JP2005028327A - Cleaning device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a cleaning device capable of conveying materials to be cleaned without hindrance even when the materials to be cleaned are sprayed with a cleaning liquid under a high spraying pressure. <P>SOLUTION: This cleaning device 21, in which the surface 28a of a glass substrate 28 conveyed in a predetermined direction is cleaned with the cleaning liquid 39 sprayed from a jet nozzle 33, is provided with a high pressure cleaning part 25. The jet nozzle 33 installed to the high pressure cleaning part 25 is arranged on the surface 28a side of the glass substrate 28 so that the cleaning liquid 39 may be sprayed in the direction orthogonal to the conveying direction 38 of the glass substrate 28. Since the spraying direction of the cleaning liquid 39 is orthogonal to the conveying direction of the glass substrate 28, the suppressing of conveying of the glass substrate 28 by the spraying pressure of the cleaning liquid 39 is reduced. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

The present invention relates to a cleaning apparatus used for cleaning semiconductor substrates, glass substrates for liquid crystal display panels, glass substrates for photomasks, and the like.

Since a substrate such as a semiconductor substrate or a glass substrate for a liquid crystal display panel requires high cleanliness, a surface cleaning process is performed on the substrate in the manufacturing process. As one of the substrate surface cleaning processes, there is a cleaning process for removing dirt such as particles adhering to the substrate surface. For this cleaning process, means such as shower cleaning, high-pressure jet cleaning, ultrasonic cleaning, scrub cleaning, and the like are used. Conventional high-pressure jet cleaning apparatuses used for cleaning substrates are as follows (for example, see Patent Document 1).

FIG. 5 is a diagram showing a simplified configuration of a conventional high-pressure jet cleaning apparatus 1. A conventional high-pressure jet cleaning apparatus 1 includes a loader 4 that houses a cassette 3a that stores, for example, a glass substrate 2 that is an object to be cleaned, a scrub cleaning unit 6 that includes two pairs of brushes 5 for cleaning the glass substrate 2, An ultrasonic cleaning unit 9 including a first ultrasonic nozzle 7 and a cleaning liquid supply nozzle 8, a jet nozzle 10 and a second ultrasonic nozzle 11
A high-pressure jet cleaning unit 12, a drying unit 14 that removes the cleaning liquid from the surface of the glass substrate 2 with an air knife 13, and a glass substrate 2 that has been cleaned.
And an unloader 15 for accommodating the cassette 3b for accommodating the cassette 3b.

In addition, between the loader 4 and the unloader 15 of the high-pressure jet cleaning device 1,
A plurality of transport rollers 16 are rotatably supported by the apparatus main body. These transport rollers 16 are rotationally driven around an axis by a drive source (not shown), and the glass substrate 2 extracted from the cassette 3a and placed on the rollers is moved in the direction indicated by the arrow 17 in FIG. Transport to unloader 15.

Hereinafter, the cleaning operation by the high-pressure jet cleaning apparatus 1 will be described. First, the glass substrate 2 is extracted from the cassette 3 a of the loader 4 and put into the scrub cleaning unit 6. The glass substrate 2 passes between the two pairs of brushes 5 arranged to face each other with the glass substrate 2 in the process of being conveyed by the conveying roller 16. At this time, the cleaning liquid is supplied to the brush 5, and the brush 5 is pressed against the front and back surfaces of the glass substrate 2 while being driven to rotate to clean the front and back surfaces of the glass substrate 2.

Next, the glass substrate 2 is conveyed to the ultrasonic cleaning unit 9. In the ultrasonic cleaning unit 9,
A cleaning liquid supply nozzle 8 is provided on the front surface side of the glass substrate 2 at a distance from the surface of the glass substrate 2, and is opposed to the cleaning liquid supply nozzle 8 at a distance from the back surface of the glass substrate 2 on the back surface side of the glass substrate 2. The 1st ultrasonic nozzle 7 is provided in this. The glass substrate 2 is transported by the transport roller 16 and passes between the cleaning liquid supply nozzle 8 and the first ultrasonic nozzle 7. At this time, the cleaning liquid sprayed from the cleaning liquid supply nozzle 8 and the first ultrasonic nozzle 7. The particles having a particle diameter exceeding 3 μm are removed from the surface of the glass substrate 2 by the cleaning liquid ejected from the substrate and the vibration of the ultrasonic wave applied to the cleaning liquid.

The glass substrate 2 cleaned by the ultrasonic cleaning unit 9 is conveyed to the high-pressure jet cleaning unit 12. FIG. 6 is a plan view showing a cleaning state of the glass substrate 2 in the high-pressure jet cleaning unit 12. In the high-pressure jet cleaning unit 12, the jet nozzle 10 is provided on the surface side of the glass substrate 2 at a distance from the surface of the glass substrate 2. The jet nozzle 10 has a cleaning liquid 18 from the downstream side in the transport direction to the upstream side with respect to the glass substrate 2.
In order to reduce energy loss when the cleaning liquid 18 collides with the surface of the glass substrate 2, the spraying direction of the cleaning liquid 18 is 10 to 20 with respect to the surface of the glass substrate 2. It is provided to have an inclination angle of degrees.

The second ultrasonic nozzle 11 of the high-pressure jet cleaning unit 12 is on the back side of the glass substrate 2, and the high-pressure cleaning liquid 18 ejected from the jet nozzle 10 is the glass substrate 2.
The cleaning liquid to which ultrasonic waves are added can be sprayed between the spray position 19 sprayed on the surface of the sheet and the transport roller 16 provided on the upstream side in the transport direction closest to the spray position 19. Provided in position.

In the high-pressure jet cleaning unit 12, the glass substrate 2 is generated by a high-pressure cleaning liquid sprayed from the jet nozzle 10 to the glass substrate 2 and an ultrasonic vibration applied to the cleaning liquid sprayed from the second ultrasonic nozzle 11. Removal of particles having a particle size of 3 μm or less adhering to the surface is performed.

The glass substrate 2 cleaned by the high-pressure jet cleaning unit 12 is conveyed to the drying unit 14. The glass substrate 2 is dried by the air knife 13 in the drying unit 14.
The cleaning liquid remaining on the surface is removed and drying is performed. After drying, the cleaning liquid is accommodated in the cassette 3b of the unloader 15, and the series of cleaning steps is completed.
JP-A-7-204593

The above-described conventional high-pressure jet cleaning apparatus 1 has the following problems. In the high-pressure jet cleaning unit 12 of the high-pressure jet cleaning apparatus 1, high-pressure cleaning in which a high-pressure cleaning liquid 18 is sprayed from the jet nozzle 10 to the surface of the glass substrate 2 obliquely from above and the second ultrasonic nozzle 11 to the glass substrate. The particles having a particle size of 3 μm or less are removed while rolling on the surface of the glass substrate 2 by the vibration of the ultrasonic wave applied to the cleaning liquid sprayed on the back surface of the glass substrate 2.

Since the spraying pressure of the cleaning liquid sprayed from the jet nozzle 10 to the surface of the glass substrate 2 to clean the glass substrate 2 is applied to the glass substrate 2, the glass substrate 2 is caused to spray by the spraying pressure of the cleaning liquid. Pressed against the conveying roller 16. The glass substrate 2 is driven by the conveyance propulsion force of the conveyance roller 16 due to the spray pressure of the cleaning liquid.
If the pressing force is less than the conveying roller 16, a phenomenon occurs in which the conveying roller 16 and the glass substrate 2 slip and cannot be conveyed.

As a means for solving such a problem, the spraying pressure of the cleaning liquid 18 sprayed from the jet nozzle 10 is lowered to the extent that the glass substrate 2 can be transported, or a transport mechanism is provided separately from the transport roller 16, and the glass It is conceivable to transport the glass substrate 2 by pushing the end face in the width direction orthogonal to the transport direction of the substrate 2 in the direction of the arrow 17 by the transport mechanism.

However, in order to remove particles having a particle diameter of 3 μm or less, the flow rate of the cleaning liquid sprayed from the jet nozzle 10 needs to be 150 m / second or more, and 150
If the speed is less than m / second, it is difficult to remove particles having a particle size of 3 μm or less, so it is not preferable to lower the spray pressure of the cleaning liquid. Further, in the conventional high-pressure jet cleaning apparatus 1 as shown in FIG. 5, in order to push the end surface in the width direction of the glass substrate 2, a separate transport mechanism must be provided in the scrub cleaning unit 6 or the high-pressure jet cleaning unit 12. However, the separate installation of such a transport mechanism has a problem of increasing the size of the apparatus.

Further, in the conventional high-pressure jet cleaning apparatus 1, the cleaning liquid 18 sprayed from the jet nozzle 10 is narrowed to the inside by several tens of mm compared to the width of the nozzle hole formed in the jet nozzle 10 by the action of surface tension. Therefore, the width of the nozzle hole of the jet nozzle 10 must be formed to be larger than the dimension in the width direction of the glass substrate 2. For example, in order to clean the entire surface of the glass substrate 2 having a width dimension of 320 mm, the width of the nozzle hole of the jet nozzle 10 is at least 45.
0 mm is required. At this time, the dimension of the jet nozzle 10 in the width direction is 5 mm.
It is formed to 00 mm. As the dimension in the width direction of the glass substrate 2 increases in this way, the dimension in the width direction of the jet nozzle 10 increases, and in order to uniformly spray the water film of the cleaning liquid 18 from the jet nozzle 10, Since the nozzle hole of the nozzle 10 needs to be processed so as to have high accuracy linearity, the processing of the jet nozzle 10 becomes difficult and there is a problem that the manufacturing cost of the jet nozzle increases.

An object of the present invention is to provide a cleaning apparatus that can transport an object to be cleaned without any trouble even when the cleaning liquid is sprayed on the object to be cleaned at a high jet pressure.

The present invention provides a cleaning apparatus for cleaning one surface of an object to be cleaned that is transported in a predetermined transport direction with a cleaning liquid sprayed from a spray nozzle.
The spray nozzle is
The surface to be cleaned of the object to be cleaned is arranged so that the cleaning liquid can be sprayed in a direction orthogonal to the transport direction of the object to be cleaned,
In the cleaning apparatus, an ultrasonic nozzle that ejects a cleaning liquid to which ultrasonic waves are applied toward the other surface of the object to be cleaned is provided on the other surface side of the object to be cleaned.

According to the present invention, the cleaning device sprays the cleaning liquid for spraying the cleaning liquid for cleaning one surface of the object to be cleaned, and the cleaning liquid to which ultrasonic waves are applied toward the other surface of the object to be cleaned. An ultrasonic nozzle is provided. The spray nozzle provided for cleaning one surface of the object to be cleaned is arranged so that the cleaning liquid can be sprayed in a direction orthogonal to the conveying direction of the object to be cleaned. This reduces the pressing force of the cleaning liquid sprayed from the spray nozzle on the cleaning roller, for example, which constitutes the transport mechanism for transporting the cleaning target, so that the cleaning liquid spray pressure is high. In this case, the object to be cleaned can be transported without any trouble. Also, it is possible to easily remove fine dirt adhering to one surface of the object to be cleaned by high-pressure cleaning liquid sprayed from the spray nozzle and ultrasonic vibration applied to the cleaning liquid sprayed from the ultrasonic nozzle. Can do.

  The invention is characterized in that a plurality of the injection nozzles are provided.

According to the present invention, since a plurality of spray nozzles are provided, it is possible to realize a cleaning apparatus having a more excellent cleaning function.

Moreover, the present invention provides a plurality of the injection nozzles,
The first row and the second row are arranged in two rows consisting of a first row and a second row each extending in a width direction orthogonal to the conveying direction of the object to be cleaned. It is characterized by being arranged so that the direction in which the cleaning liquid is sprayed is opposite.

According to the present invention, a plurality of spray nozzles are arranged in two rows each consisting of a first row and a second row, each extending in a width direction perpendicular to the conveyance direction of the object to be cleaned. It arrange | positions so that the direction which injects the washing | cleaning liquid of a row | line | column and the direction which injects the washing | cleaning liquid of a 2nd row may become reverse. By arranging the spray direction of the cleaning liquid by the spray nozzles in the first and second rows, for example, from the center to the end in the width direction of the object to be cleaned, the spray nozzles in each row Since it is only necessary to clean each half of the dimension in the width direction, sufficient cleaning can be performed.

In the present invention, the spray nozzle is
The spray angle of the cleaning liquid sprayed from the spray nozzle is arranged to have an inclination angle of 10 to 60 degrees with respect to one surface of the object to be cleaned.

According to the present invention, the spray nozzle is disposed so that the spray angle of the cleaning liquid sprayed from the spray nozzle has an inclination angle of 10 to 60 degrees with respect to one surface of the object to be cleaned. Thus, the cleaning liquid sprayed from the spray nozzle to one surface of the object to be cleaned can easily flow down to the object to be cleaned without staying on the one surface of the object to be cleaned. Therefore, the particles once removed are unlikely to remain on one surface of the object to be cleaned, and a high cleaning effect can be obtained.

According to the present invention, the cleaning device sprays the cleaning liquid for spraying the cleaning liquid for cleaning one surface of the object to be cleaned, and the cleaning liquid to which ultrasonic waves are applied toward the other surface of the object to be cleaned. An ultrasonic nozzle is provided. The spray nozzle provided for cleaning one surface of the object to be cleaned is arranged so that the cleaning liquid can be sprayed in a direction orthogonal to the conveying direction of the object to be cleaned. This reduces the pressing force of the cleaning liquid sprayed from the spray nozzle on the cleaning roller, for example, which constitutes the transport mechanism for transporting the cleaning target, so that the cleaning liquid spray pressure is high. In this case, the object to be cleaned can be transported without any trouble. Also, it is possible to easily remove fine dirt adhering to one surface of the object to be cleaned by high-pressure cleaning liquid sprayed from the spray nozzle and ultrasonic vibration applied to the cleaning liquid sprayed from the ultrasonic nozzle. Can do.

Further, according to the present invention, since a plurality of injection nozzles are provided, a cleaning device having a more excellent cleaning function can be realized.

Further, according to the present invention, the plurality of spray nozzles are arranged in two rows each consisting of a first row and a second row configured to extend in the width direction orthogonal to the conveyance direction of the object to be cleaned. It arrange | positions so that the direction which injects the washing | cleaning liquid of 1 row and the direction which injects the washing | cleaning liquid of the 2nd row may be opposite. By arranging the spray direction of the cleaning liquid by the spray nozzles in the first and second rows, for example, from the center to the end in the width direction of the object to be cleaned, the spray nozzles in each row Since it is only necessary to clean each half of the dimension in the width direction, sufficient cleaning can be performed.

According to the invention, the spray nozzle is disposed such that the spray angle of the cleaning liquid sprayed from the spray nozzle has an inclination angle of 10 to 60 degrees with respect to one surface of the object to be cleaned. Thus, the cleaning liquid sprayed from the spray nozzle to one surface of the object to be cleaned can easily flow down to the object to be cleaned without staying on the one surface of the object to be cleaned. Therefore, the particles once removed are unlikely to remain on one surface of the object to be cleaned, and a high cleaning effect can be obtained.

FIG. 1 is a diagram showing a simplified configuration of a cleaning device 21 according to an embodiment of the present invention, and FIG. 2 is a plan view showing a configuration of a high-pressure jet cleaning unit 25 provided in the cleaning device 21 shown in FIG. It is. The cleaning device 21 of the present embodiment is a single-wafer high-pressure jet cleaning device, and is used for cleaning an object to be cleaned such as a glass substrate for a liquid crystal display panel.

The cleaning device 21 includes a loader 22 that accommodates a cassette 29a that stores a glass substrate 28 to be cleaned, a scrub cleaning unit 23 that includes two pairs of brushes 30 for cleaning the glass substrate 28, and a first ultrasonic nozzle. The cleaning liquid is removed from the surface of the glass substrate 28 by the ultrasonic cleaning section 24 including the cleaning nozzle 31 and the cleaning liquid supply nozzle 32, the high-pressure jet cleaning section 25 including the jet nozzle 33 and the second ultrasonic nozzle 34, and the air knife 35. And a drying unit 26 for drying, and an unloader 27 for housing a cassette 29b for housing the glass substrate 28 that has been cleaned. Further, between the loader 22 and the unloader 27 of the cleaning device 21, a plurality of transport rollers 36 are rotatably supported by the device main body 37 of the cleaning device 21. These transport rollers 36 are driven to rotate around an axis by a drive source (not shown), and the glass substrate 28 extracted from the cassette 29a and placed on the transport rollers 36 is moved in the direction indicated by the arrow 38 in FIG. The load is transported from the loader 22 to the unloader 27, which is the determined transport direction.

The cassette 29a is a container having an internal space configured in a shelf shape, and accommodates the glass substrate 28 that is received in the cleaning process. The two pairs of brushes 30 provided in the scrub cleaning unit 23 have their rotation axes extending in a direction perpendicular to the conveyance direction of the glass substrate 28, that is, the direction of the arrow 38, and are rotatably supported by the apparatus main body 37. Each pair of brushes 30 is arranged so that the glass substrate 28 conveyed by the conveying roller 36 can pass between the brushes. Although not shown, the scrub cleaning unit 23 includes a cleaning liquid supply unit that supplies a cleaning liquid to the brush 30 described above.

One surface 28a (hereinafter simply referred to as surface 28a) of the glass substrate 28 to be cleaned of the ultrasonic cleaning unit 24 is spaced from the surface 28a in a direction perpendicular to the conveyance direction of the glass substrate 28. A cleaning liquid supply nozzle 32 is provided to extend to the other surface 28b (hereinafter referred to as the back surface 28b for convenience) of the glass substrate 28 and spaced from the back surface 28b in a direction perpendicular to the conveying direction of the glass substrate 28. A first ultrasonic nozzle 31 is provided so as to extend and face the cleaning liquid supply nozzle 32. The cleaning liquid supply nozzle 32 ejects the cleaning liquid toward the surface 28 a of the glass substrate 28. The first ultrasonic nozzle 31 applies ultrasonic waves to the cleaning liquid ejected from the nozzle holes by an ultrasonic transducer (not shown), and applies ultrasonic vibrations to the glass substrate 28 via the cleaning liquid sprayed on the glass substrate 28. Give and promote cleaning.

In the high-pressure jet cleaning unit 25 shown in an enlarged view in FIG. 2, two jet nozzles, ie, a first jet nozzle 33a and a second jet nozzle 33b, are provided as the jet nozzles 33. In addition, when generically naming a jet nozzle, it represents without attaching an alphabetic subscript. The jet nozzle 33 is formed on the surface 28 of the glass substrate 28.
On the a side, the width direction orthogonal to the transport direction (arrow 38 direction) of the glass substrate 28 (
It arrange | positions so that the washing | cleaning liquid 39 can be injected in the arrow 40 direction shown in FIG. Although the width dimension of the nozzle hole of the jet nozzle 33 (dimension in the direction parallel to the transport direction) may be arbitrarily selected, for example, the transport speed of the glass substrate 28 is 180.
When it is 0 mm / min, 30 mm is selected. When the width dimension of the nozzle hole is 30 mm, the dimension in the direction parallel to the transport direction of the jet nozzle 33 itself is about 80 mm.
Thus, the size of the jet nozzle 33 can be reduced.

Further, the two first and second jet nozzles 33 a and 33 b are arranged so that the spray angle of the cleaning liquid 39 is in the range of 10 to 60 degrees with respect to the surface 28 a of the glass substrate 28.

A second ultrasonic nozzle 34 is provided on the back surface 28 b side of the glass substrate 28 so as to face the jet nozzle 33. The position at which the cleaning liquid sprayed from the second ultrasonic nozzle 34 is sprayed onto the back surface 28b of the glass substrate 28 is the surface 28 of the glass substrate 28 from the first and second jet nozzles 33a, 33b.
This corresponds to the position where the cleaning liquid 39 is sprayed on a. By disposing the second ultrasonic nozzle 34 as described above, the cleaning action by the cleaning liquid 39 ejected from the jet nozzle 33 and the vibration action by the ultrasonic wave applied to the cleaning liquid ejected from the second ultrasonic nozzle 34. And can be sufficiently removed even particles having a small particle diameter.

The drying unit 26 is provided with an air knife 35 that is spaced from the surface 28a of the glass substrate 28 and extends in a direction perpendicular to the transport direction. The air knife 35 blows high-pressure air against the surface 28a of the glass substrate 28, whereby the surface 28
The cleaning liquid remaining on a is removed and the surface 28a is dried. The cassette 29b is a container configured in the same manner as the cassette 29a described above, and accommodates the glass substrate 28 that has been cleaned and dried.

Hereinafter, a series of cleaning operations for cleaning the glass substrate 28 by the cleaning device 21 will be described. The glass substrate 28 to be cleaned is a cassette 29a accommodated in the loader 22.
Extracted from the scrub washing unit 23. In the scrub cleaning unit 23, the front and back surfaces 28a and 28b of the glass substrate 28 are cleaned by passing between the brushes 30 which are supplied with the cleaning liquid from the cleaning liquid supply means and are rotationally driven.

The glass substrate 28 cleaned by the scrub cleaning unit 23 is transported to the ultrasonic cleaning unit 24 by the transport roller 36. In the ultrasonic cleaning unit 24, when the glass substrate 28 is conveyed between the cleaning liquid supply nozzle 32 and the first ultrasonic nozzle 31 provided to face each other, the cleaning liquid is supplied from the cleaning liquid supply nozzle 32 to the surface 28 a of the glass substrate 28. The ultrasonic vibration is applied to the back surface 28b of the glass substrate 28 through the cleaning liquid sprayed from the first ultrasonic nozzle 31 to remove particles having a particle size exceeding 3 μm from the surface 28a of the glass substrate 28. Is done.

The glass substrate 28 cleaned by the ultrasonic cleaning unit 24 is transported to the high-pressure jet cleaning unit 25 by the transport roller 36. In the high-pressure jet cleaning unit 25, when the glass substrate 28 is transported between the jet nozzle 33 and the second ultrasonic nozzle 34 provided to face each other, the surface 28 a of the glass substrate 28 is transferred from the jet nozzle 33 to the glass substrate 28. The cleaning liquid 39 is sprayed in the width direction. On the other hand, on the back surface 28b of the glass substrate 28, ultrasonic waves are passed through the cleaning liquid sprayed from the second ultrasonic nozzle 34 to a position corresponding to the position where the cleaning liquid 39 is sprayed from the jet nozzle 33 on the front surface 28a side. Vibration is added. Thus, the cleaning liquid 39 sprayed on the front surface 28a and the ultrasonic vibration applied to the back surface 28b via the cleaning liquid,
Particles having a particle diameter of 3 μm or less are removed from the surface 28a of the glass substrate 28.

The glass substrate 28 cleaned by the high-pressure jet cleaning unit 25 is transported to the drying unit 26 by the transport roller 36. In the drying unit 26, the glass substrate 28 is dried by removing the cleaning liquid 39 remaining on the surface 28 a by the air knife 35, transported to the unloader 27 after being dried and accommodated in the cassette 29 b, and a series of cleaning operations is completed. .

FIG. 3 is a plan view showing a configuration of the high-pressure jet cleaning unit 51 provided in the cleaning apparatus according to the second embodiment of the present invention. The high-pressure jet cleaning unit 51 provided in the cleaning device of the present embodiment is the high-pressure jet cleaning unit 25 provided in the cleaning device 21 of the first embodiment.
The corresponding parts are denoted by the same reference numerals and the description thereof is omitted. What should be noted in the high-pressure jet cleaning section 51 of the present embodiment is that four jet nozzles 52 of third to sixth jet nozzles 52a, 52b, 52c, and 52d are provided.

An arrow 40 in which the jet direction of the cleaning liquid 39 is perpendicular to the transport direction of the jet nozzle 52.
When arranged in the direction, the effective cleaning distance of one jet nozzle is 150
Since it is ˜200 mm, a cleaning apparatus including the four jet nozzles 52 as in the present embodiment is suitably used for cleaning the glass substrate 28 having a large dimension in the width direction.

FIG. 4 is a plan view showing a configuration of the high-pressure jet cleaning unit 53 provided in the cleaning apparatus according to the third embodiment of the present invention. The high-pressure jet cleaning unit 53 provided in the cleaning device of the present embodiment is the high-pressure jet cleaning unit 25 provided in the cleaning device 21 of the first embodiment.
The corresponding parts are denoted by the same reference numerals and the description thereof is omitted. It should be noted in the high-pressure jet cleaning section 53 of the present embodiment that the four seventh to tenth jet nozzles 54a, 54b, 54c, 54d are provided on the glass substrate 28.
First row 55 and second row 5 configured to extend in the width direction orthogonal to the transport direction of
6 in the direction of the arrow 57 for injecting the cleaning liquid 39 of the seventh and eighth jet nozzles 54 a and 54 b constituting the first row 55, and the ninth and ninth rows constituting the second row 56. 10 jet nozzles 54c and 54d are arranged so that the direction of the arrow 58 for injecting the cleaning liquid 39 is opposite.

A third ultrasonic nozzle 59 is provided on the back surface 28 b side of the glass substrate 28 so as to face the first row 55. The position where the third ultrasonic nozzle 59 is disposed corresponds to a position where the cleaning liquid 39 sprayed from the two seventh and eighth jet nozzles 54a and 54b provided in the first row 55 is sprayed on the surface 28a. Furthermore, another fourth ultrasonic nozzle 60 is provided on the back surface 28 b side of the glass substrate 28 so as to face the second row 56. The position where the fourth ultrasonic nozzle 60 is disposed corresponds to the position where the cleaning liquid 39 sprayed from the two ninth and tenth jet nozzles 54c and 54d provided in the second row 56 is sprayed on the surface 28a. The third and fourth ultrasonic nozzles 59 and 60 arranged in this way can effectively apply ultrasonic vibration to the glass substrate 28 as in the first embodiment.

Cleaning liquid 39 by the seventh and eighth jet nozzles 54a, 54b in the first row 55
The spray direction of the cleaning liquid 39 by the ninth and tenth jet nozzles 54c and 54d in the second row 56 is selected from the center of the glass substrate 28 in the width direction toward one end. The seventh and eighth jet nozzles 54a in the first row 55 are selected by selecting from the center in the width direction of the substrate 28 toward the other end.
, 54b and the ninth and tenth jet nozzles 54c, 54d in the second row 56 are
It is only necessary to clean each half of the dimension in the width direction of the glass substrate 28. Therefore, the cleaning apparatus provided with such a high-pressure jet cleaning unit 53 can be suitably used for cleaning the glass substrate 28 having a large width direction dimension, and can perform sufficient cleaning.

It is a figure which simplifies and shows the structure of the washing | cleaning apparatus 21 which is one Embodiment of this invention. It is a top view which shows the structure of the high pressure jet washing | cleaning part 25 with which the washing | cleaning apparatus 21 shown in FIG. 1 is equipped. It is a top view which shows the structure of the high pressure jet washing | cleaning part 51 with which the washing | cleaning apparatus which is 2nd Embodiment of this invention is equipped. It is a top view which shows the structure of the high pressure jet washing | cleaning part 53 with which the washing | cleaning apparatus which is 3rd Embodiment of this invention is equipped. It is a figure which simplifies and shows the structure of the conventional high-pressure jet cleaning apparatus 1. It is a top view which shows the washing | cleaning state of the glass substrate 2 in the high pressure jet washing | cleaning part 12. FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 21 Cleaning apparatus 22 Loader 23 Scrub cleaning part 24 Ultrasonic cleaning part 25, 51, 53 High-pressure jet cleaning part 26 Drying part 27 Unloader 28 Glass substrate 30 Brush 31 First ultrasonic nozzle 32 Cleaning liquid supply nozzle 33, 52, 54 Jet nozzle 34 Second ultrasonic nozzle 35 Air knife 36 Conveying roller 39 Cleaning liquid 55 First row 56 Second row 59 Third ultrasonic nozzle 60 Fourth ultrasonic nozzle

Claims (4)

In a cleaning apparatus for cleaning one surface of an object to be cleaned that is transported in a predetermined transport direction with a cleaning liquid sprayed from a spray nozzle,
The spray nozzle is
The surface to be cleaned of the object to be cleaned is arranged so that the cleaning liquid can be sprayed in a direction orthogonal to the transport direction of the object to be cleaned,
The cleaning apparatus according to claim 1, further comprising an ultrasonic nozzle that ejects a cleaning liquid to which ultrasonic waves are applied toward the other surface of the object to be cleaned. The spray nozzle is
The cleaning apparatus according to claim 1, wherein a plurality of cleaning apparatuses are provided. A plurality of the injection nozzles are provided,
The first row and the second row are arranged in two rows consisting of a first row and a second row each extending in a width direction orthogonal to the conveying direction of the object to be cleaned. The cleaning apparatus according to claim 2, wherein the cleaning apparatus is disposed so that a direction in which the cleaning liquid is sprayed is opposite. The spray nozzle is
The spray angle of the cleaning liquid sprayed from the spray nozzle is arranged to have an inclination angle of 10 to 60 degrees with respect to one surface of the object to be cleaned. A cleaning apparatus according to claim 1.

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