JP2001068537A - Substrate-mounting base - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a substrate-mounting base which enable secure detection of a substrate that it is not being held at a regular position. SOLUTION: This substrate-mounting base 50 has three substrate holding blocks 51, 52, and 53 which are arranged circumferentially at intervals along a substrate W. The substrate-holding blocks 51, 52, and 53, each have a horizontal substrate support part S which supports the peripheral edge part on the reverse surface of the substrate W, a rise part U which rises vertically from the substrate support part S and restricts the end surface of the substrate W, and a substrate fall part T having a tapered surface Ta, rising obliquely from the rise part U outward in a radius direction of the substrate W. Light projection parts 81 and 91 and photodetection parts 91 and 92 of beam sensors 80 and 90 are provided in the substrate holding blocks 51, 52, and 53 and their optical axes L1 and L2 extend along a horizontal plane crossing the tapered surface Ta nearby its upper end and cross each other in an inner area of the substrate.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a semiconductor wafer,
The present invention relates to a substrate mounting table for mounting various substrates such as a glass substrate for a liquid crystal display device, a glass substrate for a plasma display, a substrate for a photomask, and a substrate for an optical disk or a magneto-optical disk.

[0002]

2. Description of the Related Art CMP (Chemical Mechanical Polish) for chemically and mechanically polishing the surface of a substrate such as a semiconductor wafer.
ing) After processing, slurry (abrasive)
Therefore, cleaning of the substrate is indispensable. CMP
The processing apparatus and the substrate cleaning apparatus are generally independent apparatuses. Conventionally, one or a plurality of substrates after the CMP processing are housed in a cassette, for example, and the substrates are put into the substrate cleaning apparatus in units of the cassette. I have to.

However, if the slurry is dried, it becomes difficult to wash and remove the slurry. Therefore, the substrate after the CMP process must be more quickly put into the substrate cleaning process. Therefore, recently, without using a cassette, CMP
It has been proposed to connect a processing apparatus and a substrate cleaning apparatus in a single-wafer manner. That is, a transfer robot is disposed between the substrate discharge port of the CMP processing apparatus and the substrate input port of the substrate cleaning apparatus, and a substrate mounting table for transferring a substrate is disposed at the substrate input port of the substrate cleaning apparatus. With this configuration, the substrate after the CMP processing is transferred by the transfer robot.
It is immediately mounted on the substrate mounting table. The substrate mounted on the substrate mounting table is carried into the substrate cleaning unit by another transfer robot in the substrate cleaning apparatus.
Above the substrate mounting table, a pure water shower nozzle is arranged as necessary to prevent drying of the substrate surface.

The substrate holding section of the transfer robot on the side of the CMP processing apparatus does not restrain the substrate at least in the horizontal direction, for example, releases vacuum suction at the transfer end position. The substrate mounting table includes a substrate supporting portion that supports a peripheral edge of a lower surface of the substrate, and a substrate dropping portion having a tapered surface that drops the substrate at a predetermined position in a horizontal plane of the substrate supporting portion. Thus, even if the transfer position of the transfer robot on the CMP processing apparatus side is slightly shifted, the substrate slides along the taper when the substrate is lowered, so that the substrate is dropped into the substrate support at a predetermined position in the horizontal plane. so,
It can be held horizontally at a predetermined height.

[0005]

However, the transfer robot on the side of the CMP processing apparatus may fail or change over time,
If a large shift occurs in the substrate holding position when the substrate is taken out from the P processing apparatus or a large shift occurs in the transfer position, the peripheral portion of the substrate is caught outside the tapered surface, and the substrate is supported. Can not be dropped into the department. In this case, the transfer robot on the substrate cleaning unit side cannot receive the substrate, and the substrate may be damaged or the hand of the transfer robot may be damaged.

This problem may be solved by providing a movable centering mechanism for centering the substrate in a proper position in connection with the substrate mounting table.
This inevitably complicates the configuration and increases the cost. In addition, if such a centering mechanism is employed, the discovery of the abnormality of the transfer robot on the CMP processing apparatus side is delayed, so that the symptom of the defective portion may be advanced, and repair for recovery may become large. is there. Further, since the wear of the substrate contact portion of the centering mechanism is inevitable, running costs including maintenance costs and replacement parts costs may increase. Further, if the substrate contact portion is continuously used in a worn state, the edge of the substrate may be caught on the substrate contact portion, which may cause a conveyance failure.

SUMMARY OF THE INVENTION An object of the present invention is to provide a structure capable of reliably detecting when a substrate is not held at a proper position, thereby providing a substrate mounting table which solves the above technical problems. It is to provide.

[0008]

According to a first aspect of the present invention, there is provided a substrate supporting member for supporting a substrate in a substantially horizontal posture by contacting the lower surface of the substrate. And a substrate dropping member provided above the substrate support member and having a tapered surface for dropping the substrate toward the substrate support member, such that the optical axes intersect each other in a substantially horizontal plane crossing the tapered surface. A substrate mounting table, which is arranged and includes a plurality of beam sensors.

The beam sensor generates a light beam from the light projecting portion to the light receiving portion, and determines whether or not there is a light blocking member between the light projecting portion and the light receiving portion according to the amount of light received by the light receiving portion. Is a sensor that detects The phrase “optical axes intersect with each other” includes not only a case where the optical axes intersect literally, but also a case where the distance between the closest positions of the two optical axes is extremely short (for example, about the thickness of the substrate). .

According to this configuration, the plurality of beam sensors are arranged so that the optical axes cross each other in a substantially horizontal plane above the substrate supporting member. Accordingly, when the substrate is not dropped to the position of the substrate support member by the tapered surface, the substrate shields the optical axis of one of the beam sensors. This makes it possible to detect that the substrate is not held at the proper position (the position where the substrate is dropped down to the substrate support member). If the substrate is dropped into the substrate support member, such a substrate is held in a substantially horizontal position below the optical axis of the beam sensor, so that the optical axis of any beam sensor may be blocked. Absent.

Therefore, as an example, when the optical axis of any one of the beam sensors is shielded at the end of the substrate leaving operation of the transfer robot (substrate transfer mechanism on the substrate loading side) of the CMP processing apparatus, for example, Stop the operation of the substrate transfer mechanism (substrate transfer mechanism on the substrate unloading side) of the substrate cleaning device that accesses the substrate mounting table and transfer the substrate, and if necessary, confirm that an abnormality has occurred on the substrate mounting table. The notification may be made. Thereby, it is possible to prevent a substrate transfer failure or a damage of the transfer robot hand beforehand.
Further, an abnormality of the transfer robot on the side of the CMP processing apparatus can be quickly found.

In the following, it is assumed that the substrate placement failure is determined at the end of the substrate leaving operation of the transfer robot (that is, the substrate transfer mechanism for loading the substrate) on the CMP processing apparatus side. In addition, by employing a beam sensor, it is possible to detect abnormalities in the substrate position without contacting the substrate,
There is no abrasion of parts and the running cost is not high. Of course, a complicated configuration such as a centering mechanism is not required.

According to a second aspect of the present invention, the plurality of beam sensors are provided such that their optical axes intersect in a region corresponding to an inner side of the substrate supported by the substrate supporting member in plan view. 2. The substrate mounting table according to claim 1, wherein: In this configuration, since the optical axis of the beam sensor intersects in a region corresponding to the inside of the substrate supported by the substrate support member, even if the substrate is inclined in any direction, the detection of the substrate can be reliably performed. Can be done.

In this case, for example, the optical axis of at least one pair of beam sensors is 90 degrees or less which has the center of gravity of the substrate supported by the substrate supporting member (the center of a circular substrate if it is inside). It is preferable that they intersect at an angle of. The invention according to claim 3 is characterized in that the plurality of beam sensors are provided such that the optical axis is arranged in a substantially horizontal plane that crosses the vicinity of the upper end of the tapered surface. 2 is a substrate mounting table.

According to this configuration, since the optical axis is arranged near the upper end of the tapered surface, the substrate that cannot be dropped into the substrate supporting member by the guide of the substrate end surface by the tapered surface can be reliably detected. In the invention according to claim 4, the tapered surface of the substrate dropping member is divided into a plurality of portions with respect to the periphery of the substrate to be supported,
The substrate mounting table according to any one of claims 1 to 3, wherein at least one of the light projecting part and the light receiving part of the beam sensor is provided in each divided part.

In this configuration, the substrate is not guided by the tapered surface over the entire circumference, but is guided to the substrate supporting member by the plurality of divided tapered surfaces. In this case, if the peripheral edge of the substrate is caught, it should be caught at any of the divided portions of the tapered surface.
By arranging the light projecting portion or the light receiving portion of the beam sensor at each divided portion of the tapered surface, it is possible to reliably detect a substrate that has not been dropped into the substrate supporting member.

The light projecting portion of the beam sensor is constituted by a light emitting portion and a case having an opening through which light emitted from the light emitting portion toward the light receiving portion passes. Preferably, a gas (eg, clean air or an inert gas) is supplied from the means so as to generate an airflow that blows out from the inside of the case through the opening. Similarly, the light receiving portion of the beam sensor is constituted by a light detecting portion, and a case having an opening for passing incident light from the light projecting portion to the light detecting portion, and gas supply is provided in the case. Preferably, gas is supplied from the means to generate an airflow that blows out from inside the case through the opening.

Thus, since no liquid droplets adhere to the light emitting section or the light detecting section, a substrate mounting table used in a humid atmosphere (for example, a substrate mounting table on which a substrate after CMP processing is mounted). The present invention can also be applied to
In the case where the substrate mounting table of the present invention is used for mounting a substrate after the CMP process, the case is preferably made of a resin material containing no metal. Thereby, metal contamination can be prevented. In this case, even if the constituent materials of the light emitting unit or the light detecting unit contained in the case contain metals, they are not affected by the external atmosphere, and the metals in the constituent materials elute. There is no danger. Therefore, a commercially available general-purpose light emitting unit or light detecting unit can be used for the light emitting unit or the light detecting unit.

When the substrate mounting table of the present invention is used in a chemical solution atmosphere, the case is preferably made of a chemical resistant material. In this case, since the light emitting section and the light detecting section are housed in a chemical resistant case and an outward airflow is blown out from the opening, there is no intrusion of the chemical solution from the opening. Therefore, there is no problem even if a commercially available general-purpose light-emitting unit (light-emitting element or the like) and light detection unit (light-receiving element or the like) that are not provided with a chemical solution does not cause any problem. There is no risk that these constituent materials elute.

[0020]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is an illustrative view showing a simplified planar layout of a substrate processing apparatus to which a substrate mounting table according to an embodiment of the present invention is applied. This substrate processing apparatus applies C to a substrate such as a semiconductor wafer.
A CMP processing apparatus 11 for performing an MP process and a substrate cleaning apparatus 12 for cleaning a substrate processed by the CMP processing apparatus 11 are connected in-line. That is, the first transfer robot 20 (substrate transfer mechanism) is disposed between the substrate discharge port of the CMP processing apparatus 11 and the substrate input port of the substrate cleaning apparatus 12.

The substrate cleaning apparatus 12 includes a substrate mounting table 50 for mounting a substrate carried in from the first transfer robot 20 and a substrate cleaning table for cleaning the substrate. A second unit for receiving a substrate from the substrate mounting table and carrying the substrate into the substrate cleaning unit;
Transfer robot 40 (substrate transfer mechanism).
The first and second transfer robots 20 and 40 include hands 21 and 41 having suction portions 21 a and 41 a at the ends for sucking substantially the center of the back surface of the substrate, and the hands 21 and 4.
And base portions 22 and 42 coupled to the one base end portion. Then, with the rotation of the base portions 22, 42, the hands 21,
41 rotates.

Thus, the first transfer robot 20
The hand 21 and the base 22 can be bent and extended toward the CMP processing apparatus 11 and the substrate mounting table 50,
The second transfer robot 40 can bend the hand 41 and the base 42 toward the substrate mounting table 50 and the substrate cleaning unit 30. Along with such bending and stretching movements, the base portions 22 and 42 can move up and down. Thus, the first transfer robot 20 can take out one substrate from the CMP processing apparatus 11 and transfer it to the substrate mounting table 50. Further, the second transfer robot 40 moves the substrate
One substrate can be taken out and transferred to the substrate cleaning unit 30.

The substrate cleaning unit 30 includes, for example, a substrate holding mechanism for holding and rotating the substrate, and a processing liquid (chemical solution or pure water) for the substrate held by the substrate holding mechanism.
And a scrub member for scrubbing the front or back surface of the substrate held by the substrate holding mechanism. FIG. 2 is a perspective view for explaining the configuration of the substrate mounting table 50, and FIG. 3 is a sectional view thereof. The substrate mounting table 50 is a hand 21 of the first transfer robot 20.
In addition, the hand 41 of the second transfer robot 40 receives access from a direction substantially orthogonal to the plane view. At least at the positions avoiding the movable space regions of the hands 21 and 41, three substrate holding blocks 51, 52 and 53 for holding the substrate W are provided with substantially circular substrates W.
Are arranged at intervals along the circumferential direction. These substrate holding blocks 51, 52, 53 are fixed on a base 55 using appropriate bolts or the like. In order to prevent drying of the substrate W held by the substrate holding blocks 51, 52, 53, a pure water shower nozzle 57 (liquid supply mechanism) for supplying pure water toward the surface of the substrate W is provided. I have.

The substrate holding blocks 51, 52, and 53 are provided with a horizontal substrate supporting portion S (substrate supporting member) for supporting the peripheral portion of the lower surface of the substrate W, and stand up vertically from the substrate supporting portion S, and , A substrate dropping portion T (substrate dropping member) having a tapered surface Ta that rises obliquely outward from the rising portion U in the radial direction of the substrate W, and a tapered surface Ta. And an upper surface H which extends horizontally to the upper end edge of
The rising portion U has a cylindrical surface with a curvature radius slightly larger than the radius of the substrate W, and the tapered surface Ta has a mortar-shaped curved surface continuing from the cylindrical surface. With this configuration, even when the first transfer robot 40 transfers the substrate W to the substrate mounting table 50, the end surface of the substrate W is guided to the rising portion U along the tapered surface Ta even if a slight displacement occurs. Then, it can be dropped into the substrate support portion S and guided to a regular substrate holding position. The board holding block 5
Each of the tapered surfaces Ta of 1, 52, and 53 can be regarded as each divided portion when a continuous tapered surface is divided into a plurality of portions in the circumferential direction of the substrate W.

The substrate W dropped into the substrate supporting portion S and located at the regular substrate holding position assumes a substantially horizontal posture. The height of the substrate supporting portion S is such that the hands 21 and 42 are positioned such that the substrate supporting surface (the surface supporting the lower surface of the substrate W) is between the lower surface of the substrate W at the regular substrate holding position and the base 55. It is determined to be located at a height that ensures an interval at which it can enter. One substrate holding block 51 of the three substrate holding blocks 51, 52, 53 is formed to have a longer length along the periphery of the substrate W than the other two. The substrate holding block 51 includes a light emitting unit 81 of the beam sensor 80.
The light projecting portions 91 of the beam sensor 90 are provided near both ends of the substrate W in the circumferential direction. Also,
The substrate holding block 52 is provided with a light receiving unit 82 for receiving the light beam from the light emitting unit 81, and the substrate holding block 53 is provided with a light receiving unit 92 for receiving the light beam from the light emitting unit 91. Have been.

The optical axis L1 of the beam sensor 80 including the light projecting section 81 and the light receiving section 82 is
2 along a horizontal plane crossing each of the tapered surfaces Ta near each upper end, and the notch 51 is formed in each of the substrate dropping portions T of each of the substrate holding blocks 51 and 52 at the position where the optical axis L1 passes.
a, 52a are formed. Similarly, the optical axis L2 of the beam sensor 90 including the light projecting unit 91 and the light receiving unit 92 is
A notch 51b extends along a horizontal plane that crosses each tapered surface Ta of each of the substrate holding blocks 51 and 53 near each upper end, and is provided at each of the substrate dropping portions T of each of the substrate holding blocks 51 and 53 at a position where the optical axis L2 passes. , 53b are formed.

The optical axes L1 and L2 intersect in a common horizontal plane. More specifically, as shown in FIG. 4, the optical axes L1 and L2 intersect in a region inside the substrate W at a regular position in plan view, and these optical axes L1 and L2 Inside the angle α of 90 degrees or less,
The center O of the substrate W is located. Fig. 3 (a)
As shown in the case shown in FIG.
When dropped into the substrate supporting portions S of 52 and 53, the substrate W
And the optical axes L1 and L2 are substantially parallel, and the optical axes L1 and L2
Is not shaded.

On the other hand, the position when the first transfer robot 20 places the substrate W on the substrate mounting table 50 is located on one of the upper surfaces H of the substrate holding blocks 51, 52, 53. In the case where the displacement is so large as to be applied, the end face of the substrate W cannot be guided by the tapered surface Ta, and the substrate W cannot be dropped into the substrate supporting portion S. In this case, as shown in FIG. 3 (b), the peripheral portion of the substrate W has one of the substrate holding blocks 51, 5
2 and 53, and at least one of the optical axes L1 and L2 is shielded from light.

Therefore, whether at least one of the optical axes L1 and L2 is shielded from light can detect whether or not a failure has occurred in holding the substrate W on the substrate mounting table 50. The light projecting units 81 and 91 and the light receiving units 82 and 92 of the beam sensors 80 and 90 are coupled to sensor amplifiers 83 and 93 via optical fibers 84, 85;
Sensor amplifiers 83 and 93 are coupled to light emitting elements (not shown) optically coupled to ends of optical fibers 84 and 94 coupled to light projecting units 81 and 91, and to light receiving units 82 and 92. A light receiving element (not shown) optically coupled to the optical fibers 85 and 95;

When detecting the substrate W, the controller 6
By 0, each light emitting element emits light and the output signal of each light receiving element is monitored. If the amount of light received by any of the light receiving elements decreases and the output signal decreases, it means that one of the optical axes L1 and L2 has been blocked by the substrate W. When it is detected that one of the optical axes L1 and L2 is shielded, the control device 60 stops the operation of the second transfer robot 40 and places the substrate W on the display device (not shown). An alarm display indicating that a defect has occurred is performed. After that, the operator waits for the recovery work. In this manner, damage to the substrate W and the hand 41 of the second transfer robot 40 can be prevented.

Light emitting units 81 and 91 and light receiving units 82 and 92
In addition, from the air pump 90 (gas supply means),
Clean air (or an inert gas such as nitrogen gas) may be supplied via air supply pipes 87, 88, 97, and 98. FIGS. 5A and 5B are a perspective view and a cross-sectional view showing a common internal structure of the light projecting units 81 and 91 and the light receiving units 82 and 92, respectively. Floodlight unit 8
Each of the light receiving portions 1 and 91 and the light receiving portions 82 and 92 includes a cylindrical outer case 100. The outer case 100 has a gas flow passage 101 into which air supply pipes 87, 88, 97, 98 are inserted from below, and optical fibers 84, 8 also from below.
Fiber insertion holes 102 into which 5, 94 and 95 are inserted are formed.

At the tips of the optical fibers 84, 85, 94 and 95, optical components 103 as light emitting units (in the case of the light projecting units 81 and 91) or light detecting units (in the case of the light receiving units 82 and 92).
Is attached. The optical component 103 is, for example,
A cylindrical inner case 104 made of stainless steel, and optical fibers 84, 85, 94,
The lens 105 has a lens 105 for inputting and outputting light to and from the light source 95 and a reflecting mirror 106 for changing the traveling direction of light. In the inner case 104, an opening 107 for inputting and outputting light is formed at a position near the reflecting mirror 106.

On the other hand, the opening 1 is provided on the side wall of the outer case 100.
10 are formed. Inner case 10 of optical component 103
4 is attached to the outer case 100 with the opening 107 facing the opening 110. And outer case 1
The gas flow passage 101 in the hole 00 communicates with the opening 110. With this configuration, the air supply pipes 87, 88, 9
When the clean air is supplied into the outer case 100 from the first and second casings 7 and 98, the openings 11 pass through the gas flow passage 101.
The airflow of clean air blown from zero is generated. Therefore, even in a humid atmosphere near where pure water is supplied from the pure water shower nozzle 57 (see FIG. 1), water droplets and mist do not reach the optical component 103.

Therefore, the optical component 103 is
The incident light from zero can be satisfactorily guided to the optical fiber 84, and the emitted light from the optical fiber 85 can be satisfactorily guided to the opening 110. Since water droplets do not adhere to any part of the optical component 103, there is no possibility that the optical axis is shifted or undesired diffusion of light occurs. As long as the light is not blocked by the substrate W, the light is reliably incident on the light receiving sections 82 and 92. Therefore, in the light receiving units 82 and 92, a sufficient difference in the amount of received light can be secured according to the presence or absence of the substrate W that blocks the optical axes L1 and L2.

The outer case 100 exposed to the atmosphere is made of a resin material containing no metal (for example, ethylene tetrafluoride resin (PTFE) or ethylene tetrafluoride.
Perfluoroalkoxyethylene copolymer resin (PFA)
Etc.). Thereby, C
The metal substance can be prevented from adhering to the substrate W after the MP processing. Since water droplets do not enter the outer case 100, there is no problem even if the inner case 104 housed in the outer case 100 is made of a material containing a metal substance.

As described above, according to this embodiment, the mounting failure of the substrate W on the substrate mounting table 50 is detected by the beam sensors 80 and 90 in a non-contact state. Thereby, damage to the substrate W and the transfer robots 20 and 40 can be prevented beforehand, and since the structure is simple and there is no abrasion of components, both initial cost and running cost can be reduced. As mentioned above, although one Embodiment of this invention was described, this invention can be implemented also in another form. For example, in the above-described embodiment, the configuration in which the substrate W is held by the three substrate holding blocks 51, 52, and 53 is adopted, but the substrate W may be held by four or more substrate holding blocks. . Further, the substrate holding block may be one that covers almost the entire circumference of the substrate W.
The substrate W can be held by one substrate holding block. In any case, in order to secure a passage path of the hand that transfers the substrate W, it is preferable that the substrate dropping portion T and the substrate supporting portion S be arranged at least avoiding the movable space area of the hand.

In the above embodiment, the substrate mounting table 5
0 is configured to receive access from two directions substantially orthogonal to each other in a plan view, but configured to receive access from two directions forming an arbitrary angle other than a right angle (for example, directions different by 180 degrees). Alternatively, it may be configured to receive access from one direction or three or more directions. Further, in the above-described embodiment, the substrate dropping portion T and the substrate supporting portion S are provided with the substrate holding block 5.
1, 52 and 53 are integrally formed, but they may be formed of separate members.

Further, in the above-described embodiment, two beam sensors 80 and 90 are used, but three or more beam sensors may be used. For example, when three beam sensors are used, it is preferable that the optical axes of the two beam sensors intersect in an area inside the substrate W in plan view, but the optical axes of the three beam sensors are not necessarily You don't need to be in contact with them. Of course, it is preferable to arrange the optical axis of the third beam sensor in a region inside the substrate W so as to intersect with both or one of the other two beam sensors.

Further, the substrate mounting table 50 having the above-described configuration is used.
Can also be used for temporarily placing the substrate W in a chemical atmosphere. However, in this case,
It is preferable that each of the outer cases 100 of the light projecting units 81 and 91 and the light receiving units 82 and 92 of the beam sensors 80 and 90 be made of a chemical resistant material (for example, PTFE or PFA). In this case, since each component housed in the outer case 100 is not exposed to the chemical solution atmosphere by blowing the clean air from the opening 110, it is necessary to be made of a chemical resistant material. There is no.

In the above-described embodiment, the light emitting portion and the light receiving portion are coupled to the light emitting element and the light receiving element in the sensor amplifiers 83 and 93 provided at different places via the optical fiber. A configuration in which a light emitting element or a light receiving element is arranged in the light section or the light receiving section may be adopted. In this case, it is not necessary to prepare a light-emitting element or a light-receiving element that does not contain a metal material or that is provided with a chemical solution, and a commercially available general-purpose element can be used.

In the above embodiment, the reflecting mirror 106 is used.
Are used to bend the optical paths of the light entering and exiting the optical fibers 84, 85, 94, 95 at right angles.
By making the end face of 5 face the outer case 100,
Deflection of the optical path by the reflecting mirror 106 is unnecessary. In this case, the shape of the outer case 100 may be changed as needed. Further, in the above-described embodiment, a case has been described in which processing is performed on a semiconductor wafer that is a substantially circular substrate. However, the present invention relates to a general rectangular substrate or other arbitrary shape in a glass substrate for a liquid crystal display device or the like. The present invention can be applied to the case of processing a substrate.

In addition to these modifications, various design changes can be made within the scope of the matters described in the claims.

[Brief description of the drawings]

FIG. 1 is an illustrative view showing a simplified planar layout of a substrate processing apparatus to which a substrate mounting table according to an embodiment of the present invention is applied;

FIG. 2 is a perspective view illustrating a configuration of a substrate mounting table.

FIG. 3 is a cross-sectional view of the substrate mounting table.

FIG. 4 is an illustrative plan view for explaining an intersection state of optical axes of two beam sensors.

FIG. 5 is a diagram for explaining a structure of a light projecting unit and a light receiving unit of the beam sensor.

DESCRIPTION OF SYMBOLS 11 CMP processing apparatus 12 substrate cleaning apparatus 20 first transfer robot 21 hand 30 substrate cleaning unit 40 second transfer robot 41 hand 50 substrate mounting table 51 substrate holding block 52 substrate holding block 53 substrate holding block 57 Pure water shower nozzle 60 Control device 80 Beam sensor 81 Light emitting part 82 Light receiving part 83 Sensor amplifier 84 Optical fiber 85 Optical fiber 87 Air supply pipe 88 Air supply pipe 90 Air pump 90 Beam sensor 91 Light emitting part 92 Light receiving part 93 Sensor amplifier 94 Optical fiber 95 Optical fiber 100 Outer case 97 Air supply pipe 98 Air supply pipe 101 Gas flow passage 102 Fiber insertion hole 103 Optical component 110 Opening S Substrate support part T Drop part Ta Tapered surface U Rise part W substrate

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Masafumi Asa 4-chome, Horikawa-dori Teranouchi, Kamigyo-ku, Kyoto-shi, Kyoto 1 Dai-Nippon Screen Manufacturing Co., Ltd. (72) Inventor Atsushi Sawada F-term (reference) 5F031 CA02 CA05 CA07 GA47 HA07 HA24 JA05 JA17 JA27 JA28 JA30 MA23 NA02 NA04

Claims (4)

[Claims] A substrate support member for contacting a lower surface of the substrate and supporting the substrate in a substantially horizontal posture; and a taper provided above the substrate support member for dropping the substrate toward the substrate support member. A substrate mounting table, comprising: a substrate dropping member having a surface; and a plurality of beam sensors arranged so that optical axes intersect each other in a substantially horizontal plane crossing the tapered surface. 2. The apparatus according to claim 1, wherein the plurality of beam sensors are provided such that their optical axes intersect in a region corresponding to an inner side of the substrate supported by the substrate support member in plan view. The substrate mounting table according to claim 1. 3. The beam sensor according to claim 1, wherein the plurality of beam sensors are provided such that an optical axis is disposed in a substantially horizontal plane crossing the vicinity of an upper end of the tapered surface. Substrate mounting table. 4. A tapered surface of the substrate dropping member,
The periphery of the substrate to be supported is divided into a plurality of portions, and each divided portion is provided with at least one of a light projecting portion and a light receiving portion of the beam sensor. Item 4. The substrate mounting table according to any one of Items 1 to 3.