CN107463068A - Photoresistance nozzle maintenance device and light blockage coating device - Google Patents
Photoresistance nozzle maintenance device and light blockage coating device Download PDFInfo
- Publication number
- CN107463068A CN107463068A CN201710864756.4A CN201710864756A CN107463068A CN 107463068 A CN107463068 A CN 107463068A CN 201710864756 A CN201710864756 A CN 201710864756A CN 107463068 A CN107463068 A CN 107463068A
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- CN
- China
- Prior art keywords
- roller
- scraper
- photoresistance
- maintenance device
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spray Control Apparatus (AREA)
Abstract
The embodiment of the invention discloses a kind of photoresistance nozzle maintenance device, including：Roller, it can rotate, and the roller is used to safeguard nozzle；Scraper, it touch the outer surface of the roller and set；Wherein, the scraper is contacted with the outer surface of the roller for face, and the scraper is purged to the photoresistance of cylinder surface when the roller rotates.The embodiment of the invention also discloses a kind of light blockage coating device.Using the present invention, there is the advantages of improving photoresistance spraying uniformity early stage and poor uniformity.
Description
Technical field
The present invention relates to light blockage coating field, more particularly to a kind of photoresistance nozzle maintenance device and light blockage coating device.
Background technology
The gold-tinted processing procedure of LCD device array substrates is exactly by the pattern transfer of light shield to substrate, in this process
In need to be coated with photoresistance, in order that light blockage coating is preferable to uniformity on substrate and uniformity, prior art is to spraying photoresistance
Nozzle certain time that often works will be maintained (maintenance), and specific safeguard includes three steps：Refer to figure
1 and Fig. 2, in the first step, nozzle 130 spray photoresistance to roller 110, while scraper 120 strikes off the light of the outer surface of roller 110
Resistance, so that nozzle 130 forms flat end face, safeguards that rear nozzle 130 provides uniformity and uniformity during follow-up work
Preferable photoresistance；In the second step, nozzle 130 is cleaned using cleaning fluid to remove light unnecessary on lost nozzle 130
Resistance, drying and processing is carried out to nozzle 130 thereafter；In third step, nozzle 130 is put into the environment of moistening to keep nozzle
130 moistenings.After maintenance, nozzle 130 carries out spraying photoresistance work.
However, in above-mentioned maintenance process, because roller 110 (roller) and scraper 120 (blade) they are linear contact lays, tool
Body is to contact and (refer to Fig. 2) in section upper blade 120 and the roller 110 of the vertical central shaft of roller 110, causes scraper
Photoresistance strikes off unclean on 120 pairs of rollers 110, if remaining photoresistance on roller 110, in the rotation process of roller 110, influences
The end face of nozzle 130 is uneven, ultimately results in the photoresistance one that early stage sprays during nozzle 130 sprays photoresistance to substrate
Cause property and uniformity are poor, and some regions are likely present the situation of no photoresistance, particularly when photoresistance (is now PLN type light
Resistance) viscosity it is larger when, such as the photoresistance being applied on the flatness layer of array base palte, situation is more serious, on substrate early stage spray
Photoresistance uniformity and uniformity it is poor, namely there are so-called start mura.
The content of the invention
Technical problem to be solved of the embodiment of the present invention is, there is provided a kind of photoresistance nozzle maintenance device and light blockage coating
Device.The problem of photoresistance spraying uniformity early stage and poor uniformity can be improved.
In order to solve the above-mentioned technical problem, first aspect present invention embodiment provides a kind of photoresistance nozzle maintenance device,
Including：
Roller, it can rotate, and the roller is used to safeguard nozzle；
Scraper, it touch the outer surface of the roller and set；Wherein, the outer surface of the scraper and the roller connects for face
Touch, the scraper is purged to the photoresistance of cylinder surface when the roller rotates.
In the embodiment of first aspect present invention one, on the section of vertical drum central axis, the scraper touch described
The contour line of outer surface of cylinder is circular arc, and the contour line matches with the corresponding outer surface of cylinder.
In the embodiment of first aspect present invention one, the arc length of the contour line is 70mm~290mm.
In the embodiment of first aspect present invention one, the line at the contour line both ends and the angle model of the scraper bottom surface
Enclose for 30 °~60 °.
In the embodiment of first aspect present invention one, the roller and a scraper on the section of vertical drum central axis
Center angular region corresponding to the arc length of contact is 5 ° -10 °.
In the embodiment of first aspect present invention one, the part of the scraper and cylinder contact is flexibility.
In the embodiment of first aspect present invention one, the number at least two of the scraper, when the number of the scraper
For two when two scrapers be located at the opposite sides of the roller.
In the embodiment of first aspect present invention one, the one end of the scraper away from roller is provided with adjustment seat, the scraper
In the adjustment seat, side connection elastic device of the adjustment seat away from scraper, the elastic device forces described
Scraper is close to the roller.
In the embodiment of first aspect present invention one, in addition to light blockage collection container, it is located at the lower section of roller and scraper,
It is used to collect the photoresistance that scraper scrapes off from roller.
Second aspect of the present invention embodiment provides a kind of light blockage coating device, including nozzle and above-mentioned photoresistance nozzle dimension
Protection unit.
Implement the embodiment of the present invention, have the advantages that：
Because photoresistance nozzle maintenance device includes scraper, the outer surface that the scraper touch the roller is set；Wherein, institute
The outer surface that scraper is stated with the roller is contacted for face, and the scraper is carried out clear to the photoresistance of cylinder surface when the roller rotates
Remove.So as to, roller scraper during rotating one week can carry out continuous several times cleaning to the photoresistance of same point on roller,
The photoresistance except outer surface of cylinder is greatly scraped, so as to which nozzle is after maintenance, the end face of nozzle is relatively flat, and nozzle is follow-up
The problem of being not in the photoresistance uniformity and poor uniformity of spraying early stage during coating photoresistance, improve start
The problem of mura.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, can be with
Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is the schematic diagram (illustrating nozzle to come) of prior art photoresistance nozzle maintenance device；
Fig. 2 is the sectional view (central shaft of the vertical roller in section) of Fig. 1 photoresistance nozzle maintenance device；
Fig. 3 is sectional view (central shaft of the vertical roller in section, and general of one embodiment of the invention photoresistance nozzle maintenance device
Nozzle, which illustrates, to be come)；
Fig. 4 is the enlarged drawing of scraper in Fig. 3；
Shown by reference numeral：
110th, 210- rollers；120th, 220- scrapers；130th, 230- nozzles；The contour line that 221- scrapers are close to roller；
240- adjustment seats；241- elastic devices；250- light blockage collection containers；α-the line at contour line both ends and the angle of bottom surface；β-scrape
Knife bottom surface and the angle of horizontal plane；δ-roller central angle corresponding with the arc length of scraper into contact.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
The term " comprising " and " having " occurred in present specification, claims and accompanying drawing and their any changes
Shape, it is intended that cover non-exclusive include.Such as contain the process of series of steps or unit, method, system, product or
The step of equipment is not limited to list or unit, but alternatively also include the step of not listing or unit, or it is optional
Ground is also included for the intrinsic other steps of these processes, method, product or equipment or unit.In addition, term " first ", " the
Two " and " the 3rd " etc. are for distinguishing different objects, and are not intended to describe specific order.
A kind of photoresistance nozzle maintenance device of offer of the embodiment of the present invention, its nozzle being used for after maintenance work for a period of time,
Described a period of time is, for example, 45 minutes, the purpose that nozzle is safeguarded be make nozzle spray photoresistance uniformity and uniformity compared with
It is good.Fig. 3 and Fig. 4 are referred to, the photoresistance nozzle maintenance device includes roller 210 and scraper 220.
Continuing with referring to Fig. 3 and Fig. 4, in the present embodiment, the roller 210 is in cylinder, and the roller 210 can revolve
Transhipment is dynamic.Particularly, there is central shaft at the center of the roller 210, and the roller 210 is connected to driving dress by central shaft
Put, the drive device driving drum 210 rotates.The roller 210 is used to safeguard nozzle 230.Particularly, nozzle
230 are located at the top of the roller 210, have certain gap between the nozzle 230 and roller 210, the gap is for example
For 100nm (nanometer), 90nm, 110nm etc..When being safeguarded to nozzle 230, during the first step specially safeguarded, the spray
Mouth 230 sprays photoresistance to roller 210, while the roller 210 rotates together with central shaft, the nozzle 230 continue to
Roller 210 sprays photoresistance, so as to be advantageous to nozzle 230 is formed flat end face, is advantageous to nozzle 230 in successive process and provides one
Cause property and the preferable photoresistance of uniformity.
In the present embodiment, the number of the scraper 220 is one, and the scraper 220 touch the appearance of the roller 210
Face is set, and in the present embodiment, the left end of the scraper 220 touch the outer surface setting of the roller 210.So as to work as roller
When having photoresistance on 210, the scraper 220 can scrape off the photoresistance on the outer surface of roller 210.
It is in the present embodiment, described in order to by the photoresistance scraped clean of the outer surface of roller 210, prevent photoresistance residual being present
Scraper 220 contacts with the outer surface of the roller 210 for face, namely the contact position of scraper 220 and roller 210 connecing for face and face
Touch, be not contact of the point with face, nor contact of the line with face, the scraper 220 is to the rolling when the roller 210 rotates
The photoresistance of 210 outer surfaces of cylinder is purged.In the present embodiment, because the roller 210 is cylinder, so as to roller 210
Outer surface is the curved surface of arc, so as to which face contact is contact of the curved surface with curved surface.In the present embodiment, due to the scraper
220 contact with the outer surface of the roller 210 for face, linear contact lay compared with the prior art, and roller 210 is during rotating one week
The scraper 220 can carry out continuous several times cleaning to the photoresistance of same point on roller 210, and roller 210 exists compared with the prior art
It can only clear up once, greatly be scraped except the photoresistance of the outer surface of roller 210 in one rotation period, so as to which roller 210 is not allowed still
Easily there is photoresistance residual, for nozzle 230 after maintenance, its end face is relatively flat, and nozzle 230 is during subsequently coating photoresistance
The problem of being not in the photoresistance uniformity and poor uniformity of spraying early stage, improve asking for prior art start mura
Topic.
In the present embodiment, the scraper 220 is touched outside the roller 210 on the section of the vertical central shaft of roller 210
The contour line 221 on surface is circular arc, here, the section of the vertical central shaft of roller 210 refer to the bottom surface of cylinder roller 210 or
The parallel section of person's top surface, the contour line 221 match with the corresponding outer surface of roller 210, so as to which the scraper 220 can ratio
The outer surface of roller 210 preferably is touched, and the photoresistance effect for striking off the outer surface of roller 210 is relatively good.In the present embodiment, hang down
Directly the section of the central shaft of roller 210 has many individual and parallel each other, and scraper 220 touch the outer surface of the roller 210
Shape of the contour line 221 on each section is identical.In the present embodiment, the song that the scraper 220 contacts with the roller 210
Face is projected as square, for example, rectangle horizontal plane.
In the present embodiment, the arc length of the contour line 221 is 70mm~290mm, for example, 70mm, 80mm,
90mm, 100mm, 120mm, 140mm, 160mm, 180mm, 200mm, 210mm, 230mm, 250mm, 270mm, 290mm equidimension,
Namely the arc length of the circular arc is 70mm-290mm.In the present embodiment, when the arc length of the contour line 221 is less than 70mm
When, now scraper 220 is not ideal to the photoresistance cleaning effect on roller 210；When the arc length of the contour line 221 is more than
During 290mm, now the scraper 220 contacts long with the outer surface of roller 210, although can be by the outer surface of roller 210
Photoresistance remove cleaner, but the scraper 220 manufactures more complicated, and cost is higher.In the present embodiment, the profile
The arc length preferred range of line 221 is 140mm~200mm.
In the present embodiment, the roller 210 contacts with a scraper 220 on the interface of the vertical central shaft of roller 210
Arc length corresponding to central angle δ scopes be 5 ° -10 °, for example, 5 °, 6 °, 7 °, 8 °, 9 °, 10 ° etc..The arc of the now rolling
The long corresponding circular arc, it is, in general, that because both are to be close to and match, both equal lengths, shape is identical.
In the present embodiment, the angle α scope of the line at the both ends of contour line 221 and the bottom surface of scraper 220 is 30 °
~60 °, for example, 30 °, 35 °, 40 °, 45 °, 50 °, 55 °, 60 ° angularly.In the present embodiment, the bottom surface and horizontal plane
Angle β scopes be 30 °~60 °, for example, 30 °, 35 °, 40 °, 45 °, 50 °, 55 °, 60 ° angularly.
In the present embodiment, the part that the scraper 220 contacts with roller 210 is flexibility, in the present embodiment, described to scrape
It is flexible that knife 220 is overall.So as to which the scraper 220 and roller 210 are flexible contact, so as to which scraper 220 is striking off roller
Roller 210 will not be damaged during photoresistance on 210.In the present embodiment, the scraper 220 is made up of speciality elastomeric material.
Further, in the present embodiment, the described one end of scraper 220 away from roller 210 is provided with adjustment seat 240, described
Scraper 220 is arranged in the adjustment seat, side connection elastic device 241 of the adjustment seat 240 away from the scraper 220,
The elastic device 241 is, for example, spring or shell fragment etc., and the elastic device 241 can be forced described by adjustment seat 240
Scraper 220 is close to the roller 210, namely scraper 220 can apply forces to roller 210, enters one so as to be advantageous to scraper 220
Step cleans the photoresistance on clean roller 210.
After scraper 220 scrapes off the photoresistance on roller 210, in order to be reclaimed to the photoresistance scraped off or sharp again
With in the present embodiment, the photoresistance nozzle maintenance device also includes light blockage collection container 250, and it is located at roller 210 and scraper
220 lower section, the light blockage collection container 250 are used to collect the photoresistance that scraper 220 scrapes off from roller 210, so as to
By the photoresistance centralized collection scraped off into light blockage collection container 250, it is easy to follow-up recovery or recycling.
In other embodiments of the invention, it is described to scrape in order to further lift the effect that scraper strikes off photoresistance on roller
The number at least two of knife, for example, two, three, four, the numbers such as five.When the number of the scraper is two,
The scraper is located at the opposite sides of roller, preferably, the setting substantially symmetrical about its central axis of the relatively described roller of two scrapers.
The embodiment of the present invention also provides a kind of light blockage coating device, and the light blockage coating device includes nozzle and above-mentioned light
Nozzle maintenance device is hindered, the nozzle is located at the top of the photoresistance nozzle maintenance device.
It should be noted that each embodiment in this specification is described by the way of progressive, each embodiment weight
Point explanation is all difference with other embodiments, between each embodiment identical similar part mutually referring to.
For device embodiment, because it is substantially similar to embodiment of the method, so description is fairly simple, related part referring to
The part explanation of embodiment of the method.
By the description of above-described embodiment, the present invention has advantages below：
Because photoresistance nozzle maintenance device includes scraper, the outer surface that the scraper touch the roller is set；Wherein, institute
The outer surface that scraper is stated with the roller is contacted for face, and the scraper is carried out clear to the photoresistance of cylinder surface when the roller rotates
Remove.So as to, roller scraper during rotating one week can carry out continuous several times cleaning to the photoresistance of same point on roller,
The photoresistance except outer surface of cylinder is greatly scraped, so as to which nozzle is after maintenance, the end face of nozzle is relatively flat, and nozzle is follow-up
The problem of being not in the photoresistance uniformity and poor uniformity of spraying early stage during coating photoresistance, improve start
The problem of mura.
Above disclosure is only preferred embodiment of present invention, can not limit the right model of the present invention with this certainly
Enclose, therefore the equivalent variations made according to the claims in the present invention, still belong to the scope that the present invention is covered.
Claims (10)
- A kind of 1. photoresistance nozzle maintenance device, it is characterised in that including：Roller, it can rotate, and the roller is used to safeguard nozzle；Scraper, it touch the outer surface of the roller and set；Wherein, the scraper contacts with the outer surface of the roller for face, The scraper is purged to the photoresistance of cylinder surface when the roller rotates.
- 2. photoresistance nozzle maintenance device as claimed in claim 1, it is characterised in that on the section of vertical drum central axis, The contour line that the scraper touch the outer surface of cylinder is circular arc, the contour line and the corresponding outer surface of cylinder phase Match somebody with somebody.
- 3. photoresistance nozzle maintenance device as claimed in claim 2, it is characterised in that the arc length of the contour line is 70mm ~290mm.
- 4. photoresistance nozzle maintenance device as claimed in claim 2, it is characterised in that the line at the contour line both ends with it is described The angular range of scraper bottom surface is 30 °~60 °.
- 5. photoresistance nozzle maintenance device as claimed in claim 2, it is characterised in that the institute on the section of vertical drum central axis Roller center angular region corresponding with the arc length of a scraper into contact is stated as 5 ° -10 °.
- 6. the photoresistance nozzle maintenance device as described in claim 1-5 any one, it is characterised in that the scraper connects with roller Tactile part is flexibility.
- 7. the photoresistance nozzle maintenance device as described in claim 1-5 any one, it is characterised in that the number of the scraper is extremely It is two less, when the number of the scraper is two, two scrapers are located at the opposite sides of the roller.
- 8. the photoresistance nozzle maintenance device as described in claim 1-5 any one, it is characterised in that the scraper is away from roller One end be provided with adjustment seat, the scraper is arranged in the adjustment seat, side connection elasticity of the adjustment seat away from scraper Device, the elastic device force the scraper to be close to the roller.
- 9. the photoresistance nozzle maintenance device as described in claim 1-5 any one, it is characterised in that also hold including light blockage collection Device, it is located at the lower section of roller and scraper, and it is used to collect the photoresistance that scraper scrapes off from roller.
- A kind of 10. light blockage coating device, it is characterised in that the photoresistance including nozzle and as described in claim 1-9 any one Nozzle maintenance device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710864756.4A CN107463068A (en) | 2017-09-22 | 2017-09-22 | Photoresistance nozzle maintenance device and light blockage coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710864756.4A CN107463068A (en) | 2017-09-22 | 2017-09-22 | Photoresistance nozzle maintenance device and light blockage coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107463068A true CN107463068A (en) | 2017-12-12 |
Family
ID=60553579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710864756.4A Pending CN107463068A (en) | 2017-09-22 | 2017-09-22 | Photoresistance nozzle maintenance device and light blockage coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107463068A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109324484A (en) * | 2018-09-27 | 2019-02-12 | 武汉华星光电技术有限公司 | Developing cell cleaning device and the clean method for using the device |
| CN109350839A (en) * | 2018-11-21 | 2019-02-19 | 新疆维吾尔自治区分析测试研究院 | A kind of liquid adhesive bandage smearing instrument |
| CN110727176A (en) * | 2019-10-15 | 2020-01-24 | 合肥奕斯伟材料技术有限公司 | COF Film photoresist coating process, COF Film production method and coating structure |
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Application publication date: 20171212 |