CN101398632B - 光刻设备和清洁光刻设备的方法 - Google Patents

光刻设备和清洁光刻设备的方法 Download PDF

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Publication number
CN101398632B
CN101398632B CN2008101610752A CN200810161075A CN101398632B CN 101398632 B CN101398632 B CN 101398632B CN 2008101610752 A CN2008101610752 A CN 2008101610752A CN 200810161075 A CN200810161075 A CN 200810161075A CN 101398632 B CN101398632 B CN 101398632B
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Prior art keywords
cleaning fluid
substrate
liquid
substrate table
inlet
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Chinese (zh)
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CN101398632A (zh
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E·C·凯德泽克
J·范德埃克
D·L·安斯托特兹
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ASML Holding NV
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ASML Holding NV
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN2008101610752A 2007-09-27 2008-09-26 光刻设备和清洁光刻设备的方法 Active CN101398632B (zh)

Applications Claiming Priority (2)

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US96038507P 2007-09-27 2007-09-27
US60/960,385 2007-09-27

Related Child Applications (1)

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CN2010102836876A Division CN101950130B (zh) 2007-09-27 2008-09-26 光刻设备和光刻投影设备

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CN101398632A CN101398632A (zh) 2009-04-01
CN101398632B true CN101398632B (zh) 2011-11-23

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CN2010102836876A Active CN101950130B (zh) 2007-09-27 2008-09-26 光刻设备和光刻投影设备

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US (1) US8638421B2 (https=)
JP (2) JP4939504B2 (https=)
KR (2) KR101005511B1 (https=)
CN (2) CN101398632B (https=)
NL (1) NL1035942A1 (https=)
TW (1) TWI426961B (https=)

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CN1975578A (zh) * 2005-11-29 2007-06-06 东京毅力科创株式会社 涂布、显影装置和涂布、显影方法

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Also Published As

Publication number Publication date
KR20090033130A (ko) 2009-04-01
US20090091716A1 (en) 2009-04-09
TWI426961B (zh) 2014-02-21
US8638421B2 (en) 2014-01-28
KR101005511B1 (ko) 2011-01-04
NL1035942A1 (nl) 2009-03-30
KR20100117548A (ko) 2010-11-03
JP5346100B2 (ja) 2013-11-20
JP2012134527A (ja) 2012-07-12
CN101398632A (zh) 2009-04-01
TW200922700A (en) 2009-06-01
CN101950130B (zh) 2012-12-05
JP2009088509A (ja) 2009-04-23
JP4939504B2 (ja) 2012-05-30
KR101059489B1 (ko) 2011-08-25
CN101950130A (zh) 2011-01-19

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