JP2011067782A - Apparatus for treating substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for treating a substrate capable of supplying a treating liquid effectively throughout the surface of the substrate without consuming a great amount of the treating liquid. <P>SOLUTION: Liquid-luring members 71 are arranged along the direction of conveying a glass substrate 100 in the vicinity of the end edges of the glass substrate 100 on both sides in the conveying direction of the glass substrate 100 which is conveyed by conveying rollers 9. The distance D between the end edge of the glass substrate 100 which is conveyed by the conveying rollers 9 and the liquid-luring member 71 is not greater than 2 mm. Furthermore, the height position of the top surface of the liquid-luring member 71 is higher than a height position of the top surface of the glass substrate 100 by H. This H value is favorably not less than a film thickness of the treating liquid supplied onto the surface of the glass substrate 100 from a nozzle 2 for delivering the treating liquid. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention provides a substrate processing for processing a substrate such as a glass substrate for FPD (flat panel display) such as LCD (liquid crystal display) or PDP (plasma display), a glass substrate for organic EL, a glass substrate for photomask, etc. with a processing liquid. Relates to the device.

  For example, when manufacturing an LCD, an amorphous silicon layer is formed on a glass substrate, a natural oxide film on the surface of the silicon layer is etched, washed and dried, and then irradiated with a laser to melt and regenerate the amorphous silicon layer. Crystallized. At this time, in the etching process or the like, conventionally, a configuration in which the surface of the substrate is etched by sequentially supplying an etching solution to the surface while rotating around the vertical axis while the substrate is horizontally supported is employed. Yes. In addition, since the substrate after the etching process has strong water repellency, the cleaning liquid is supplied while rotating the etched substrate at a low speed, and the cleaning process is performed in a state where a liquid film of the cleaning liquid is formed on the entire surface by the surface tension. Then, the structure which rotates a board | substrate at high speed and removes a washing | cleaning liquid is employ | adopted (refer patent document 1).

JP2003-17461

  Due to the recent increase in size of the substrate to be processed, it is difficult to perform the etching process while rotating the substrate as in the invention described in Patent Document 1. For this reason, it has been proposed to process a substrate by supplying a processing solution such as an etching solution to the surface of the substrate while transporting the substrate in the horizontal direction.

  That is, the substrate is processed with the processing liquid by supplying the processing liquid to the surface of the substrate from the slit nozzle or the spray nozzle arranged opposite to the surface of the substrate while conveying the substrate in the horizontal direction by a plurality of conveying rollers. It is possible to do. However, when the surface of the substrate has strong liquid repellency (water repellency), the processing liquid is repelled on the surface of the substrate, which causes a problem that the processing liquid cannot be supplied to the entire surface of the substrate.

  In particular, in an etching process using an etching solution as a processing solution, the surface of the substrate becomes strongly liquid-repellent after the etching process is started, and the etching solution as the processing solution is repelled on the surface of the substrate. For this reason, it is conceivable that the processing liquid is spread over the entire surface of the substrate by supplying an extremely large amount of the processing liquid to the surface of the substrate. However, in this case, not only the processing liquid is wasted, but even when such a configuration is adopted, the processing liquid is not supplied to the entire surface of the substrate due to the surface tension of the processing liquid. It becomes difficult.

  FIG. 19A is a schematic diagram showing a state when the processing liquid is supplied to the surface of the glass substrate 100.

  As shown in this figure, when the surface of the glass substrate 100 has strong liquid repellency (water repellency), the processing liquid 101 is repelled on the surface of the substrate, and due to the action of the surface tension of the processing liquid 101, In the vicinity of the edge of the glass substrate 100, a region where the processing liquid 101 does not exist is generated. The generation of such a region is a phenomenon that occurs similarly when the processing liquid 101 flows out from the edge of the glass substrate 100 even when a large amount of the processing liquid 101 is supplied. When such a phenomenon occurs, it becomes impossible to properly process the glass substrate 100.

  The present invention has been made to solve the above problems, and provides a substrate processing apparatus capable of effectively supplying a processing liquid to the entire surface of a substrate without consuming a large amount of the processing liquid. Objective.

  According to the first aspect of the present invention, a rectangular substrate is supported in a state where its main surface is in a substantially horizontal direction, and a conveyance mechanism that conveys the substrate in a substantially horizontal direction and a processing liquid discharge port that faces downward are provided. A processing liquid discharge nozzle for supplying a processing liquid to the surface of the substrate that is extended in a direction intersecting the substrate transport direction by the transport mechanism and transported by the transport mechanism, and on both sides of the substrate in the transport direction, A surface tension is provided at a position close to or in contact with an edge of the substrate along the transport direction of the substrate, and a height position of an upper surface thereof is disposed at a position higher than a height position of the surface of the substrate. And a liquid feeding member that extends the processing liquid supplied from the processing liquid discharge nozzle to the surface of the substrate to the edge of the substrate.

  According to a second aspect of the present invention, in the first aspect of the present invention, the height position of the upper surface of the liquid gathering member is equal to or greater than the film thickness of the processing liquid supplied from the processing liquid discharge nozzle to the surface of the substrate. It is arrange | positioned in the position higher than the height position of the surface of the said board | substrate so that it may become.

  According to a third aspect of the present invention, in the invention of the second aspect, the liquid drawing member and the edge of the substrate are separated from each other, and the distance between the liquid drawing member and the edge of the substrate is 2 mm. It is as follows.

  Invention according to claim 4, in the invention described in claim 3, wherein the liquid attracting member has an elongated shape which extends along the conveying direction of the substrate, the transport direction of the substrate Fixed on both sides.

  According to a fifth aspect of the present invention, in the third aspect of the present invention, the liquid gathering member moves in synchronization with a transport speed of the substrate by the transport mechanism along the transport direction of the substrate.

  According to a sixth aspect of the present invention, in the fifth aspect of the present invention, the transport mechanism includes a transport roller that rotates while supporting the substrate from the lower surface thereof, and the liquid collecting member is wound around the transport roller. It is comprised from the endless belt made.

  A seventh aspect of the present invention is the endless belt according to the sixth aspect, wherein a plurality of the processing liquid discharge nozzles are disposed apart from each other in the substrate transport direction by the transport mechanism. A pair of liquid gathering members is provided at positions on both sides of the substrate transported by the transport mechanism at a position between the plurality of processing liquid discharge nozzles.

  The invention according to claim 8 is the invention according to claim 6, wherein a plurality of the processing liquid discharge nozzles are arranged apart from each other in the substrate transport direction by the transport mechanism, and the endless belt is provided. It constituted liquid attracting member from, and respectively corresponding to said plurality of processing liquid discharge nozzle, with the pairs disposed on both sides of the position of the substrate transported by the transport mechanism, the liquid shifting of the pairs A gap through which the processing liquid can flow is formed between the members.

  The invention according to claim 9 is the invention according to any one of claims 1 to 8, wherein the processing liquid discharge nozzle is formed between the processing liquid discharge port and the surface of the substrate transported by the transport mechanism. The distance between them is arranged at a position where the liquid film of the processing liquid discharged from the processing liquid discharge port is in a liquid-tight state, and the liquid pool of the processing liquid is held at a position facing the processing liquid discharge port. And a liquid pool holding member disposed at a position where a distance between the processing liquid discharge port and the processing liquid holding surface can form a liquid pool of the processing liquid therebetween. .

  According to the first aspect of the present invention, since the processing liquid can be extended to the edge of the substrate by the action of the liquid gathering member, even if the surface of the substrate becomes liquid repellent, It becomes possible to supply the treatment liquid effectively.

  According to the second aspect of the present invention, the processing liquid can be effectively supplied to the entire surface of the substrate while the film thickness of the processing liquid on the surface of the substrate is maintained at a desired value.

  According to the invention described in claim 3, while preventing the contact between the substrate and the liquid attracting member, by the action of surface tension, it becomes possible to supply effectively the processing liquid across the surface of the substrate.

  According to the fourth aspect of the present invention, the liquid draw member can be easily configured, and positioning thereof is facilitated.

  According to the fifth aspect of the present invention, the liquid gathering member and the substrate move in synchronization with each other, so that the effect of the surface tension on the processing liquid can be made more effective.

  According to the sixth aspect of the present invention, it is possible to use both the conveying roller and the moving mechanism of the liquid gathering member, and the liquid gathering member can be moved more easily in synchronization with the substrate.

  According to the invention of claim 7, at a position between the plurality of processing liquid discharge nozzle, by the action of the liquid attracting member, process liquid can be prevented from flowing down from the edge of the substrate. For this reason, it becomes possible to always maintain the processing liquid over the entire surface of the substrate.

  According to the eighth aspect of the present invention, the processing liquid supplied from the first processing liquid supply nozzle can be caused to flow down from the gap between the liquid gathering members. For this reason, it is possible to supply a new processing liquid from the next processing liquid supply nozzle in a state where the processing liquid supplied from the previous processing liquid supply nozzle does not exist or is reduced.

  According to the ninth aspect of the present invention, the processing liquid is applied to the entire front end portion of the surface of the substrate transported by the transport mechanism by the action of the liquid pool formed between the processing liquid discharge nozzle and the liquid pool holding member. After that, the processing liquid can be supplied to the surface of the substrate in a liquid-tight state between the processing liquid discharge nozzle and the surface of the substrate by a liquid film. For this reason, it becomes possible to supply the processing liquid more effectively over the entire surface of the substrate.

It is a side surface schematic diagram of the substrate processing apparatus concerning this invention. It is a side view which expands and shows the process and washing | cleaning unit. 6 is a plan view showing a relationship between a glass substrate 100 conveyed by a conveyance roller 9 and a liquid draw member 71. FIG. FIG. 6 is a front view showing main parts of a glass substrate 100 and a liquid draw member 71 conveyed by a conveyance roller 9. 4 is a bottom view of a processing liquid discharge nozzle 2. FIG. 3 is a schematic view showing a mechanism for supplying a processing liquid to the processing liquid discharge nozzle 2. FIG. FIG. 3 is a view showing an outline of a liquid pool holding member 3. 4 is a partial perspective view of a liquid pool holding member 3. FIG. It is a fragmentary perspective view of the liquid pool holding member 3 which concerns on other embodiment. It is a figure which shows the outline | summary of the back surface washing | cleaning part. It is explanatory drawing which shows the processing operation of the glass substrate 100 by the substrate processing apparatus which concerns on this invention. It is explanatory drawing which shows the processing operation of the glass substrate 100 by the substrate processing apparatus which concerns on this invention. It is explanatory drawing which shows the processing operation of the glass substrate 100 by the substrate processing apparatus which concerns on this invention. It is explanatory drawing which shows the processing operation of the glass substrate 100 by the substrate processing apparatus which concerns on this invention. It is explanatory drawing which shows the processing operation of the glass substrate 100 by the substrate processing apparatus which concerns on this invention. It is a side view which expands and shows the process and the washing | cleaning unit 1 in the substrate processing apparatus which concerns on 2nd Embodiment of this invention. It is a side view which expands and shows the process and the washing | cleaning unit 1 in the substrate processing apparatus which concerns on 3rd Embodiment of this invention. It is a side view which expands and shows the process and the washing | cleaning unit 1 in the substrate processing apparatus which concerns on 4th Embodiment of this invention. It is a schematic diagram which shows a state when a process liquid is supplied to the surface of the glass substrate.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic side view of a substrate processing apparatus according to the present invention. FIG. 2 is an enlarged side view showing the processing / cleaning unit 1.

  This substrate processing apparatus is for etching an oxide film formed on the surface of a silicon layer before performing laser annealing on the glass substrate 100 on which the amorphous silicon layer is formed. The substrate processing apparatus supports the glass substrate 100 in a state where its main surface is in the horizontal direction, and also includes a plurality of transport rollers 9 for transporting the glass substrate 100 in the horizontal direction, four processing / cleaning units 1a, 1b, 1c, and 1d (referred to collectively as “processing / cleaning unit 1”) and a liquid feeding member 71.

  Each processing / cleaning unit 1 includes a processing liquid discharge nozzle 2 for supplying a processing liquid to the surface of the glass substrate 100 transported by a plurality of transport rollers 9 and a processing liquid discharging nozzle 2 between the processing liquid discharge nozzles 2. A liquid pool holding member 3 for forming a liquid pool and a pair of back surface cleaning units 4 for cleaning the back surface of the glass substrate 100 are provided. With the action of the four processing / cleaning units 1a, 1b, 1c, and 1d, the processing liquid is sequentially supplied to the front surface and the back surface is cleaned with respect to the glass substrate 100 transported by the transport roller 9. Is done.

  FIG. 3 is a plan view showing a relationship between the glass substrate 100 conveyed by the conveying roller 9 and the liquid drawing member 71, and FIG. 4 is a front view showing an essential part thereof.

  The liquid gathering member 71 is disposed along the transport direction of the glass substrate 100 at a position close to or in contact with the edge of the glass substrate 100 on both sides of the transport direction of the glass substrate 100 transported by the transport roller 9. ing. As shown in FIG. 1, the liquid draw member 71 has a long shape extending along the conveyance direction of the glass substrate 100. As described above, the liquid drawing member 71 is fixed to both sides of the glass substrate 100 in the transport direction.

  More preferably, the liquid drawing member 71 is separated from the edge of the glass substrate 100 conveyed by the conveyance roller 9, and the distance D between the glass substrate 100 and the liquid drawing member 71 is 2 mm or less. . Further, the height position of the upper surface of the liquid gathering member 71 is higher than the height position of the surface of the glass substrate 100 by H. The value of H is preferably equal to or greater than the film thickness of the processing liquid supplied from the processing liquid discharge nozzle 2 to the surface of the glass substrate 100.

  By adopting such a configuration, as described later, while maintaining the film thickness of the treatment liquid on the surface of the glass substrate 100 at a desired value, the contact between the glass substrate 100 and the liquid draw member 71 is prevented. The treatment liquid can be effectively supplied to the entire surface of the glass substrate 100 by the action of the surface tension.

  In addition, as the material of the liquid collecting member 71, for example, a material made of a fluororesin is used which has chemical resistance and can ensure the cleanliness of the treatment without elution of metal ions or the like. preferable.

  Next, the configuration of the processing liquid discharge nozzle 2 in the cleaning / processing unit 1 will be described. FIG. 5 is a bottom view of the treatment liquid discharge nozzle 2.

  The treatment liquid discharge nozzle 2 has a configuration in which a large number of treatment liquid discharge ports 21 are formed on the lower surface facing the glass substrate 100 conveyed by the conveyance roller 9. These treatment liquid discharge ports 21 are arranged in a direction orthogonal to the transport direction of the glass substrate 100 transported by the transport roller 9. The processing liquid discharge port 21 has a diameter of about 0.5 mm, for example, and is 5 mm in the longitudinal direction of the processing liquid discharge nozzle 2 (a direction orthogonal to the transport direction of the glass substrate 100 transported by the transport roller 9). It is formed with a pitch of about 10 mm. The processing liquid discharge port 21 is provided over the entire width direction of the glass substrate 100 (direction orthogonal to the transport direction of the glass substrate 100 transported by the transport roller 9).

  At the time of processing the glass substrate 100, as will be described later, the processing liquid is discharged from the processing liquid discharge port 21 and supplied to the surface of the glass substrate 100. At this time, as described later, the distance between the surface of the glass substrate 100 transported to the processing liquid outlet port 21 by the transport roller 9, the process liquid of the liquid film between them was discharged from the processing liquid outlet port 21 Since it is necessary to be in a liquid-tight state, it is preferably as small as possible. On the other hand, when excessively small distance between the surface of the glass substrate 100 transported to the processing liquid outlet port 21 by the transport roller 9, there is a risk that the glass substrate 100 and the treatment liquid ejection nozzle 2 collide. While avoiding a collision with the glass substrate 100 and the processing liquid discharge nozzle 2, to a liquid-tight state by liquid film of the process liquid between the treatment liquid ejection nozzle 2 and the surface of the glass substrate 100, the treatment liquid ejection The distance D1 (see FIG. 2) between the processing liquid discharge port 21 (that is, the lower surface of the processing liquid discharge nozzle 2) in the nozzle 2 and the surface of the glass substrate 100 conveyed by the conveying roller 9 is 1 mm to 2 mm. preferable.

  Further, between the surface of the glass substrate 100 carried by the processing liquid discharge nozzle 2 and the conveying roller 9, the liquid film discharged from the treatment liquid outlet port 21 the treatment liquid in order to become a liquid-tight state The shape of the lower surface of the processing liquid discharge nozzle 2 is preferably a flat shape, or the cross-sectional shape by a plane including the transport direction and the vertical direction of the glass substrate 100 is preferably an arc shape with a convex downward. . By adopting such a shape, a liquid film of the processing liquid can be formed between the processing liquid discharge nozzle 2 and the surface of the glass substrate 100, and a liquid-tight state can be easily achieved. . In addition, in order to make the lower surface of the treatment liquid discharge nozzle 2 have an arc shape with a downward projection as described above, the treatment liquid discharge nozzle 2 has, for example, a plurality of treatment liquid discharge ports formed at the lower end thereof. What is necessary is just to comprise from a pipe. The material of the treatment liquid discharge nozzle 2 is preferably made of, for example, a fluororesin that can ensure the cleanliness of the treatment without elution of metal ions or the like.

  FIG. 6 is a schematic view showing a mechanism for supplying the processing liquid to the processing liquid discharge nozzle 2.

  As illustrated in FIG. 6A, the processing liquid discharge nozzle 2 is connected to a storage tank 22 that stores the processing liquid via a pipe line 23. The storage tank 22 is disposed at a position above the processing liquid discharge nozzle 2, and an open / close valve 24 is disposed in the pipe line 23. For this reason, the processing liquid in the storage tank 22 is discharged from the processing liquid discharge port 21 of the processing liquid discharge nozzle 2 by opening the on-off valve 24.

  FIG. 6B shows another embodiment of a mechanism for supplying a processing liquid to the processing liquid discharge nozzle 2. In this embodiment, the processing liquid discharge nozzle 2 is connected to a storage tank 22 that stores the processing liquid via a pipe line 23, and a pump 25 is disposed in the pipe line 23. In this embodiment, the processing liquid in the storage tank 22 is discharged from the processing liquid discharge port 21 of the processing liquid discharge nozzle 2 by driving the pump 25.

  In addition, in order to prevent the processing liquid from flowing down when the glass substrate 100 is not processed, the processing liquid discharge port 21 in the processing liquid discharge nozzle 2 is in a state where no pressure is applied to the processing liquid supplied thereto. It is preferable that the processing liquid does not flow down from the processing liquid discharge port 21 due to the surface tension of the liquid. That is, when the on-off valve 24 shown in FIG. 6 (a) is closed or the pump 25 in FIG. 6 (b) is not driven, processing is performed from the processing liquid discharge port 21 due to the surface tension of the processing liquid. The liquid does not flow down. The size of the processing liquid discharge port 21 depends on the viscosity of the processing liquid, but is preferably about 0.5 mm as described above.

  However, instead of the multiple treatment liquid discharge ports 21 arranged in the transport direction of the glass substrate 100, slit-shaped discharge ports extending in the transport direction of the glass substrate 100 may be employed.

  An etching solution as a processing solution is supplied from the four processing / cleaning units 1a, 1b, 1c, and 1d described above. As such an etchant, for example, hydrofluoric acid (hydrofluoric acid / HF) is used. In order to intentionally form a uniform oxide film on the surface of the glass substrate 100, the etching solution is used from the processing / cleaning unit 1a, from the processing / cleaning unit 1d, or from the processing / cleaning units 1a and 1d. Instead, ozone water may be supplied.

  As a preferred embodiment, for example, an embodiment in which hydrofluoric acid is supplied to the glass substrate 100 from all of the four processing / cleaning units 1a, 1b, 1c, and 1d described above, and four processing / Of the cleaning units 1a, 1b, 1c and 1d, hydrofluoric acid is supplied from the three upstream processing / cleaning units 1a, 1b and 1c in the conveying direction of the glass substrate 100, and the most downstream processing / cleaning unit 1d. Has an embodiment in which ozone water is supplied. However, an etchant other than hydrofluoric acid or ozone water may be used.

  Next, the configuration of the liquid pool holding member 3 in the cleaning / processing unit 1 will be described. FIG. 7 is a view showing an outline of the liquid pool holding member 3, FIG. 7A is a longitudinal sectional view of the liquid pool holding member 3, and FIG. 7B is a partial plan view of the liquid pool holding member 3. It is. FIG. 8 is a partial perspective view of the liquid pool holding member 3.

  The liquid pool holding member 3 is for forming a liquid pool for the processing liquid between the processing liquid discharge nozzles 2. The liquid pool holding member 3 includes a processing liquid holding surface 31 that holds a liquid pool of processing liquid at a position facing the processing liquid discharge port 21 of the processing liquid discharge nozzle 2. The treatment liquid holding surface 31 is provided with a recess 32 for holding a treatment liquid pool.

  The recess 32 is used to hold a liquid pool of the processing liquid in the processing liquid holding surface 31 suitably. That is, as the material for the liquid pool holding member 3, for example, a material made of a fluororesin, for example, similar to the processing liquid discharge nozzle 2, which can ensure the cleanliness of processing without elution of metal ions or the like, is adopted. Is preferred. Here, the fluororesin has strong liquid repellency that repels the treatment liquid. For this reason, it becomes easy for the processing liquid to flow down from the processing liquid holding surface 31 in the liquid pool holding member 3. In order to prevent such a flow-down, a recess 32 is formed in the treatment liquid holding surface 31. In addition, when using resin, such as a vinyl chloride, as the material of the liquid pool holding member 3, this recessed part 32 may be abbreviate | omitted.

  As shown in FIGS. 7 and 8, the recess 32 has a shape extending in the liquid reservoir retaining member 3 in the longitudinal direction (direction perpendicular to the conveying direction of the glass substrate 100 transported by the transport roller 9). The recess 32 is formed over the entire width direction of the glass substrate 100 (direction perpendicular to the transport direction of the glass substrate 100 transported by the transport roller 9). However, the recess 32 is not limited to such a shape.

  FIG. 9 is a partial perspective view of a liquid pool holding member 3 according to another embodiment.

  As shown in FIG. 9, a plurality of concave portions 33 arranged in a direction orthogonal to the conveyance direction of the glass substrate 100 conveyed by the conveyance roller 9 may be used. In this case, the treatment liquid discharge port 21 in the treatment liquid discharge nozzle 2 and the recess 33 of the liquid pool holding unit 3 do not necessarily have to face each other. The treatment liquid discharge port 21 in the treatment liquid discharge nozzle 2 and the recess 33 of the liquid pool holding unit 3 may be at the same position with respect to the conveyance direction of the glass substrate 100 conveyed by the conveyance roller 9.

  In a stage before supplying the processing liquid to the glass substrate 100, as will be described later, the processing liquid is discharged from the processing liquid discharge port 21 of the processing liquid discharge nozzle 2, and processing of the processing liquid discharge nozzle 2 and the liquid pool holding unit 3 is performed. It is necessary to form a liquid pool for the processing liquid between the liquid holding surface 31 and the liquid holding surface 31. For this purpose, it is preferable that the distance between the processing liquid discharge nozzle 2 and the processing liquid holding surface 31 of the liquid pool holding unit 3 is as small as possible within a range where the glass substrate 100 can pass. On the other hand, if the distance between the liquid pool holding unit 3 and the back surface of the glass substrate 100 transported by the transport roller 9 is excessively small, the glass substrate 100 and the liquid pool holding unit 3 may collide. In order to form a liquid pool of the processing liquid between the processing liquid discharge nozzle 2 and the liquid pool holding member 3 while avoiding a collision between the glass substrate 100 and the liquid pool holding unit 3, The distance D2 (see FIG. 2) between the treatment liquid holding surface 31 and the back surface of the glass substrate 100 transported by the transport roller 9 is preferably 1 mm to 2 mm.

  The liquid reservoir of the processing liquid formed between the processing liquid discharge nozzle 2 and the processing liquid holding surface 31 of the liquid pool holding section 3 is the processing liquid holding surface 31 of the processing liquid discharge nozzle 2 and the liquid pool holding section 3. It is not necessary to be formed in the whole area between. For example, there may be regions where liquid pools are not partially formed in various regions in the longitudinal direction of the treatment liquid discharge nozzle 2. If a liquid pool is formed in a certain region between the processing liquid discharge nozzle 2 and the processing liquid holding surface 31 of the liquid pool holding unit 3, the tip of the glass substrate 100 conveyed by the conveyance roller 9 becomes a liquid pool. When entering, the liquid pool formed in a certain area between the processing liquid discharge nozzle 2 and the processing liquid holding surface 31 of the liquid pool holding section 3 is processed by the processing liquid discharge nozzle 2 and the liquid pool holding section 3. The entire area between the liquid holding surface 31 and the liquid holding surface 31 can be expanded.

  Next, the configuration of the back surface cleaning unit 4 in the cleaning / processing unit 1 will be described. FIG. 10 is a diagram showing an outline of the back surface cleaning unit 4, FIG. 10A is a partial perspective view of the back surface cleaning unit 4, and FIG. 10B is a longitudinal sectional view of the back surface cleaning unit 4.

  The back surface cleaning unit 4 is for cleaning the back surface of the glass substrate 100. As shown in FIGS. 1 and 2, the back surface cleaning unit 100 is provided along the transport direction of the glass substrate 100 transported by the transport roller 9 in each of the four processing / cleaning units 1a, 1b, 1c, and 1d. A pair is arranged. The upper surface of the back surface cleaning unit 4 is a cleaning liquid holding surface 42 that holds a pool of cleaning liquid. The cleaning liquid holding surface 42 is provided with a concave portion 43 for holding a cleaning liquid reservoir, and a cleaning liquid discharge port 41 is formed in the concave portion 43.

  The recess 43 is preferably used for holding a cleaning liquid pool on the cleaning liquid holding surface 42. That is, as the material of the back surface cleaning unit 4, metal ions or the like are not eluted, and the cleanliness of the processing can be ensured. It is preferable to employ one. Here, the fluororesin has strong liquid repellency that repels the cleaning liquid. For this reason, the cleaning liquid easily flows down from the cleaning liquid holding surface 42 in the back surface cleaning unit 4. In order to prevent such a flow-down, a recess 43 is formed in the cleaning liquid holding surface 42. In addition, when using resin, such as a vinyl chloride, as a material of the back surface washing | cleaning part 4, you may abbreviate | omit this recessed part 43. FIG.

  As shown in FIG. 10A, the recess 43 has a shape extending in the longitudinal direction of the back surface cleaning unit 4 (direction orthogonal to the transport direction of the glass substrate 100 transported by the transport roller 9). The recess 43 is formed over the entire width direction of the glass substrate 100 (direction perpendicular to the transport direction of the glass substrate 100 transported by the transport roller 9). A plurality of cleaning liquid discharge ports 41 are arranged along the recess 43.

  During the processing of the glass substrate 100, as will be described later, the cleaning liquid is discharged from the cleaning liquid discharge port 41 and supplied to the back surface of the glass substrate 100. At this time, as will be described later, the distance between the cleaning liquid holding surface 42 and the back surface of the glass substrate 100 conveyed by the conveying roller 9 is in a liquid-tight state due to the liquid film of the cleaning liquid discharged from the cleaning liquid discharge port 41 between them. Is preferably as small as possible. On the other hand, when excessively small distance between the rear surface of the glass substrate 100 carried by the back surface cleaning unit 4 and the conveying roller 9, there is a possibility that the glass substrate 100 and the back section 4 collide. In order to avoid a collision between the glass substrate 100 and the back surface cleaning unit 4, a back surface of the cleaning solution holding surface 42 of the back surface cleaning unit 4 and the back surface of the glass substrate 100 are in a liquid-tight state by a cleaning liquid film. The distance D2 (see FIG. 2) between the cleaning liquid holding surface 42 in the cleaning unit 4 and the back surface of the glass substrate 100 transported by the transport roller 9 is preferably 1 mm to 2 mm.

  Next, a processing operation for processing the glass substrate 100 by the substrate processing apparatus described above will be described. 11 to 15 are explanatory views showing the processing operation of the glass substrate 100 by the substrate processing apparatus according to the present invention. 11 to 15, only the upstream-side back surface cleaning unit 4 among the pair of back surface cleaning units 4 in the processing / cleaning unit 1 is shown. The other back surface cleaning unit 4 also performs the same operation as the upstream side back surface cleaning unit 4.

  Before the plurality of conveying rollers 9 is the tip of the glass substrate 100 is conveyed in the horizontal direction to reach the processing and cleaning unit 1, as shown in FIG. 11, a small amount of the processing liquid discharge nozzle 2 of treatment liquid outlet port 21 The treatment liquid is discharged, and a treatment liquid reservoir 51 is formed in advance between the treatment liquid discharge port 21 of the treatment liquid discharge nozzle 2 and the treatment liquid holding surface 31 of the liquid reservoir holding unit 3. A cleaning liquid reservoir 61 is formed on the cleaning liquid holding surface 42 of the back surface cleaning unit 4.

  In this state, when the conveyance of the glass substrate 100 is further continued by the conveyance roller 9, the tip of the glass substrate 100 is formed between the processing liquid discharge nozzle 2 and the liquid pool holding member 3 as shown in FIG. It enters the liquid reservoir 51 of the processing liquid. When the tip of the glass substrate 100 reaches the liquid reservoir 51 of the processing liquid, the processing liquid is discharged from the processing liquid discharge nozzle 2. The discharge of the treatment liquid from the treatment liquid discharge nozzle 2 may be started before the tip of the glass substrate 100 reaches the treatment liquid reservoir 51, or the apparatus is operated for the treatment of the glass substrate 100. During processing, the processing liquid may be continuously discharged.

  When the glass substrate 100 is further transported in the horizontal direction in this state, as shown in FIG. 13, a liquid film 52 of the processing liquid is formed between the processing liquid discharge nozzle 2 and the surface of the glass substrate 100, A space between the processing liquid discharge nozzle 2 and the surface of the glass substrate 100 is in a liquid-tight state by a liquid film 52 of the processing liquid. That is, after the front end of the glass substrate 100 has entered the liquid reservoir 51 of the processing liquid formed between the processing liquid discharge nozzle 2 and the liquid pool holding member 3, the surface tension of the processing liquid causes the processing liquid discharge nozzle 2 to The discharged processing liquid is drawn and spread over the entire surface of the glass substrate 100 without being repelled there. At this time, even if there are regions where liquid pools are not partially formed in some regions in the longitudinal direction of the treatment liquid discharge nozzle 2, as the glass substrate 100 continues to move, these regions The liquid is filled with the processing liquid, and the space between the processing liquid discharge nozzle 2 and the surface of the glass substrate 100 is liquid-tight by the liquid film 52 of the processing liquid. Here, the liquid-tight state refers to a state where the space between them is filled with the processing liquid.

  By the glass substrate 100 is conveyed in a horizontal direction in a state in which a liquid-tight by a liquid film 52 of the treatment liquid between the treatment liquid ejection nozzle 2 and the glass substrate 100, as shown in FIG. 14, The processing liquid is supplied to the entire surface of the glass substrate 100 while the liquid film 52 of the processing liquid is in a liquid-tight state between the processing liquid discharge nozzle 2 and the surface of the glass substrate 100.

  When the front end of the glass substrate 100 enters the processing liquid pool 51 formed between the processing liquid discharge nozzle 2 and the liquid holding member 3, as shown in FIG. The processing solution also reaches the side. This processing liquid is cleaned by the back surface cleaning unit 4.

  That is, as shown in FIG. 14, before the tip of the glass substrate 100 conveyed in the horizontal direction reaches the back surface cleaning unit 4, the cleaning liquid holding surface 42 (see FIG. 10) in the back surface cleaning unit 4 A liquid film 61 of the cleaning liquid discharged from the outlet 41 is formed. In this state, when the glass substrate 100 is further conveyed and passes through the back surface cleaning unit 4, as shown in FIG. 15, a liquid film of the cleaning liquid is formed between the back surface of the glass substrate 100 and the cleaning liquid holding surface 42 of the back surface cleaning unit 4. 62 is formed, and the space between the back surface of the glass substrate 100 and the back surface cleaning unit 4 is liquid-tight by the liquid film 62 of the cleaning liquid.

  If the conveyance of the glass substrate 100 is continued in such a state, a liquid film 52 of the processing liquid is formed on the surface of the glass substrate 100. Then, as shown in FIG. 19B, the liquid film 52 is expanded to the edge of the glass substrate 100 by the action of surface tension by the liquid gathering member 71. Thereby, it becomes possible to effectively supply the processing liquid to the entire surface of the glass substrate 100 while maintaining the film thickness of the processing liquid on the surface of the glass substrate 100 at a desired value.

  In such a state, by continuing the conveyance of the glass substrate 100, a liquid film 52 of the processing liquid is formed on the surface of the glass substrate 100, and the processing liquid is supplied to the entire surface. A cleaning liquid film 62 is formed and the entire surface is cleaned.

  As described above, in the substrate processing apparatus according to the present invention, the liquid film 52 of the processing liquid is formed between the processing liquid discharge nozzle 2 and the surface of the glass substrate 100 by the action of the liquid gathering member 71. the processing solution from the supplying extend across the surface of the glass substrate 100, when a very small amount of processing solution used, it becomes possible to supply the processing liquid to the entire surface of the glass substrate 100.

  Further, as shown in FIG. 1, in this substrate processing apparatus, four processing / cleaning units 1 having the above-described configuration are arranged in a line. The glass substrate 100 transported in the horizontal direction by the plurality of transport rollers 9 is sequentially supplied with processing liquid by these four processing / cleaning units 1a, 1b, 1c, and 1d, and the back surface is cleaned. For this reason, even in the case of an etching process using an etching liquid as a processing liquid, even when the surface of the glass substrate 100 becomes strongly liquid repellent after the etching process is started, the processing liquid discharge nozzle 2 and the glass substrate 100 are used. Is made liquid-tight with the liquid film 52 of the processing liquid to prevent the etching liquid from being repelled, and this operation is performed using four processing / cleaning units 1a, 1b, 1c, and 1d. By repeating the process four times, an etching solution or the like as a processing solution can be reliably supplied to the surface of the glass substrate 100, and the backside cleaning of the glass substrate 100 can be reliably performed accordingly.

  In this embodiment, the single liquid collecting member 71 is disposed over the entire area of the four processing / cleaning units 1a, 1b, 1c, and 1d, but each processing / cleaning unit 1a, 1b, 1c is disposed. You may make it arrange | position a liquid gathering member separately for every 1d.

  Next, another embodiment of the present invention will be described. FIG. 16 is an enlarged side view showing the processing / cleaning unit 1 in the substrate processing apparatus according to the second embodiment of the present invention. In addition, about the member similar to 1st Embodiment mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted.

  In 1st Embodiment mentioned above, the liquid drawing member 71 which has the elongate shape extended along the conveyance direction of the glass substrate 100 is used. And this liquid gathering member 71 is being fixed to the both sides of the conveyance direction in the glass substrate 100. FIG. On the other hand, in the substrate processing apparatus according to the second embodiment, the liquid feeding member 72 is transported by using the liquid feeding member 72 composed of an endless belt wound around the transporting roller 9. It is configured to move in synchronization with the conveyance speed of the glass substrate 100 by the roller 9.

  That is, as shown in FIG. 16, the liquid drawing member 72 formed of an endless belt is wound around the three conveying rollers 9. Of the three transport rollers 9, another transport member 72 is wound around the transport rollers 9 positioned at both ends of the liquid transport member 72. Accordingly, a plurality of liquid drawing members 72 are alternately arranged on the side of the glass substrate 100, and the plurality of liquid drawing members 72 are extended along the conveyance direction of the glass substrate 100. .

  Thus, by using the constructed liquid attracting member 72 from the endless belt wound around the conveying roller 9, to move the liquid attracting member 72 in synchronization with the conveying speed of the glass substrate 100 by the transport roller 9 In the case of adopting the configuration, it is possible to make the action of the surface tension on the treatment liquid generated between the liquid drawing member 72 and the glass substrate 100 more effective.

  In addition, when the plurality of liquid drawing members 72 are arranged in a staggered manner in this way, in order to set the distance D between the glass substrate 100 and the liquid drawing member 71 shown in FIGS. 2 and 3 to 2 mm or less, the liquid drawing member The width of 72 itself needs to be 2 mm or less.

  Next, still another embodiment of the present invention will be described. FIG. 17 is an enlarged side view showing the processing / cleaning unit 1 in the substrate processing apparatus according to the third embodiment of the present invention. In addition, about the member similar to 1st Embodiment mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted.

  In the first and second embodiments described above, a configuration is adopted in which the space between the processing liquid discharge nozzle 2 and the glass substrate 100 is in a liquid-tight state by the liquid film of the processing liquid, and further, a liquid pool for forming a liquid pool. The holding member 3 is used. On the other hand, in the third embodiment, the liquid pool holding member 3 is omitted, and a relatively large amount of processing liquid is supplied to the surface of the glass substrate 100 to form a liquid film 52 of the processing liquid. A treatment liquid discharge nozzle 82 is used.

  In the third embodiment shown in FIG. 17, as in the second embodiment shown in FIG. 16, a liquid draw member 73 composed of an endless belt is wound around the three conveying rollers 9. . These liquid-feeding members 73 are disposed at positions on both sides of the glass substrate 100 that is transported by the transport roller 9 at positions between the processing liquid discharge nozzles 82.

  In the case of adopting such a configuration, the liquid film 52 of the processing liquid flows down from the edge of the glass substrate 100 by the action of the liquid drawing member 73 at a position between the plurality of processing liquid discharge nozzles 82. Can be prevented. For this reason, it becomes possible to always maintain the processing liquid over the entire surface of the glass substrate 100. Therefore, even if discharge a relatively large amount of the processing liquid from the processing liquid discharge nozzle 82, which was maintained on the surface of the glass substrate 100 by liquid-attracting member 73, supply effectively the processing liquid across the surface of the glass substrate 100 It becomes possible to do.

  Next, still another embodiment of the present invention will be described. FIG. 18 is an enlarged side view showing the processing / cleaning unit 1 in the substrate processing apparatus according to the fourth embodiment of the present invention. In addition, about the member similar to 3rd Embodiment mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted.

  In the fourth embodiment, as in the case of the third embodiment, the liquid pool holding member 3 is omitted, and a relatively large amount of processing liquid is supplied to the surface of the glass substrate 100 to form a liquid film 52 of the processing liquid. A treatment liquid discharge nozzle 82 is used for the formation.

  In the fourth embodiment shown in FIG. 18, as in the third embodiment shown in FIG. 17, a liquid draw member 74 composed of an endless belt is wound around the three conveying rollers 9. . A plurality of pairs of these liquid-feeding members 74 are arranged at positions on both sides of the glass substrate 100 conveyed by the conveyance roller 9 in correspondence with the respective treatment liquid discharge nozzles 82. As shown by an arrow A in FIG. 18, a gap through which the processing liquid can flow is formed between the liquid feeding members 74.

  When such a configuration is adopted, the processing liquid supplied from the first processing liquid supply nozzle 82 can flow down from the gap between the liquid feeding members 74 as indicated by an arrow A. Therefore, there is no processing liquid supplied from the preceding process liquid supply nozzle 82, or at a reduced state, it is possible to supply the new process liquid from the next processing liquid supply nozzle 82.

  For this reason, when supplying the same processing liquid from the plurality of processing liquid supply nozzles 82, after the old processing liquid supplied for processing the glass substrate 100 is caused to flow down from the gap between the liquid feeding members 74, The glass substrate 100 can be processed with the new processing liquid.

  Further, for example, hydrofluoric acid is supplied from the three processing / cleaning units 1a, 1b, 1c on the upstream side in the transport direction of the glass substrate 100 among the four processing / cleaning units 1a, 1b, 1c, 1d. When the embodiment in which ozone water is supplied from the most downstream processing / cleaning unit 1d is adopted, the processing / cleaning unit 1c for supplying hydrofluoric acid and the processing / cleaning unit 1d for supplying ozone water By adopting such a configuration, it is possible to prevent the hydrofluoric acid and the ozone water from mixing.

  In the above-described embodiment, the glass substrate 100 is supported in a state where the main surface is in the horizontal direction and is conveyed in the horizontal direction. However, the glass substrate 100 may be slightly inclined. For example, the present invention can be applied even if the glass substrate 100 is inclined by about 1 degree with respect to the direction orthogonal to the conveyance direction. That is, the present invention is not limited to the case where the glass substrate 100 is accurately supported in the horizontal direction, but can be applied to the case where the glass substrate 100 is supported in a substantially horizontal direction.

  In the above-described embodiment, hydrofluoric acid or the like as an etchant is supplied to the surface of the glass substrate 100, but the present invention is not limited to this. For example, the present invention may be applied to a substrate processing apparatus that performs development processing by supplying a developing solution to the glass substrate 100. Furthermore, the present invention can be applied to a substrate processing apparatus that uses other processing liquids.

DESCRIPTION OF SYMBOLS 1 Processing and washing | cleaning unit 2 Processing liquid discharge nozzle 3 Liquid pool holding member 4 Back surface washing | cleaning part 9 Conveyance roller 21 Processing liquid discharge port 22 Reservoir 23 Pipe line 24 On-off valve 25 Pump 31 Processing liquid holding surface 32 Recessed part 33 Recessed part 41 Cleaning liquid discharge Exit 42 Cleaning liquid holding surface 43 Recess 52 Liquid film 71 Liquid gathering member 72 Liquid gathering member 73 Liquid gathering member 74 Liquid gathering member 82 Processing liquid discharge nozzle 100 Glass substrate

Claims (9)

A support mechanism for supporting the rectangular substrate in a state where its main surface is in a substantially horizontal direction, and transporting the substrate in a substantially horizontal direction;
A processing liquid discharge nozzle for supplying a processing liquid to the surface of the substrate transported by the transport mechanism, wherein a processing liquid discharge port facing downward extends in a direction intersecting the transport direction of the substrate by the transport mechanism;
On both sides of the substrate in the conveyance direction, the substrate is disposed along the substrate conveyance direction at a position close to or in contact with an edge of the substrate, and the height position of the upper surface is the height position of the surface of the substrate. A liquid squeeze member that is disposed at the above position and extends the processing liquid supplied from the processing liquid discharge nozzle to the surface of the substrate by the action of surface tension to the edge of the substrate;
A substrate processing apparatus comprising: The substrate processing apparatus according to claim 1,
Arranged at a position higher than the height position of the surface of the substrate so that the height position of the upper surface of the liquid gathering member is equal to or greater than the film thickness of the processing liquid supplied from the processing liquid discharge nozzle to the surface of the substrate. Substrate processing apparatus. The substrate processing apparatus according to claim 2,
The substrate processing apparatus, wherein the liquid drawing member and the edge of the substrate are separated from each other, and the distance between the liquid drawing member and the edge of the substrate is 2 mm or less. The substrate processing apparatus according to claim 3,
The liquid handling member has a long shape extending along the transport direction of the substrate, and is fixed to both sides of the substrate in the transport direction. The substrate processing apparatus according to claim 3,
The liquid handling member is a substrate processing apparatus that moves in synchronization with a transport speed of the substrate by the transport mechanism along a transport direction of the substrate. The substrate processing apparatus according to claim 5,
The transport mechanism includes a transport roller that rotates while supporting the substrate from its lower surface,
The liquid processing member is a substrate processing apparatus including an endless belt wound around the transport roller. The substrate processing apparatus according to claim 6,
A plurality of the treatment liquid discharge nozzles are arranged apart from each other in the substrate transport direction by the transport mechanism,
A substrate processing apparatus in which a pair of liquid gathering members constituted by the endless belt is disposed at positions on both sides of the substrate transported by the transport mechanism at a position between the plurality of processing liquid discharge nozzles. The substrate processing apparatus according to claim 6,
A plurality of the treatment liquid discharge nozzles are arranged apart from each other in the substrate transport direction by the transport mechanism,
A plurality of pairs of liquid gathering members composed of the endless belts are disposed at positions on both sides of the substrate transported by the transport mechanism corresponding to the plurality of processing liquid discharge nozzles, respectively. A substrate processing apparatus in which a gap through which a processing liquid can flow is formed between a pair of liquid feeding members. The substrate processing apparatus according to any one of claims 1 to 8,
The treatment liquid discharge nozzle has a liquid-tight state due to the liquid film of the treatment liquid discharged from the treatment liquid discharge port between the treatment liquid discharge port and the surface of the substrate conveyed by the conveyance mechanism. Is placed at the position where
A treatment liquid holding surface for holding a treatment liquid pool is provided at a position opposite to the treatment liquid discharge port, and the distance between the treatment liquid discharge port and the treatment liquid holding surface is a treatment liquid pool between them. A substrate processing apparatus further comprising a liquid pool holding member arranged at a position where formation is possible.

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