JP2008053694A - Substrate processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which a substrate being conveyed while inclined at a predetermined angle is prevented from floating from the support roller supporting the back surface of the substrate. <P>SOLUTION: The substrate processing apparatus which processes a substrate with processing liquid while conveying a substrate inclined at a predetermined angle, comprises: a chamber 3; support rollers 14 which are arranged in the chamber and support the back surface of a substrate which lies on the lower side of an inclining direction; a driving roller 17 which supports the lower end side of a substrate, whose the back surface is supported by the support rollers, by its outer circumferential surface, and carries the substrate to a predetermined direction by its rotation; nozzles 62 each of which spurts process liquid to the front surface of a substrate which lies on the upper side of the inclining direction; and liquid returning prevention members 65 each of which is formed in the space surrounded by the inner back wall facing to the back surface of a substrate to be conveyed, and prevents the liquid, which is reflected from the inner back wall after injected from the nozzles and got onto the inner back wall, from running onto the back face of a substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a substrate processing apparatus for processing a substrate with a fluid such as a processing liquid or a gas while conveying the substrate in an upright state inclined at a predetermined angle.

  A circuit pattern is formed on a glass substrate used in the liquid crystal display device. A lithographic process is employed to form a circuit pattern on the substrate. In a lithography process, as is well known, a resist is applied to the substrate, and light is irradiated through a mask having a circuit pattern formed on the resist.

  Next, the portion of the resist not irradiated with light or the portion irradiated with light is removed, and the portion of the substrate where the resist is removed is etched. A circuit pattern is formed on the substrate by repeating a series of steps of removing the resist after etching a plurality of times.

  In such a lithography process, the substrate is treated with a developing solution, an etching solution or a stripping solution for removing the resist after etching, a step of washing with a rinsing solution, and a rinsing solution remaining on the substrate after washing. The drying process which removes by gas is required.

  Conventionally, when the above-described series of processing is performed on a substrate, the substrate is sequentially transported to processing chambers in which the processing is performed in a substantially horizontal state by transport rollers arranged with the axis line horizontal, and in each processing chamber. The substrate is processed with a processing liquid, or after the processing, a compressed gas is injected to dry the substrate.

  Recently, glass substrates used in liquid crystal display devices tend to be larger and thinner. For this reason, when the substrate is horizontally transported, the bending of the substrate between the transport rollers becomes large, so that processing in each processing chamber cannot be performed uniformly over the entire plate surface of the substrate.

  Furthermore, when the substrate is enlarged, the transport shaft provided with the transport roller for transporting the substrate becomes longer. In addition, since the substrate is increased in size, the processing liquid supplied onto the substrate is increased, and the load applied to the transport shaft is increased according to the amount of the processing liquid on the substrate. Deflection increases. Therefore, the substrate may be bent even when the transport shaft is bent, and uniform processing may not be performed.

  Therefore, when the substrate is processed with the processing liquid, the substrate is transported at a predetermined inclination angle, for example, an angle of 75 degrees inclined by 15 degrees from the vertical state in order to prevent the substrate from being bent by the weight of the processing liquid. The front surface of the substrate is processed by injecting the processing liquid onto the front surface located on the upper side in the tilt direction.

  If the substrate is transported at an incline and the processing liquid is sprayed and supplied to the front surface of the substrate, the processing liquid does not stay on the plate surface of the substrate, but smoothly flows from the upper side to the lower side. It is possible to prevent the substrate from being bent by the weight of the liquid.

  In the case of a processing apparatus that processes a substrate while tilting it at a predetermined angle, as shown in Patent Document 1, a support roller that supports a back surface on the lower side in the tilt direction of the substrate and a lower end are supported in the chamber. A driving roller is provided. The drive roller is attached to a drive shaft, and the drive shaft is rotationally driven by a drive source.

In the processing apparatus, a plurality of the supporting rollers and the driving roller are arranged in the chamber at a predetermined interval with respect to the transport direction of the substrate. Accordingly, the lower surface of the substrate is driven by the driving roller while being supported on the back surface by the support roller, and is conveyed in a predetermined direction.
JP 2004-210511 A

  By the way, in order to enhance the effect depending on the type of the processing liquid, the processing liquid is sprayed from the nozzle body to the front surface of the substrate to be transported at a high pressure of about 0.7 MPa, for example.

  On the other hand, a plurality of substrates are sequentially transferred into the chamber at a predetermined interval in the front-rear direction. That is, there is a gap between the rear end of the substrate that is transported in the chamber on the downstream side in the transport direction and the front end of the substrate that is positioned on the upstream side. Sprayed continuously from the nozzle body.

  Therefore, the processing liquid sprayed from the nozzle body not only sprays to the front surface of the substrate, but also collides with the inner surface of the rear wall of the chamber through the gap between the front and rear ends of the pair of substrates in the front-rear direction. Will do.

  The treatment liquid that has collided with the inner surface of the rear wall of the chamber hits the back surface of the substrate that is reflected and conveyed by the inner surface. For this reason, the substrate transported with the back surface supported by the support roller is lifted from the support roller by the action of the processing liquid impinging on the back surface.

  If the substrate rises from the support roller, the substrate transfer state becomes unstable, and if the lift is large, it hits the slit for passing the substrate formed on the end wall of the chamber, damages the substrate, There was a possibility that it could not be transported.

  The substrate treated with the treatment liquid is washed with a rinsing liquid, and then gas is ejected from a liquid cutting knife to remove the treatment liquid adhering to the plate surface of the substrate. Also during the liquid draining process, the gas jetted from the liquid draining knife collides with the inner surface of the rear wall of the chamber and is reflected by the inner surface and hits the back surface of the substrate to be transported. For this reason, the substrate transported with the back surface supported by the support roller may be lifted from the support roller even by the action of the gas for draining.

  The present invention is directed to a substrate processing apparatus in which a fluid such as a processing liquid or a gas sprayed toward a substrate collides with an inner surface of a rear wall of a chamber and is reflected so that the fluid does not easily hit the back surface of the substrate being transported. Is to provide.

The present invention is a substrate processing apparatus for processing with a fluid while transporting the substrate inclined at a predetermined angle,
A chamber;
A support roller that is provided in the chamber and supports a back surface on the lower side in the tilt direction of the substrate;
A driving roller that supports the lower end of the substrate supported by the supporting roller on the back surface by the outer peripheral surface and is driven to rotate to convey the substrate in a predetermined direction;
Fluid supply means for ejecting the fluid to the front surface on the upper side in the tilt direction of the substrate;
A fluid which is provided on the inner surface of the rear wall of the chamber facing the back surface of the substrate to be transported and is ejected from the fluid supply means and collides with the inner surface of the rear wall of the chamber to prevent the reflected fluid from hitting the back surface of the substrate. The substrate processing apparatus is provided with a fluid return preventing member.

  The fluid return prevention member includes a vertical wall portion whose tip is provided on the inner surface of the rear wall of the chamber toward the back surface of the substrate, and a slope provided at a predetermined angle on the tip of the vertical wall portion. A wall portion and a return prevention wall portion that is provided at the tip of the inclined wall portion so as to bend toward the inner surface of the rear wall and prevents the fluid reflected by the inner surface of the rear wall from scattering toward the back surface of the substrate. It is preferable that it is comprised.

  The fluid return preventing member is set to have a length shorter than the vertical dimension of the chamber, and at least the lower end of the fluid return preventing member is disposed on the inner surface of the rear wall of the chamber. It is preferable to provide a passage blocking member that prevents the fluid that has collided with and reflected from passing through the lower end of the fluid return preventing member and hits the back surface of the substrate.

  The passage blocking member is preferably provided at an end of the chamber along the transport direction of the substrate.

The fluid supply means includes a plurality of supply pipes that are arranged at predetermined intervals along the transport direction of the substrate and that are supplied with the fluid, and a plurality of nozzle bodies that are provided in the supply pipes.
It is preferable that the fluid return preventing member is disposed at a position corresponding to each supply pipe located at an upstream end and a downstream end of the substrate in the transport direction.

The fluid supply means includes a supply pipe to which the fluid is supplied and a plurality of nozzle bodies provided in the supply pipe.
It is preferable that the fluid return preventing member is disposed at a position corresponding to both sides of the supply pipe along the transport direction of the substrate.

  According to the present invention, the fluid that has been ejected from the nozzle body and collided with the inner surface of the rear wall of the chamber is prevented from hitting the back surface of the substrate by the fluid return preventing member. It can be prevented from floating.

Embodiments of the present invention will be described below with reference to the drawings.
1 to 4 show a first embodiment of the present invention. FIG. 1 is a perspective view showing a schematic configuration of a processing apparatus according to the present invention. The apparatus main body 1 is formed by connecting a plurality of divided processing units, in this embodiment, first to fifth processing units 1A to 1E in a row so as to be disassembled.

  Each processing unit 1 </ b> A to 1 </ b> E has a gantry 2. A box-shaped chamber 3 is held on the front surface of the gantry 2 at a predetermined angle. An upper transfer unit 4 is provided on the upper surface of the gantry 2 and the chamber 3. A pair of plate-like legs 5 (only one is shown) are provided at both ends in the width direction of the lower end of the gantry 2 so as to be disassembled. The leg 5 forms a space 6 on the lower surface side of the gantry 2.

  In the space 6, a tank or pump for supplying a processing liquid such as a chemical liquid or a rinsing liquid used for processing the substrate W performed in the chamber 3 as described later, or a control device for controlling the supply of the processing liquid. A device unit 9 in which a device 7 such as is mounted on a frame 8 is accommodated. That is, each of the processing units 1A to 1E supports the gantry 2 with the legs 5 and forms the space 6 below the chamber 3, so that the chamber 3, the upper transport unit 4 and the equipment unit 9 positioned in the vertical direction are arranged. It is divided into three parts.

  The chamber 3 is held at a predetermined angle to the gantry 2 at an angle of 75 degrees with respect to a horizontal plane, for example, 15 degrees from a vertical state, and 75 on both side surfaces in the width direction. A slit 13 (only one place is shown in FIG. 1) is formed through which the substrate W transported inclined at an angle of degrees passes.

  Inside the chamber 3, as shown in FIGS. 2 and 3, a plurality of conveying shafts 15 constituting the inclined conveying means are provided at predetermined intervals in the width direction of the chamber 3. A plurality of support rollers 14 are provided on the transport shaft 15 so as to be rotatable at predetermined intervals in the axial direction. The transport shaft 15 is supported at its upper and lower ends by brackets 15 a so that the axis is inclined at the same angle as the slit 13.

  A substrate W is transferred from the slit 13 into the chamber 3 by being converted from a horizontal state to an angle of 75 degrees by a first posture changing unit 16 indicated by a chain line in FIG. That is, the unprocessed substrate W is transported from the fifth processing unit 1E side to the first processing unit 1A side by the upper transport unit 4, and is moved from the horizontal state to the 75 degree angle by the first attitude conversion unit 16. It is inclined and carried into the first processing unit 1A.

  The back surface, which is a non-device surface, is supported on the substrate W carried into the chamber 3 of the first processing unit 1 </ b> A by the support roller 14 provided on the transport shaft 15. The lower end of the substrate W is supported by the outer peripheral surface of the drive roller 17 (shown in FIG. 2).

  The drive roller 17 is provided on the rotary shaft 19 of the drive unit 18. When the rotary shaft 19 is rotationally driven, the substrate W, the lower end of which is supported by the drive roller 17 and the back surface of which is supported by the support roller 14, is conveyed in the rotational direction of the drive roller 17. Yes.

  The substrate W is cleaned with the removing liquid as the processing liquid in the first to third processing units 1A to 1C upstream in the transport direction, and then cleaned with the cleaning liquid as the processing liquid in the fourth processing unit 1D. Processing is performed. Then, a drying process using a fluid such as hot air is performed in the fifth processing unit 1E.

  The substrate W processed by sequentially passing through each of the processing units 1A to 1E is unloaded from the fifth processing unit 1E while being inclined at an angle of 75 degrees. The substrate W carried out of the fifth processing unit 1E is changed in posture from the inclined state to the horizontal state by the second posture converting unit 23 shown by a chain line in FIG.

  As shown in FIG. 2, the drive unit 18 has a plate-like lower base member 24 that is long along the width direction of the chamber 3 (the transport direction of the substrate W). On the upper surface of the lower base member 24, a channel-shaped upper base member 25 having the same length as the lower base member 24 is provided with both lower ends fixed.

  One end and the other end in the width direction of a flat mounting member 26 having substantially the same size as the lower base member 24 are connected to the upper base member 25 so that the inclination of the upper base member 25 can be adjusted. Is provided. That is, the attachment member 26 can adjust the tilt angle in the front-rear direction of the chamber 3.

  A plurality of brackets 31 are provided at one end and the other end in the width direction of the mounting member 26 at predetermined intervals with respect to the longitudinal direction of the mounting member 26 and at positions corresponding to the width direction. A pair of brackets 31 corresponding to each other in the width direction are rotatably supported in the axial direction of the rotary shaft 19 via a bearing (not shown). The driving roller 17 is attached to the tip of the rotating shaft 19, and the first gear 33 is fitted to the rear end.

  When the chamber 3 is installed on the gantry 2, the lower end surfaces of the four rod-shaped reference members 35 are attached and fixed to the upper surface of the support portion 41 provided on the gantry 2 with screws 42. In the drive unit 18, the lower surfaces of the four corners of the lower base member 24 are fixedly attached to the upper end surface of the reference member 35 with screws 42. The upper end surfaces of the four reference members 35 are located on the same plane. Therefore, the drive unit 18 is mounted and fixed without distortion in the width direction and the longitudinal direction of the lower base member 24.

  When the drive unit 18 is incorporated in the chamber 3 with reference to the upper end surface of the reference member 35, the rear end portions of the plurality of rotating shafts 19 supported by the drive unit 18 are led out to be opened in the front wall 12 b of the chamber 3. Project into the drive chamber 45 from the hole 44. Then, after the drive unit 18 is assembled in the chamber 3, the first gear 33 is fitted to the rear end of the rotary shaft 19.

  A drive source 51 is provided in the drive chamber 45. A drive pulley 53 is fitted on the output shaft of the drive source 51. A belt 55 is stretched between the driving pulley 53 and the driven pulley 54. The driven pulley 54 is provided with a second gear (not shown) coaxially. The second gear meshes with the first gear 33. As a result, when the drive source 51 is activated, the rotary shaft 19 is rotationally driven, so that the drive roller 17 provided at the tip of the rotary shaft 19 is also rotationally driven.

  If the driving roller 17 is rotationally driven, the substrate W having the lower end supported by the driving roller 17 is transported in the rotational direction of the driving roller 17.

  In the first to third processing units 1A to 1C, which remove the resist by spraying a stripping solution on the front surface of the substrate W, the upper surface in the tilt direction of the substrate W conveyed in an inclined manner, that is, a circuit pattern. A plurality of liquid supply pipes 61 serving as supply pipes that are spaced apart from each other in parallel with the front surface on which the substrate is formed are arranged at a predetermined interval in the transport direction of the substrate W.

  Each liquid supply pipe 61 is provided with a plurality of nozzle bodies 62 at a predetermined interval with respect to an axial direction intersecting the transport direction of the substrate W. The liquid supply pipe 61 and the nozzle body 62 form the processing liquid supply means of the present invention.

  The stripping liquid is supplied to the liquid supply pipe 61 at a high pressure of about 0.7 MPa. As a result, the processing liquid is ejected from the nozzle body 62 provided in the liquid supply pipe 61 onto the front surface of the substrate W at a high pressure.

  The substrate W is transported at predetermined intervals in the chamber 3 of each of the processing units 1A to 1C. That is, there is a gap G shown in FIG. 3 between the rear end of the substrate W located on the downstream side in the transport direction and the front end of the substrate W located on the upstream side. Therefore, a part of the processing liquid ejected from the nozzle body 62 toward the front surface of the substrate W collides with the inner surface of the rear wall 12c of the chamber 3 through the gap G and is reflected.

  The processing liquid reflected from the inner surface of the rear wall 12c of the chamber 3 is prevented from hitting the back surface of the substrate W transported in the chamber 3 by the liquid return preventing member 65. The liquid return preventing member 65 is opposed to the respective liquid supply pipes 61 located at the upstream and downstream ends of the inner surface of the rear wall 12c of the chamber 3 in the transport direction of the substrate W, that is, one of the liquid return preventing members 65. The liquid return prevention member 65 is slightly upstream from the liquid supply pipe 61 located on the most upstream side, and the other liquid return prevention member 65 is slightly downstream from the liquid supply pipe 61 located on the most downstream side. Is provided.

  The liquid return preventing member 65 has a length dimension substantially the same as the height dimension of the substrate W as shown in FIG. 2, and the cross-sectional shape is fixed to the rear wall 12c as shown in FIG. The vertical wall portion 65a provided substantially vertically, the inclined wall portion 65b provided at the tip of the vertical wall portion 65a with a predetermined inclination angle, for example, an angle of 45 degrees, and the inclined wall portion 65b Is formed in a bowl shape by a return prevention wall portion 65c provided in parallel to the vertical wall portion 65a toward the inner surface of the rear wall 12c.

  The pair of liquid return preventing members 65 are opposed to each other with the return preventing wall portions 65c facing each other along the transport direction of the substrate W in the chamber 3, that is, both ends in the width direction of the chamber 3 as shown in FIG. It is arrange | positioned near the end wall 12a.

  On the upper and lower ends of the rear wall 12c side of the conveying shaft 15 provided with the upper and lower support rollers 14 of the chamber 3, piping and drive system parts (not shown) are provided. Therefore, in order to prevent the liquid return preventing member 65 from interfering with piping, driving system components, etc., the length dimension is set shorter than the height dimension of the chamber 3 as shown in FIG.

  Thus, an upper space portion 66 and a lower space portion 67 are formed between the upper end of the liquid return preventing member 65 and the inner surface of the ceiling wall of the chamber 3 and between the lower end and the inner surface of the bottom wall, respectively.

  Passage blocking members 68 are provided at the upper and lower ends of the liquid return preventing member 65 located at both ends in the width direction of the chamber 3. FIG. 2 shows a passage blocking member 68 provided in the lower space 67 on the lower end side of the liquid return prevention member 65. The passage blocking member 68 has a substantially L-shaped cross section, and its base end 68a is the above-mentioned. It is fixed to the inner surface of the end wall 12 a of the chamber 3, and the midway portion 68 b is parallel to the rear wall 12 c of the chamber 3 and engages with the lower end surface of the liquid return preventing member 65. Furthermore, the front end portion 68c protrudes toward the return prevention wall portion 65c of the liquid return prevention member 65 and is bent at a substantially right angle toward the rear wall 12c.

Similarly to the lower space 67, a passage blocking member 68 is provided in the upper space 66 on the upper end side of the liquid return preventing member 65.
The passage preventing member 68 provided on the upper end side of the liquid return preventing member 65 and the passage preventing member 68 provided on the lower end side are provided over the entire length in the height direction of the upper space portion 66 and the lower space portion 67, respectively. . That is, the space portions 66 and 67 are provided with no gap in the height direction.

  Accordingly, after a part of the processing liquid that has passed through the gap G between the front and rear ends of the substrate W transported at a predetermined interval collides with the inner surface of the rear wall 12c of the chamber 3 and is reflected, the liquid return preventing member 65 is then reflected. Even after passing through the upper space portion 66 and the lower space portion 67 formed at the upper and lower ends, the processing liquid that has passed through the space portions 66, 67 collides with the inner surfaces of the pair of upper and lower passage blocking members 68. It is designed to be prevented from flying toward the back of the.

  In the processing apparatus configured as described above, a plurality of substrates W are sequentially carried into the chambers 3 of the first to third processing units 1A to 1C at predetermined intervals. The processing liquid is sprayed from the nozzle body 62 provided in the liquid supply pipe 61 to the front surface of the substrate W carried into the chamber 3. Thereby, the front surface of the substrate W is processed by the processing liquid.

  Part of the processing liquid sprayed from the nozzle body 62 passes through a gap G (shown in FIG. 3) between the front end and the rear end of the substrate W transported at a predetermined interval, and the inner surface of the rear wall 12c of the chamber 3 May be reflected by the inner surface of the substrate 3 and hit the back surface of the substrate W transported in the chamber 3. In that case, the back surface of the substrate W may be lifted from the support roller 14, and the transport state may become unstable, or the substrate W may not pass through the slits 13 formed on both side walls in the width direction of the chamber 3.

  However, a liquid return preventing member 65 is provided on the inner surface of the rear wall 12 c of the chamber 3. The liquid return preventing member 65 is formed in a bowl shape by a vertical wall portion 65a, an inclined wall portion 65b, and a return prevention wall portion 65c.

  Therefore, a part of the processing liquid that is sprayed from the nozzle body 62 and collides with the inner surface of the rear wall 12c of the chamber 3 and reflected by the inner surface, as shown by arrows A and B in FIG. Since the wall portion 65b and the return prevention wall portion 65c flow so as to be wound along the inner surface of the bowl-shaped portion and do not collide with the back surface of the substrate W being transported in the chamber 3, the transport state of the substrate W is There is no instability.

  The processing liquid that is captured by the pair of liquid return preventing members 65 and prevented from returning to the back surface of the substrate W is a part of the processing liquid reflected by the inner surface of the rear wall 12c of the chamber 3, and the remaining processing liquid May collide with the back surface of the substrate W.

  However, even if a part of the processing liquid is captured by the pair of liquid return prevention members 65, the force of the processing liquid reflected on the inner surface of the rear wall 12c of the chamber 3 and acting on the substrate W is weakened. As a result, it is possible to prevent the smooth transfer state of the substrate W from being damaged.

  The liquid return preventing member 65 has a bowl shape having an inclined wall portion 65b inclined at a predetermined angle. Therefore, even if the processing liquid that has passed through the gap G between the front and rear ends of the substrate W sprayed from the nozzle body 62 and collides with the outer surface of the inclined wall portion 65b, as shown by the arrow C in FIG. Reflects in a direction according to the tilt angle. For this reason, the processing liquid reflected by the outer surface of the inclined wall portion 65b hardly returns to the inner surface of the substrate W, so that the transport state of the substrate W is hardly impaired.

  An upper space portion 66 and a lower space portion 67 are formed between the upper and lower ends of the liquid return preventing member 65 and the inner surface of the ceiling wall and the bottom wall of the chamber 3, respectively. Therefore, a part of the processing liquid that has passed through the gap G between the front and rear ends of the substrate W transferred at a predetermined interval and reflected by the inner surface of the rear wall 12c of the chamber 3 passes through the upper space portion 66 and the lower space portion 67. There is a possibility that the light passes through the inner wall of the end wall 12a of the chamber 3 and collides with the back surface of the substrate W.

  However, the upper and lower ends of the liquid return preventing member 65 are provided with passage preventing members 68 that prevent the processing liquid reflected by the rear wall 12 c of the chamber 3 from passing through the upper space portion 66 and the lower space portion 67. .

  Therefore, as shown by an arrow F in FIG. 3, the upper space portion 66 and the lower space where the processing liquid that has passed through the gap G and reflected by the rear wall 12 c of the chamber 3 is formed at the upper and lower ends of the liquid return prevention member 65. Even after passing through the portion 6, it collides with the inner surface of the intermediate portion 68 b of the passage blocking member 68 provided in each of the space portions 66 and 67 and reflects toward the rear wall 12 c side of the chamber 3.

  The treatment liquid reflected toward the rear wall 12c side of the chamber 3 is reflected toward the rear wall 12c side on the inner surface of the end wall 12a of the chamber 3, and then collides with the rear wall 12c and attenuates.

  Thereby, even if the processing liquid passes through the upper space portion 66 and the lower space portion 6 formed at the upper and lower ends of the liquid return prevention member 65, it is prevented from being reflected toward the back surface of the substrate W by the passage prevention member 68. Therefore, it is possible to reliably prevent the processing liquid that has passed through the spaces 66 and 67 from colliding with the back surface of the substrate W.

  FIG. 4 shows a second embodiment of the present invention. In this embodiment, two liquid return preventing members 65 for one liquid supply pipe 61 are arranged at positions corresponding to both sides of the liquid supply pipe 61, that is, slightly upstream and downstream of the liquid supply pipe 61. Place in position.

If the liquid return preventing member 65 is arranged in this way, most of the processing liquid that is ejected from the nozzle body 62 of one liquid supply pipe 61 and reflected by the inner surface of the rear wall 12c of the chamber 3 is indicated by an arrow D. In this way, the substrate W is captured by the pair of liquid return preventing members 65 and is reflected from the inner surface of the rear wall 12c of the chamber 3 and is prevented from returning to the back surface of the substrate W, so that the transport state of the substrate W can be further stabilized. It becomes.
Although not shown, the passage preventing member 68 shown in the first embodiment may be provided on the upper and lower ends of the liquid return preventing member 65 shown in FIG.

  The present invention can be applied not only when a substrate is treated with a stripping solution, but also when treated with another treatment solution such as pure water, and gas and liquid are mixed from a nozzle body. The present invention is applicable even when a mixed fluid is ejected. Furthermore, the present invention can be applied even when a liquid cutting gas is ejected by, for example, an air knife in order to remove the liquid adhering to the substrate instead of the liquid. In short, the present invention can be applied to the case where a fluid such as liquid or gas is jetted onto the substrate at a high pressure.

  There may be no need to provide piping between the upper end of the liquid return preventing member and the inner surface of the ceiling wall of the chamber. In such a case, since the upper end of the liquid return preventing member can be brought into contact with the inner surface of the ceiling wall of the chamber, the passage blocking member may be provided only on the lower end side of the liquid return preventing member.

  Further, although the passage preventing members are provided at the upper and lower ends of the liquid return preventing member located near the end walls at both ends in the width direction of the chamber, the liquid returning preventing member is provided at a place other than near the end wall of the chamber. In that case, a passage preventing member may be provided at the upper or lower end or at least the lower end of the liquid return preventing member.

The perspective view which shows schematic structure of the processing apparatus of 1st Embodiment of this invention. The longitudinal cross-sectional view of the chamber of the said processing apparatus. The longitudinal cross-sectional view of one chamber which shows the arrangement | positioning relationship between a liquid supply pipe | tube and a liquid return prevention member. The longitudinal cross-sectional view which abbreviate | omitted one part of the chamber which shows the arrangement | positioning relationship between the liquid supply pipe | tube and liquid return prevention member of 2nd Embodiment of this invention.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 3 ... Chamber, 14 ... Support roller, 17 ... Drive roller, 19 ... Rotating shaft, 62 ... Nozzle body, 65 ... Liquid return prevention member, 65a ... Vertical wall part, 65b ... Inclined wall part, 65c ... Return prevention wall part, 68: A passage blocking member.

Claims (6)

A substrate processing apparatus for processing with a fluid while transporting the substrate inclined at a predetermined angle,
A chamber;
A support roller that is provided in the chamber and supports a back surface on the lower side in the tilt direction of the substrate;
A driving roller that supports the lower end of the substrate supported by the supporting roller on the back surface by the outer peripheral surface and is driven to rotate to convey the substrate in a predetermined direction;
Fluid supply means for ejecting the fluid to the front surface on the upper side in the tilt direction of the substrate;
A fluid which is provided on the inner surface of the rear wall of the chamber facing the back surface of the substrate to be transported and is ejected from the fluid supply means and collides with the inner surface of the rear wall of the chamber to prevent the reflected fluid from hitting the back surface of the substrate. A substrate processing apparatus comprising: a fluid return preventing member.   The fluid return prevention member includes a vertical wall portion whose tip is provided on the inner surface of the rear wall of the chamber toward the back surface of the substrate, and a slope provided at a predetermined angle on the tip of the vertical wall portion. A wall portion and a return prevention wall portion that is provided at the tip of the inclined wall portion so as to bend toward the inner surface of the rear wall and prevents the fluid reflected by the inner surface of the rear wall from scattering toward the back surface of the substrate. The substrate processing apparatus according to claim 1, comprising:   The fluid return preventing member is set to have a length shorter than the vertical dimension of the chamber, and at least the lower end of the fluid return preventing member is disposed on the inner surface of the rear wall of the chamber. The substrate processing apparatus according to claim 1, further comprising a passage blocking member that prevents the fluid reflected upon collision with the light from passing through the lower end of the fluid return preventing member and hitting the back surface of the substrate.   The substrate processing apparatus according to claim 3, wherein the passage blocking member is provided at an end of the chamber along a transport direction of the substrate. The fluid supply means includes a plurality of supply pipes that are arranged at predetermined intervals along the transport direction of the substrate and that are supplied with the fluid, and a plurality of nozzle bodies that are provided in the supply pipes.
The fluid return prevention member is disposed at a position corresponding to each supply pipe located at an upstream end and a downstream end of the substrate in the transport direction. 3. The substrate processing apparatus according to 2. The fluid supply means includes a supply pipe to which the fluid is supplied and a plurality of nozzle bodies provided in the supply pipe.
3. The substrate processing apparatus according to claim 1, wherein the fluid return prevention member is disposed at a position corresponding to both sides of the supply pipe along the transport direction of the substrate.

Images