 | 2004-03-03 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 이민 리간드와의 발광 란탄족 착물 및 이러한 착물을사용하여 제조된 장치 |
| US6656611B2 (en) | 2001-07-20 | 2003-12-02 | Osram Opto Semiconductors Gmbh | Structure-defining material for OLEDs |
| EP1411088B1 (en) | 2001-07-26 | 2013-08-21 | Nissan Chemical Industries, Ltd. | Polyamic acid resin composition |
| US7166368B2 (en) | 2001-11-07 | 2007-01-23 | E. I. Du Pont De Nemours And Company | Electroluminescent platinum compounds and devices made with such compounds |
| JP4231645B2 (ja) | 2001-12-12 | 2009-03-04 | 大日本印刷株式会社 | パターン形成体の製造方法 |
| CA2455844A1 (en) | 2001-12-26 | 2003-07-31 | Viacheslav A. Petrov | Electroluminescent iridium compounds wiht fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds |
| US6955773B2 (en) | 2002-02-28 | 2005-10-18 | E.I. Du Pont De Nemours And Company | Polymer buffer layers and their use in light-emitting diodes |
| GB0207134D0 (en) * | 2002-03-27 | 2002-05-08 | Cambridge Display Tech Ltd | Method of preparation of organic optoelectronic and electronic devices and devices thereby obtained |
| JP4092261B2 (ja) | 2002-08-02 | 2008-05-28 | 三星エスディアイ株式会社 | 基板の製造方法及び有機エレクトロルミネッセンス素子の製造方法 |
| US6963005B2 (en) | 2002-08-15 | 2005-11-08 | E. I. Du Pont De Nemours And Company | Compounds comprising phosphorus-containing metal complexes |
| US6780511B2 (en) * | 2002-09-05 | 2004-08-24 | Borden Chemical, Inc. | N-substituted arylamino-phenol-formaldehyde condensates |
| US7098060B2 (en) | 2002-09-06 | 2006-08-29 | E.I. Du Pont De Nemours And Company | Methods for producing full-color organic electroluminescent devices |
| WO2004029128A2 (en) | 2002-09-24 | 2004-04-08 | E.I. Du Pont De Nemours And Company | Water dispersible polythiophenes made with polymeric acid colloids |
| CA2499364A1 (en) | 2002-09-24 | 2004-04-08 | E. I. Du Pont De Nemours And Company | Water dispersible polyanilines made with polymeric acid colloids for electronics applications |
| EP1560068B1 (en) | 2002-11-06 | 2008-01-23 | Asahi Glass Company Ltd. | Barrier rib and its method of preparation |
| JP2004177793A (ja) * | 2002-11-28 | 2004-06-24 | Seiko Epson Corp | 微細構造物の製造方法およびこの微細構造物の製造方法を用いて製造された自発光素子、光学素子、デバイス並びにこのデバイスを備えた電子機器 |
| JP2004234901A (ja) * | 2003-01-28 | 2004-08-19 | Seiko Epson Corp | ディスプレイ基板、有機el表示装置、ディスプレイ基板の製造方法および電子機器 |
| WO2004070836A1 (ja) * | 2003-02-06 | 2004-08-19 | Neomax Co., Ltd. | 気密封止用キャップおよびその製造方法 |
| JP2004294878A (ja) * | 2003-03-27 | 2004-10-21 | Seiko Epson Corp | 微細構造物の製造方法、デバイス、光学素子、集積回路及び電子機器 |
| US7098525B2 (en) * | 2003-05-08 | 2006-08-29 | 3M Innovative Properties Company | Organic polymers, electronic devices, and methods |
| US7102155B2 (en) | 2003-09-04 | 2006-09-05 | Hitachi, Ltd. | Electrode substrate, thin film transistor, display device and their production |
| JP4632193B2 (ja) * | 2003-09-18 | 2011-02-16 | 大日本印刷株式会社 | パターニング用基板の製造方法 |
| JP4152852B2 (ja) * | 2003-09-30 | 2008-09-17 | 東京応化工業株式会社 | 吐出ノズル式塗布法用ポジ型ホトレジスト組成物及びレジストパターンの形成方法 |
| JP4784723B2 (ja) * | 2003-12-24 | 2011-10-05 | Tdk株式会社 | ハードコート剤組成物及びこれを用いた光情報媒体 |
| US7067841B2 (en) | 2004-04-22 | 2006-06-27 | E. I. Du Pont De Nemours And Company | Organic electronic devices |
| JP2006024535A (ja) * | 2004-07-09 | 2006-01-26 | Seiko Epson Corp | 有機薄膜素子の製造方法、電気光学装置の製造方法及び電子機器の製造方法 |
-
2006
- 2006-04-10 US US11/401,151 patent/US8124172B2/en active Active
- 2006-06-01 US US11/444,655 patent/US20070205409A1/en not_active Abandoned
-
2007
- 2007-04-10 EP EP07755188A patent/EP2005498A4/en not_active Withdrawn
- 2007-04-10 KR KR1020087027338A patent/KR101391082B1/ko not_active Expired - Fee Related
- 2007-04-10 WO PCT/US2007/008830 patent/WO2007120654A2/en not_active Ceased
- 2007-04-10 CN CN2007800120800A patent/CN101416327B/zh not_active Expired - Fee Related
- 2007-04-10 JP JP2009505432A patent/JP2009533251A/ja active Pending
-
2011
- 2011-04-05 US US13/080,361 patent/US8383192B2/en not_active Expired - Fee Related
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