CN101273099B - 由氧化铝和周期表第ⅰ和ⅱ主族元素氧化物构成的表面改性的纳米粒子及其制备 - Google Patents
由氧化铝和周期表第ⅰ和ⅱ主族元素氧化物构成的表面改性的纳米粒子及其制备 Download PDFInfo
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- CN101273099B CN101273099B CN2006800352790A CN200680035279A CN101273099B CN 101273099 B CN101273099 B CN 101273099B CN 2006800352790 A CN2006800352790 A CN 2006800352790A CN 200680035279 A CN200680035279 A CN 200680035279A CN 101273099 B CN101273099 B CN 101273099B
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- ZMYXZXUHYAGGKG-UHFFFAOYSA-N propoxysilane Chemical compound CCCO[SiH3] ZMYXZXUHYAGGKG-UHFFFAOYSA-N 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229960001866 silicon dioxide Drugs 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052566 spinel group Inorganic materials 0.000 description 1
- 238000005118 spray pyrolysis Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- ALVYUZIFSCKIFP-UHFFFAOYSA-N triethoxy(2-methylpropyl)silane Chemical compound CCO[Si](CC(C)C)(OCC)OCC ALVYUZIFSCKIFP-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- SEAZOECJMOZWTD-UHFFFAOYSA-N trimethoxy(oxiran-2-ylmethyl)silane Chemical compound CO[Si](OC)(OC)CC1CO1 SEAZOECJMOZWTD-UHFFFAOYSA-N 0.000 description 1
- 238000002525 ultrasonication Methods 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 238000012982 x-ray structure analysis Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/12—Treatment with organosilicon compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/40—Compounds of aluminium
- C09C1/407—Aluminium oxides or hydroxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/006—Combinations of treatments provided for in groups C09C3/04 - C09C3/12
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/04—Physical treatment, e.g. grinding, treatment with ultrasonic vibrations
- C09C3/041—Grinding
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/60—Compounds characterised by their crystallite size
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Abstract
Description
Claims (12)
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005039435A DE102005039435A1 (de) | 2005-08-18 | 2005-08-18 | Verfahren zur Herstellung von mit Silanen oberflächenmodifiziertem Nanokorund |
DE102005039436A DE102005039436B4 (de) | 2005-08-18 | 2005-08-18 | Beschichtungsmassen enthaltend mit Silanen modifizierte Nanopartikel |
DE102005039436.1 | 2005-08-18 | ||
DE102005039435.3 | 2005-08-18 | ||
DE102006012319A DE102006012319A1 (de) | 2006-03-17 | 2006-03-17 | Kosmetische Mittel enthaltend nanopartikuläres Korund |
DE102006012319.0 | 2006-03-17 | ||
DE200610020516 DE102006020516A1 (de) | 2006-04-29 | 2006-04-29 | Oberflächenmodifizierte Nanopartikel aus Aluminiumoxid und Oxiden von Elementen der I. und II. Hauptgruppe des Periodensystems sowie deren Herstellung |
DE102006020516.2 | 2006-04-29 | ||
PCT/EP2006/008067 WO2007020064A1 (de) | 2005-08-18 | 2006-08-16 | Oberflächenmodifizierte nanopartikel aus aluminiumoxid und oxiden von elementen der i. und ii. hauptgruppe des periodensystems sowie deren herstellung |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101273099A CN101273099A (zh) | 2008-09-24 |
CN101273099B true CN101273099B (zh) | 2011-10-05 |
Family
ID=37697398
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
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CN2006800352790A Expired - Fee Related CN101273099B (zh) | 2005-08-18 | 2006-08-16 | 由氧化铝和周期表第ⅰ和ⅱ主族元素氧化物构成的表面改性的纳米粒子及其制备 |
CNA2006800353685A Pending CN101273100A (zh) | 2005-08-18 | 2006-08-16 | 含有用硅烷改性的纳米粒子的涂料组合物 |
CN2006800343880A Expired - Fee Related CN101268156B (zh) | 2005-08-18 | 2006-08-16 | 含有由50-99.9重量%Al2O3和0.1-50重量%周期表第Ⅰ或Ⅱ主族元素的氧化物组成的混合氧化物纳米粒子的涂料组合物 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2006800353685A Pending CN101273100A (zh) | 2005-08-18 | 2006-08-16 | 含有用硅烷改性的纳米粒子的涂料组合物 |
CN2006800343880A Expired - Fee Related CN101268156B (zh) | 2005-08-18 | 2006-08-16 | 含有由50-99.9重量%Al2O3和0.1-50重量%周期表第Ⅰ或Ⅱ主族元素的氧化物组成的混合氧化物纳米粒子的涂料组合物 |
Country Status (6)
Country | Link |
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US (1) | US20100006005A1 (zh) |
EP (1) | EP1922370A2 (zh) |
JP (1) | JP2009504856A (zh) |
CN (3) | CN101273099B (zh) |
DE (1) | DE102005039436B4 (zh) |
WO (1) | WO2007020062A2 (zh) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090041656A1 (en) * | 2005-07-16 | 2009-02-12 | Norbert Roesch | Nanoparticles of alumina and oxides of elements of main groups I and II of the periodic table, and their preparation |
DE102005039435A1 (de) * | 2005-08-18 | 2007-03-01 | Clariant International Limited | Verfahren zur Herstellung von mit Silanen oberflächenmodifiziertem Nanokorund |
EP1922368B1 (de) * | 2005-08-18 | 2016-12-21 | Clariant Finance (BVI) Limited | Beschichtungsmassen enthaltend mischoxid-nanopartikel bestehend aus 50-99,9 gew% al2o3 und 0,1-50 gew% oxiden von elementen der i. oder ii. hauptgruppe des periodensystems |
KR101244205B1 (ko) * | 2005-08-18 | 2013-03-18 | 클라리언트 파이넌스 (비브이아이)리미티드 | 산화알루미늄 및 주기율표의 제ⅰ 및 제ⅱ 주족 원소의산화물로부터의 표면-개질 나노입자 및 이의 제법 |
DE102006032582A1 (de) * | 2006-07-13 | 2008-01-24 | Clariant International Limited | Verfahren zur Herstellung von Nanopartikeln aus Aluminiumspinellen und deren Anwendung |
WO2008027561A2 (en) * | 2006-09-01 | 2008-03-06 | Cabot Corporation | Surface-treated metal oxide particles |
DE102006045816A1 (de) * | 2006-09-28 | 2008-04-03 | Clariant International Limited | Polykristalline Korundfasern und Verfahren zu deren Herstellung |
DE102006054013A1 (de) * | 2006-11-16 | 2008-05-21 | Clariant International Ltd. | Beschichtungsmassen enthaltend reaktive Esterwachse und Mischoxid-Nanopartikel |
JP2010525178A (ja) * | 2007-04-17 | 2010-07-22 | ハイクー マテリアルズ アーゲー | 繊維および繊維製品の防水、防油および防塵仕上げ材 |
NO328788B1 (no) * | 2008-03-14 | 2010-05-18 | Jotun As | Bindemiddel til lufttørkende maling |
US8703874B2 (en) * | 2008-11-06 | 2014-04-22 | Thomas Aberle | Powder to hydrophobise and its use |
US20110245359A1 (en) * | 2008-12-18 | 2011-10-06 | Condo Peter D | Methods of preparing hybrid aerogels |
US8283412B2 (en) * | 2009-05-01 | 2012-10-09 | Nanosys, Inc. | Functionalized matrices for dispersion of nanostructures |
KR100970461B1 (ko) * | 2010-02-09 | 2010-07-16 | 엘베스트지에이티 주식회사 | 유무기 하이브리드 방식 코팅제 조성물 및 그 제조방법 |
US9136516B2 (en) | 2010-12-29 | 2015-09-15 | Industrial Technology Research Institute | Hybrid materials using ionic particles |
US9139770B2 (en) | 2012-06-22 | 2015-09-22 | Nanosys, Inc. | Silicone ligands for stabilizing quantum dot films |
TWI596188B (zh) | 2012-07-02 | 2017-08-21 | 奈米系統股份有限公司 | 高度發光奈米結構及其製造方法 |
WO2015100072A1 (en) * | 2013-12-23 | 2015-07-02 | Saint-Gobain Performance Plastics Corporation | Coating materials and low haze heat rejection composites |
CN105925043A (zh) * | 2016-06-07 | 2016-09-07 | 平顶山市美伊金属制品有限公司 | 一种含有可吸收锌元素的不粘锅喷涂料 |
CN106065212A (zh) * | 2016-06-07 | 2016-11-02 | 平顶山市美伊金属制品有限公司 | 一种含有可吸收钙元素的不粘锅喷涂料 |
CN105925029A (zh) * | 2016-06-07 | 2016-09-07 | 平顶山市美伊金属制品有限公司 | 一种含有可吸收铁元素的不粘锅喷涂料 |
WO2018231761A1 (en) * | 2017-06-15 | 2018-12-20 | Sasol (Usa) Corporation | Hydrophobic surface modified aluminas and method for making thereof |
CN107312363A (zh) * | 2017-07-14 | 2017-11-03 | 杭州智华杰科技有限公司 | 一种微晶耐磨易涂覆氧化铝粉末的制备方法 |
CN109265181A (zh) * | 2017-07-18 | 2019-01-25 | 北京泽马新技术有限公司 | 锅炉水冷壁高温防腐抗沾污防结渣陶瓷涂料 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003055939A1 (en) * | 2001-12-28 | 2003-07-10 | Ucb, S.A. | Ultrasonic method for the production of inorganic/organic hybrid nanocomposite |
US6896958B1 (en) * | 2000-11-29 | 2005-05-24 | Nanophase Technologies Corporation | Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1068836B (de) * | 1959-11-12 | Badische Bau- und Kunststoff G.m. b.H., Mannheim-Feudenheim | Verwendung im regulären Kristallsystem kristallisierter, spinellartiger Verbindungen als Pigmente oder Füller | |
DE19811790A1 (de) * | 1998-03-18 | 1999-09-23 | Bayer Ag | Nanopartikel enthaltende transparente Lackbindemittel mit verbesserter Verkratzungsbeständigkeit, ein Verfahren zur Herstellung sowie deren Verwendung |
DE19933098A1 (de) * | 1999-07-15 | 2001-01-18 | Herberts Gmbh & Co Kg | Mit Nanopartikeln modifizierte Bindemittel für Überzugsmittel und deren Verwendung |
DE50108613D1 (de) * | 2000-02-29 | 2006-03-30 | Feron Aluminium | Verfahren zur herstellung eines schichtwerkstoffs und so erhaltener schichtwerkstoff |
DE10304849A1 (de) * | 2003-02-06 | 2004-08-19 | Institut für Neue Materialien gemeinnützige Gesellschaft mit beschränkter Haftung | Chemomechanische Herstellung von Funktionskolloiden |
-
2005
- 2005-08-18 DE DE102005039436A patent/DE102005039436B4/de not_active Revoked
-
2006
- 2006-08-16 JP JP2008526433A patent/JP2009504856A/ja not_active Withdrawn
- 2006-08-16 CN CN2006800352790A patent/CN101273099B/zh not_active Expired - Fee Related
- 2006-08-16 CN CNA2006800353685A patent/CN101273100A/zh active Pending
- 2006-08-16 WO PCT/EP2006/008065 patent/WO2007020062A2/de active Application Filing
- 2006-08-16 EP EP06776871A patent/EP1922370A2/de not_active Withdrawn
- 2006-08-16 CN CN2006800343880A patent/CN101268156B/zh not_active Expired - Fee Related
- 2006-08-16 US US11/990,357 patent/US20100006005A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6896958B1 (en) * | 2000-11-29 | 2005-05-24 | Nanophase Technologies Corporation | Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles |
WO2003055939A1 (en) * | 2001-12-28 | 2003-07-10 | Ucb, S.A. | Ultrasonic method for the production of inorganic/organic hybrid nanocomposite |
CN1602332A (zh) * | 2001-12-28 | 2005-03-30 | 舒飞士特种化工有限公司 | 用于制备无机/有机混杂纳米复合材料的超声方法 |
Non-Patent Citations (1)
Title |
---|
D.Monceau et al..surface segregation and morphology of Mg-doped alpha-Alumina powders.《Journal of the european chemical society》.1995,第15卷(第9期),851-858. * |
Also Published As
Publication number | Publication date |
---|---|
CN101273100A (zh) | 2008-09-24 |
WO2007020062A3 (de) | 2007-07-26 |
US20100006005A1 (en) | 2010-01-14 |
EP1922370A2 (de) | 2008-05-21 |
JP2009504856A (ja) | 2009-02-05 |
CN101268156A (zh) | 2008-09-17 |
DE102005039436B4 (de) | 2009-05-07 |
WO2007020062A2 (de) | 2007-02-22 |
DE102005039436A1 (de) | 2007-02-22 |
CN101273099A (zh) | 2008-09-24 |
CN101268156B (zh) | 2011-10-05 |
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