CN101111496B - 长波长位移苯并三唑uv-吸收剂和它们的用途 - Google Patents

长波长位移苯并三唑uv-吸收剂和它们的用途 Download PDF

Info

Publication number
CN101111496B
CN101111496B CN2006800037870A CN200680003787A CN101111496B CN 101111496 B CN101111496 B CN 101111496B CN 2006800037870 A CN2006800037870 A CN 2006800037870A CN 200680003787 A CN200680003787 A CN 200680003787A CN 101111496 B CN101111496 B CN 101111496B
Authority
CN
China
Prior art keywords
phenyl
compound
butyl
general formula
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2006800037870A
Other languages
English (en)
Chinese (zh)
Other versions
CN101111496A (zh
Inventor
K·夫里兹谢
A·布莱格
M·傅里
W·费希尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of CN101111496A publication Critical patent/CN101111496A/zh
Application granted granted Critical
Publication of CN101111496B publication Critical patent/CN101111496B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Cosmetics (AREA)
  • Plural Heterocyclic Compounds (AREA)
CN2006800037870A 2005-02-02 2006-01-23 长波长位移苯并三唑uv-吸收剂和它们的用途 Active CN101111496B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP05100703 2005-02-02
EP05100703.7 2005-02-02
PCT/EP2006/050354 WO2006082145A1 (en) 2005-02-02 2006-01-23 Long wavelength shifted benzotriazole uv-absorbers and their use

Publications (2)

Publication Number Publication Date
CN101111496A CN101111496A (zh) 2008-01-23
CN101111496B true CN101111496B (zh) 2010-12-29

Family

ID=34938620

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800037870A Active CN101111496B (zh) 2005-02-02 2006-01-23 长波长位移苯并三唑uv-吸收剂和它们的用途

Country Status (12)

Country Link
US (1) US7695643B2 (enExample)
EP (1) EP1844049B1 (enExample)
JP (1) JP4975646B2 (enExample)
KR (1) KR101322194B1 (enExample)
CN (1) CN101111496B (enExample)
AT (1) ATE502942T1 (enExample)
BR (1) BRPI0606893B1 (enExample)
DE (1) DE602006020839D1 (enExample)
MY (1) MY144674A (enExample)
RU (1) RU2414471C2 (enExample)
TW (1) TWI391393B (enExample)
WO (1) WO2006082145A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104744675A (zh) * 2015-03-30 2015-07-01 华南理工大学 含6H–吡咯并[3,4–f]苯并三唑–5,7–二酮的共轭聚合物及其应用
TWI588019B (zh) * 2013-01-15 2017-06-21 Sk化學公司 熱收縮性聚酯類薄膜

Families Citing this family (94)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10214937A1 (de) * 2002-04-04 2003-10-16 Basf Ag Cyclische Verbindungen und ihre Verwendung als Lichtabsorber, Lichtemitter oder Komplexliganden
DE102005012056A1 (de) * 2005-03-16 2006-09-28 Basf Coatings Ag Mehrschichtlackierungen, Verfahren zu ihrer Herstellung und deren Verwendung im Automobilbau
ATE497502T1 (de) * 2006-06-27 2011-02-15 Basf Se Zu langen wellenlängen verschobene benzotriazol- uv-absorber und deren verwendung
WO2009065490A2 (de) * 2007-11-21 2009-05-28 Lofo High Tech Film Gmbh Verwendung bestimmter uv-absorber in flächigen materialien und/oder linsen und damit zusammenhängende erfindungsgegenstände
US20090291315A1 (en) * 2008-01-24 2009-11-26 Costin Darryl J Ultra Violet Resistant Coating for Wood Products
TWI453199B (zh) * 2008-11-04 2014-09-21 Alcon Inc 用於眼用鏡片材料之紫外光/可見光吸收劑
CN102292397B (zh) 2009-01-19 2014-12-10 巴斯夫欧洲公司 有机黑色颜料及其制备
TWI464151B (zh) * 2009-07-06 2014-12-11 Alcon Inc 用於眼用鏡片材料之uv/可見光吸收劑
KR101869746B1 (ko) * 2010-04-29 2018-06-21 노파르티스 아게 자외선 흡수제들 및 청색광 발색단들의 조합을 이용한 인공수정체들
EP2481847A1 (en) 2011-01-31 2012-08-01 DSM IP Assets B.V. UV-Stabilized high strength fiber
US20120279566A1 (en) * 2011-05-02 2012-11-08 Basf Se Photovoltaic element with increased long-term stability
WO2014026780A1 (en) 2012-08-16 2014-02-20 Basf Coatings Gmbh Coating compositions containing benzotrizol based uv-absorbers
CN103965094B (zh) * 2013-01-31 2016-07-06 江苏道博化工有限公司 N-甲基-4-氨基-5-溴-邻苯二甲酰亚胺的合成方法
CN105308130B (zh) * 2013-04-02 2017-09-29 巴斯夫欧洲公司 经涂覆的碳纤维增强塑料部件
US9969864B2 (en) 2013-07-08 2018-05-15 Basf Se Light stabilizers
KR101663280B1 (ko) * 2014-10-06 2016-10-06 에스케이씨하스디스플레이필름(유) 액정표시장치용 색순도 향상 필름 및 이를 포함하는 액정표시장치
TW201703879A (zh) 2015-06-02 2017-02-01 西克帕控股有限公司 用於生產光學效應層之製程
US20180243976A1 (en) 2015-09-30 2018-08-30 Carbon, Inc. Method and Apparatus for Producing Three- Dimensional Objects
US10647054B2 (en) 2015-12-22 2020-05-12 Carbon, Inc. Accelerants for additive manufacturing with dual cure resins
WO2017112521A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Production of flexible products by additive manufacturing with dual cure resins
JP6944935B2 (ja) 2015-12-22 2021-10-06 カーボン,インコーポレイテッド 二重硬化樹脂を用いた積層造形による複数の中間体からの複合生産物の製作
WO2017112653A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
US9828467B2 (en) 2016-02-05 2017-11-28 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers
CN105891915A (zh) * 2016-05-19 2016-08-24 江苏淘镜有限公司 一种新型uv420镜片的制造方法
WO2018094131A1 (en) 2016-11-21 2018-05-24 Carbon, Inc. Method of making three-dimensional object by delivering reactive component for subsequent cure
WO2018102341A1 (en) * 2016-11-30 2018-06-07 Basf Se Photocurable hardcoat compositions, methods, and articles derived therefrom
US11208517B2 (en) 2017-01-05 2021-12-28 Carbon, Inc. Dual cure stereolithography resins containing diels-alder adducts
WO2018148632A1 (en) 2017-02-13 2018-08-16 Carbon, Inc. Method of making composite objects by additive manufacturing
WO2018165090A1 (en) 2017-03-09 2018-09-13 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
US20210107211A1 (en) 2017-03-23 2021-04-15 Carbon, Inc. Lip supports useful for making objects by additive manufacturing
WO2018182974A1 (en) 2017-03-27 2018-10-04 Carbon, Inc. Method of making three-dimensional objects by additive manufacturing
US10239255B2 (en) 2017-04-11 2019-03-26 Molecule Corp Fabrication of solid materials or films from a polymerizable liquid
EP3635487A1 (en) 2017-06-08 2020-04-15 Carbon, Inc. Blocking groups for light polymerizable resins useful in additive manufacturing
US11135766B2 (en) 2017-06-29 2021-10-05 Carbon, Inc. Products containing nylon 6 produced by stereolithography and methods of making the same
US11135765B2 (en) 2017-08-11 2021-10-05 Carbon, Inc. Serially curable resins useful in additive manufacturing
US11472904B2 (en) 2017-09-22 2022-10-18 Carbon, Inc. Production of light-transmissive objects by additive manufacturing
CN111201457A (zh) * 2017-09-29 2020-05-26 积水化学工业株式会社 玻璃结构体
WO2019083876A1 (en) 2017-10-26 2019-05-02 Carbon, Inc. REDUCTION OF WITHDRAWAL OR LOWERING IN OBJECTS PRODUCED BY ADDITIVE MANUFACTURING
WO2019099347A1 (en) 2017-11-20 2019-05-23 Carbon, Inc. Light-curable siloxane resins for additive manufacturing
US11479628B2 (en) 2017-12-08 2022-10-25 Carbon, Inc. Shelf stable, low tin concentration, dual cure additive manufacturing resins
US10966713B2 (en) 2018-02-21 2021-04-06 Ethicon Llc Three dimensional adjuncts
US10799237B2 (en) 2018-02-21 2020-10-13 Ethicon Llc Three dimensional adjuncts
USD882782S1 (en) 2018-02-21 2020-04-28 Ethicon Llc Three dimensional adjunct
KR102790175B1 (ko) * 2018-02-27 2025-04-03 세키스이가가쿠 고교가부시키가이샤 접합 유리용 중간막, 및 접합 유리
US12042994B2 (en) 2018-03-02 2024-07-23 Carbon, Inc. Sustainable additive manufacturing resins and methods of recycling
US11390705B2 (en) 2018-05-11 2022-07-19 Carbon, Inc. Reactive particulate materials useful for additive manufacturing
WO2019245892A1 (en) 2018-06-20 2019-12-26 Carbon, Inc. Method of treating additive manufacturing objects with a compound of interest
US12162975B2 (en) 2018-07-27 2024-12-10 Carbon, Inc. Branched reactive blocked prepolymers for additive manufacturing
WO2020028232A1 (en) 2018-08-01 2020-02-06 Carbon, Inc. Production of low density products by additive manufacturing
KR102365792B1 (ko) * 2018-08-30 2022-02-21 삼성에스디아이 주식회사 유기발광소자 봉지용 조성물 및 이로부터 제조된 유기층을 포함하는 유기발광소자 표시장치
WO2020055682A1 (en) 2018-09-10 2020-03-19 Carbon, Inc. Dual cure additive manufacturing resins for production of flame retardant objects
US11135744B2 (en) 2018-09-13 2021-10-05 Carbon, Inc. Reversible thermosets for additive manufacturing
WO2020068720A1 (en) 2018-09-25 2020-04-02 Carbon, Inc. Dual cure resins for additive manufacturing
CN109456596B (zh) * 2018-10-30 2021-06-29 深圳市晨宇丰塑胶新材料有限公司 一种高温尼龙汽车材料
WO2020114936A1 (en) 2018-12-06 2020-06-11 Basf Se Novel procedure for the formation of 2h-benzotriazole bodies and congeners
CN115745970B (zh) * 2018-12-10 2024-12-13 江苏裕事达新材料科技有限责任公司 一种多环化合物、制备方法以及膜
WO2020131675A1 (en) 2018-12-21 2020-06-25 Carbon, Inc. Energy absorbing dual cure polyurethane elastomers for additive manufacturing
US20220145180A1 (en) * 2019-03-18 2022-05-12 Merck Patent Gmbh Polymerisable liquid crystal material and polymerised liquid crystal film
US11555095B2 (en) 2019-03-29 2023-01-17 Carbon, Inc. Dual cure resin for the production of moisture-resistant articles by additive manufacturing
US20220049066A1 (en) * 2019-06-06 2022-02-17 Paragon Films, Inc. Ultraviolet Inhibiting Stretch Film
WO2020263480A1 (en) 2019-06-28 2020-12-30 Carbon, Inc. Dual cure additive manufacturing resins for the production of objects with mixed tensile properties
EP3791809B1 (en) 2019-09-16 2024-07-17 Ethicon LLC Compressible non-fibrous adjuncts
EP3791799B1 (en) 2019-09-16 2025-01-22 Ethicon LLC Compressible non-fibrous adjuncts
EP4031020A1 (en) 2019-09-16 2022-07-27 Carbon, Inc. Bio absorbable resin for additive manufacturing
US11490890B2 (en) 2019-09-16 2022-11-08 Cilag Gmbh International Compressible non-fibrous adjuncts
EP3791808B1 (en) 2019-09-16 2024-09-25 Ethicon LLC Compressible non-fibrous adjuncts
EP3791806A1 (en) 2019-09-16 2021-03-17 Ethicon LLC Compressible non-fibrous adjuncts
EP3791810B1 (en) 2019-09-16 2023-12-20 Ethicon LLC Compressible non-fibrous adjuncts
EP4052656B1 (en) 2019-09-16 2025-08-20 Ethicon LLC Compressible non-fibrous adjuncts
US11534169B2 (en) 2019-09-16 2022-12-27 Cilag Gmbh International Compressible non-fibrous adjuncts
EP3791807B1 (en) 2019-09-16 2023-10-04 Ethicon LLC Compressible non-fibrous adjuncts
EP3791800B1 (en) 2019-09-16 2024-09-25 Ethicon LLC Compressible non-fibrous adjuncts
EP3791804B1 (en) 2019-09-16 2023-11-29 Ethicon LLC Compressible non-fibrous adjuncts
WO2021080974A1 (en) 2019-10-25 2021-04-29 Carbon, Inc. Mechanically anisotropic 3d printed flexible polymeric sheath
EP3838592A1 (en) 2019-12-17 2021-06-23 Evonik Operations GmbH Composition comprising polyesters for additive manufacturing
WO2021133585A1 (en) 2019-12-23 2021-07-01 Carbon, Inc. Inhibition of crystallization in polyurethane resins
WO2021146237A1 (en) 2020-01-17 2021-07-22 Carbon, Inc. Chemical recycling of additively manufactured objects
EP4110843A1 (en) 2020-02-28 2023-01-04 Carbon, Inc. One part moisture curable resins for additive manufacturing
EP4093599B1 (en) 2020-02-28 2023-11-29 Carbon, Inc. Methods of making a three-dimensional object
WO2021183741A1 (en) 2020-03-12 2021-09-16 Carbon, Inc. Partially reversible thermosets useful for recycling
WO2021202655A1 (en) 2020-04-03 2021-10-07 Carbon, Inc. Resins and methods for additive manufacturing of energy absorbing three-dimensional objects
US11655329B2 (en) 2020-04-24 2023-05-23 Carbon, Inc. Delayed action catalysts for dual cure additive manufacturing resins
WO2021222086A1 (en) 2020-04-28 2021-11-04 Carbon, Inc. Methods of making a three-dimensional object
USD1029255S1 (en) 2020-09-01 2024-05-28 Cilag Gmbh International Stapling cartridge assembly with a compressible adjunct
WO2022066565A1 (en) 2020-09-25 2022-03-31 Carbon, Inc. Epoxy dual cure resin for the production of moisture-resistant articles by additive manufacturing
CN116724067A (zh) 2021-01-15 2023-09-08 赢创运营有限公司 硅酮氨基甲酸酯(甲基)丙烯酸酯以及它们在3d打印树脂和涂层组合物中的用途
US20240239948A1 (en) 2021-06-03 2024-07-18 Carbon, Inc. Methods for the rapid production of blocked prepolymers
US11952457B2 (en) 2021-06-30 2024-04-09 Carbon, Inc. Bioabsorbable resin for additive manufacturing with non-cytotoxic photoinitiator
US11884000B2 (en) 2021-08-27 2024-01-30 Carbon, Inc. One part, catalyst containing, moisture curable dual cure resins for additive manufacturing
JP2025521743A (ja) 2022-06-29 2025-07-10 エボニック オペレーションズ ゲーエムベーハー シリコーンウレタン(メタ)アクリレートおよびコーティング組成物におけるそれらの使用
WO2024206541A1 (en) * 2023-03-31 2024-10-03 Gcp Applied Technologies Inc. Daylight curing concrete primer composition
WO2025038337A1 (en) 2023-08-11 2025-02-20 Carbon, Inc. Dual cure resins having polyether and polyamide subunits and additive manufacturing methods using the same
WO2025080931A1 (en) 2023-10-12 2025-04-17 Carbon, Inc. Dual cure resins for mixed modulus materials
WO2025137013A1 (en) 2023-12-19 2025-06-26 Carbon, Inc. Silicone resin compositions and methods of using same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0717313A1 (en) * 1994-11-30 1996-06-19 Eastman Kodak Company Benzotriazole based UV absorbing compounds and photographic elements containing them
GB2346369A (en) * 1999-01-21 2000-08-09 Ciba Sc Holding Ag Benzotriazole uv absorbers
WO2002028854A1 (en) * 2000-10-03 2002-04-11 Ciba Specialty Chemicals Holding Inc. Heteroaryl substituted hydroxyphenyltriazine uv-absorbers

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2054699T3 (es) * 1986-04-10 1994-08-16 Sandoz Ag Pigmentos que contienen grupos de piperidilo.
JPH03200788A (ja) * 1989-12-27 1991-09-02 Kuraray Co Ltd ベンゾトリアゾール系化合物およびその用途
JP2753921B2 (ja) * 1992-06-04 1998-05-20 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2001323251A (ja) * 2000-05-15 2001-11-22 Asahi Denka Kogyo Kk 顆粒状紫外線吸収剤の製造方法
US6566507B2 (en) * 2000-08-03 2003-05-20 Ciba Specialty Chemicals Corporation Processes for the preparation of benzotriazole UV absorbers
US7105479B2 (en) * 2001-03-27 2006-09-12 Ciba Specialty Chemicals Corporation Fabric rinse composition containing a benztriazole UV absorber
CA2459374C (en) * 2001-10-17 2011-02-08 Ciba Specialty Chemicals Holding Inc. Photoactivable nitrogen bases
JP2004277581A (ja) * 2003-03-17 2004-10-07 Konica Minolta Holdings Inc セルロースエステルフィルム、偏光板、液晶表示装置、セルロースエステルフィルムの製造方法、偏光板の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0717313A1 (en) * 1994-11-30 1996-06-19 Eastman Kodak Company Benzotriazole based UV absorbing compounds and photographic elements containing them
GB2346369A (en) * 1999-01-21 2000-08-09 Ciba Sc Holding Ag Benzotriazole uv absorbers
WO2002028854A1 (en) * 2000-10-03 2002-04-11 Ciba Specialty Chemicals Holding Inc. Heteroaryl substituted hydroxyphenyltriazine uv-absorbers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI588019B (zh) * 2013-01-15 2017-06-21 Sk化學公司 熱收縮性聚酯類薄膜
CN104744675A (zh) * 2015-03-30 2015-07-01 华南理工大学 含6H–吡咯并[3,4–f]苯并三唑–5,7–二酮的共轭聚合物及其应用

Also Published As

Publication number Publication date
DE602006020839D1 (de) 2011-05-05
US20080157025A1 (en) 2008-07-03
BRPI0606893B1 (pt) 2014-10-14
EP1844049A1 (en) 2007-10-17
JP2008528657A (ja) 2008-07-31
EP1844049B1 (en) 2011-03-23
BRPI0606893A2 (pt) 2009-07-21
ATE502942T1 (de) 2011-04-15
MY144674A (en) 2011-10-31
KR20070104640A (ko) 2007-10-26
CN101111496A (zh) 2008-01-23
US7695643B2 (en) 2010-04-13
TWI391393B (zh) 2013-04-01
RU2007132974A (ru) 2009-03-10
KR101322194B1 (ko) 2013-10-30
TW200633988A (en) 2006-10-01
JP4975646B2 (ja) 2012-07-11
RU2414471C2 (ru) 2011-03-20
WO2006082145A1 (en) 2006-08-10

Similar Documents

Publication Publication Date Title
CN101111496B (zh) 长波长位移苯并三唑uv-吸收剂和它们的用途
TW565557B (en) Benzotriazoles containing alpha-cumyl groups substituted by heteroatoms and compositions stabilized therewith
CN100384826C (zh) 空间位阻的胺醚的制备
TWI249561B (en) Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom
GB2319035A (en) Benzotriazole UV absorbers and compositions containing them
TW419497B (en) Novel 2-(2-hudroxy-3-<alpha>-cumyl-5-alkylphenyl)-2H-benzotriazoles
TW470761B (en) Tris-aryl s-triazines substituted with biphenylyl groups
EP2116585B1 (en) Ultraviolet absorber composition
TW449610B (en) Hydroxyphenyltriazines
CN101479271B (zh) 长波长偏移的苯并三唑uv吸收剂及其用途
TWI290564B (en) Substituted 5-aryl and 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith
KR100346064B1 (ko) 트리스-아릴-s-트리아진및그를포함하는조성물
CN101472744B (zh) 可逆热致变色体系、组合物、制品和用于可逆热致变色地着色载体材料的方法
KR20000067910A (ko) 자외선 흡수제로서의 폴리옥시알킬렌으로 치환 및 가교된 트리아
JPH02782A (ja) 新規な2―(2―ヒドロキシフェニル)ベンゾトリアゾール誘導体
CN1167805A (zh) 用作有机材料稳定剂的二羧酸多烷基哌啶-4-基酯混合物
CN103819960A (zh) 用2-羟基苯基三嗪稳定的着色透明涂层uv
CZ223695A3 (en) Alkoxyphenyl group substituted bisacylphosphine oxides
CA2517334A1 (en) Water compatible sterically hindered alkoxyamines and hydroxy substituted alkoxyamines
GB2317174A (en) Hydroxyphenytriazine stabilisers
JP3653676B2 (ja) 二量体ビスアシルホスフィン、ビスアシルホスフィンオキシドおよびビスアシルホスフィンスルフィド
JP2004534009A (ja) ベンゾトリアゾール類及び紫外線安定剤としてのそれらの用途
US6603020B1 (en) Fluorescent diketopyrrolopyrroles
JPH0215070A (ja) 液体状の置換2h―ベンゾトリアゾール混合物
US5919944A (en) Polymerisable diketopyrrolopyrroles

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant