JP2003188140A - Solution processing method, solution processing apparatus, and electro-optical panel - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To realize highly efficient solution process and particularly realize highly efficient simultaneous solution process of a plurality of substrates by fully utilizing sufficient processing capability of bubbles to the processing surface at the time of solution processing through introduction of bubbles under the condition that the substrate is soaked in the solution. <P>SOLUTION: The solution processing apparatus comprises a cleaning vessel 102 for soaking a substrate 102 in the pure wafer 201, a bubble introducing section 104 for introducing bubbles 200 into the pure water 201 and a cassette 101 for inclining the substrate 102 for the specified angle θ so that the bubbles 200 move along the cleaning surface 102a of the substrate 102. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid processing method, a liquid processing apparatus, and an electro-optical panel, and more particularly to a substrate processing technique suitable for cleaning a substrate with a liquid.

[0002]

2. Description of the Related Art Generally, various flat panel display devices such as a liquid crystal display device, an electroluminescence display device and a plasma display device have been developed. What is common to these flat panel display devices is that they each have at least one substrate arranged in parallel to the display surface. In addition, for example, in a manufacturing process of a flat panel display device, there are various liquid processing steps in which a substrate is immersed in a liquid for processing, such as cleaning, etching and coating of the substrate.

As an example of such a liquid processing step, in a manufacturing process of a flat panel display device, a step of cleaning a liquid crystal display panel formed by bonding a pair of substrates and a step before forming the liquid crystal display panel are performed. There is a step of cleaning a single substrate made of glass or the like. For example, in the case of the latter substrate cleaning process, by mounting a large number of substrates in a cleaning cassette, etc., a large number of substrates are arranged in a vertically standing posture and are spaced apart from each other in the cleaning tank. Introduced into the water. Then, gas such as air or nitrogen gas is introduced into the bubble generator arranged in the cleaning tank.
As a result, a large number of bubbles are generated from the bubble introduction port of the bubble generator. In this state, in the process in which a large number of bubbles rise in water, the bubbles contact or leave the surface to be processed of the substrate, so that the substrate surface is cleaned.

[0004]

However, in the above-mentioned conventional substrate cleaning method, when air bubbles are introduced into water as described above, the air bubbles rise along the surface to be processed of the substrate. At this time, since the bubbles rise substantially parallel to the surface to be treated, the cleaning power is weak and there is a problem that a sufficient cleaning effect cannot be obtained. The above-mentioned problems are not limited to the cleaning method, and generally exist in a liquid processing method in which air bubbles are introduced into a liquid to perform various kinds of processing in a state where the object to be processed is immersed in the liquid.

The present invention has been made to solve the above-mentioned problems, and when the liquid treatment is performed by introducing bubbles in a state where the substrate is immersed in the liquid, the bubbles are treated on the substrate. It is an object of the present invention to improve the efficiency of liquid processing by exhibiting sufficient processing capacity for a surface, and particularly to improve the efficiency when simultaneously performing liquid processing on a plurality of substrates.

[0006]

In order to solve the above problems and achieve the object, the present invention comprises a dipping step of dipping a substrate in a liquid and a bubble introducing step of introducing bubbles into the liquid. A liquid processing method comprising: a liquid processing method, wherein the substrate is tilted so that the bubbles move along a surface to be processed of the substrate. This allows
Since the bubbles sufficiently act on the surface to be treated, a sufficient cleaning effect can be obtained, for example. As a result, the processing efficiency can be improved.

Further, according to a preferred aspect of the present invention, it is preferable that the bubble introducing step further includes a step of introducing the bubbles by a porous member. More preferably, the porous member is a porous rod-shaped member, and it is desirable to include a step of arranging the longitudinal direction of the porous rod-shaped member substantially perpendicular to the substrate. Thereby, the bubbles can be uniformly supplied to the surface to be processed of the substrate. Further, according to a preferable aspect of the present invention, it is desirable that an angle of inclining the substrate is approximately 10 to 15 degrees. Thereby, a more sufficient cleaning effect can be obtained.

Further, the present invention provides a liquid processing apparatus for processing a substrate by the liquid processing method described above, wherein the substrate is tilted by a predetermined angle so that the bubbles move along the surface to be processed of the substrate. Provided is a liquid processing apparatus comprising a substrate holding unit for holding. As a result, the bubbles sufficiently act on the surface to be processed, so that, for example, a high cleaning effect can be obtained. As a result, the processing efficiency can be improved.

Further, according to a preferred aspect of the present invention, it is preferable that the substrate holding portion has a flat surface portion, and the substrate comes into contact with the flat surface portion when the substrate holding portion is tilted by the predetermined angle. . This allows the substrate to be washed in a stable state. Moreover, the substrate can be easily inserted into and removed from the substrate holder.

The present invention also provides an electro-optical panel comprising a substrate processed by the liquid processing method described above. This makes it possible to obtain an electro-optical panel in which foreign matter has been sufficiently removed from the surface to be processed.

[0011]

BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. FIG. 1 is a schematic perspective view schematically showing a main part of the cleaning device 100 according to the first embodiment. For example, a TFD element (Thin Fi)
A part of the manufacturing process of a liquid crystal panel substrate such as an electro-optical panel using an lm diode (thin film diode) includes a liquid treatment process of immersing the panel substrate in a liquid and performing a predetermined treatment. . For example, a liquid treatment process such as a process of peeling the photoresist from the substrate, a process of cleaning the substrate, or a process of rinsing the substrate. And
In these liquid processing steps, so-called bubbling, which introduces bubbles into the liquid, is performed. In this embodiment, a cleaning process for cleaning a liquid crystal substrate will be described as an example.

The cleaning device 100 includes a cleaning tank 1 which is an immersion part.
03 and a bubble introducing portion 104. The bubble introducing portion 104 is a porous rod-shaped member in which a large number of fine bubble introducing ports 104a are formed. The bubble introducing unit 104 is arranged on the inner bottom of the cleaning tank 103. Bubble introduction part 10
An air supply pipe 105 is connected to 4. Bubble introduction part 1
Reference numeral 04 denotes the surface to be cleaned 10 of the substrate 102 when the substrate 102 is housed in the cleaning tank 103 along the vertical direction (z direction).
It is provided substantially perpendicular to the plane including 2a. The gas introduced through the air supply pipe 105 is the bubble introduction port 104.
Fine bubbles form a and are introduced into the water contained in the cleaning tank 103.

The bubble introducing portion 104 is not limited to the one made of a porous member as shown in the figure, but may have various structures such as one having a large number of micropores around the tube. You can

The cleaning apparatus 100 of the present embodiment is for cleaning a plurality of, for example, 10 to 20 large-sized substrates 102 simultaneously made of glass or the like for manufacturing a liquid crystal display panel constituting a liquid crystal display device. belongs to. The substrate 102 is held in the cassette 101, and the cleaning tank 103
As will be described later, they are arranged at a predetermined angle. The cassette 101 holds a large number of substrates 102 at intervals from each other, and the cassette 101 is in a vertical state and at a predetermined angle θ (FIG. 2).
It is configured so that the substrate 102 can be properly accommodated in an inclined state. The holding mechanism for the substrate 102 will be described later.

FIG. 2 is a view showing a state in which a cassette (not shown) accommodating a plurality of substrates 102 is immersed in the water of the cleaning tank 103. The bubble introducing portion 104 is provided substantially perpendicular to the z direction as described above. The substrate 102 is tilted by a predetermined angle θ so that the bubbles 200 move upward along the surface 102a to be cleaned of the substrate 102. The predetermined angle θ is preferably in the range of 10 degrees to 15 degrees. The substrate 102 holding mechanism will be described later.

Bubbles 200 are generated from the bubble introducing portion 104 by supplying a gas such as air or nitrogen to the air supply pipe 105. The bubbles 200 rise in the pure water 201 in the vertical direction (z direction). Next, the bubbles 200 are disposed on the surface to be cleaned 10 of the substrate 102, which is arranged at a predetermined angle θ.
Reach 2a. Then, the air bubbles 200 become the surface to be cleaned 102.
By ascending along a, the surface to be cleaned 102a is effectively cleaned. At this time, the surface to be cleaned 102a is also cleaned by the rising water flow generated as the bubbles 200 rise.

Next, with reference to FIG. 3, the overall structure of the cleaning apparatus 100 will be described. For simplicity, the substrate 102 housed in the cassette 101 will be described in a state where it is not tilted at a predetermined angle, that is, in a vertical state. Cleaning device 10
At 0, the cleaning tank 103 has a drain valve 103a provided in a discharge path for discharging water in the cleaning tank, an overflow tank 103b for receiving and discharging water overflowing from the upper portion of the tank, and a tank. Water level sensor 10 for detecting water level inside
3c are provided. Further, above the cleaning tank 103, the cassette 101 is moved up and down to move the substrate 102 to the cleaning tank 1.
A drive mechanism 123 for introducing the liquid into the container 03 and pulling it out of the cleaning tank 103 is provided. further,
The cleaning apparatus 100 includes a water supply source 125 for supplying pure water 201 into the cleaning tank 103, and a water supply valve 125a capable of controlling whether or not the pure water 201 is supplied from the water supply source 125 to the cleaning tank 103. Is provided. Also, the bubble introduction part 1
To 04, an air supply pipe 105 for supplying gas from an air supply source 126 via an air supply valve 126a and a flow meter 126b is connected.

The cleaning device 100 is provided with a control unit 124 composed of a microprocessor unit (MPU) or the like. The control unit 124 receives output signals from the water level sensor 103c and the flow meter 126b, and depending on the situation, the drain valve 103a, the water supply valve 125a, and the air supply valve 126.
a, the drive mechanism 123 is appropriately controlled. An input operation unit 127 is connected to the control unit 124. The operation parameter of the control unit 124 can be input via the input operation unit 127. The operation parameters of the control unit 124 include, for example, the amount (water level) of pure water supplied to the cleaning tank 103, the flow rate of gas supplied to the bubble introducing unit 104, and the like. As described above, since various operation parameters can be input from the input operation unit 127 to the control unit 124, the cleaning process can be automatically performed in an appropriate operation mode.

Next, a mechanism for holding the substrate 102 in the cassette 101 will be described. FIG. 4 shows the cassette 101.
It is the figure which looked at from the + z direction. The cassette 101 supports a lower end support shaft 350 extending in the x direction so as to support the lower end portion of the substrate 102 in an upright state, and supports side end portions of the substrate 102 on both sides of the substrate 102 in an upright state. And a plurality of lateral support shafts 310 extending in the x direction. These lateral support shaft 310 and lower support shaft 3
Both ends of 50 are connected to the frame 360. In addition, the lateral support shafts 310 have flat portions 31 provided at predetermined intervals.
Has 0a. Further, in the cassette 101, the upper frame and the lower frame (not shown) are connected by a reinforcing frame 365 extending in the vertical direction (z direction).

In the present cassette 101, the upper end of the frame 360 extending in the vertical direction (z direction) at each of the four corners is projected upward. Then, the end portion protruding upward is held by the work transfer robot. Cassette 1 having such a configuration
When 01 is tilted by a predetermined angle θ (FIG. 2), the substrate 102
Due to its own weight, the flat portion 310 of the lateral support shaft 310 is
It is stably held in contact with a. Therefore, even when the cassette 101 is tilted, the substrate 102 does not bite (bite into) the holding portion in the cassette 101. As a result, when the cassette 101 is pulled up from the cleaning tank 103 after the predetermined cleaning process is completed in the cleaning tank 103 shown in FIG. 1, the cleaned substrate 102 can be easily taken out from the cassette 101.

FIGS. 5A, 5B and 5C respectively show
It is an example of an electronic device using an electro-optical panel cleaned by the cleaning method according to the present invention. FIG. 5A is a perspective view showing an example of a mobile phone. Reference numeral 1000 denotes a mobile phone main body, of which 1001 is a liquid crystal display device using the electro-optical panel of the present invention. FIG. 5B is a perspective view showing an example of a wristwatch type electronic device. Reference numeral 1100 denotes a watch body, and 1101 is a liquid crystal display device using the electro-optical panel of the present invention. FIG. 5C is a perspective view showing an example of a portable information processing device such as a word processor and a personal computer. 12 in the figure
Reference numeral 00 denotes an information processing apparatus, 1202 an input unit such as a keyboard, 1204 an information processing apparatus main body, and 1206 a liquid crystal display apparatus using the electro-optical panel of the present invention.

[0022]

As described above, according to the present invention,
When performing a liquid treatment by introducing bubbles in a state in which the substrate is immersed in the liquid, the bubbles exert sufficient processing ability on the surface to be treated, thereby improving the efficiency of the liquid treatment, particularly It is possible to improve the efficiency when performing liquid processing on a plurality of substrates at the same time.

[Brief description of drawings]

FIG. 1 is a diagram showing a schematic configuration of a cleaning device according to an embodiment of the present invention.

FIG. 2 is a diagram showing a schematic configuration of a cassette in the above embodiment.

FIG. 3 is a diagram showing an overall configuration of a cleaning apparatus according to the above embodiment.

FIG. 4 is a diagram showing a schematic configuration of a holding unit for a substrate in the above embodiment.

5A, 5B, and 5C are external views showing examples of electronic devices using the electro-optical panel of the present invention.

[Explanation of symbols]

100 cleaning equipment 101 cassettes 102 substrate 102a surface to be cleaned 103 cleaning tank 104 Bubble introduction part 104a Bubble introduction port 105 Air supply pipe 200 bubbles 201 Pure water 310 Lateral support shaft 310a flat part 350 Lower support shaft 360 frame 365 reinforcement frame 1000 mobile phone body 1100 watch body 1200 Information processing device

Claims (7)

[Claims] 1. A dipping step of dipping a substrate in a liquid,
A liquid processing method comprising a bubble introducing step of introducing bubbles into the liquid, wherein the substrate is tilted so that the bubbles move along a surface to be processed of the substrate. 2. The liquid processing method according to claim 1, wherein the bubble introducing step further includes a step of introducing the bubbles by a porous member. 3. The porous member comprises a porous rod-shaped member, and the method further comprises the step of arranging the longitudinal direction of the porous rod-shaped member substantially perpendicular to the substrate. The liquid treatment method according to. 4. The liquid processing method according to claim 1, wherein an angle at which the substrate is tilted is approximately 10 to 15 degrees. 5. A liquid processing apparatus for processing a substrate by the liquid processing method according to claim 1, wherein the substrate is such that the bubbles move along a surface to be processed of the substrate. A liquid processing apparatus, comprising: a substrate holding portion that holds the substrate at a predetermined angle. 6. The liquid according to claim 5, wherein the substrate holding portion has a flat surface portion, and the substrate comes into contact with the flat surface portion when the substrate holding portion is tilted by the predetermined angle. Processing equipment. 7. An electro-optical panel comprising a substrate processed by the liquid processing method according to claim 1.