CN101401154B - 磁记录介质、其制造方法以及磁记录和再现装置 - Google Patents

磁记录介质、其制造方法以及磁记录和再现装置 Download PDF

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Publication number
CN101401154B
CN101401154B CN2007800085690A CN200780008569A CN101401154B CN 101401154 B CN101401154 B CN 101401154B CN 2007800085690 A CN2007800085690 A CN 2007800085690A CN 200780008569 A CN200780008569 A CN 200780008569A CN 101401154 B CN101401154 B CN 101401154B
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China
Prior art keywords
magnetic
magnetic recording
magnetosphere
atom
recording media
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Chinese (zh)
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CN101401154A (zh
Inventor
福岛正人
坂胁彰
佐佐木保正
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Lishennoco Co ltd
Resonac Holdings Corp
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Showa Denko KK
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Priority claimed from PCT/JP2007/052446 external-priority patent/WO2007091702A1/en
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CN2007800085690A 2006-02-10 2007-02-06 磁记录介质、其制造方法以及磁记录和再现装置 Active CN101401154B (zh)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP2006034218 2006-02-10
JP034218/2006 2006-02-10
JP036957/2006 2006-02-14
JP2006036957 2006-02-14
JP061493/2006 2006-03-07
JP2006061493 2006-03-07
JP120741/2006 2006-04-25
JP2006120741A JP2007273067A (ja) 2006-02-10 2006-04-25 磁気記録媒体、その製造方法、及び磁気記録再生装置
PCT/JP2007/052446 WO2007091702A1 (en) 2006-02-10 2007-02-06 Magnetic recording medium, method for production thereof and magnetic recording and reproducing device

Publications (2)

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CN101401154A CN101401154A (zh) 2009-04-01
CN101401154B true CN101401154B (zh) 2011-10-19

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CN2007800085690A Active CN101401154B (zh) 2006-02-10 2007-02-06 磁记录介质、其制造方法以及磁记录和再现装置

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JP (1) JP2007273067A (ja)
CN (1) CN101401154B (ja)
TW (1) TWI346327B (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8389048B2 (en) 2006-02-10 2013-03-05 Showa Denko K.K. Magnetic recording medium, method for production thereof and magnetic recording and reproducing device
JP4597933B2 (ja) * 2006-09-21 2010-12-15 昭和電工株式会社 磁気記録媒体の製造方法、並びに磁気記録再生装置
JP5013100B2 (ja) 2007-12-21 2012-08-29 国立大学法人秋田大学 磁気記録媒体及びその製造方法ならびに磁気ディスク装置
JP5383050B2 (ja) * 2008-01-11 2014-01-08 昭和電工株式会社 磁気記録媒体の製造方法及び磁気記録再生装置
JP5100409B2 (ja) * 2008-01-21 2012-12-19 株式会社アルバック 磁性膜へのイオン注入方法およびイオン注入装置
JP5206025B2 (ja) * 2008-02-29 2013-06-12 富士通株式会社 磁気記録媒体の製造方法および磁気記録媒体
JP5024135B2 (ja) * 2008-03-17 2012-09-12 富士通株式会社 垂直磁気記録媒体および多層構造膜並びに記憶装置
JP5175605B2 (ja) * 2008-04-18 2013-04-03 株式会社日立ハイテクノロジーズ パターン形状検査方法
KR20110090978A (ko) 2008-10-31 2011-08-10 쇼와 덴코 가부시키가이샤 전사 재료용 경화성 조성물 및 패턴 형성 방법
WO2010067830A1 (ja) * 2008-12-09 2010-06-17 Hoya株式会社 磁気記録媒体および磁気記録媒体の製造方法
EP2393106A4 (en) * 2009-01-29 2012-10-03 Showa Denko Kk CURABLE COMPOSITION FOR TRANSFER MATERIAL AND UREA COMPOUND CONTAINING (METH) ACRYLOYL GROUP
JP5238780B2 (ja) * 2010-09-17 2013-07-17 株式会社東芝 磁気記録媒体とその製造方法及び磁気記録装置
JP5238781B2 (ja) * 2010-09-17 2013-07-17 株式会社東芝 磁気記録媒体の製造方法
JP5712241B2 (ja) * 2013-03-19 2015-05-07 エイチジーエスティーネザーランドビーブイ 磁気記録媒体
JP6374421B2 (ja) * 2016-02-17 2018-08-15 ダブリュディ・メディア・シンガポール・プライベートリミテッド 熱アシスト記録用磁気ディスクおよび熱アシスト記録用磁気ディスクの製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331364B1 (en) * 1999-07-09 2001-12-18 International Business Machines Corporation Patterned magnetic recording media containing chemically-ordered FePt of CoPt

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002288813A (ja) * 2001-03-26 2002-10-04 Fuji Electric Co Ltd 磁気記録媒体およびその製造方法
JP3886802B2 (ja) * 2001-03-30 2007-02-28 株式会社東芝 磁性体のパターニング方法、磁気記録媒体、磁気ランダムアクセスメモリ
JP4488236B2 (ja) * 2006-02-14 2010-06-23 昭和電工株式会社 磁気記録媒体の製造方法、及び磁気記録再生装置
JP2007226862A (ja) * 2006-02-21 2007-09-06 Showa Denko Kk 磁気記録媒体、その製造方法、及び磁気記録再生装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331364B1 (en) * 1999-07-09 2001-12-18 International Business Machines Corporation Patterned magnetic recording media containing chemically-ordered FePt of CoPt

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Publication number Publication date
TWI346327B (en) 2011-08-01
CN101401154A (zh) 2009-04-01
JP2007273067A (ja) 2007-10-18
TW200805316A (en) 2008-01-16

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Address after: Tokyo, Japan

Patentee after: Lishennoco Co.,Ltd.

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