CN100530525C - Base plate processing device - Google Patents
Base plate processing device Download PDFInfo
- Publication number
- CN100530525C CN100530525C CNB2005101034237A CN200510103423A CN100530525C CN 100530525 C CN100530525 C CN 100530525C CN B2005101034237 A CNB2005101034237 A CN B2005101034237A CN 200510103423 A CN200510103423 A CN 200510103423A CN 100530525 C CN100530525 C CN 100530525C
- Authority
- CN
- China
- Prior art keywords
- substrate
- process chamber
- described substrate
- installing component
- backing roll
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G13/00—Roller-ways
- B65G13/02—Roller-ways having driven rollers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
Abstract
The invention provides a treatment apparatus in which the undersurface of a substrate can be supported surely by a supporting roller when the substrate is treated while being inclined and conveyed. This treatment apparatus is provided with: a plurality of treatment chambers 3-5 which are arranged side by side and each of which has the width narrower than that of the substrate and in each of which the predetermined treatment is performed on the substrate; a plurality of mounting members 11 each of which has the length shorter than the height of the substrate and some of which are arranged in each of treatment chambers parallel to one another at predetermined intervals in the vertical direction; the supporting roller 15 which is arranged to be rotated on each of mounting members and used for supporting the undersurface of the substrate to be sent into the corresponding treatment chamber while being inclined at a predetermined angle; and a driving roller 22 which is arranged to be rotary driven in each of treatment chambers for supporting the bottom end of the substrate, the undersurface of which is supported by the supporting roller, and is rotary driven to convey the substrate to the predetermined direction.
Description
Technical field
The present invention relates in processing unit to its substrate of handling with predetermined angular inclination conveying substrate.
Background technology
On the substrate that the glass that is used for liquid crystal indicator is made, form circuitous pattern.When on substrate, forming circuitous pattern, adopt imprint lithography.For imprint lithography, such as everyone knows, resist is coated on the aforesaid substrate, and carries out the irradiation of light to this resist via the mask that is formed with circuitous pattern.
Then, the part that does not shine light of resist or the part that will shine light are removed, the part of removing resist to substrate is carried out etching, repeatedly removes series of processes such as resist after etching repeatedly, by form circuitous pattern like this on aforesaid substrate.
In this imprint lithography, have at the stripper that utilizes developer solution, etching solution on the aforesaid substrate or be used for after etching, resist being removed and wait the operation that substrate is handled, and the operation of using cleaning fluid to clean, remain in the operation that the cleaning fluid on the substrate removes and necessitate will adhering to after the cleaning.
In the past, when substrate being carried out above-mentioned a series of processing, utilized axis is the conveying roller of horizontal arrangement and aforesaid substrate is transported in each process chamber successively, managed the indoor above-mentioned various processing of carrying out throughout with level.
, the substrate made of the glass that uses in liquid crystal indicator recently has and maximizes and the tendency of slimming.Therefore, if the horizontal feed substrate, then the substrate deflection between the conveying roller that causes because of deadweight will increase, so, the situation that the processing in the chambers can not be carried out equably along the whole plate face of substrate can take place.
And, if substrate maximizes, then supply with the amount of residual treatment fluid on substrate, and make the load on the corresponding above-mentioned conveying axis of the amount that is applied to and residues in the treatment fluid on the substrate become big, the deflection that has increased conveying axis thus owing to having increased.Therefore, substrate and conveying axis produce deflection simultaneously, have the so-called problem that can not carry out uniform treatment.
Therefore, recently in order to reduce the deflection of substrate, making so-calledly becomes practicability to its method of handling in predetermined angular inclination conveying substrate.If substrate tilt to be carried, then not only can eliminate between the conveying roller deflection that the deadweight because of substrate causes, residual treatment fluid and the substrate deflection that causes by its deadweight on substrate in the time of can also preventing as horizontal feed.
When tilt carrying aforesaid substrate, use backing roll come the supporting substrate incline direction below, support its lower end by driven roller.Therefore, by making the driven roller rotation drive on the rotation direction of driven roller, to carry aforesaid substrate.
Above-mentioned backing roll rotatably is set on a plurality of installation shaft with the interval of regulation in the axial direction, wherein, described a plurality of installation shaft along the throughput direction of substrate with predetermined distance and make axis parallel with the plate face of the substrate of inclination, promptly with the angle tilt configuration identical with the angle of inclination of substrate.
Summary of the invention
Yet, as mentioned above,, and drive the structure of carrying with the driven roller of following end in contact if by being arranged on backing roll on the installation shaft supporting substrate that tilts, owing to the maximization of substrate, and make above-mentioned installation shaft elongated inevitably.That is, installation shaft must be longer than the size (height dimension) of the above-below direction of inclination substrate, and recently, along with the maximization of substrate, having to make the length dimension of installation shaft is more than 2 meters.
If the size of installation shaft is elongated, when particularly becoming the length more than 2 meters, owing to this installation shaft is to be obliquely installed and to be to be applied in the weight etc. of substrate via backing roll with predetermined angular, so be easy to make installation shaft to produce deflection.If installation shaft produces deflection, a plurality of backing rolls that are provided with predetermined distance on this installation shaft then can not be with the plate face of uniform intensity contact substrate.
That is, produced backing roll with respect to the contact of the almost discontiguous backing roll of substrate and excess load.Therefore, successfully conveying substrate might make substrate be scratched owing to the backing roll of excess load contact.
The object of the present invention is to provide a kind of processing unit of substrate, in predetermined angular inclination conveying substrate, substrate and a plurality of backing roll even contact are carried.
The present invention is a kind of processing unit of substrate, with predetermined angular inclination conveying substrate, and in course of conveying described substrate is carried out predetermined processing, it is characterized in that, comprising:
A plurality of process chambers form and are set up in parallel with the width dimensions littler than the width dimensions of described substrate, simultaneously described substrate are carried out various predetermined processing;
A plurality of installing components are set at the length dimension shorter than the height dimension of described substrate, manage throughout indoorly to be arranged in parallel with predetermined distance and with the throughput direction of described substrate at above-below direction;
Backing roll can be rotatably set on each installing component, supports the face of downside that tilts to be delivered to the incline direction of the described substrate in the described process chamber with predetermined angular; With
Driven roller, rotatable being arranged at drivingly in each described process chamber supported the lower end of described substrate, and by the rotation driving described substrate carried along prescribed direction.
The present invention is a kind of processing unit of substrate, with predetermined angular inclination conveying substrate, in its course of conveying described substrate is carried out predetermined processing, it is characterized in that, comprising:
A plurality of process chambers form and are set up in parallel with the width dimensions littler than the width dimensions of described substrate, simultaneously described substrate are carried out various predetermined processing;
Backing roll supports the face that is tilted the downside of the incline direction that is delivered to the described substrate in the described process chamber with predetermined angular; With
Driven roller, rotatable being arranged at drivingly in each described process chamber supported the lower end of described substrate, and by the rotation driving described substrate carried along prescribed direction, and wherein, described substrate is being supported the face of the downside of incline direction by described backing roll.
According to the present invention, make the width dimensions of process chamber littler, and the length dimension of the set installing component of backing roll is shorter than the height dimension of substrate, and this installing component can be set along the Width of process chamber than the width of substrate.Therefore, owing to can make the length dimension of installing component compare enough weak points, and make the installing component difficult labour give birth to deflection, can utilize the backing roll that is arranged on this installing component and supporting substrate reliably with the width dimensions and the height dimension of substrate.
Description of drawings
Fig. 1 is the longitudinal section of Width of the processing unit of expression one embodiment of the present invention.
Fig. 2 is the longitudinal section of second processing section of same processing unit.
Fig. 3 is the cross-sectional view of same processing unit.
Fig. 4 is the sectional view of the mounting structure of expression backing roll.
Symbol description: 3 first process chambers; 4 second process chambers; 5 the 3rd process chambers; 11 installing components; 15 backing rolls; 22 driven rollers; 23 drive motors; 25 feed pipes; 26 nozzles.
Embodiment
Fig. 1 is the formation sketch of expression processing unit of the present invention, and this processing unit comprises framework 1.In this framework 1,, for example separated into three process chambers 3～5 of first to the 3rd in the present embodiment by being separated into a plurality of process chambers with a plurality of next doors 2 of predetermined distance setting in the longitudinal direction.That is, in framework 1, be listed in laterally and be formed with first to the 3rd process chamber 3～5.
Fig. 3 is the transverse cross of above-mentioned framework 1, on the sidewall 1a of length direction one end of framework 1, be formed with at above-below direction with predetermined angular, for example move into mouthfuls 6 with the groove shape of the angle tilts of 75 degree, on the sidewall 1b of the length direction other end of framework 1, be formed with the groove shape move into mouthful 6 inclination equal angular be similarly the groove shape take out of mouthfuls 7.Framework 1 inner region is being divided on the next door 2 of three process chambers 3～5, is being formed with above-mentioned and moves into mouth 6 and take out of a mouthful connected entrance 87 inclination equal angular, that be similarly the groove shape.
In first to the 3rd process chamber 3～5, a plurality of (being four the in the present embodiment) installing component 11 that will have certain thickness strip shape, as shown in Figure 2, can moving into mouthfuls 6, take out of mouthfuls 7 and the mode pulled down of connected entrance 8 (connected entrance 8 only is shown Fig. 2) from what tilt with equal angular, and by above-below direction with the predetermined distance level and be arranged at the position of fore-and-aft direction with staggering.
As shown in Figure 3, on the two sides of the inner face of sidewall 1a, the 1b at the length direction two ends of above-mentioned framework 1 and a pair of dividing plate 2, be provided with fixing L shaped carriage 12 on one side.On the both ends of the surface of the length direction of above-mentioned installing component 11, be provided with one side fixing L shaped installing component 13 corresponding with carriage 12.
Therefore, use bolt to fix the another side of above-mentioned carriage 12 and the another side of above-mentioned installing component 13, by like this, manage throughout in the chamber 3～5, make above-mentioned installing component 11 with as described above in above-below direction level and at interval according to the rules along with stagger ground mode and be arranged at the anterior position place near the lower end.
Above the installing component 11, be respectively arranged with axis normal and rotatable four backing rolls 15 at each.What Fig. 4 represented is the installation constitution of above-mentioned backing roll 15.That is, front end one side of the fore-and-aft direction on installing component 11 is formed with elongated installing hole 16 along fore-and-aft direction.
Above-mentioned backing roll 15 is provided with bearing 17, inserts at the interior ring of this bearing 17 and is connected with construction bolt 18.Nut 20 be fastened to via packing ring 19 construction bolt 18 from the outstanding end of above-mentioned installing hole 16.Thereby above-mentioned backing roll 15 is installed on the above-mentioned installing component 11 in the mode that can adjust the fore-and-aft direction installation site.
As depicted in figs. 1 and 2, manage the bottom of chamber 3～5 throughout, dispose a plurality of driven rollers 22 along the Width of process chamber 3～5 and with predetermined distance.Each driven roller 22 can rotate driving by drive motors 23.
From the sidewall 1a that is formed at above-mentioned first process chamber 3 move into mouthfuls 6, be used for the substrate W that the glass of liquid crystal panel is made with the angle tilt ground supplies of 75 degree.Be supplied to the substrate W of first process chamber 3, its lower end is supported by driven roller 22, and the face of the downside of incline direction is supported by backing roll 15.Therefore, if by drive motors 23 driven roller 22 rotation is driven, then aforesaid substrate W is along the direction of rotation of driven roller 22, promptly be transferred towards the direction of second process chamber 4.
Aforesaid substrate W is the square above size of 2m, and for example having height dimension is that 2200mm, width dimensions are the size of 2600mm.The width dimensions of first to the 3rd process chamber 3～5 is set for sufficiently littler than the width dimensions of aforesaid substrate W.For example be set at 1/2nd to 2/3rds degree of the width dimensions of substrate W.The length dimension of above-mentioned installing component 11 is set for shorter than the height dimension of substrate W.For example be set to 1/2nd to 2/3rds degree of substrate W height dimension.Thereby, can make installing component 11 form the length dimension that is difficult to produce deflection because of deadweight, for example can be set to being shorter than the size of 2m greatly.
Even make the length dimension of above-mentioned installing component 11 be set at the length dimension that is difficult to produce deflection because of deadweight, because the width dimensions of chambers 3～5 also is set shortlyer than the width dimensions of substrate W, so the length dimension of installing component 11 too can not be arranged to shorter than the width dimensions of process chamber 3～5.
Thereby, be arranged on the backing roll 15 on the installing component 11, can support the part of the substrate W that is positioned at chambers 3～5 along Width reliably.That is, although installing component 11 is shortened, owing to the corresponding width dimensions of chambers 3～5 that makes with it also shortens, so can support the Width of the substrate W part that is positioned at chambers 3～5 reliably by backing roll 15.
Aforesaid substrate W cleans by not shown Washing brush in above-mentioned first process chamber 3.The substrate W that is scrubbed clean in first process chamber 3 washes processing in process chamber 4.That is, in second process chamber 4, above-below direction with predetermined distance separately and horizontal arrangement the feed pipe 25 that is connected with the supply source of flushing liquor through flow control valve (also not shown) is arranged.
On each feed pipe 25, be provided with a plurality of nozzles 26, from the face jet douche liquid of the incline direction upside of the substrate W of these nozzles 26 in being transported to second process chamber 3 with predetermined distance.
Being provided with the feed pipe 25 that is used for to the nozzle 26 of substrate W jet douche liquid is configured with predetermined distance in short transverse, on the short transverse of this substrate W, can regulate the amount of spraying the flushing liquor that supplies to substrate W from the nozzle 26 of each feed pipe 25 by being arranged on the flow control valve (not shown) on each feed pipe 25.That is, be supplied at the flushing liquor on the plate face of substrate W and flow downwards above the short transverse of substrate W.Therefore,, make substrate W above ratio below the short transverse, be subjected to becoming big, can not make the whole plate face of substrate W wash processing equably from the flushing action of flushing liquor to the flushing liquor that each feed pipe 25 is supplied with amount.
But, because a plurality of feed pipes 25 with respect to the short transverse of substrate W with predetermined distance separate configuration, so by adjusting quantity delivered, and can adjust the amount of flushing liquor of upper and lower of the short transverse of the plate face that is supplied to substrate W to the flushing liquor of each feed pipe 25.
Therefore, if the amount of flushing liquor that is supplied to substrate W top more than the amount of the flushing liquor that is supplied to the bottom, then owing to be supplied to the flushing liquor on top and flow to the bottom, and can make the effect of the suffered flushing liquor in bottom and top much at one.As an example, make the flow velocity of flushing liquor of the substrate W plate face that flows through inclination and the summation of flow, any position in the short transverse of substrate W all equates, as long as set the flushing liquor quantity delivered from each supply pipe 25, just can be bordering on uniform flushing processing to the whole plate face of substrate W.
Be situation in the present embodiment with the flushing liquor treatment substrate, but the treatment fluid beyond the also available flushing liquor, even when substrate W being handled with the treatment fluid of for example etching solution or stripper etc., by adjusting the quantity delivered of above-mentioned treatment fluid, the whole plate face of treatment substrate W equably.
The substrate W that will carry out handling in second process chamber 4 is transported to the 3rd process chamber 5.In the 3rd process chamber 5, dispose not shown air knife at the above-below direction that intersects along throughput direction with respect to substrate W, carry out removing the dried that is attached to the flushing liquor on the substrate W plate face that flushing liquor was handled by air pressure.Then, the substrate W that drying was handled in the 3rd process chamber 5 is being transported the back and is being handed off to next process from taking out of mouthful 7 quilts.
According to the processing unit of this structure, by being arranged at and the backing roll 15 on the installing component 11 of horizontal arrangement supports the downside that is tilted the incline direction of substrate conveying W with predetermined angular along the Width of chambers 3～5.
The width dimensions of chambers 3～5 is littler than the width dimensions of substrate W, is set to 1/2nd to 2/3rds degree, and the length dimension of installing component 11 is littler than the height dimension of substrate W, is set to 1/2nd to 2/3rds degree.
If the length dimension of installing component is shortened as described above, then can prevent the deflection that this installing component 11 produces because of deadweight.Therefore, be arranged on a plurality of backing rolls 15 on this installing component 11, can not produce difference in height in the horizontal direction and be positioned.And, be arranged on the backing roll 15 on each installing component 11, by being formed at the installing hole 16 on the installing component 11, and can adjust the installation site of fore-and-aft direction.
Thereby, because the backing roll 15 that is arranged on each installing component 11 is contacted with the following of incline direction of substrate W with identical intensity, so,, then can successfully guide and carry aforesaid substrate W by above-mentioned backing roll 15 if driven roller 22 is driven.That is, substrate is not produced scratches and carries reliably.
If the length dimension of installing component 11 is too short with respect to the width dimensions of process chamber 3～5, then manage throughout in the chamber 3～5, make the part that on the Width of substrate W, does not have supported roller 15 to be supported become many, this part might produce deflection.
But, in this embodiment, not only make installing component 11 form the size that is difficult to produce deflection because of deadweight, and owing to the width dimensions of process chamber 3～5 also diminishes, so compare with the size of the width of chambers 3～5, the length dimension of installing component 11 needn't be shortened significantly.Thereby,, by being arranged at a plurality of backing rolls 15 on the above-mentioned installing component 11, and can be supported on the Width reliably for the part that is positioned at chambers 3～5 of substrate W.
Promptly, in order not produce deflection because of deadweight, installing component 11 is shortened, width dimensions with respect to process chamber 3～5, if make the length dimension of installing component 11 become too short, then the Width that is positioned at chambers 3～5 part of substrate W become can not supported roller 15 secure support state, thereby make substrate W produce distortion, might be able to not successfully carry.
Yet, owing to not only installing component 11 is shortened, and the width dimensions of process chamber 3～5 is also diminished, and the size that makes installing component 11 can be with respect to the width dimensions of the chambers 3～5 of substrate W and excessively short and small.Therefore, by being arranged at the backing roll 15 on the installing component 11, and the part that is positioned at chambers 3～5 of supporting substrate W reliably.
In substrate W being cleaned second process chamber of handling 4, a plurality of feed pipes 25 that are provided with the nozzle 26 that is used for jet douche liquid are horizontally disposed with.By the not shown flow control valve that goes out and can adjust the amount of the flushing liquor that is supplied to each feed pipe 25.
Therefore, owing to be supplied to the amount that is positioned at the feed pipe 25 that is tilted substrate conveying W short transverse top, the amount that is positioned at the feed pipe 25 that is tilted substrate conveying W short transverse below is many than being supplied to, so can make substrate W almost wash processing with same state on above-below direction.That is, the whole plate face of substrate W can be carried out cleaning uniformly handling.
Owing to make the width dimensions of process chamber 3～5 littler than the width of substrate W, substrate W carries with the state that strides across a plurality of process chambers that adjoin each other in a plurality of process chambers 3～5 shown in the chain-dotted line of Fig. 1.Therefore, for substrate W, for example wash when handling at second process chamber 4 when the leading section of throughput direction, rearward end is scrubbed clean in first process chamber 3.Equally, when leading section was dried processing in the 3rd process chamber 5, rearward end was washed processing in second process chamber 4.
Like this, in conveying substrate W, when in a plurality of process chambers 3～5, this substrate W being carried out a plurality of processing continuously, owing to can in the process chamber that adjoins each other, carry out different processing simultaneously, so can improve the treatment effeciency of substrate W.
The present invention is not limited to above-mentioned execution mode, can carry out various distortion.For example, for example understand three situations that process chamber is set up in parallel that make as processing unit, but do not limit the number of process chamber, nor limit any indoor kind that substrate is handled of managing throughout.
Claims (3)
1. the processing unit of a substrate with predetermined angular inclination conveying substrate, and carries out predetermined processing to described substrate in course of conveying, it is characterized in that, comprising:
A plurality of process chambers form and are set up in parallel with the width dimensions littler than the width dimensions of described substrate, simultaneously described substrate are carried out various predetermined processing;
A plurality of installing components are set at the length dimension shorter than the height dimension of described substrate, manage throughout indoorly to be arranged in parallel with predetermined distance and with the throughput direction of described substrate at above-below direction;
Backing roll can be rotatably set on each installing component, supports the face of downside that tilts to be delivered to the incline direction of the described substrate in the described process chamber with predetermined angular; With
Driven roller, rotatable being arranged at drivingly in each described process chamber supported the lower end of described substrate, and by the rotation driving described substrate carried along prescribed direction.
2. substrate board treatment as claimed in claim 1 is characterized in that:
In a plurality of process chambers at least one is the process chamber of handling to substrate inject process liquid, this in the process chamber that substrate inject process liquid is handled along throughput direction simultaneously at the above-below direction that intersects with throughput direction, dispose feed pipe with predetermined distance, each feed pipe is provided with the nozzle that is used for supplying with to the face of the incline direction upside of described substrate treatment fluid.
3. substrate board treatment as claimed in claim 1 is characterized in that:
On described installing component, described backing roll is set up to position the mode of adjustment on the fore-and-aft direction that can intersect at the throughput direction with described substrate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004268627 | 2004-09-15 | ||
| JP2004268627A JP4568059B2 (en) | 2004-09-15 | 2004-09-15 | Substrate processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1750232A CN1750232A (en) | 2006-03-22 |
| CN100530525C true CN100530525C (en) | 2009-08-19 |
Family
ID=36160924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005101034237A Expired - Fee Related CN100530525C (en) | 2004-09-15 | 2005-09-15 | Base plate processing device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4568059B2 (en) |
| KR (1) | KR101204725B1 (en) |
| CN (1) | CN100530525C (en) |
| TW (1) | TWI364069B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4685618B2 (en) * | 2005-12-13 | 2011-05-18 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
| WO2007129389A1 (en) * | 2006-05-01 | 2007-11-15 | Hitachi Plasma Display Limited | Resist removing line |
| JP4820705B2 (en) * | 2006-07-24 | 2011-11-24 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
| KR100854981B1 (en) * | 2007-10-10 | 2008-08-28 | 홍경표 | Wet processing treatment apparatus for manufacturing printed circuit board |
| JP7148289B2 (en) * | 2018-06-20 | 2022-10-05 | 芝浦メカトロニクス株式会社 | Substrate detection device and substrate processing device |
| CN110970337A (en) * | 2018-09-28 | 2020-04-07 | 芝浦机械电子株式会社 | Substrate conveying device and substrate processing device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2850118B2 (en) | 1996-12-03 | 1999-01-27 | 東京化工機株式会社 | Transport processing equipment |
| JP4280075B2 (en) * | 2003-01-07 | 2009-06-17 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
-
2004
- 2004-09-15 JP JP2004268627A patent/JP4568059B2/en not_active Expired - Fee Related
-
2005
- 2005-09-05 TW TW094130358A patent/TWI364069B/en not_active IP Right Cessation
- 2005-09-15 KR KR1020050086347A patent/KR101204725B1/en not_active IP Right Cessation
- 2005-09-15 CN CNB2005101034237A patent/CN100530525C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1750232A (en) | 2006-03-22 |
| JP4568059B2 (en) | 2010-10-27 |
| JP2006081997A (en) | 2006-03-30 |
| KR20060051344A (en) | 2006-05-19 |
| TW200618084A (en) | 2006-06-01 |
| TWI364069B (en) | 2012-05-11 |
| KR101204725B1 (en) | 2012-11-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100530525C (en) | Base plate processing device | |
| TWI419251B (en) | Substrate processing device (1) | |
| CN100390931C (en) | Substrate processing device and method, and pattern forming method | |
| KR20100055786A (en) | Module for cleaning a substrate and apparatus for processing a substrate having the same | |
| JP2008053694A (en) | Substrate processing apparatus | |
| KR101703212B1 (en) | Washing apparatus for cleaning system of float glass | |
| KR101336996B1 (en) | Ultrasonic washing apparatus for large area panel | |
| TWI453848B (en) | Apparatus for treating substrates | |
| KR20060051701A (en) | Apparatus for treating substrates | |
| KR20060046703A (en) | Treatment solution supply apparatus | |
| KR20080096452A (en) | Apparatus for treating substrates | |
| KR20070119398A (en) | Air knife and substrate drying system using it | |
| JP3535706B2 (en) | Substrate processing equipment | |
| JP3866856B2 (en) | Substrate processing equipment | |
| KR19990023551A (en) | Substrate Processing Equipment | |
| KR100937153B1 (en) | Developing apparatus | |
| KR101650439B1 (en) | Washing apparatus for cleaning system of float glass | |
| TWI345260B (en) | Resist elimination device | |
| TWI788210B (en) | Substrate processing equipment | |
| KR20190000865U (en) | Substrate cleaning apparatus | |
| JPH08293660A (en) | Apparatus and method for etching board | |
| KR100845893B1 (en) | Ramjet air knife, apparatus for transferring substrate and equipment for circuit board process comprising the same | |
| CN218262298U (en) | Etching apparatus | |
| JP4523402B2 (en) | Processing apparatus and processing method | |
| JP2004031444A (en) | Chemical processing unit |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090819 Termination date: 20150915 |
|
| EXPY | Termination of patent right or utility model |