JP7148289B2 - Substrate detection device and substrate processing device - Google Patents

Description

TECHNICAL FIELD Embodiments of the present invention relate to a substrate detection apparatus and a substrate processing apparatus.

2. Description of the Related Art A substrate processing apparatus for processing a substrate such as a glass substrate is used in a manufacturing process of a liquid crystal display device or the like. 2. Description of the Related Art In a substrate processing apparatus, substrates being transported are subjected to various types of processing. The various processes include, for example, a resist coating process, a resist stripping process, an etching process, a cleaning process, and the like. During substrate processing by the substrate processing apparatus, the processing liquid is supplied to the surface of the substrate while the substrate is transported by a plurality of transport rollers.

A substrate processing apparatus is equipped with a substrate detection device for detecting substrates in order to grasp the substrate transfer status (for example, substrate transfer interval) during the substrate transfer process. The board detection device has a swing member, a detection roller, a magnet and a reed switch. The oscillating member is oscillatably supported, and the detection roller is rotatably provided at one end of the oscillating member, and is pushed down when it hits the conveyed substrate. A magnet is fixed to the other end of the oscillating member, and a reed switch is provided to output a signal according to a change in the magnetic field generated by the magnet. When the conveyed substrate hits the detection roller, the detection roller is pushed down by the substrate, and the swing member rotates about the fulcrum. As a result, when the magnet rises, the reed switch outputs a signal according to the change in the magnetic field generated by the magnet.

Since the substrate detection device requires contact between the substrate being transported and the detection roller, it is usually provided between two adjacent transport rollers out of a plurality of transport rollers forming the transport path of the substrate. . At this time, the detection roller, swinging member, magnet, etc. are positioned in a vertical plane parallel to the board transfer direction. The interval between two adjacent conveying rollers is widened so that the substrate detecting device can be installed, and becomes wider as the width of the substrate detecting device in the substrate conveying direction increases. As the distance between two adjacent transport rollers increases, the substrate flexes more, resulting in uneven processing of the substrate (for example, uneven cleaning) and deterioration of substrate quality (product quality).

JP 2003-128244 A

A problem to be solved by the present invention is to provide a substrate detection apparatus and a substrate processing apparatus capable of improving substrate quality.

A substrate detection device according to an embodiment of the present invention comprises a base, a swinging member attached to the base so as to be swingable about a swing fulcrum shaft, and a swing member provided at one end of the swinging member to be transported. a detection roller that is pushed down by hitting the substrate coming in, a detection sensor that outputs a detection signal indicating that the substrate has been detected when the detection roller hits the substrate and is pushed down and moves about the swinging fulcrum shaft; A first stopper that determines an initial position in the range of motion and a second stopper that determines a limit position in the range of motion of the rocking member, wherein the rocking fulcrum axis is aligned with the conveying direction of the substrate. wherein said first stop is adjustable to change said initial position and said second stop is adjustable to change said limit position. be.

A substrate processing apparatus according to an embodiment of the present invention includes a substrate detection apparatus according to the above-described embodiment, a substrate transport section that transports a substrate, and a processing liquid supply section that supplies a processing liquid to the substrate transported by the substrate transport section. and

According to embodiments of the present invention, substrate quality can be improved.

1 is a diagram showing a schematic configuration of a substrate processing apparatus according to a first embodiment; FIG. 1 is a diagram showing a schematic configuration of a substrate detection device according to a first embodiment (a diagram of the substrate detection device viewed from the downstream side to the upstream side in the substrate transport direction); FIG. 1 is a view showing a schematic configuration of a substrate detection device according to a first embodiment (a view of the substrate detection device viewed from the inside to the outside of the substrate processing apparatus in a direction horizontally perpendicular to the substrate transfer direction); FIG. 4 is a plan view showing the positional relationship between the detection roller and the detection sensor with respect to the substrate transfer area according to the first embodiment; FIG. FIG. 4 is a diagram showing a state in which a swing member according to the first embodiment is at a detection position; FIG. 4 is a diagram showing a state in which the rocking member according to the first embodiment is at a restricted position; FIG. 4 is a view showing a comparative example of the substrate detection device according to the first embodiment (a view of the substrate detection device viewed from the outside to the inside of the substrate processing apparatus in a direction horizontally orthogonal to the substrate transfer direction); FIG. 10 is a diagram showing a schematic configuration of a substrate detection device according to a second embodiment (a diagram of the substrate detection device viewed from the downstream side to the upstream side in the substrate transport direction);

<First embodiment>
A first embodiment will be described with reference to FIGS. 1 to 7. FIG.

(basic configuration)
As shown in FIG. 1, the substrate processing apparatus 1 according to the first embodiment includes a processing chamber 10, a substrate transfer section 20, a processing liquid supply section 30, a substrate detection device 40, and a control section 50. ing. As the substrate W to be processed, for example, a rectangular thin substrate such as a glass substrate is used.

The processing chamber 10 is a housing having therein a transport path H1 along which the substrate W is transported, and is formed so that the substrate W can pass through the processing chamber 10 along the transport path H1. The processing chamber 10 functions as a chamber for processing the substrates W moving on the transport path H1. A discharge port (not shown) for discharging the liquid is formed in the bottom surface of the processing chamber 10 .

The substrate transport section 20 has a plurality of long transport rollers 21 and transports the substrate W by these transport rollers 21 . The transport rollers 21 are positioned so that their longitudinal directions are horizontally perpendicular to the transport direction A1 of the substrate W, and are arranged at predetermined intervals so as to form a transport path H1. These transport rollers 21 are rotatably provided in the processing chamber 10 and configured to rotate in synchronization with each other by a drive source (not shown). Each transport roller 21 has a plurality of rollers 21a and a shaft 21b. Each roller 21a is attached to a shaft 21b at predetermined intervals. When the shaft 21b rotates, each roller 21a attached to the shaft 21b rotates. The substrate W placed on each of the transport rollers 21 is transported along the transport path H1 by the rotating transport rollers 21 .

The processing liquid supply unit 30 has a first liquid supply head 31 and a second liquid supply head 32. These liquid supply heads 31 and 32 apply the processing liquid ( for example, a chemical solution or a cleaning solution). The first liquid supply head 31 and the second liquid supply head 32 are provided above and below the transport path H1 so as to sandwich the transport path H1. The first liquid supply head 31 discharges the processing liquid, for example, like a shower from an upper position toward the transport path H1. In addition, the second liquid supply head 32 ejects the processing liquid, for example, in the form of a shower, avoiding the transport roller 21 toward the transport path H1 from the lower position. The treatment liquid is discharged from the first liquid supply head 31 and the second liquid supply head 32 toward the transport path H1, and the treatment liquid is applied to both surfaces (upper surface and lower surface) of the substrate W moving in the transport path H1. is supplied.

The substrate detection device 40 detects the substrate W in order to grasp the transport status of the substrate W (for example, the transport interval of the substrate W) in the substrate transport process of transporting the substrate W, and performs detection indicating that the substrate W has been detected. A signal is output to the control unit 50 . The substrate detection device 40 is provided upstream of the processing chamber 10 in the substrate transport direction A1. The substrate detection device 40 will be described later in detail. In FIG. 1, the substrate detection device 40 is provided upstream in the substrate transfer direction A1 in the processing chamber 10, but is not limited to this. may be provided.

The control unit 50 has a microcomputer that centrally controls each unit, and a storage unit (none of which is shown) that stores substrate processing information and various programs related to substrate processing. The control unit 50 controls each unit such as the substrate transfer unit 20 and the processing liquid supply unit 30 based on substrate processing information and various programs. Also, the control unit 50 receives a detection signal output from the board detection device 40 . For example, when the control unit 50 determines that the transport interval of the substrates W is out of the allowable range based on the received detection signal, it controls the substrate transport unit 20 to stop transporting the substrates W. FIG.

(Substrate detection device)
Next, the board detection device 40 will be described with reference to FIGS. 2 to 4. FIG.

As shown in FIGS. 2 and 3, the substrate detection device 40 includes a base 41, a swing member 42, a detection roller 43, a magnet 44, a detection sensor 45 (for example, a reed switch), and a first stopper. 46 and a second stopper 47 .

The base 41 has a first support member 41a and a second support member 41b. The first support member 41 a is formed, for example, in a rectangular parallelepiped shape, and one end thereof is fixed to a member for attachment or a side wall in the processing chamber 10 . The second support member 41b is formed in a U shape, and its lower end is fixed to the other end (the end opposite to the one end described above) of the first support member 41a. there is As for the shape of the base portion 41, various shapes can be adopted according to the space in the processing chamber 10, the mounting position of the substrate detection device 40, and the like.

The swinging member 42 is, for example, a rod-shaped member made of metal, and is attached to the base 41 above the second support member 41b so as to swing around a swinging fulcrum shaft 42a. The swing fulcrum shaft 42a is positioned so that its extending direction is parallel to the substrate transport direction A1, and is provided to bridge over the upper portion of the U-shaped second support member 41b. The swinging member 42 is rotatable around a swinging fulcrum shaft 42a, and rotates in a first rotating direction B1 and a second rotating direction B2, which is the reverse rotating direction, in a vertical plane orthogonal to the substrate conveying direction A1. oscillate along. Note that parallel includes not only the concept of perfect parallel but also the concept of almost parallel.

A metal weight 42b is provided at a first end (left end in FIG. 2), which is one end of the rocking member 42 described above. The first end is the end positioned closer to the first support member 41 a than the second support member 41 b , that is, closer to the inside of the substrate detection device 40 . The weight 42b is for balancing the weight with the detection roller 43 provided at the second end (right end in FIG. 2) which is the other end of the swinging member 42. It is provided on the outer peripheral surface of the first end of the member 42 . The second end portion is an end portion located on the outer side of the substrate detection device 40 from the second support member 41b.

The detection roller 43 is, for example, a member made of resin, and is rotatably attached to the second end of the swing member 42 about a rotation fulcrum shaft 43a. The rotation fulcrum shaft 43a is positioned so that its extending direction is orthogonal to the substrate transport direction A1, and is provided on the end surface of the swing member 42. As shown in FIG. When the detection roller 43 hits the substrate W being transported, the detection roller 43 is pressed down by the substrate W while rotating about the rotation fulcrum shaft 43a. After that, the detection roller 43 rotates while contacting the lower surface of the substrate W being transported until the substrate W passes over the detection roller 43 . The term "orthogonal" includes not only the concept of "completely orthogonal" but also the concept of "substantially orthogonal".

The magnet 44 generates a magnetic field (magnetic field) and is provided inside the first end of the swing member 42 . The magnet 44 may be provided on the outer surface of the swinging member 42, for example, on the end surface of the swinging member 42, or may be provided on the outer surface of the weight 42b attached to the swinging member 42. The installation position is not limited. However, in order to save space, it is preferable to provide the magnet 44 inside the rocking member 42 .

The detection sensor 45 detects a change in the magnetic field generated by the magnet 44 , and is located at a position that responds to the change in the magnetic field generated by the magnet 44 , for example, the first end of the swing member 42 and the first end of the base 41 . 1 support member 41a. The detection sensor 45 outputs a detection signal indicating that the substrate W has been detected to the control unit 50 in response to a change in the magnetic field generated by the magnet 44 (for example, in response to failure to detect the magnetic field of the magnet 44). do. A first stopper 46 prevents the detection sensor 45 and the weight 42b of the swinging member 42 from coming into contact with each other.

Here, as shown in FIG. 4, in a plan view, the detection roller 43 is provided in a transport region (substrate transport region) R1 of the substrate W, which is a region in which the substrate W is transported, and the detection sensor 45 , are provided outside the transport region R1 of the substrate W. As shown in FIG. Further, the detection roller 43 is provided so as to come into contact with the transport region R1 of the substrate W, that is, the edge portion of the substrate W along the substrate transport direction A1. For example, the width in the direction horizontally orthogonal to the substrate transfer direction A1 at the edge is 20 mm or less.

Returning to FIGS. 2 and 3, the first stopper 46 is a member (bolt, screw, or the like) that abuts on the weight 42b of the swinging member 42, and serves as the second stopper in the first support member 41a of the base 41. (right side of the center of the first support member 41a in FIG. 2), passes through the first support member 41a and is perpendicular to the substrate transport direction A1 ( vertical direction). The first stopper 46 moves vertically in FIG. 2 by rotating. As a result, the amount of protrusion of the upper end portion of the first stopper 46 changes, and the height position of the upper end surface of the first stopper 46 changes.

The second stopper 47 abuts on the detection roller 43 attached to the rocking rocking member 42 (bolt, screw, etc.), and is located on the rocking fulcrum shaft 42a side of the second support member 41b of the base 41. (above the center of the second support member 41b in FIG. 2), and provided on the second support member 41b so as to be movable in a direction (horizontal direction in FIG. 2) perpendicular to the substrate transfer direction A1. It is The second stopper 47 rotates to move in the horizontal direction in FIG. As a result, the amount of protrusion of the right end portion of the second stopper 47 changes, and the position of the right end surface of the second stopper 47 changes.

(Swing range of swing member)
Next, the swinging range of the swinging member 42 will be described with reference to FIGS. 2, 5 and 6. FIG.

In FIG. 2, the swinging member 42 is in contact with the first stopper 46 and stopped at the initial position. At the initial position, the longitudinal direction of the swing member 42 is inclined at an angle (θ1) with respect to the vertical line. At this time, the substrate W is not in contact with the detection roller 43 . Normally, the swinging member 42 is in the initial position due to the weight of the weight 42b when the substrate W is not in contact with the detection roller 43. As shown in FIG.

The first stopper 46 has a function of positioning the rocking member 42 while being inclined at an angle θ1 (for example, 70 degrees). The angle θ1 can be changed by changing the height position of the upper end surface of the first stopper 46 . The detection sensor 45 faces the weight 42b provided at the first end of the swinging member 42 while being separated from the weight 42b provided at the first end of the swinging member 42 while the swinging member 42 is stopped at the initial position. positioned.

In FIG. 5, the swing member 42 is rotating in the first rotation direction B1 and stopped at the detection position. At the detection position, the longitudinal direction of the swing member 42 is inclined at an angle (θ1+θ2) with respect to the vertical line. At this time, the substrate W is in contact with the detection roller 43 . When the detection roller 43 hits the substrate W being transported, it is pressed down by the substrate W being transported while rotating around the rotation fulcrum shaft 43a. At this time, the swing member 42 rotates in the first rotation direction B1 around the swing fulcrum shaft 42a.

When the swinging member 42 rotates in the first rotation direction B1 and moves from the initial position to the detection position, the detection sensor 45 detects that the first end of the swinging member 42 rises. A change in the magnetic field generated by the magnet 44 is detected. Then, the detection sensor 45 outputs a detection signal indicating that the substrate W has been detected in response to a change in the magnetic field, for example, when the magnetic field of the magnet 44 cannot be detected.

In FIG. 6, the rocking member 42 is rotated in the first rotation direction B1 and is in contact with the second stopper 47 at the limit position. At the limit position, the longitudinal direction of the swing member 42 is inclined at an angle (θ1+θ2+θ3) with respect to the vertical line. At this time, the substrate W is not in contact with the detection roller 43 . The swinging member 42 may rotate in the first rotation direction B1 about the swinging fulcrum shaft 42a up to the limit position due to the momentum when the detection roller 43 comes into contact with the substrate W. It is prohibited to abut on the stopper 47 and rotate beyond the limit position.

The distance between the detection roller 43 and the swinging fulcrum shaft 42a of the swinging member 42 is set shorter than the distance between the swinging fulcrum shaft 42a and the weight 42b (magnet 44). As a result, the swing member 42 can be rotated in the second rotation direction B2 from the detection position to the initial position, and from the limit position to the detection position.

As shown in FIGS. 2, 5 and 6, the swing member 42 can swing from an initial position (see FIG. 2) to a limit position (see FIG. 6) via a detection position (see FIG. 5). . Therefore, the swinging range (rotatable angle range) of the swinging member 42 is the range from the initial position to the limit position, that is, within the range where the longitudinal direction of the swinging member 42 forms an angle (θ2+θ3) with respect to the vertical line. is. The first stopper 46 and the second stopper 47 function as stoppers that limit the swing range (rotational range) of the swing member 42, respectively.

(Substrate processing step)
Next, a substrate processing process performed by the substrate processing apparatus 1 described above will be described.

In the substrate processing apparatus 1 shown in FIG. 1, each transport roller 21 of the substrate transport unit 20 rotates, and the substrate W on these transport rollers 21 is transported in the substrate transport direction A1 and moves along the transport path H1. . At the liquid supply position in the transport path H1, the processing liquid is supplied in advance by the first liquid supply head 31 from above the transport path H1, and the processing liquid is supplied by the second liquid supply head 32 from below the transport path H1. pre-supplied by In this liquid supply state, when the substrate W passes the liquid supply position in the transport path H1, the processing liquid is supplied to both surfaces (upper surface and lower surface) of the substrate W, and the substrate W is processed with the processing liquid. At this time, the processing liquid dropped from both surfaces of the substrate W is discharged from the discharge port on the bottom surface of the processing chamber 10 .

When the substrate W passes over the substrate detection device 40 while being transported in the substrate transport direction A1, the detection roller 43 shown in FIG. As a result, the rocking member 42 shown in FIG. 2, which is stopped at the initial position, rotates about the rocking fulcrum shaft 42a to the detection position shown in FIG. The magnet 44 provided at the first end of the swinging member 42 is separated from the detection sensor 45 in the first rotation direction B1, and the weight 42b provided at the first end of the swinging member 42 is , away from the first stop 46 .

The magnet 44 moves from an initial position close to the detection sensor 45 shown in FIG. 2 to a position away from the detection sensor 45 shown in FIG. The detection sensor 45 outputs a detection signal indicating that the substrate W has been detected (ON state) in response to a change in the magnetic field, that is, when the magnetic field of the magnet 44 can no longer be detected. Based on the detection signal output from the detection sensor 45, the control unit 50 determines that the substrate W is present on the substrate detection device 40 (the substrate W is being detected).

When the substrate W has passed over the substrate detection device 40 and is separated from the detection roller 43, the swinging member 42 rotates in the second rotation direction B2 due to the force of gravity, and moves from the detection position to the initial position. return. As a result, when the magnet 44 returns to the initial position from the position away from the detection sensor 45, the detection sensor 45 detects the magnetic field generated by the magnet 44 and stops outputting the detection signal (OFF state). The control unit 50 recognizes that the detection sensor 45 has detected the magnetic field, and determines that the substrate W does not exist on the substrate detection device 40 (the substrate W is not detected).

(Comparison between this embodiment and a comparative example)
Next, a comparison between this embodiment and a comparative example will be described.

In the comparative example shown in FIG. 7, the swinging member 101 is positioned such that its longitudinal direction is along the substrate conveying direction A1, and is provided swingably around a swinging fulcrum shaft 101a. A detection roller 102 is provided at one end of the swinging member 101, a magnet 103 is provided inside the other end, and a weight 101b is provided on the outer circumference of the other end. Furthermore, a detection sensor 104 is provided for detecting the substrate W by a change in the magnetic field generated by the magnet 103 and outputting a detection signal. The detection roller 102, the magnet 103, the detection sensor 104, and the weight 101b are positioned within a vertical plane including the swinging member 101, that is, a vertical plane parallel to the board transfer direction A1. For this reason, the length of the substrate detecting device 100 in the substrate transport direction A1 tends to increase, and it is necessary to widen the interval between the two adjacent transport rollers 21 . As a result, the distance between the two adjacent transport rollers 21 is widened, and the substrate W is flexed more, resulting in uneven processing of the substrate W and deterioration of the substrate quality (product quality).

Therefore, as shown in FIGS. 1 and 2, the swinging member 42 is provided so that its longitudinal direction is orthogonal to the substrate conveying direction A1 (the swinging fulcrum shaft 42a is parallel to the substrate conveying direction A1). ). In this case, the detection roller 43 and the detection sensor 45 are provided in a vertical plane including the swinging member 42, that is, in a vertical plane orthogonal to the board transfer direction A1. As a result, the length of the substrate detection device 40 in the substrate transport direction A1 is shorter than in the comparative example described above, so that the interval between the two adjacent transport rollers 21 can be narrowed. Therefore, the gap between the two adjacent transport rollers 21 can be made narrower than in the above-described comparative example, and bending of the substrate W can be suppressed. As a result, it is possible to suppress the occurrence of processing unevenness on the substrate W, so that the substrate quality can be improved.

Also, as shown in FIG. 2, a second stopper 47 is provided on the base portion 41 . As a result, it is possible to prevent the oscillating member 42 from continuously oscillating and repeatedly contacting and separating from the substrate W while the substrate W is passing through. can be suppressed.

In addition, in the comparative example shown in FIG. 7, when the transport speed of the substrate W is high, the swing member 101 may fall too much in the vertical plane parallel to the substrate transport direction A1. At this time, if the weight 101b provided at one end of the swing member 101 collides with the substrate W being conveyed, the substrate W may be damaged or contaminated, and the quality of the substrate may be degraded.

Therefore, as shown in FIG. 4, in plan view, the detection roller 43 is provided in the transport region R1 of the substrate W, which is the region in which the substrate W is transported, and the detection sensor 45 is located in the transport region of the substrate W. It is provided outside R1. Therefore, when the swinging member 42 is supported without the second support member 41b of the base 41 and the second stopper 47 shown in FIG. Even if the first end of the swinging member 42 rises to the height of the substrate W being transported, the substrate W does not exist directly above the first end. 42b will not collide with the substrate W being conveyed. As a result, it is possible to suppress damage and contamination of the substrate W, so that the quality of the substrate can be improved.

Further, the swinging member 42 is held so as to be inclined by an angle θ1 in advance toward the first rotation direction B1 at the initial position. Therefore, when the substrate W is separated from the detection roller 43, the swinging member 42 rotates in the second rotation direction B2 from the detection position to the initial position by the force of gravity, so that it can immediately return to the initial position with good response. . Moreover, the weight 42 b provided at the first end of the swing member 42 contacts the first stopper 46 . As a result, the swinging member 42 is prevented from swinging like a pendulum (chattering) in the first rotation direction B1 and the second rotation direction B2, and the swinging member 42 can be immediately positioned at the initial position. can be done. A chattering waveform is not generated in the detection signal, and the convergence of the swing motion of the swing member 42 can be shortened to prevent erroneous detection of the passage of the substrate W. Moreover, since the convergence of the swinging motion of the swinging member 42 can be shortened, the presence/absence of the substrates W can be reliably detected even if the transfer interval between the plurality of substrates W that are sequentially transferred is reduced. It is possible to increase the substrate processing efficiency while transporting.

As described above, according to the first embodiment, the swinging member 42 is attached to the base portion 41 so as to swing about the swinging fulcrum shaft 42a, and the swinging fulcrum shaft 42a extends in the board conveying direction A1. is parallel to Thereby, the swinging member 42 is provided so that its longitudinal direction is perpendicular to the board transfer direction A1, and swings in a vertical plane perpendicular to the board transfer direction A1. Therefore, the length of the board detection device 40 in the board transport direction A1 is shorter than in the case where the swinging member 101 is provided with its longitudinal direction parallel to the board transport direction A1 as in the comparative example described above. Therefore, when installing the board|substrate detection apparatus 40 between two adjacent conveyance rollers 21, the space|interval of those conveyance rollers 21 can be narrowed, and the bending of the board|substrate W can be suppressed. As a result, it is possible to suppress the occurrence of processing unevenness on the substrate W, so that the substrate quality can be improved.

<Second embodiment>
A second embodiment will be described with reference to FIG. In addition, in the second embodiment, the difference (the second stopper) from the first embodiment will be explained, and other explanations will be omitted.

As shown in FIG. 8, a second stopper 47 according to the second embodiment is provided on the second support member 41b of the base 41, that is, the second end of the swing member 42, as in the first embodiment. It is provided above the first end of the swing member 42 rather than below the portion (see FIG. 2).

The second stopper 47 is positioned so as to come into contact with the first end of the rocking member 42 rotating in the first rotation direction B1, that is, the weight 42b provided at the first end. It is supported by a member (not shown) for. By providing the second stopper 47, as in the first embodiment, the swinging member 42 is prevented from continuously swinging during passage of the substrate W and repeatedly contacting and separating from the substrate W. Therefore, it is possible to suppress the occurrence of erroneous detection by the detection sensor 45 .

As described above, according to the second embodiment, it is possible to obtain the same effects as those of the first embodiment.

The substrate processing apparatus according to the first or second embodiment described above includes a cleaning processing apparatus for cleaning a substrate, a resist processing apparatus for forming a photoresist film on the surface of a substrate, an exposure processing apparatus, and a developing apparatus. There are processing equipment, etching processing equipment, stripping processing equipment, drying processing equipment, and the like. Such a substrate processing apparatus can be used for manufacturing liquid crystal substrates, semiconductor substrates, photomasks, and the like.

<Other embodiments>
In the above description, as the detection sensor 45, a magnetic sensor that measures the magnitude and direction of the magnetic field (magnetic field) generated by the magnet 44 is exemplified, but the sensor is not limited to this, and a proximity sensor and a displacement sensor can be used. , an ultrasonic sensor, an optical sensor, and a mechanical switch.

Although several embodiments of the invention have been described above, these embodiments are presented by way of example and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, replacements, and modifications can be made without departing from the scope of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are included in the scope of the invention described in the claims and equivalents thereof.

Reference Signs List 1 substrate processing apparatus 20 substrate transfer section 30 processing liquid supply section 40 substrate detection device 41 base 42 swing member 42a swing fulcrum shaft 43 detection roller 43a rotation fulcrum shaft 45 detection sensor 46 first stopper 47 second stopper A1 substrate Transfer direction R1 Substrate transfer area W Substrate

Claims (6)

a base;
a rocking member attached to the base so as to be rockable about a rocking fulcrum shaft;
a detection roller provided at one end of the swinging member and pressed down by contact with the substrate being conveyed;
a detection sensor that outputs a detection signal indicating that the substrate has been detected when the detection roller hits and is pushed down on the substrate and moves about the swing fulcrum shaft;
a first stopper that determines an initial position in the swinging range of the swinging member;
a second stopper that determines a limit position in the swinging range of the swinging member;
with
the rocking fulcrum axis is parallel to the transport direction of the substrate ,
the first stop is adjustable to change the initial position;
The substrate detection device , wherein the second stop is adjustable to change the limit position . 2. The substrate detecting device according to claim 1, wherein said first stopper is adjusted so as to be inclined when said swinging member is in said initial position. In plan view,
The detection roller is provided in a substrate transport area, which is an area in which the substrate is transported,
3. The substrate detection device according to claim 1, wherein the detection sensor is provided outside the substrate transfer area. The substrate has a rectangular shape in plan view,
4. The substrate detection device according to claim 1, wherein the detection roller is provided so as to come into contact with an edge of the substrate along the conveying direction. 5. The substrate detection device according to claim 1 , wherein the detection roller is rotatable around a rotation fulcrum axis orthogonal to the swing fulcrum axis. A substrate detection device according to any one of claims 1 to 5;
a substrate transport unit that transports the substrate;
a processing liquid supply unit that supplies a processing liquid to the substrate transported by the substrate transport unit;
A substrate processing apparatus comprising:

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