5431.13 A8 B8 C8 D8 彳年//月尸日傪(更)正替换頁 六、申請專利範圍 1. 一種薄膜電晶體液晶顯示器（TFT LCD)用玻璃基板 之自動蝕刻裝置，主要包括： —蝕刻槽，其內部設置有一多孔性起泡裝置，於該起 泡裝置上側並設有一擊板裝置，該蝕刻槽內部注有一處理 溶液，用以蝕刻裝載於一蝕刻卡匣內之薄膜電晶體液晶顯 示器用玻璃基板； 一第一快速拋洗槽，其內部用以容置裝載蝕刻完成之 薄膜電晶體液晶顯示器用玻璃基板之蝕刻卡匣，其內部並 設置有一噴射超純水之噴灑裝置，一位於下部、用以噴射 氮氣之多孔性起泡裝置，以及一上部之擊板，用以洗淨該 玻璃基板； 一第二快速拋洗槽，使用與該第一快速拋洗槽相同之 方式反覆洗淨該第一快速拋洗槽洗淨完成之該玻璃基板， 以將該玻璃基板表面徹底洗淨； 一乾燥槽，其內部用以容置裝載洗淨完成之該玻璃基 板之蝕刻卡匣，並設有一噴嘴，用以噴射氮氣，以乾燥該 玻璃基板； 22 本紙張尺度適用中國國家赛準（CNS > A4規格（210x2^7公趙） 請先讀背面之注意事項再填寫本頁各欄 裝 線！ 5431.135431.13 A8 B8 C8 D8 Leap year // Month sundial (revised) Replacement page 6. Application for patent scope 1. An automatic etching device for a glass substrate for a thin film transistor liquid crystal display (TFT LCD), which mainly includes:-an etching tank A porous foaming device is provided in the inside, and a punching device is provided on the upper side of the foaming device. The etching tank is filled with a processing solution for etching the thin-film transistor liquid crystal display loaded in an etching cassette. Glass substrate; a first rapid-washing tank, which is used to house an etching cassette for loading a glass substrate for an etched thin-film transistor liquid crystal display, and a spray device for spraying ultrapure water is arranged in the interior; A porous foaming device for spraying nitrogen, and an upper striking plate for cleaning the glass substrate; a second rapid throwing and washing tank, which is repeatedly washed in the same manner as the first fast throwing and cleaning tank The glass substrate that has been cleaned by the first rapid throwing and washing tank is thoroughly cleaned on the surface of the glass substrate; a drying tank is used for containing the loaded and cleaned Etching cassette for glass substrate, and a nozzle for spraying nitrogen to dry the glass substrate; 22 This paper size is applicable to China National Standards (CNS > A4 size (210x2 ^ 7 male Zhao) Please read the back Matters needing attention fill in the columns of this page again! 5431.13
A8 B8 C8 D8 六、申請專利範圍 將處理藥液與超純水適當地調配為能蝕刻玻璃基板的 該處理溶液，然後將該處理溶液供應到該蝕刻槽的處理溶 液供應槽； 交叉沉澱蝕刻過程中使用過的該處理溶液之再生處理 溶液的一對沉澱槽； 將該處理溶液之原液交叉供應到該供應槽的一對原液 供應裝置；以及 用以將使用在蝕刻工程的該處理溶液再生，而將該處 理溶液過濾的一對過濾器。 2. _種薄膜電晶體液晶顯示器（TFT LCD>用玻璃基板 之自動蝕刻裝置，主要包括： _蝕刻槽，其內部設置有一多孔性起泡裝置，於該起 泡裝置上側並設有一擊板裝置，該蝕刻槽內部注有一處理 溶液，用以蝕刻裝載於一蝕刻卡匣內之薄膜電晶體液晶顯 示器用玻璃基板； 一第一快速拋洗槽，其內部用以容置裝載蝕刻完成之 薄膜電晶體液晶顯示器用玻璃基板之蝕刻卡厘，其內部並 設置有一噴射超純水之噴灑裝置，一位於下部、用以噴射 23 本紙張尺度適用中國國家標準（CNS ) A4規格（210x297公麗） 請先讀背面之注意事項再填寫本頁各搁 裝 n n n n I 言 線！ 5431.13 _____ , Β8 7爷/月>。日接(更)轉換頁 C8 _ _A8 B8 C8 D8 6. Scope of the patent application The treatment chemical liquid and ultrapure water are appropriately formulated into the treatment solution capable of etching the glass substrate, and then the treatment solution is supplied to the treatment solution supply tank of the etching tank; cross-precipitation etching process A pair of precipitation tanks for regenerating the processing solution used in the processing solution; a pair of stock solution supplying devices for cross-supplying the stock solution of the processing solution to the supply tank; and for regenerating the process solution used in the etching process, A pair of filters for filtering the treatment solution. 2. _Thin-film transistor liquid crystal display (TFT LCD>) automatic etching device for glass substrates, mainly including: _ Etching tank, a porous foaming device is set inside, and a hitting device is provided on the upper side of the foaming device A treatment solution is injected into the etching tank to etch the glass substrate for the thin-film transistor liquid crystal display loaded in an etching cassette; a first rapid-washing tank is used to hold the loaded film-etched film. Etching calipers for glass substrates for crystal liquid crystal displays. Inside, there is a spraying device for spraying ultrapure water. One is located at the lower part to spray 23 paper sizes. Applicable to China National Standard (CNS) A4 size (210x297g). Please Read the precautions on the back before filling in this page and put the nnnn I speech line! 5431.13 _____, Β8 7 Lord / Month >. Day (re) conversion page C8 _ _
D8 ------J 六、申請專利範圍 氮氣之多孔性起泡裝置，以及一上部之撃板，用以洗淨該 玻璃基板； 請先讀背面之注意事項再填寫本頁各欄 装 n n u n n §口 線！ 一第二快速拋洗槽，使用與該第一快速拋洗槽相同之 方式反覆洗淨該第一快速抛洗槽洗淨完成之該玻璃基板， 以將該玻璃基板表面徹底洗淨； 一乾燥槽，其內部用以容置裝載洗淨完成之該玻璃基 板之蝕刻卡匣，並設有一噴嘴，用以噴射氮氣，以乾燥該 玻璃基板；以及 一Rib排氣裝置，以切斷該蝕刻槽蓋打開時該處理溶 液氣體洩出。 3.—種薄膜電晶體液晶顯示器（TFT LCD)用玻璃基板 之自動蝕刻裝置，主要包括： 一蝕刻槽，其內部設置有一多孔性起泡裝置，於該起 泡裝置上側並設有一擊板裝置，該蝕刻槽內部注有一處理 溶液，用以蝕刻裝載於一蝕刻卡匣內之薄膜電晶體液晶顯 示器用玻璃基板； 一第一快速拋洗槽，其內部用以容置裝載蝕刻完成之 薄膜電晶體液晶顯示器用玻璃基板之蝕刻卡匣，其內部並 24 本紙張尺度適用中國國家標準（CNS > A4規格（2丨0*297公Μ ) ' 5431.13 A8 B8 C8 D8 六、 申請專利範圍 設置有一噴射超純水之噴灑裝置，一位於下部、用以噴射 氮氣之多孔性起泡裝置，以及一上部之擊板，用以洗淨該 玻璃基板； 一第二快速抛洗槽，使用與該第一快速拋洗槽相同之 方式反覆洗淨該第一快速拋洗槽洗淨完成之該玻璃基板， 以將該玻璃基板表面徹底洗淨； 一乾燥槽，其內部用以容置裝載洗淨完成之該玻璃基 板之蝕刻卡匣，並設有一噴嘴，用以噴射氮氣，以乾燥該 玻璃基板；以及 一斷絕該蝕刻槽內之該處理溶液氣體洩出的氣體帷幕 奘置。 請先讀背面之注意事項再填寫本頁各撊 裝D8 ------ J VI. Patent application scope Porous foaming device of nitrogen, and an upper fascia plate for cleaning the glass substrate; please read the precautions on the back before filling in the columns on this page nnunn § Mouthline! A second rapid throwing and washing tank, repeatedly cleaning the glass substrate cleaned by the first rapid throwing and washing tank in the same manner as the first fast throwing and washing tank to thoroughly clean the surface of the glass substrate; A groove for containing the etched cassette containing the cleaned glass substrate inside, and a nozzle for spraying nitrogen to dry the glass substrate; and a Rib exhaust device to cut off the etching groove The treatment solution gas was vented when the cover was opened. 3. An automatic etching device for a glass substrate for a thin film transistor liquid crystal display (TFT LCD), which mainly includes: An etching tank, which is provided with a porous foaming device, and a hitting device is provided on the upper side of the foaming device. A treatment solution is injected into the etching tank to etch the glass substrate for the thin-film transistor liquid crystal display loaded in an etching cassette; a first rapid-washing tank is used to hold the loaded film-etched film. Etching cassette of glass substrate for crystal liquid crystal display, the inside of which is 24 paper standards applicable to Chinese national standards (CNS > A4 specification (2 丨 0 * 297mm)) 5431.13 A8 B8 C8 D8 A spraying device for spraying ultrapure water, a porous foaming device for spraying nitrogen at the lower portion, and an upper striking plate for cleaning the glass substrate; a second rapid throwing and washing tank, used in connection with the first A rapid-throwing and washing tank repeatedly cleans the glass substrate that has been cleaned by the first rapid-throwing and washing tank in the same manner to thoroughly clean the surface of the glass substrate; a drying tank, The inside thereof is used for containing an etching cassette carrying the cleaned glass substrate, and a nozzle is provided for spraying nitrogen to dry the glass substrate; and a gas that cuts off the treatment solution gas in the etching tank Gas curtain installation. Please read the precautions on the back before filling out each installation on this page
u 1=Q 線— 25 本絨張尺度通_用中國國家標準（CNS ) A4規格（210><297公Μ )u 1 = Q line — 25 velvet scales commonly used _ China National Standard (CNS) A4 specification (210 > < 297 gM)