CN101085446B - Precoated roller cleaning unit and cleaning method, substrate application device - Google Patents
Precoated roller cleaning unit and cleaning method, substrate application device Download PDFInfo
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- CN101085446B CN101085446B CN2007101074089A CN200710107408A CN101085446B CN 101085446 B CN101085446 B CN 101085446B CN 2007101074089 A CN2007101074089 A CN 2007101074089A CN 200710107408 A CN200710107408 A CN 200710107408A CN 101085446 B CN101085446 B CN 101085446B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 70
- 239000000758 substrate Substances 0.000 title claims description 56
- 238000000034 method Methods 0.000 title claims description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 229920002120 photoresistant polymer Polymers 0.000 claims description 67
- 239000002904 solvent Substances 0.000 claims description 34
- 239000007921 spray Substances 0.000 claims description 21
- 239000012530 fluid Substances 0.000 claims description 13
- 238000001035 drying Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 238000007598 dipping method Methods 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 6
- 230000001276 controlling effect Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000013557 residual solvent Substances 0.000 description 4
- 101100165177 Caenorhabditis elegans bath-15 gene Proteins 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 238000007761 roller coating Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000004323 axial length Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000005002 finish coating Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000935 solvent evaporation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Saccharide Compounds (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention relates to a cleaning unit for cleaning the precoat roller of baseplate coating device, especially relates to cleaning unit including shell and ultrasonic wave generating unit for emitting ultrasonic wave towards inside the shell and baseplate coating device containing the said cleaning unit. The invention has effects of improving the coating liquor cleaning ability of the precoat roller and simplying the structure of the cleaning device.
Description
Technical field
The present invention relates to precoated roller (Priming Roller) cleaning unit and cleaning method and the substrate application device that comprises described cleaning unit, relate in particular to the substrate application device that utilizes ultrasonic wave to increase the precoated roller cleaning unit and the cleaning method of precoated roller cleansing power and comprise described cleaning unit.
Background technology
Usually, the method that is used for evenly applying photoresist (Photoresist) in photoetching process has roller coating (Roll Coating) method, spin coating (Spin Coating) method, slit coating (Slit Coating) method.Roller coating is that described roller is rolled and the method for coating photoresist by certain orientation on substrate; Spin coating is to place substrate on the disc supporter and make the substrate rotation after described substrate center drippage photoresist, thereby applies the method for photoresist on substrate according to centrifugal force; Slit coating is that the nozzle by shape of slit is sprayed onto the method that substrate applies with photoresist according to the inswept substrate of certain orientation the time.
But substrate is big more heavy more, be difficult to more substrate is rotated at a high speed, and substrate is subjected to when rotating at a high speed damage or energy consumption is also big more.Therefore, panel display apparatus such as employed glass substrate of display panels mainly uses the slit coating method with substrate.
The slit coating device that is used for carrying out described slit coating comprises: the substrates fixed disk (Chuck) that is used to place substrate; Be located at the pre-ejection portion of described substrates fixed disk one side; Be positioned at the gap nozzle (slit-nozzle) on described substrates fixed disk and pre-ejection portion top, while this gap nozzle moves horizontally to substrate ejection photoresist.That is, gap nozzle after pre-ejection portion top sprays in advance, is moved horizontally to the substrates fixed disk of placing substrate and sprays photoresist to substrate earlier.For photoresist is evenly distributed on the substrate, gap nozzle is at the uniform velocity mobile when the ejection photoresist.
Fig. 1 is the sectional view with pre-ejection portion of general cleaning unit.
As shown in Figure 1, ejection portion comprises shell 10, is positioned at the precoated roller 12 of described shell 10 inside and is used to flood the rinse bath 15 of described precoated roller 12 parts in advance.
Opening is formed at described shell 10 tops, and cylindrical shape precoated roller 12 is positioned at described shell 10 inside, and the part on precoated roller 12 tops is exposed by the opening of described shell 10.And, in described shell 10 bottoms rinse bath 15 is set, to be used to flood the part of described precoated roller 12 bottoms.
Inwall along described shell 10 sets gradually solvent drippage unit 14, first scraper (blade) 16, the first ejection of solvent device 18, the second ejection of solvent device 20, second scraper 22 and utilizes the drier 24 (to call the CDA drier in the following text) that cleans with dry air.
That is, when gap nozzle 30 applied photoresist on precoated roller 12 tops that are rotated, solvent drippage unit 14 dripped to solvent and dilutes the photoresist that is bonded on the precoated roller 12 on the precoated roller 12.Diluted photoresist is removed with the way of contact by first scraper 16, then by the first ejection of solvent device 18 to precoated roller 12 ejection of solvent and cleaning photoetching glue.Then, precoated roller 12 is dipped in the rinse bath 15, cleans thus attached to the photoresist on the precoated roller 12.
Remove residual photoresist through precoated roller 12 surfaces of cleaning by the second ejection of solvent device 20 and second scraper 22.At last, carry out drying by 24 pairs of precoated rollers of CDA drier 12 and finish cleaning.
Yet along with the maximization of substrate, the axial length of precoated roller 12 increases day by day, therefore needs the pre-ejection of adjustment portion structure to adapt to the length of precoated roller 12.Especially, along with pre-ejection portion becomes big, for regular supply and discharge solvent, solvent drippage unit 14, first and second scraper (16,22), first and second ejection of solvent device (18,20) and CDA drier 24 etc. have the labyrinth that is made of a plurality of pipe arrangements.
And precoated roller 12 also becomes greatly and since to the cleansing power of precoated roller 12 by drippage and be ejected into the flow of the solvent on the roller 12 and factor institute such as pressure about, therefore if think to improve relatively cleansing power, just need the solvent of more multithread amount.
Summary of the invention
The present invention proposes in order to solve aforesaid problem, the substrate application device that its purpose is to provide a kind of precoated roller cleaning unit and cleaning method and comprises described cleaning unit, by using ultrasonic wave to clean precoated roller, thus simplification device structure and improve cleansing power.
To achieve these goals, cleaning unit provided by the present invention is used for the photoresist on the precoated roller of cleaning base plate applying device, comprise: shell, the length of this shell is greater than the length of described precoated roller, this shell upper forms opening to expose the upper face of the described precoated roller that is positioned at described enclosure, and described enclosure is equipped with cleaning fluid to be used to flood the part of described precoated roller bottom; Be located at described precoated roller and be cleaned the liquid dipping solvent drippage device of position before; Be located at described precoated roller and be cleaned liquid the dipping scraper and the CDA drier of position afterwards; Launch hyperacoustic ultrasonic wave generation unit to described enclosure, described ultrasonic wave generation unit comprises oscillator and provides the ultrasonic oscillator of signal to described oscillator, and described oscillator has the curve of corresponding described precoated roller towards the one side of precoated roller.
And described oscillator is set to a plurality of, and the high frequency voltage that is provided to described each oscillator respectively is controlled to be has same phase.
And, can also comprise the rinse bath that cleaning fluid is housed in the described shell.
Provided by the present invention being used for comprises the substrate application device that substrate applies: place the coating portion of substrate, in advance ejection portion, to the spray nozzle part of described substrate spraying and applying liquid, described pre-ejection portion has above-mentioned cleaning unit.
The precoated roller cleaning method of substrate application device provided by the present invention comprises step: the described precoated roller that rotates injected photoresist; The dilution photoresist; Utilize ultrasonic wave to clean described photoresist; Remove the residue on the described precoated roller; Described precoated roller is carried out drying, wherein, utilize the ultrasonic wave generation unit to carry out the described step of utilizing ultrasonic wave to clean described photoresist, described ultrasonic wave generation unit comprises oscillator and provides the ultrasonic oscillator of signal to described oscillator, and described oscillator has the curve of corresponding described precoated roller towards the one side of described precoated roller.
Fig. 1 is the sectional view with pre-ejection portion of general cleaning unit;
Fig. 2 and Fig. 3 are side view and the stereogram with substrate application device of ultrasonic wave cleaning unit provided by the present invention;
Description of drawings
The sectional view of the pre-ejection portion of the ultrasonic wave cleaning unit that has first embodiment of the invention and provide is provided Fig. 4;
Fig. 5 is the sectional view of the variation of expression pre-ejection shown in Figure 4 portion;
The sectional view of the pre-ejection portion of the ultrasonic wave cleaning unit that has second embodiment of the invention and provide is provided Fig. 6;
Fig. 7 is the sectional view of the variation of expression pre-ejection shown in Figure 6 portion;
Fig. 8 is the sectional view of expression substrate application device working condition provided by the present invention;
Fig. 9 is the flow chart with pre-ejection portion cleaning method of ultrasonic wave cleaning unit provided by the present invention;
Figure 10 to Figure 12 has the sectional view of the pre-ejection portion working condition of ultrasonic wave cleaning unit provided by the present invention for expression;
Figure 13 is the sectional view of expression substrate application device working condition provided by the present invention.
Main symbol description: 10,310 is shell, and 12,320 is precoated roller, and 15,330 is rinse bath, 16,22,350 is scraper, and 18,20 is the ejection of solvent device, and 100 is spray nozzle part, 110 is gap nozzle, and 120 is ejiction opening, and 200 are coating portion, 210 is workbench (Table), and 230 is level board (Plate), and 250 is transfer unit, 300 is pre-ejection portion, 370 is oscillator (Vibrator), and 380 is high-frequency generator, and 500 is substrate.
Describe embodiments of the invention with reference to the accompanying drawings in detail.But the present invention is not limited to following public embodiment, can be presented as various different shapes, and the following examples are just for intactly openly the present invention, and intactly introduces category of the present invention to the personnel with this area general knowledge and provide.Same numeral in the accompanying drawing is represented identical inscape.
Fig. 2 and Fig. 3 are side view and the stereogram with substrate application device of ultrasonic wave cleaning unit provided by the present invention.
The specific embodiment
With reference to accompanying drawing, substrate application device of the present invention comprises coating portion 200, spray nozzle part 100 and has the pre-ejection portion 300 of ultrasonic wave cleaning unit.
Described a plurality of thimble 220 is inserted in the through hole of described workbench 210, and along with the lifting of described level board 230 is projected into described workbench 210 tops or falls back on described workbench 210 inside.Described a plurality of thimble 220 plays from workbench 210 jack-up substrates or substrate is put into the effect of workbench 210.
In addition, in the pedestal 400 upper surface left and right sides, the outside has the pair of guide rails 240 that extends longitudinally about promptly described workbench 210.Transfer unit 250 is installed respectively on the described pair of guide rails 240 is along the longitudinal movement transfer unit 250.
The spray nozzle part 100 that described a pair of transfer unit 250 supports between being positioned at wherein makes it across described workbench 210, and described spray nozzle part 100 is sprayed onto coating agents such as photoresist on the substrate 500 such as glass and applies.The gap nozzle 110 of described spray nozzle part 100 is bar (Bar) shape along left and right sides horizontal expansion, and common left and right sides width greater than substrate.Form the fine ejiction opening 120 of ejection photoresist in the bottom of described gap nozzle 110, this ejiction opening 120 is along described horizontal expansion.Spray a certain amount of photoresist by described linear ejiction opening 120 to substrate 500.
And described transfer unit 250 is along the longitudinal movement with certain speed under the state that supports described spray nozzle part 100 both sides, thus on workbench 210 moving nozzle portion 100.In addition, described transfer unit 250 can be regulated spray nozzle part 100 height in vertical direction, therefore can consider the amount of coated photoresist and viscosity and the ejiction opening 120 of described gap nozzle 110 and the spacing between the substrate 500 are carried out fine control.
In addition, to the device of described spray nozzle part 100 supply photoresists comprise the photoresist supply department 130 that is located at described transfer unit 250 1 sides, the first photoresist supply pipe 140 that is communicated with described photoresist supply department 130 and gap nozzle 110, from the second photoresist supply pipe 150 of outside source (not shown) to described photoresist supply department 130 supply photoresists.
Supply photoresists by the second photoresist supply pipe 150 to photoresist supply department 130 by outside source.Photoresist supply department 130 utilizes the pump that is located at inside to apply predetermined pressure to photoresist, makes photoresist ejiction opening 120 by gap nozzle 110 after the first photoresist supply pipe 140 is fed to gap nozzle 110 spray with predetermined pressure.
Described coating portion 200 1 sides are provided with pre-ejection portion 300.That is, described pre-ejection portion 300 is along the moving direction setting of spray nozzle part 100, and is located at described spray nozzle part 100 bottoms.
The sectional view of the pre-ejection portion of the ultrasonic wave cleaning unit that has first embodiment of the invention and provide is provided Fig. 4, and Fig. 5 is the sectional view of the variation of expression pre-ejection portion shown in Figure 4.
With reference to accompanying drawing, described pre-ejection portion 300 comprises shell 310, be positioned at the precoated roller 320 of described shell 310 inside, be used to flood described precoated roller 320 bottoms a part rinse bath 330 and be located at the ultrasonic wave generation unit of described rinse bath 330 inboards.Can also be provided with feeding unit (not shown) that is used to supply cleaning fluid and the deliverying unit (not shown) that is used to discharge contaminated cleaning fluid in the described rinse bath 330.
Opening is formed at described shell 310 tops, thereby exposes the upper face of the precoated roller 320 that is positioned at shell 310 inside.Described shell 310 walls are provided with solvent drippage device 340 and scraper 350 and CDA drier 360.
Described solvent drippage device 340 is formed on the top wall of shell 310, with the solvent that drips when precoated roller 320 is rotated.Described solvent drippage device 340 plays the effect that dilution is ejected into the photoresist on the precoated roller 320.And described scraper 350 front ends are in order to contact and to be obliquely installed with described precoated roller 320, and are used for removing residual photoresist or the solvent that is left after precoated roller 320 is removed photoresists through described rinse bath 330.And CDA drier 360 is located at the inside upper part wall of shell 310, to be used for carrying out drying to removing residual photoresist or solvent precoated roller 320 afterwards.
Promptly, after photoresist is sprayed on precoated roller 320 tops, drip solvent and dilute photoresist to the precoated roller 320 that rotates according to counter clockwise direction in the accompanying drawings by solvent drippage device 340, after this precoated roller 320 is through rinse bath 330, removes residual solvent by the friction of scraper 350 front ends that contact with precoated roller 320 then.Then, the precoated roller 320 of removing residual solvents by scraper 350 rotates to the position that is provided with of the CDA drier 360 that is formed on shell 310 tops, and carries out drying by the 360 pairs of precoated roller that is rotated 320 surfaces of described CDA drier.
At this moment, though solvent drippage device 340 and CDA drier 360 are formed on the top wall of shell 310, also can be formed on shell 310 sidewalls.And,, also can be docile and obedient the clockwise rotation though precoated roller 320 is not limited thereto in the accompanying drawings according to rotation counterclockwise.Just, solvent drippage device 340, scraper 350 and CDA drier 360 are preferably arranged successively, make precoated roller 320 successively through solvent drippage device 340, scraper 350 and CDA drier 360.
Described shell 310 inside bottom surface are provided with rinse bath 330, fill cleaning fluid in the rinse bath 330, to be used to flood the part of precoated roller 320 bottoms.Described rinse bath 330 utilizes the photoresist of cleaning fluid cleaning attached to the dilution on the precoated roller 320.
Described rinse bath 330 bottoms are provided with the ultrasonic wave generation unit, and the ultrasonic wave generation unit comprises oscillator 370 that is located at described rinse bath 330 inboards and the high-frequency generator 380 that signal is provided to described oscillator 370.
Described oscillator 370 is bonded in the inside bottom surface of rinse bath 330 by bonding agent etc., and its size enough greatly, to provide ultrasonic wave fully in rinse bath 330.At this moment, described oscillator 370 can be made of pottery (ceramics) tie-plate material.
At this moment, the curved shape in described oscillator 370 tops with the surface curve of corresponding precoated roller 320, therefore can utilize uniform ultrasonic wave to clean described precoated roller 320 surfaces.
Described oscillator 370 is connected in the high-frequency generator 380 that ultrasonic signal is provided, and described high-frequency generator 380 is connected high frequency voltage and carried out exciting to oscillator 370, and oscillator 370 vibrates with the frequency of ultrasonic wave range thus.
And, as shown in Figure 5, can be in rinse bath 330 bottom surfaces bonding two described oscillator 370a, 370b, and be provided with respectively to each oscillator 370a, 370b and ultrasonic signal be provided and produce high-frequency generator 380a, the 380b of ultrasonic signal.That is, each high-frequency generator 380a, 380b transmit ultrasonic signal to each oscillator 370a, 370b respectively, and excite described oscillator 370a, 370b to produce ultrasonic wave.At this moment, described high-frequency generator 380a, 380b can carry out phase controlling respectively and be switched to oscillator 370a, 370b, also a phase controlling power supply 390 can be set in addition and control two high-frequency generator 380a, 380b simultaneously.
At this moment, need control two oscillator 370a, 370b to have identical phase place.That is, when the ultrasonic signal of the last connection of two oscillator 370a, 370b outs of phase,, therefore be difficult to produce uniform ultrasonic wave owing to can interfere in the gap between two oscillator 370a, the 370b.So, preferably comprise and can control the phase controlling power supply 390 that two high-frequency generator 380a, 380b have same phase.
Though oscillator described in the previous embodiment 370 attached to the inside bottom surface of rinse bath 330, also can be located at other positions such as inner side surface of rinse bath 330.And described oscillator 370 quantity are not limited to 1 or 2, also can be provided with a plurality of.
The sectional view of the pre-ejection portion of the ultrasonic wave cleaning unit that has second embodiment of the invention and provide is provided Fig. 6, and Fig. 7 is the sectional view of the variation of expression pre-ejection portion shown in Figure 6.
With reference to Fig. 6 and Fig. 7, in advance ejection portion 300 comprise shell 310, be positioned at described shell 310 precoated roller 320, be formed on the ultrasonic wave generation unit of described shell 310 inside bottom surface.At this moment, do not have special rinse bath in the described shell 310, but bear the rinse bath effect by shell 310.
That is, solvent drippage device 340, scraper 350 and CDA drier 360 are set in the shell 310 that cleaning fluid is housed, precoated roller 320 cleans by rotation in shell 310.The direction of rotation of described precoated roller 320 is not defined, and is preferably in and sets gradually solvent drippage device 340, scraper 350 and CDA drier 360 on the direction of rotation of precoated roller 320.
The ultrasonic wave generation unit provides the high-frequency generator 380 of signal to constitute by oscillator 370 with to described oscillator 370, and both can be as shown in Figure 6, constitute by an oscillator 370 and the high-frequency generator 380 that is connected in described oscillator 370, also can be as shown in Figure 7, comprise a plurality of oscillators (370a, 370b), corresponding high-frequency generator (380a, 380b) and phase controlling power supply 390 with it.At this moment, because the structure and the effect of ultrasonic wave generation unit are identical with first embodiment of the invention, therefore omit its explanation.
Below, the working condition and the cleaning method of slit coating device are described.
Fig. 8 and Figure 13 are the sectional view of expression substrate application device working condition provided by the present invention, Fig. 9 is the flow chart with pre-ejection portion cleaning method of ultrasonic wave cleaning unit provided by the present invention, and Figure 10 to Figure 12 has the sectional view of the pre-ejection portion working condition of ultrasonic wave cleaning unit provided by the present invention for expression.
At first, with reference to Fig. 2, the thimble 220 that is formed on the workbench 210 moves and gives prominence to workbench 210 tops for supporting substrate 500, and substrate 500 relies on the thimble 220 that is projected into workbench 210 tops to be placed in described workbench 210.The described substrate 500 that is placed is aimed at by the aligner (aligner) that does not illustrate on workbench 210, and by the vacuum suction hole by vacuum suction to workbench 210, mounting substrate 500 thus.
Then, as shown in Figure 8, move to pre-ejection portion 300 tops in order to spray gap nozzle 110 in advance.In slit coating technology, when the photoresist that constitutes by solid constituent and the volatile organic solvent that is used to dissolve this solid constituent when the ejiction opening of gap nozzle 110 contacts with air, because organic solvent evaporation causes the photoresist of initial stage ejection even inadequately, therefore sprays in advance in order to remove this uneven photoresist.
Then, the precoated roller 320 of gap nozzle 110 in pre-ejection portion 300 sprays photoresists and begins to spray, and precoated roller 320 beginnings of injected photoresist are simultaneously being cleaned in pre-ejection portion 300.
With reference to Fig. 9, the step of utilizing hyperacoustic cleaning method to comprise to rotate precoated roller (S10), the step (S30) that ultrasonic wave cleans of precoated roller being carried out to the step (S20) of the precoated roller drippage solvent of injected photoresist, in rinse bath, the step (S40) of removing residual solvent, the step (S50) of drying that the precoated roller after removing solvent carried out.
With reference to Figure 10, the precoated roller 320 of injected photoresist begins according to rotation counterclockwise.That is, photoresist is ejected into precoated roller 320 upper faces from gap nozzle 110, and precoated roller 320 promptly is rotated the step (S10) of precoated roller for cleaning photoetching glue in order to carry out each step process.
If precoated roller 320 begins rotation, then as shown in figure 10, on the precoated roller 320 of injected photoresist, drip solvent (S20) by the solvent drippage device 340 that is located at shell 310 inside upper part.At this moment, described solvent dilutes photoresist and increases cleaning performance.
Then, the precoated roller 320 that adheres to diluted photoresist is further rotated, and as shown in figure 11, diluted photoresist immerses in the rinse bath 330.At this moment, the ultrasonic wave generation unit produces ultrasonic wave in rinse bath 330, be that high-frequency generator 380 provides signal to oscillator 370, and produce ultrasonic wave that cleaning is immersed in the photoresists in the rinse bath 330 and carries out ultrasonic wave cleaning step (S30) thus according to the vibration of oscillator 370.
The photoresist that cleans in rinse bath 330 cleans by ultrasonic wave and is cleaned major part, has only few photoresist or residual solvent remaining.Therefore, as shown in figure 12, the scraper 350 that is located at shell 310 interior sidewall surface is finally to remove the step (S40) of residue on the precoated roller 320 with precoated roller 320 state of contact.
After scraper 350 removing residues, utilize the CDA drier 360 that is located at shell 310 inside upper part walls to carry out the step (S50) that precoated roller 320 is dried up, finish washing and cleaning operation thus.
In addition, the gap nozzle 110 of finishing pre-ejection as mentioned above stops to spray photoresist and moves to substrate 500 front ends as shown in figure 13, Yi Bian at the uniform velocity move the uniform photoresist of injection on whole base plate 500 on one side then.
Then, when finishing the coating operation of substrate, unload the substrate 500 of finishing coating, thereby finish coating of substrates technology from coating portion 200.
Though the oscillator of the generation unit of ultrasonic wave described in the embodiment of the invention is arranged on the inside bottom surface of rinse bath or shell, described oscillator also can be located at the side of rinse bath or shell.And, when using inflammable organic solvent,, therefore oscillator can be located on the outside diapire or sidewall of rinse bath or shell, to avoid directly contacting cleaning fluid owing to there is the danger of being lighted because of the spark that produces in the running as cleaning fluid.
More than, describe the present invention with reference to drawings and Examples, but those skilled in the art should be able to understand in the scope that does not break away from the technology of the present invention thought that claim puts down in writing and can carry out various modifications and distortion to the present invention.
In sum, the present invention proposes structure and the method for utilizing ultrasonic wave that the precoated roller of pre-ejection coating liquid is cleaned.Therefore, have coating liquid cleansing power that improves precoated roller and the effect of simplifying the cleaning device structure.
Claims (5)
1. cleaning unit is used for the photoresist on the precoated roller of cleaning base plate applying device, it is characterized in that comprising:
Shell, the length of this shell is greater than the length of described precoated roller, this shell upper forms opening to expose the upper face of the described precoated roller that is positioned at described enclosure, and described enclosure is equipped with cleaning fluid to be used to flood the part of described precoated roller bottom;
Be located at described precoated roller by the solvent drippage device of position before the described cleaning fluid dipping;
Be located at described precoated roller by the scraper and the CDA drier of position after the described cleaning fluid dipping;
Launch hyperacoustic ultrasonic wave generation unit to described enclosure,
Described ultrasonic wave generation unit comprises oscillator and provides the ultrasonic oscillator of signal to described oscillator, and described oscillator has the curve of corresponding described precoated roller towards the one side of described precoated roller.
2. cleaning unit according to claim 1, it is a plurality of to it is characterized in that described oscillator is set to, and the high frequency voltage that is provided to described each oscillator respectively is controlled to be has same phase.
3. cleaning unit according to claim 1 and 2 is characterized in that described enclosure is provided with rinse bath, and described cleaning fluid is contained in the described rinse bath.
4. a substrate application device is used for substrate is applied, it is characterized in that comprising the coating portion of placing substrate, in advance ejection portion, to the spray nozzle part of described substrate spraying and applying liquid, and described pre-ejection portion has cleaning unit as claimed in claim 1.
5. cleaning method is used for the precoated roller of cleaning base plate applying device, it is characterized in that comprising step:
Rotate the described precoated roller of injected photoresist;
Dilute described photoresist;
Utilize ultrasonic wave to clean described photoresist;
Remove the residue on the described precoated roller;
Described precoated roller is carried out drying,
Wherein, utilize the ultrasonic wave generation unit to carry out the described step of utilizing ultrasonic wave to clean described photoresist, described ultrasonic wave generation unit comprises oscillator and provides the ultrasonic oscillator of signal to described oscillator, and described oscillator has the curve of corresponding described precoated roller towards the one side of described precoated roller.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2006-0052146 | 2006-06-09 | ||
| KR1020060052146 | 2006-06-09 | ||
| KR1020060052146A KR101206776B1 (en) | 2006-06-09 | 2006-06-09 | Priming roller cleaning unit and method, and substrate coating apparatus with the cleaner |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101085446A CN101085446A (en) | 2007-12-12 |
| CN101085446B true CN101085446B (en) | 2010-11-10 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101074089A Expired - Fee Related CN101085446B (en) | 2006-06-09 | 2007-05-10 | Precoated roller cleaning unit and cleaning method, substrate application device |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101206776B1 (en) |
| CN (1) | CN101085446B (en) |
| TW (1) | TWI384526B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI494456B (en) * | 2012-06-15 | 2015-08-01 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102039245B (en) * | 2009-10-13 | 2015-01-14 | 住友橡胶工业株式会社 | Roller coating device |
| CN102806210A (en) * | 2011-06-02 | 2012-12-05 | 昆山阿基里斯人造皮有限公司 | Roller cleaning vehicle |
| CN102641819A (en) * | 2012-05-14 | 2012-08-22 | 江苏博腾新材料股份有限公司 | Roller coating delivery device of HPL (High Power Laser) plate roller coating machine |
| JP5701822B2 (en) * | 2012-06-20 | 2015-04-15 | 東レエンジニアリング株式会社 | Cleaning apparatus and cleaning method |
| CN103341471A (en) * | 2013-07-08 | 2013-10-09 | 常熟市威腾进出口有限公司 | Industrial adhesive tape removing method |
| KR102250362B1 (en) * | 2014-07-08 | 2021-05-12 | 세메스 주식회사 | Predischarging unit, Apparatus and Method for treating substrate with the unit |
| CN104391435B (en) * | 2014-12-12 | 2019-02-22 | 通富微电子股份有限公司 | A kind of photoresist glue edge clean device and method |
| CN107463068A (en) * | 2017-09-22 | 2017-12-12 | 武汉华星光电技术有限公司 | Photoresistance nozzle maintenance device and light blockage coating device |
| CN115443192A (en) * | 2020-04-24 | 2022-12-06 | 东丽株式会社 | Coating device and coating method |
| CN112893330A (en) * | 2021-04-19 | 2021-06-04 | 惠州市浩发机械设备有限公司 | Roller surface cleaning device |
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| KR100337259B1 (en) * | 2000-11-24 | 2002-05-17 | Systems Technology Inc | Method and apparatus for removing photoresist from glass substrate of liquid crystal display |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW200746247A (en) | 2007-12-16 |
| CN101085446A (en) | 2007-12-12 |
| KR101206776B1 (en) | 2012-11-30 |
| TWI384526B (en) | 2013-02-01 |
| KR20070117919A (en) | 2007-12-13 |
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