CN101067725B - Preventing device and method for sensitive-liquid curing in slit-nozzle - Google Patents
Preventing device and method for sensitive-liquid curing in slit-nozzle Download PDFInfo
- Publication number
- CN101067725B CN101067725B CN2007101022065A CN200710102206A CN101067725B CN 101067725 B CN101067725 B CN 101067725B CN 2007101022065 A CN2007101022065 A CN 2007101022065A CN 200710102206 A CN200710102206 A CN 200710102206A CN 101067725 B CN101067725 B CN 101067725B
- Authority
- CN
- China
- Prior art keywords
- liquid
- sclerosis
- slit
- nozzle
- sensitization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 99
- 238000000034 method Methods 0.000 title claims abstract description 21
- 208000034189 Sclerosis Diseases 0.000 claims abstract description 61
- 206010070834 Sensitisation Diseases 0.000 claims description 58
- 230000008313 sensitization Effects 0.000 claims description 58
- 238000000576 coating method Methods 0.000 claims description 28
- 239000011248 coating agent Substances 0.000 claims description 26
- 239000007888 film coating Substances 0.000 abstract 4
- 238000009501 film coating Methods 0.000 abstract 4
- 239000000758 substrate Substances 0.000 description 15
- 238000005516 engineering process Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007591 painting process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
- B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
- B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
- B05B15/557—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids the cleaning fluid being a mixture of gas and liquid
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Manufacturing & Machinery (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Environmental & Geological Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention relates to a preventing sclerosis device and method for sensitive liquid in slit nozzle comprising: a container section for containing the slit of the preventing sclerosis liquid and sensitive film coating nozzle, and making the slit of the sensitive film coating nozzle not to contact with preventing sclerosis liquid; a slit contact component which is used for making the part preventing sclerosis liquid to contact with end of the sensitive film coating nozzle. The method of preventing sclerosis device and method for sensitive liquid in slit nozzle comprises: utilizing the slit contact component to make part preventing sclerosis liquid to generate the surface tension; making the end of the slit of the sensitive film coating nozzle in the standby state to contact with the part preventing sclerosis liquid protruding with the surface tension. The invention reduces the amount of the preventing sclerosis liquid and prolongs the replacement cycle by using setting slit contact component to make a spot of preventing sclerosis liquid to contact with the end of the slit.
Description
Technical field
The sensitization liquid sclerosis that the present invention relates to a kind of sensitization liquid gap nozzle prevents device and method, relates in particular to prevent to cause the sensitization liquid sclerosis of the sensitization liquid gap nozzle of spout latch up phenomenon to prevent device and method because of coating (spinless coating) nozzle is dry without spin under holding state.
Background technology
Usually, the manufacture process of semiconductor device or display device comprises the process that forms film repeatedly and form pattern (pattern) on film.
Mainly use the method for utilizing light-sensitive surface when forming pattern removing a part of film.For the even described light-sensitive surface of coating on film, adopted rotary plate in the past and placed quantitative sensitization liquid and according to the method for centrifugal force coating uniform thickness light-sensitive surface at the central portion of this rotary plate.
But, because it is increasing to be used to make the substrate area of display device, can't re-use aforesaid rotary coating (spin coating) method, therefore use coating (spinless coating) mode without spin at present, promptly under the state that large-area substrates is fixing, utilize nozzle evenly to be coated with light-sensitive surface on this large-area substrates top.
This coating without spin is under the state that large-area substrates is loaded into platform (surface plate), sprays quantitative sensitization liquid by the nozzle that keeps preset distance with this large-area substrates top and at the uniform velocity move and carries out.
So, existing apparatus for coating without spin comprises platform and the nozzle of the quantitative sensitization liquid of ejection and the mobile device that constant speed moves this nozzle.
Unload the substrate of finishing described light-sensitive surface painting process from platform, then new large-area substrates is loaded on the platform.
Described nozzle is in holding state before finishing the loading of large-area substrates, residual sensitization liquid might harden more in the long more described nozzle of its stand-by time, coating process can take place can't to carry out because of nozzle is blocked when sensitization liquid hardens or be ejected problems such as can't being coated with uniform light-sensitive surface because of the sensitization liquid of sclerosis.
Summary of the invention
The present invention proposes in order to solve aforesaid problem, and its purpose is to provide a kind of can prevent under holding state that the sensitization liquid sclerosis of the sensitization liquid gap nozzle of sensitization liquid sclerosis in the nozzle from preventing device and method.
And, the present invention also aims to provide a kind of sensitization liquid sclerosis that under holding state, prevents in the nozzle, the sensitization liquid sclerosis that can significantly reduce the sensitization liquid gap nozzle that is used to prevent the use amounts such as solvent of hardening simultaneously prevents device and method.
To achieve these goals, the anti-locking apparatus of sensitization liquid sclerosis of sensitization liquid gap nozzle provided by the present invention, comprise: the resettlement section is used to accommodate the slit that sclerosis prevents liquid and light-sensitive surface coating nozzle, and makes the slit of light-sensitive surface coating nozzle not prevent that with described sclerosis liquid from contacting; One end is fixed on bottom surface, described resettlement section, the other end has the slit contact component of carrying out the dip plane that line contacts with the side of described light-sensitive surface coating nozzle slot, to be used to making described sclerosis prevent that liquid from relying on surface tension and being positioned at described dip plane,, the described sclerosis of part contacts with the end of described light-sensitive surface coating nozzle so that preventing liquid.
And the sensitization liquid sclerosis of sensitization liquid gap nozzle provided by the present invention prevents that method from comprising: utilize the slit contact component with dip plane to make described sclerosis prevent that liquid from relying on surface tension to be positioned on this dip plane; Make the slot ends of the light-sensitive surface coating nozzle that is in holding state prevent that with sclerosis on being positioned at this dip plane liquid from contacting.
Description of drawings
Fig. 1 prevents the light-sensitive surface apparatus for coating structural representation of locking apparatus for the sensitization liquid sclerosis of using sensitization liquid gap nozzle provided by the present invention;
Fig. 2 is the sectional view of the anti-locking apparatus of sensitization liquid sclerosis of sensitization liquid gap nozzle provided by the present invention.
Main symbol description: 10 is platform, and 11 is large-area substrates, and 20 are handover portion, and 30 is nozzle, and 31 is slit, and 40 are standby portion, and 41 is the resettlement section, and 42 for sclerosis prevents liquid, and 43 is slit contact component.
Embodiment
The sensitization liquid sclerosis that describes sensitization liquid gap nozzle provided by the present invention with reference to the accompanying drawings in detail prevents the embodiment of device and method.
Fig. 1 prevents the light-sensitive surface apparatus for coating structural representation of locking apparatus for the sensitization liquid sclerosis of using sensitization liquid gap nozzle provided by the present invention.
As shown in Figure 1, the light-sensitive surface apparatus for coating comprises: the platform 10 that loads large-area substrates 11; Be located at the handover portion 20 of described platform 10 both sides; Rely on described handover portion 20 to spray the nozzle 30 of sensitization liquid equably on described large-area substrates 11 tops; Standby portion 40, described nozzle 30 will stop in standby portion 40 after light sensitive liquid coating is on described large-area substrates 11.
Fig. 2 is the sectional view of described standby portion 40.
As shown in Figure 2, described standby portion 40 comprises: the resettlement section 41 of accommodating the slit 31 of nozzle 30; The sclerosis that is housed in 41 segment spaces of described resettlement section prevents liquid 42, and this sclerosis prevents that liquid 42 from not contacting with described slit 31; The slit contact component 43 that is combined in 41 bottom surfaces, described resettlement section and contacts with described slit 31.
Below, further describe structure and the effect of the anti-locking apparatus embodiment of sensitization liquid sclerosis of sensitization liquid gap nozzle provided by the present invention.
At first, large-area substrates 11 is being loaded under the state of platform 10, by handover portion 20 moving nozzles 30.
This moment, translational speed kept evenly, and the nozzle 30 in moving is sprayed onto described large-area substrates 11 tops by its slit 31 with quantitative sensitization liquid.
So, by when constant speed moves, spraying quantitative sensitization liquid, thus can be at the light-sensitive surface of large-area substrates 11 tops coating uniform thickness.
Finish after the aforesaid working procedure of coating, nozzle 30 relies on handover portions to come back to original position, and all will rest on described standby portion 40 before carrying out light sensitive liquid coating action next time.
Described standby portion 40 upper surfaces have the dip plane that is used to accommodate nozzle 30 bottoms, have the resettlement section 41 that the sclerosis adorned prevents liquid 42 in its inboard, dip plane.
Described sclerosis prevents that liquid 42 from can prevent that the sensitization liquid in the described nozzle 30 from hardening, and can use the solvent or the sensitization liquid of sensitization liquid.
Sensitization liquid in the described nozzle 30 may contact and hardening with air, and hardens thus.Especially, in the time of outside slit 31 width are directly exposed to less than nozzle 30 inner widths and slit 31, the easier sclerosis of sensitization liquid in the slit 31.
When sensitization liquid takes place in described slit 31 by when sclerosis, slit 31 is blocked and can't apply sensitization liquid, if having only the part of slit 31 blocked, then Tu Bu light-sensitive surface can become inhomogeneous.
In order to prevent that the sensitization liquid in the slit 31 from hardening, described slit contact component 43 contacts with the lateral parts of slit 31 ends.
Described slit contact component 43 has with the lateral parts of slit 31 ends carries out the dip plane that line contacts.
Though the dip plane of described slit contact component 43 is projected into described sclerosis and prevents liquid 42 upsides,, also have sclerosis on this dip plane and prevent liquid 42 because sclerosis prevents the surface tension of liquid 42.
If described slit contact component 43 terminal slit 31 ends that directly contact then might change slit 31 spacings or make slit 31 end fray and reduce reliability of technology.For fear of this problem takes place, described slit contact component 43 does not directly contact slit 31, but contacts with the lateral parts of slit 31.
And, prevent in the liquid 42 to sclerosis if slit 31 directly submerged, then described sclerosis prevents that liquid 42 is easily contaminated and causes the replacement cycle to shorten, and the present invention makes slit 31 terminal contact hardenings prevent liquid 42 by using slit contact component 43, and therefore reducing in 42 sclerosis of the sensitization liquid during preventing slit 31 hardens prevents the pollution of liquid 42 and increase the service life.
And, owing to use a spot of sclerosis that is positioned at slit contact component 43 tops because of surface tension to prevent that liquid 42 from preventing that slit 31 from stopping up, and therefore can reduce sclerosis and preventing liquid 42 use amounts.
Foregoing is the explanation of according to specific preferred embodiment the present invention being carried out in conjunction with the accompanying drawings.The invention is not restricted to the foregoing description, without departing from the present invention, the personnel with common knowledge of the technical field of the invention can carry out various changes and modifications.
In sum, the sensitization liquid sclerosis of sensitization liquid gap nozzle provided by the present invention prevents device and method, harden owing to can prevent the interior sensitization liquid of light-sensitive surface coating nozzle that is in holding state, therefore can be coated with uniform light-sensitive surface in the light-sensitive surface coating process afterwards.
And, the sensitization liquid sclerosis of sensitization liquid gap nozzle provided by the present invention prevents device and method, make a small amount of sclerosis prevent that liquid from contacting with slot ends by slit contact component is set, thereby can make sclerosis prevent liquid use amount minimum, and prolong the replacement cycle.
Claims (4)
1. locking apparatus is prevented in the sclerosis of the sensitization liquid of a sensitization liquid gap nozzle, comprises:
The resettlement section is used to accommodate the slit that sclerosis prevents liquid and light-sensitive surface coating nozzle, and makes the slit of light-sensitive surface coating nozzle not prevent that with described sclerosis liquid from contacting;
One end is fixed on bottom surface, described resettlement section, the other end has the slit contact component of carrying out the dip plane that line contacts with the side of described light-sensitive surface coating nozzle slot, to be used to making described sclerosis prevent that liquid from relying on surface tension and being positioned at described dip plane,, the described sclerosis of part contacts with the end of described light-sensitive surface coating nozzle so that preventing liquid.
2. the anti-locking apparatus of sensitization liquid sclerosis of sensitization liquid gap nozzle according to claim 1 is characterized in that the dip plane of described slit contact component does not contact with described slot ends.
3. the sclerosis of the sensitization liquid of a sensitization liquid gap nozzle prevents method, when nozzle is in holding state, the slit contact component that utilization has the dip plane makes described sclerosis prevent that liquid from relying on surface tension to be positioned on this dip plane, and the sclerosis on making slot ends and being positioned at this dip plane prevents that liquid from contacting, thereby prevents the sensitization liquid sclerosis in the slit.
4. the sensitization liquid sclerosis of sensitization liquid gap nozzle according to claim 3 prevents method, it is characterized in that described slot ends does not contact with described slit contact component, and only with because of the outstanding sclerosis of surface tension prevents that liquid from contacting.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2006-0039454 | 2006-05-02 | ||
| KR1020060039454 | 2006-05-02 | ||
| KR1020060039454A KR100691481B1 (en) | 2006-05-02 | 2006-05-02 | Preventing device and method for sensitive-liquid in slit-nozzle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101067725A CN101067725A (en) | 2007-11-07 |
| CN101067725B true CN101067725B (en) | 2010-08-18 |
Family
ID=38102815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101022065A Expired - Fee Related CN101067725B (en) | 2006-05-02 | 2007-04-27 | Preventing device and method for sensitive-liquid curing in slit-nozzle |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR100691481B1 (en) |
| CN (1) | CN101067725B (en) |
| TW (1) | TWI346840B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5226046B2 (en) * | 2010-08-18 | 2013-07-03 | 東京エレクトロン株式会社 | Coating device and nozzle maintenance method |
| KR101895409B1 (en) | 2011-09-06 | 2018-09-06 | 세메스 주식회사 | substrate processing apparatus |
| CN113492080B (en) * | 2020-04-01 | 2022-11-18 | 阳程科技股份有限公司 | Coating machine capable of slowing down solvent backflow into coating head and soaking method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10312944A (en) | 1997-05-13 | 1998-11-24 | Sony Corp | Resist nozzle receiving body |
| JP2001203151A (en) | 2000-01-21 | 2001-07-27 | Sony Corp | Semiconductor manufacturing apparatus |
| JP3631180B2 (en) | 2001-09-04 | 2005-03-23 | キヤノン株式会社 | Photoresist coating method, head cleaning mechanism, and coating apparatus |
| KR20050112884A (en) * | 2004-05-28 | 2005-12-01 | 삼성전자주식회사 | Spin coater for semiconductor photolithography |
-
2006
- 2006-05-02 KR KR1020060039454A patent/KR100691481B1/en active IP Right Grant
-
2007
- 2007-04-27 TW TW096115059A patent/TWI346840B/en not_active IP Right Cessation
- 2007-04-27 CN CN2007101022065A patent/CN101067725B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TWI346840B (en) | 2011-08-11 |
| KR100691481B1 (en) | 2007-03-12 |
| CN101067725A (en) | 2007-11-07 |
| TW200742943A (en) | 2007-11-16 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: Korea city Daoan Patentee after: KC Limited by Share Ltd. Address before: 268-1 cities in South Korea Patentee before: K.C. Tech Co.,Ltd. |
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| CP03 | Change of name, title or address | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20180824 Address after: Korea city Daoan Patentee after: K.C.TECH Co.,Ltd. Address before: Korea city Daoan Patentee before: KC Limited by Share Ltd. |
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| TR01 | Transfer of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100818 |
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| CF01 | Termination of patent right due to non-payment of annual fee |