KR100337259B1 - Method and apparatus for removing photoresist from glass substrate of liquid crystal display - Google Patents
Method and apparatus for removing photoresist from glass substrate of liquid crystal display Download PDFInfo
- Publication number
- KR100337259B1 KR100337259B1 KR1020000070197A KR20000070197A KR100337259B1 KR 100337259 B1 KR100337259 B1 KR 100337259B1 KR 1020000070197 A KR1020000070197 A KR 1020000070197A KR 20000070197 A KR20000070197 A KR 20000070197A KR 100337259 B1 KR100337259 B1 KR 100337259B1
- Authority
- KR
- South Korea
- Prior art keywords
- cleaning solution
- glass substrate
- liquid crystal
- crystal display
- removing photoresist
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/343—Lamination or delamination methods or apparatus for photolitographic photosensitive material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10S156/918—Delaminating processes adapted for specified product, e.g. delaminating medical specimen slide
- Y10S156/919—Delaminating in preparation for post processing recycling step
- Y10S156/922—Specified electronic component delaminating in preparation for recycling
- Y10S156/924—Delaminating display screen, e.g. cathode-ray, LCD screen
Abstract
PURPOSE: A method and an apparatus for removing photoresist from a glass substrate of a liquid crystal display are provided to dip a poor glass substrate in a swelling bath containing a cleaning solution used for removing photoresist from the poor glass substrate. CONSTITUTION: A cassette(13) in which a plurality of poor glass substrates are loaded is dipped in a swelling bath(20) filled with a cleaning solution. The cleaning solution filled in the swelling bath is continuously circulated from an external cleaning solution tank(21) in order to improve cleaning effect of photoresist. The cleaning solution is vibrated according to the ultrasonic vibration device. The cleaning solution is completely discharged from the swelling bath into the cleaning solution tank. The surface of photoresist coated on the poor glass substrates is air-dried.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020000070197A KR100337259B1 (en) | 2000-11-24 | 2000-11-24 | Method and apparatus for removing photoresist from glass substrate of liquid crystal display |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020000070197A KR100337259B1 (en) | 2000-11-24 | 2000-11-24 | Method and apparatus for removing photoresist from glass substrate of liquid crystal display |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100337259B1 true KR100337259B1 (en) | 2002-05-17 |
Family
ID=37479985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020000070197A KR100337259B1 (en) | 2000-11-24 | 2000-11-24 | Method and apparatus for removing photoresist from glass substrate of liquid crystal display |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100337259B1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101085446B (en) * | 2006-06-09 | 2010-11-10 | K.C.科技股份有限公司 | Precoated roller cleaning unit and cleaning method, substrate application device |
KR101010486B1 (en) * | 2003-12-30 | 2011-01-21 | 엘지디스플레이 주식회사 | An alignment strip device and the stripping method |
KR20170059064A (en) * | 2015-11-19 | 2017-05-30 | 삼성디스플레이 주식회사 | Window reworking system and method of reworking window |
-
2000
- 2000-11-24 KR KR1020000070197A patent/KR100337259B1/en not_active IP Right Cessation
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101010486B1 (en) * | 2003-12-30 | 2011-01-21 | 엘지디스플레이 주식회사 | An alignment strip device and the stripping method |
CN101085446B (en) * | 2006-06-09 | 2010-11-10 | K.C.科技股份有限公司 | Precoated roller cleaning unit and cleaning method, substrate application device |
TWI384526B (en) * | 2006-06-09 | 2013-02-01 | K C Tech Co Ltd | Priming roller cleaning unit |
KR20170059064A (en) * | 2015-11-19 | 2017-05-30 | 삼성디스플레이 주식회사 | Window reworking system and method of reworking window |
KR102418606B1 (en) * | 2015-11-19 | 2022-07-08 | 삼성디스플레이 주식회사 | Window reworking system and method of reworking window |
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