CN101017959A - 脊形波导半导体激光二极管 - Google Patents
脊形波导半导体激光二极管 Download PDFInfo
- Publication number
- CN101017959A CN101017959A CNA200610125681XA CN200610125681A CN101017959A CN 101017959 A CN101017959 A CN 101017959A CN A200610125681X A CNA200610125681X A CN A200610125681XA CN 200610125681 A CN200610125681 A CN 200610125681A CN 101017959 A CN101017959 A CN 101017959A
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- layer
- ridge portion
- laser diode
- semiconductor layer
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- 239000004065 semiconductor Substances 0.000 claims abstract description 42
- 238000002347 injection Methods 0.000 claims abstract description 16
- 239000007924 injection Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 13
- 230000004888 barrier function Effects 0.000 claims description 11
- 230000007480 spreading Effects 0.000 claims description 11
- 238000003892 spreading Methods 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 238000009413 insulation Methods 0.000 claims description 2
- 239000002800 charge carrier Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 229910002601 GaN Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
-
- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04H—BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES; SWIMMING OR SPLASH BATHS OR POOLS; MASTS; FENCING; TENTS OR CANOPIES, IN GENERAL
- E04H13/00—Monuments; Tombs; Burial vaults; Columbaria
- E04H13/006—Columbaria, mausoleum with frontal access to vaults
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0421—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
- H01S5/0422—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
- H01S5/0424—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer lateral current injection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04254—Electrodes, e.g. characterised by the structure characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0421—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
- H01S5/0422—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
- H01S5/04257—Electrodes, e.g. characterised by the structure characterised by the configuration having positive and negative electrodes on the same side of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
- H01S5/2009—Confining in the direction perpendicular to the layer structure by using electron barrier layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2214—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on oxides or nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
- H01S5/3216—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities quantum well or superlattice cladding layers
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Geometry (AREA)
- Architecture (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Civil Engineering (AREA)
- Structural Engineering (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060012602A KR101221067B1 (ko) | 2006-02-09 | 2006-02-09 | 리지 도파형 반도체 레이저 다이오드 |
KR12602/06 | 2006-02-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101017959A true CN101017959A (zh) | 2007-08-15 |
CN101017959B CN101017959B (zh) | 2011-09-21 |
Family
ID=37524068
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200610125681XA Expired - Fee Related CN101017959B (zh) | 2006-02-09 | 2006-08-31 | 脊形波导半导体激光二极管 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7483463B2 (zh) |
JP (1) | JP5314251B2 (zh) |
KR (1) | KR101221067B1 (zh) |
CN (1) | CN101017959B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101257080B (zh) * | 2008-03-11 | 2014-10-15 | 北京大学东莞光电研究院 | 氮化物基脊型发光二极管和激光器及制备方法 |
US10355453B2 (en) | 2017-11-08 | 2019-07-16 | International Business Machines Corporation | Electro-optical device with lateral electron blocking layer |
CN110140264A (zh) * | 2016-12-29 | 2019-08-16 | 欧司朗光电半导体有限公司 | 半导体激光二极管 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8169890B2 (en) * | 2005-07-20 | 2012-05-01 | Qualcomm Incorporated | Systems and method for high data rate ultra wideband communication |
JP2009021424A (ja) * | 2007-07-12 | 2009-01-29 | Opnext Japan Inc | 窒化物半導体発光素子及びその製造方法 |
US8073031B2 (en) * | 2008-03-03 | 2011-12-06 | Sharp Kabushiki Kaisha | Laser diode with improved heat dissipation |
KR101064006B1 (ko) * | 2009-03-03 | 2011-09-08 | 엘지이노텍 주식회사 | 발광소자 |
KR101827975B1 (ko) * | 2011-10-10 | 2018-03-29 | 엘지이노텍 주식회사 | 발광소자 |
CN111357158B (zh) * | 2017-11-17 | 2022-08-30 | 三菱电机株式会社 | 半导体装置及半导体装置的制造方法 |
WO2022097258A1 (ja) * | 2020-11-06 | 2022-05-12 | 三菱電機株式会社 | 光半導体装置およびその製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4622673A (en) * | 1984-05-24 | 1986-11-11 | At&T Bell Laboratories | Heteroepitaxial ridge overgrown laser |
JP3772651B2 (ja) * | 1996-03-25 | 2006-05-10 | 日亜化学工業株式会社 | 窒化物半導体レーザ素子 |
JP3431389B2 (ja) * | 1996-03-25 | 2003-07-28 | 日亜化学工業株式会社 | 窒化物半導体レーザ素子 |
JPH09275243A (ja) * | 1996-04-05 | 1997-10-21 | Nichia Chem Ind Ltd | 窒化物半導体の結晶成長方法およびレーザ素子の共振面の形成方法 |
JP3314641B2 (ja) * | 1996-11-29 | 2002-08-12 | 日亜化学工業株式会社 | 窒化物半導体レーザ素子 |
US6160830A (en) | 1998-03-04 | 2000-12-12 | Motorola, Inc. | Semiconductor laser device and method of manufacture |
JP4166885B2 (ja) * | 1998-05-18 | 2008-10-15 | 富士通株式会社 | 光半導体装置およびその製造方法 |
JP3609661B2 (ja) | 1999-08-19 | 2005-01-12 | 株式会社東芝 | 半導体発光素子 |
JP2004048080A (ja) * | 2000-05-17 | 2004-02-12 | Sony Corp | 半導体レーザの製造方法 |
JP3813472B2 (ja) * | 2000-07-10 | 2006-08-23 | 三洋電機株式会社 | 窒化物系半導体発光素子 |
JP2002076505A (ja) * | 2000-08-30 | 2002-03-15 | Sony Corp | 半導体レーザとその製造方法 |
JP2002094189A (ja) * | 2000-09-14 | 2002-03-29 | Sharp Corp | 窒化物半導体レーザ素子およびそれを用いた光学装置 |
JP4315583B2 (ja) * | 2000-09-19 | 2009-08-19 | パイオニア株式会社 | Iii族窒化物系半導体レーザ素子 |
DE60230602D1 (de) * | 2001-03-28 | 2009-02-12 | Nichia Corp | Nitrid-halbleiterelement |
JP4178807B2 (ja) * | 2002-02-19 | 2008-11-12 | ソニー株式会社 | 半導体発光素子およびその製造方法 |
CN1756010A (zh) * | 2004-09-29 | 2006-04-05 | 中国科学院半导体研究所 | 半绝缘衬底长波长半导体激光器及其制作方法 |
-
2006
- 2006-02-09 KR KR1020060012602A patent/KR101221067B1/ko active IP Right Grant
- 2006-08-18 US US11/505,871 patent/US7483463B2/en active Active
- 2006-08-31 CN CN200610125681XA patent/CN101017959B/zh not_active Expired - Fee Related
-
2007
- 2007-02-08 JP JP2007029509A patent/JP5314251B2/ja not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101257080B (zh) * | 2008-03-11 | 2014-10-15 | 北京大学东莞光电研究院 | 氮化物基脊型发光二极管和激光器及制备方法 |
CN110140264A (zh) * | 2016-12-29 | 2019-08-16 | 欧司朗光电半导体有限公司 | 半导体激光二极管 |
US11011887B2 (en) | 2016-12-29 | 2021-05-18 | Osram Oled Gmbh | Semiconductor laser diode |
US11626707B2 (en) | 2016-12-29 | 2023-04-11 | Osram Oled Gmbh | Semiconductor laser diode |
US10355453B2 (en) | 2017-11-08 | 2019-07-16 | International Business Machines Corporation | Electro-optical device with lateral electron blocking layer |
US10700496B2 (en) | 2017-11-08 | 2020-06-30 | International Business Machines Corporation | Electro-optical device with lateral electron blocking layer |
Also Published As
Publication number | Publication date |
---|---|
JP5314251B2 (ja) | 2013-10-16 |
CN101017959B (zh) | 2011-09-21 |
KR101221067B1 (ko) | 2013-01-11 |
US20060280215A1 (en) | 2006-12-14 |
JP2007214570A (ja) | 2007-08-23 |
KR20070080984A (ko) | 2007-08-14 |
US7483463B2 (en) | 2009-01-27 |
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