CN101185024B - 接枝图案形成方法、通过该方法得到的接枝图案材料和使用其的平版印刷方法 - Google Patents

接枝图案形成方法、通过该方法得到的接枝图案材料和使用其的平版印刷方法 Download PDF

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Publication number
CN101185024B
CN101185024B CN2006800149382A CN200680014938A CN101185024B CN 101185024 B CN101185024 B CN 101185024B CN 2006800149382 A CN2006800149382 A CN 2006800149382A CN 200680014938 A CN200680014938 A CN 200680014938A CN 101185024 B CN101185024 B CN 101185024B
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China
Prior art keywords
formula
base material
macromolecular compound
graft
exposure
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Expired - Fee Related
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CN2006800149382A
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English (en)
Chinese (zh)
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CN101185024A (zh
Inventor
川村浩一
若田裕一
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Fujifilm Corp
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Fujifilm Corp
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Publication of CN101185024A publication Critical patent/CN101185024A/zh
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Optical Filters (AREA)
CN2006800149382A 2005-05-02 2006-05-02 接枝图案形成方法、通过该方法得到的接枝图案材料和使用其的平版印刷方法 Expired - Fee Related CN101185024B (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP134365/2005 2005-05-02
JP2005134365 2005-05-02
JP2005155497 2005-05-27
JP155497/2005 2005-05-27
JP222225/2005 2005-07-29
JP2005222225 2005-07-29
PCT/JP2006/309169 WO2006118305A1 (ja) 2005-05-02 2006-05-02 グラフトパターン形成方法、それにより得られたグラフトパターン材料及びそれを用いたリソグラフィ方法

Publications (2)

Publication Number Publication Date
CN101185024A CN101185024A (zh) 2008-05-21
CN101185024B true CN101185024B (zh) 2011-01-05

Family

ID=37308093

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800149382A Expired - Fee Related CN101185024B (zh) 2005-05-02 2006-05-02 接枝图案形成方法、通过该方法得到的接枝图案材料和使用其的平版印刷方法

Country Status (4)

Country Link
JP (1) JP4986848B2 (ko)
KR (1) KR20080003389A (ko)
CN (1) CN101185024B (ko)
WO (1) WO2006118305A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101410758B (zh) * 2006-03-28 2012-06-13 富士胶片株式会社 感光性树脂组合物、感光性转印材料、间壁墙及其形成方法、光学元件及其制造方法以及显示装置
JP2012068357A (ja) * 2010-09-22 2012-04-05 Eastman Kodak Co 平版印刷版原版

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1405628A (zh) * 2001-08-03 2003-03-26 富士胶片株式会社 平版印刷版前体
JP2004175098A (ja) * 2002-09-30 2004-06-24 Fuji Photo Film Co Ltd パターン形成材料及びパターン形成方法、並びに、平版印刷版原版

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6147641A (ja) * 1984-08-15 1986-03-08 Toshiba Corp レジストパタ−ンの形成方法
JP3557023B2 (ja) * 1995-01-11 2004-08-25 積水化学工業株式会社 基材密着性の良好な表面層を有する物品および該物品の製造方法
JPH08320574A (ja) * 1995-05-25 1996-12-03 Hitachi Ltd パタ−ン形成方法
JP3798667B2 (ja) * 2001-10-11 2006-07-19 富士写真フイルム株式会社 親水性部材前駆体及びそれを用いた親水性部材
JP2005037881A (ja) * 2003-04-21 2005-02-10 Fuji Photo Film Co Ltd パターン形成方法、画像形成方法、微粒子吸着パターン形成方法、導電性パターン形成方法、パターン形成材料、及び平版印刷版

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1405628A (zh) * 2001-08-03 2003-03-26 富士胶片株式会社 平版印刷版前体
JP2004175098A (ja) * 2002-09-30 2004-06-24 Fuji Photo Film Co Ltd パターン形成材料及びパターン形成方法、並びに、平版印刷版原版

Also Published As

Publication number Publication date
JP4986848B2 (ja) 2012-07-25
KR20080003389A (ko) 2008-01-07
CN101185024A (zh) 2008-05-21
JPWO2006118305A1 (ja) 2008-12-18
WO2006118305A1 (ja) 2006-11-09

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Granted publication date: 20110105

Termination date: 20130502