CN100377236C - 光信息记录介质 - Google Patents

光信息记录介质 Download PDF

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Publication number
CN100377236C
CN100377236C CNB021185204A CN02118520A CN100377236C CN 100377236 C CN100377236 C CN 100377236C CN B021185204 A CNB021185204 A CN B021185204A CN 02118520 A CN02118520 A CN 02118520A CN 100377236 C CN100377236 C CN 100377236C
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CN
China
Prior art keywords
organism
groove
recording layer
carbon number
recording
Prior art date
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Expired - Fee Related
Application number
CNB021185204A
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English (en)
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CN1383143A (zh
Inventor
角田毅
齐藤真二
石田寿男
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Fujifilm Corp
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Fujifilm Corp
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Publication date
Priority claimed from JP2001128734A external-priority patent/JP2002324338A/ja
Priority claimed from JP2001128733A external-priority patent/JP2002324337A/ja
Priority claimed from JP2001199845A external-priority patent/JP2003077185A/ja
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of CN1383143A publication Critical patent/CN1383143A/zh
Application granted granted Critical
Publication of CN100377236C publication Critical patent/CN100377236C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G11B7/2407Tracks or pits; Shape, structure or physical properties thereof
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    • G11B7/256Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers improving adhesion between layers
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    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/257Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
    • G11B7/2578Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers consisting essentially of inorganic materials
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    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
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    • G11B7/258Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/259Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
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    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
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    • G11B7/258Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/2595Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on gold
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    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
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  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Abstract

本发明提供C/N和再现耐久性都优秀且可无故障进行高密度记录的光记录介质。另外,提供照射短波长蓝色激光可进行信息的高密度且大容量记录和再现并具有感光度和反射率均优秀的记录特性的光信息记录介质。该光记录介质使用450nm以下的激光进行记录再现,在形成了轨道间距为200~400nm、槽深为50~150nm、槽半值宽度为90~200nm的凹槽的基板上,设置反射层、记录层等,且前述记录层含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物。该光信息记录介质,是基板上具有通过数值孔径(NA)0.7以上的透镜照射波长380~500nm的激光可记录信息的记录层的光信息记录介质,其特征在于,前述记录层是含有有机物的层,且前述基板的槽深是15~45nm,轨道间距为250~400nm,槽半值宽度为60~200nm,槽的倾斜角为40°~80°。

Description

光信息记录介质
技术领域
本发明涉及光信息记录介质,更详细地说,涉及可通过激光照射进行信息记录和再现的光信息记录介质。
背景技术
对于大量记录、再现文字信息、图像信息、声音信息等的高密度光信息记录介质(DVD)的需求越来越大。特别是最近,为了与数字高清晰度电视播放的录像相对应,盛行光记录介质进一步高密度记录化的研究。作为高密度记录的方法,可通过进一步缩短在光记录介质的记录再现中使用的激光波长的方法、扩大在记录再现机的光学系统中使用的物镜的数值孔径(NA)的方法等进行。在这种情况下,开发了蓝紫激光。
另外,已知DVD是相变化型光盘,它是采用GeSbTe等合金层作为记录层,用激光对记录层进行瞬间加热,使之从结晶状态相变化到非晶态,利用通过相变化改变的反射率进行记录、再现的方式。最近,发表了使用相变化型记录层,通过蓝紫激光进行记录、再现的DVR系统(“ISOM2000”210-211页)。通过该系统,对于所谓高密度化的课题虽然可达到一定的成果,但是存在记录层重复再现中的耐久性不充分的问题。
另一方面,在上述DVD中,已知只可进行一次信息记录的追记型DVD(DVD-R)。DVD-R是以在形成凹槽的基板上,设置有记录层、反射层、保护层等的光盘为基本构成的产品,通常,在这样的光盘中,已知将在基板上设置了反射层和保护层的产品在保护层的面之间用粘合剂贴合的结构的产品,或者将前述光盘和单层基板形成的光盘贴合的结构的产品等。另外,还已知在基板上依次设置有反射层、记录层和覆盖层的产品,该类型的产品通过激光的记录、再现从覆盖层一侧进行。
在如前所述的DVD-R的记录和再现中,通常使用635nm或650nm的红色激光。但是,即使在DVD-R中,对记录密度的要求也越来越高,另一方面,为了进行高密度记录,需要不是红色激光,而是更短波长的激光进行记录再现。DVD-R的高密度记录化也被认为是如上所述激光的短波化、物镜的高NA化。
一般地,光能与波长成反比例地增大,为了高密度化使激光短波化时,赋予光盘的光能增大。特别是,由于DVD-R使用有机物层作为记录层,为再现反复进行光照射时,记录层劣化(再现劣化),其耐久性成为问题。因此,考虑将激光输出功率降低的方法,但是,如果再现输出功率降低,则反射率降低,因此成为RF输出功率降低、C/N降低和再现耐久性降低的原因。
另外,以前已知通过激光可只进行一次信息记录的光信息记录介质(光盘)。该光盘也被称做追记型CD(所谓CD-R),其代表性的结构是在透明的圆盘状基板上依次层压有机物形成的记录层、金等金属形成的反射层以及树脂制的保护层。而且在该CD-R上记录信息通过对CD-R照射近红外区域的激光(通常为780nm附近波长的激光)进行,记录层的照射部分吸收该光,局部温度上升,通过物理或化学变化(例如形成坑),改变该部分的光学特性,从而信息被记录。另一方面,信息的读取(再现)通过对CD-R照射另外的与记录用激光具有同样波长的激光进行,通过检测出记录层光学特性变化的部位(记录部分)和未变化的部位(未记录部分)的反射率的差异进行。
近年来,人们寻求记录密度更高的光信息记录介质。对于这样的期望,有人提出称为追记型数字化视频光盘(所谓DVD-R)的光盘(例如,“日经新型媒介”“DVD”分册,1995年发行)。该DVD-R具有跟踪照射激光用的引导槽(也称为凹槽或预凹槽)以上述CD-R一半以下(0.74~0.8μm)的狭窄槽的一半宽度值形成的透明圆盘状基板上,通常将依次层压了含有有机物的记录层、反射层和保护层的2片光盘以记录层为内侧贴合的结构,或者以记录层为内侧,将该光盘和具有同样形状的圆盘状保护基板贴合的结构。而且,对该DVD-R信息的记录和再现通过照射可见激光(通常波长630nm~680nm范围的激光)进行,可进行比CD-R高密度的照射。
最近,因特网等网络或高清晰度电视正快速普及。另外,最近也开始了HDTV(高清晰度电视,High Definition Television)的试验播放。在这种状况下,需要可廉价、简便地记录图像信息的大容量记录介质。DVD-R的现状虽然能够充分发挥作为大容量记录介质的功能,但对大容量化、高密度化的要求提高,也必须开发可对应于该需求的记录介质。因此,可用比DVD-R更短波长的光进行高密度记录的更大容量的记录介质的开发正在进行。
例如,在特开平4-74690号公报、特开平7-304256号公报、特开平7-304257号公报、特开平8-127174号公报、特开平11-53758号公报、特开平11-334204号公报、特开平11-334205号公报、特开平11-334206号公报、特开平11-334207号公报、特开2000-43423号公报、特开2000-108513号公报、特开2000-113504号公报、特开2000-149320号公报、特开2000-158818号公报和特开2000-228028中,公开了在具有含有机物的记录层的光信息记录介质中,从记录层侧向反射层侧照射波长530nm以下的激光,从而进行信息的记录和再现的记录再现方法。这些方法通过对具备含有卟啉化合物、偶氮类有机物、金属偶氮类有机物、奎酞酮类有机物、三次甲基花青苷有机物、二氰基乙烯基苯基骨架有机物、香豆素化合物、萘花青苷化合物等的记录层的光盘照射蓝色(波长430nm、488nm)或蓝绿色(波长515nm)的激光进行信息的记录和再现。
另外,从与现在使用的CD-R系统的互换性的观点考虑,提出了可用2种不同波长区域的激光进行记录和再现的光信息记录介质。例如,在特开2000-141900号公报、特开2000-158816号公报、特开2000-185471号公报、特开2000-289342号公报、特开2000-309165号公报中,提出了通过混合使用在CD-R中使用的有机物和在DVD-R中使用的有机物,用780nm附近的近红外区域激光和650nm附近的可见激光中的任一激光可进行记录和再现的光信息记录介质。
但是,根据本发明者的研究表明,用上述公报中记载的光盘,通过照射波长380~500nm的短波长激光记录信息时,不能得到实用上必须的感光度,另外,反射率或变调度等其他记录特性也不是可满足需要的水平,因此有必要进一步改进。特别是,用上述公报中记载的光盘照射波长380~500nm的激光时,记录特性降低。
发明内容
本发明是鉴于如前所述问题提出的,其目的在于提供一种C/N和再现耐久性都优秀的可无故障进行高密度记录的光记录介质。
本发明的另一目的在于提供一种照射波长380~500nm的短波长蓝色激光可进行信息的高密度记录和再现且具有优秀的记录特性的光信息记录介质。
前述课题可通过下面的本发明的光记录介质解决。
按照第1方面,本发明是使用450nm以下的激光和数值孔径(NA)为0.7以上的物镜进行记录再现的光记录介质,是在形成了轨道间距为200~400nm、槽深度为50~150nm、槽半值宽度为90~200nm的凹槽的基板上,依次设置有反射层、记录层和覆盖层,且前述记录层含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物的光记录介质。
按照第2方面,本发明是使用450nm以下的激光和数值孔径(NA)为0.5以上0.7以下的物镜进行记录再现的光记录介质,是在形成了轨道间距为200~400nm、槽深度为50~150nm、槽半值宽度为90~200nm的凹槽的基板上,依次设置有记录层和反射层,且前述记录层含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物的光记录介质。
而且,按照第3方面,本发明的光信息记录介质是在基板上具有可通过数值孔径(NA)0.7以上的透镜照射波长380~500nm的激光从而记录信息的记录层的光信息记录介质,其特征在于,在前述基板上,在反射层上的前述记录层上设置有片材层,前述记录层是含有有机物的层,且前述基板的槽深度是15~45nm,轨道间距为250~400nm,槽半值宽度为60~200nm,槽的倾斜角为40~80°。
在上述的本发明中,前述有机物是选自花青苷有机物、氨基丁二烯有机物、苯并三唑有机物、酞菁有机物和玫红花青苷有机物的有机物。
附图说明
图1是第3方面的本发明光信息记录介质的基板槽半径方向的剖视图。
具体实施方式
按照第1方面的本发明的实施方案如下所述。
本发明的光记录介质具有在形成了特定凹槽的基板上依次设置了反射层、记录层和覆盖层的层结构,通过覆盖层进行记录再现。覆盖层通过粘合剂贴合在记录层上。
前述基板上设置有凹槽,特别是螺旋状凹槽,凹槽的轨道间距为200~400nm,槽深为50~150nm,槽半值宽度为90~200nm。另外,作为前述记录层,使用含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物的记录层。
另外,前述光记录介质使用450nm以下的激光和数值孔径(NA)为0.7以上的物镜进行记录再现。
本发明的光记录介质通过在形成了特定凹槽的基板上设置特定的有机物记录层,C/N和再现耐久性都优秀,可无故障进行高密度记录。
作为本发明光记录介质中使用的基板材料,可使用聚碳酸酯、聚甲基丙烯酸甲酯等丙烯酸树脂、聚氯乙烯、氯乙烯共聚物等氯乙烯类树脂、环氧树脂、非晶类聚烯烃和聚酯等塑料基板,其中优选使用聚碳酸酯。
另外,本发明的光记录介质中形成的记录层主要设置了有机物记录层,作为有机物,可使用公知的物质,对此没有特别的限制,作为前述有机物,其特征是含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物。具体地说,优选特开平4-74690号、特开平8-127174号、特开平11-53758号、特开平11-334204号、特开平11-334205号、特开平11-334206号、特开平11-334207号、特开2000-43423号、特开2000-108513号、特开2000-158818号中记载的有机物,或三唑、三嗪、花青苷、部花青、氨基丁二烯、酞菁、肉桂酸、氧化还原(染料)、偶氮、氧杂菁苯并唑、苯并三唑类有机物等,更优选花青苷、氨基丁二烯、苯并三唑、酞菁、玫红(ロ一ド)花青苷类有机物。其中,特别优选在600~700nm和300~400nm分别具有极大吸收在1以上的酞菁类有机物。
有机物记录层的形成可通过除前述有机物外,根据需要在溶剂中溶解褪色防止剂、粘合剂、防氧化剂、UV吸收剂、可塑剂和润滑剂等各种添加剂,制备涂布液,然后将该涂布液在基板表面涂布,形成涂膜后干燥进行。另外,将有机物、褪色防止剂等溶于溶剂中时,为了完全溶解,优选进行超声波处理分散。作为有机物层涂布液的溶剂,可列举乙酸丁酯、溶纤剂醋酸酯等酯,甲基乙基酮、环己酮、甲基异丁基酮等酮类,二氯甲烷、1,2-二氯乙烷、氯仿等氯化烃,二甲基甲酰胺等酰胺,环己烷等烃,四氢呋喃、乙醚、二氧六环等醚类,乙醇、正丙醇、异丙醇、正丁醇、二丙酮醇等醇,2,2,3,3-四氟丙醇等氟类溶剂,乙二醇单甲醚、乙二醇单乙醚、丙二醇单甲醚等二醇醚类等。上述溶剂考虑到使用的有机物的溶解性,可单独使用或两种以上适当合并使用。
作为粘合剂的例子,可列举例如明胶、纤维素衍生物、葡聚糖、松香、橡胶等天然有机高分子物质,聚氨酯、聚乙烯、聚丙烯、聚苯乙烯、聚异丁烯等烃类树脂、聚氯乙烯、聚偏氯乙烯、氯乙烯-乙酸乙烯基酯共聚物等乙烯类树脂、聚丙烯酸甲酯、聚甲基丙烯酸甲酯等丙烯酸树脂、聚乙烯醇、氯化聚乙烯、环氧树脂、丁缩醛树脂、橡胶衍生物、酚醛树脂等合成有机高分子。作为有机物记录层的材料并用粘合剂时,粘合剂的使用量相对于100质量份有机物为0.2~20质量份,优选0.5~10质量份,更优选1~5质量份。
这样制备的涂布液中的有机物的浓度一般在0.01~10质量%的范围内,优选在0.1~5质量%的范围。
作为涂布方法,可列举喷雾法、旋转涂布法、浸渍法、辊涂布法、刮板涂布法、刮刀辊法、丝网印刷法等。从减少有机物膜厚的周内变化,可均一成膜的观点考虑,优选使用旋转涂布法。有机物记录层可以是单层,也可以是多层。有机物记录层的层厚一般在20~500nm范围内,优选50~300nm的范围。
有机物涂布液的涂布温度只要在23~50℃的范围内就可以,对此没有特别的限制,优选24~40℃,更优选25~37℃。
另外,本发明的光记录介质中形成的反射层只要是相对于激光的反射率高,即只要反射率为70%以上的反射膜即可,作为其例子,可列举Mg、Se、Y、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Mn、Re、Fe、Co、Ni、Ru、Rh、Pd、Ir、Pt、Cu、Ag、Au、Zn、Cd、Al、Ga、In、Si、Ge、Te、Pb、Po、Sn、Bi等金属和准金属或不锈钢,优选含有Au或Ag的反射膜,其中,特别优选主要成分是Ag或Au的反射膜。
光反射层例如可通过将上述光反射性物质真空蒸镀、溅射或离子喷镀在有机物记录层上形成。光反射层的层厚一般在10~800nm的范围内,优选20~500nm的范围,更优选50~300nm的范围。
本发明的覆盖层使用相对于记录再现中使用的激光的透光率在80%以上,表面粗造度为5nm以下的树脂片材,对此没有特别的限制,作为这样的材料,可列举聚碳酸酯(帝人(株)制Biuaes、帝人化成(株)制Panrit等)、3醋酸纤维素(富士胶片(株)制Phditack等)、PET(东Re(株)制Rumira等)等,优选使用聚碳酸酯和3醋酸纤维素。
覆盖层通过粘合剂与记录层粘接。考虑粘接强度或作业性等选择粘合剂,优选使用放射线固化粘合剂。作为放射线固化粘合剂,可列举电子束固化粘合剂或紫外线固化粘合剂等。
放射线固化粘合剂含有分子中具有2个以上放射线官能性双键的单体或树脂,例如丙烯酸酯类、丙烯酰胺类、甲基丙烯酸酯类、甲基丙烯酰胺类、烯丙基化合物、乙烯基醚类、乙烯基酯类等。优选2个官能以上的丙烯酸酯类化合物、甲基丙烯酸酯类化合物。
作为2官能的(甲基)丙烯酸酯单体或树脂的具体例,可使用乙二醇二丙烯酸酯、丙二醇二丙烯酸酯、丁二醇二丙烯酸酯、己二醇二丙烯酸酯、二甘醇二丙烯酸酯、三甘醇二丙烯酸酯、四甘醇二丙烯酸酯、新戊二醇二丙烯酸酯、三丙二醇二丙烯酸酯、乙二醇二甲基丙烯酸酯、丙二醇二甲基丙烯酸酯、丁二醇二甲基丙烯酸酯、己二醇二甲基丙烯酸酯、二甘醇二甲基丙烯酸酯、三甘醇二甲基丙烯酸酯、四甘醇二甲基丙烯酸酯、新戊二醇二甲基丙烯酸酯、三丙二醇二甲基丙烯酸酯等代表的在脂肪族二醇中加成了丙烯酸、甲基丙烯酸的物质。
另外,也可使用在聚乙二醇、聚丙二醇、聚1,4-丁二醇等聚醚聚醇中加成了丙烯酸、甲基丙烯酸的聚醚丙烯酸酯、聚醚甲基丙烯酸酯或在从公知的二元酸、二元醇得到的聚酯聚醇中加成了丙烯酸、甲基丙烯酸的聚酯丙烯酸酯、聚酯甲基丙烯酸酯。
另外,也可使用在公知的多元醇和聚异氰酸酯反应得到的聚氨酯中加成了丙烯酸、甲基丙烯酸的聚氨酯丙烯酸酯、聚氨酯甲基丙烯酸酯。
另外,也可使用双酚A、双酚F、氢化双酚A、氢化双酚F或在它们的环氧烷加成物中加成了丙烯酸、甲基丙烯酸的物质,或异氰尿酸环氧烷改性二丙烯酸酯、异氰尿酸环氧烷改性二甲基丙烯酸酯、三环癸烷二甲醇二丙烯酸酯、三环癸烷二甲醇二甲基丙烯酸酯等具有环状结构的物质。
作为在本发明中使用的放射线固化粘合剂,使用紫外线固化粘合剂时,必须在前述聚合性单体或树脂中进一步添加光聚合引发剂,可使用公知的光聚合引发剂,其中优选芳香族酮化合物。芳香族酮化合物没有特别的限制,优选作为紫外线照射光源通常使用的汞灯不产生明线光谱且在254、313和365nm波长下吸光系数较大的物质。作为其代表例有苯乙酮、二苯酮、苯偶姻乙醚、苄基甲基酮缩醇、苄基乙基酮缩醇、苯偶姻异丁基酮、羟基二甲基苯基酮、1-羟基环己基苯基酮、2-2二乙氧基苯乙酮、米蚩酮等,可以使用各种芳香族酮化合物。
芳香族酮化合物的混合比例相对于聚合性单体或树脂100质量份为0.5~20质量份,优选2~15质量份,更优选3~10质量份。作为紫外线固化型粘合剂,市售的有预先添加了光引发剂的产品,可使用它们。作为紫外线光源,可使用汞灯。汞灯使用20~200W/cm的灯,以速度为0.3~20m/分使用。覆盖层和汞灯之间的距离一般优选1~30cm。
作为电子束固化粘合剂中使用的电子束加速器,可使用扫描方式、双扫描方式或幕帘光束方式,优选能够比较廉价地得到大输出功率的幕帘光束方式。作为电子束特性,加速电压为100~1000kV,优选150~300kV,作为吸收剂量,为0.5~20Mrad,优选1~10Mrad。
将粘合剂涂布到记录层上的方法没有特别的限制,优选旋转涂布法。粘合剂层的厚度在5~50μm合适。另外,粘合剂的涂布温度只要在23~50℃的范围内即可,没有特别限定,优选24~40℃,更优选25~37℃。
下面,对按照第2方面的本发明的实施方案进行详述。
本发明的光记录介质具有在形成了特定凹槽的基板上依次设置记录层和反射层的层结构。
在前述基板上设置有凹槽,特别是螺旋状凹槽,凹槽的轨道间距为200~400nm,槽深为50~150nm,槽半值宽度为90~200nm。另外,作为前述记录层,使用含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物的记录层。
另外,前述光记录介质使用450nm以下的激光和数值孔径(NA)为0.5以上0.7以下的物镜进行记录再现。
本发明的光记录介质通过在形成了特定凹槽的基板上设置特定的有机物记录层,从而C/N和再现耐久性都优秀,可无故障进行高密度记录。
另外,在按照第2方面的本发明中,优选在前述基板上设置有记录层和反射层的光记录介质(以下有时称为第1光盘)与至少具有基板的第2光盘贴合。第2光盘可以是基板单层,也可以是基板上设置有反射层的物质。另外,在第1和第2光盘上可进一步设置保护层或印刷层。第1光盘和第2光盘通过粘合剂粘接。
第2方面的本发明的光记录介质中使用的基板材料、记录层材料、有机物记录层的形成方法、有机物层涂布液的溶剂、粘合剂、涂布液中的有机物浓度、涂布方法等可与第1方面的本发明中公开的内容相同。
另外,对于第2方面的本发明光记录介质中形成的反射层,可使用与第1方面的本发明公开的同样的材料、同样的方法。光反射层的层厚一般在10~800nm的范围,优选20~500nm的范围,更优选50~300nm的范围。
粘接第1和第2光盘的粘合剂可考虑粘接强度或作业性等进行选择,但优选使用放射线固化粘合剂。作为放射线固化粘合剂,可列举电子束固化粘合剂或紫外线固化粘合剂等。
对于放射线固化粘合剂、光聚合引发剂等,可使用与第1方面的本发明公开的同样的物质。
对于电子束固化粘合剂中使用的电子束加速器及其它内容,可使用与第1方面的本发明中公开的同样的方法。
下面,对按照第3方面的本发明的实施方案进行详述。
本发明的光信息记录介质是在基板上具有可通过数值孔径(NA)0.7以上的透镜照射波长380~500nm的激光从而进行信息记录的记录层的光信息记录介质,其特征在于,在该基板上,在反射层上的前述记录层上设置有片材层,前述记录层是有机物层,且该基板的槽深是15~45nm,轨道间距为250~400nm,槽半值宽度为60~200nm,槽的倾斜角为40~80°。
(有机物记录层)
本发明的光信息记录介质的记录层由有机物(有时也称为有机色素)层形成,通过NA(数值孔径)0.7以上的透镜将波长380~500nm的激光会聚,在其焦点位置照射记录层,从而该有机物层的照射部分吸收光,局部温度上升,通过物理或化学变化(例如生成坑等)其部分光学特性变化,利用这一点信息被记录。另一方面,信息的读取(再现)通常对光盘照射与上述记录用激光同样波长的激光,通过检测前述有机物记录层光学特性变化的部位(记录部分)和未变化部位(未记录部分)之间的反射率差异等进行。
作为构成本发明记录层的有机物,从获得更大容量且高密度的记录介质的观点考虑,优选含有酞菁衍生物和/或苯并三唑衍生物的物质。
(酞菁衍生物)
作为本发明的光信息记录介质的有机物记录层中使用的前述酞菁衍生物,优选下述通式(I)表示的化合物。
通式(1)
Figure C0211852000121
[式(I)中,R表示取代基,n表示1~8的整数,n是2以上的整数时,多个R可相互相同,也可不同,M表示2个氢原子、金属、金属氧化物或有配体的金属。]
在通式(I)中,作为R表示的取代基的优选例子,可列举碳原子数1~20的烷基,碳原子数6~14的芳基,碳原子数7~15的芳烷基,碳原子数1~10的杂环基,碳原子数1~20的烷氧基,碳原子数6~14的芳氧基,碳原子数2~21的酰基,碳原子数2~21的磺酰基,碳原子数1~25的氨基甲酰基,碳原子数0~32的氨磺酰基,碳原子数1~20的烷氧基羰基,碳原子数7~15的芳氧基羰基,碳原子数2~21的酰基氨基,碳原子数1~20的磺酰基氨基或卤素原子,优选碳原子数3~16的烷基,碳原子数6~10的芳基,碳原子数3~16的烷氧基,碳原子数6~10的芳氧基,碳原子数3~16的磺酰基,碳原子数2~20的氨磺酰基,更优选碳原子数4~12的烷氧基,碳原子数4~12的磺酰基或碳原子数4~16的氨磺酰基,特别优选碳原子数6~12的氨磺酰基。
在通式(I)中,取代基R可进一步具有取代基,作为该取代基的例子,可列举下列基团。
碳原子数1~20的链状或环状烷基(例如,甲基、乙基、异丙基、环己基),碳原子数6~18的芳基(例如,苯基、氯苯基、2,4-二叔戊基苯基、1-萘基),碳原子数7~18的芳烷基(例如,苄基、茴香基),碳原子数2~20的链烯基(例如,乙烯基、2-甲基乙烯基),碳原子数2~20的炔基(例如,乙炔基、2-甲基乙炔基、2-苯基乙炔基),卤素原子(例如,F、Cl、Br、I),氰基、羟基、羧基、碳原子数2~20的酰基(例如,乙酰基、苯甲酰基、水杨酰基、三甲基乙酰基),碳原子数1~20的烷氧基(例如,甲氧基、丁氧基、环己氧基),碳原子数6~20的芳氧基(例如,苯氧基、1-萘氧基、甲苯甲酰基),碳原子数1~20的烷硫基(例如,甲硫基、丁硫基、苄基硫基、3-甲氧基丙基硫基),碳原子数6~20的芳硫基(例如,苯基硫基、4-氯苯基硫基),碳原子数1~20的烷基磺酰基(例如,甲磺酰基、丁磺酰基),碳原子数6~20的芳基磺酰基(例如,苯磺酰基,对甲苯磺酰基),碳原子数1~17的氨基甲酰基(例如,无取代的氨基甲酰基、甲基氨基甲酰基、乙基氨基甲酰基、正丁基氨基甲酰基、二甲基氨基甲酰基),碳原子数1~16的酰胺基(例如,乙酰胺基、苯酰胺基),碳原子数2~10的酰基氧基(例如,乙酰氧基、苯甲酰氧基),碳原子数2~10的烷氧羰基(例如,甲氧基羰基、乙氧基羰基),5或6元杂环基(例如,吡啶基、噻吩基、呋喃基、噻唑基、咪唑基、吡唑基等芳香族杂环,吡咯烷环、哌啶环、吗啉环、吡喃环、硫代吡喃环、二氧六环、二硫戊环等杂环)。
通式(I)中,作为取代基R的取代基,优选碳原子数1~16的链状或环状烷基,碳原子数6~14的芳基,碳原子数7~15的芳烷基,碳原子数1~16的烷氧基,碳原子数6~14的芳氧基,卤素原子,碳原子数2~17的烷氧基羰基,碳原子数1~10的氨基甲酰基,碳原子数1~10的酰胺基,其中优选碳原子数1~10的链状或环状烷基,碳原子数7~13的芳烷基,碳原子数6~10的芳基,碳原子数1~10的烷氧基,碳原子数6~10的芳氧基,氯原子,碳原子数2~11的烷氧基羰基,碳原子数1~7的氨基甲酰基,碳原子数1~8的酰胺基,特别优选碳原子数3~10的链状分枝或环状烷基,碳原子数7~11的芳烷基,碳原子数1~8的烷氧基,碳原子数3~9的烷氧基羰基,苯基和氯原子。
在通式(I)中,n优选2~6,更优选3或4,特别优选4。n是2以上的整数时,多个R可相互相同,也可不同,优选相同的情况。另外,在通式(I)中,M优选金属,其中优选铜、镍或钯,更优选铜或镍,特别优选铜。
通式(I)表示的化合物可在任意位置结合形成多倍体,此时各单元可相同,也可不同,另外,也可与聚苯乙烯、聚甲基丙烯酸酯、聚乙烯基醇、纤维素等聚合物链结合。
本发明的光信息记录介质中使用的通式(I)表示的酞菁衍生物可单独使用特定的衍生物,也可混合使用结构不同的多种物质,但优选单独使用。另外,通式(I)所示的酞菁衍生物在其合成时,有时不可避免地含有取代基R的取代位置异构体,但这些取代位置异构体相互之间没有区别,可视为同一衍生物。另外,R取代基中含有异构体时,它们没有区别,可视为同一酞菁衍生物。因此,结构不同的情况,如果用通式(I)说明,是指取代基R的构成原子种类或数量不同的情况或n不同的情况中的任一种。
下面,在下述表1中显示在本发明中使用的酞菁衍生物的优选具体例,但本发明并不限于这些具体例。另外,酞菁衍生物的取代基R的取代位置编号如下述化2所示。
化2
Figure C0211852000151
表1
本发明中使用的酞菁衍生物的具体例
  No.   取代位置-R   M
  (I-1)(I-2)(I-3)(I-4)(I-5)(I-6)(I-7)(I-8)(I-9)(I-10)(I-11)(I-12)(I-13)(I-14)(I-15)(I-16)(I-17)(I-18)(I-19)(I-20)(I-21)(I-22)(I-23)(I-24)(I-25)(I-26)(I-27)(I-28)(I-29)(I-30)(I-31)(I-32)   2,9,16,23-SO<sub>2</sub>N(异丁基)<sub>2</sub>2,9,16,23-SO<sub>2</sub>NH-(2-丁氧基苯基)2,9,16,23-SO<sub>2</sub>NH(CH<sub>2</sub>)<sub>3</sub>O-(2,4-二叔戊基苯基)2,9,16,23-SO<sub>2</sub>N-(2-乙氧基乙基)<sub>2</sub>2,9,16,23-SO<sub>2</sub>N-(环己基)<sub>2</sub>2,9,16,23-SO<sub>2</sub>N(苯基)<sub>2</sub>2,9,16,23-SO<sub>2</sub>NH(2-异丙氧基羰基苯基)2,9,16,23-SO<sub>2</sub>NH(2,6-二异丙基苯基)2,9,16,23-SO<sub>2</sub>-(4-吗啉基)2,9,16,23-SO<sub>2</sub>NMe-(3-氯苯基)2,9,16-SO<sub>2</sub>N(CH<sub>2</sub>)<sub>3</sub>NMe<sub>2</sub>2,9,16,23-SO<sub>2</sub>-(2-丁氧基苯基)2,9,16,23-SO<sub>2</sub>-(2-乙氧基-5-叔丁基)2,9,16,23-SO<sub>2</sub>-(2-乙氧基羰基苯基)2,9,16,23-SO<sub>2</sub>(CH<sub>2</sub>)<sub>4</sub>-(2,4-二叔戊基苯氧基)2,9,16,23-SO<sub>2</sub>(CH<sub>2</sub>)<sub>2</sub>OEt2,9,16,23-SO<sub>2</sub>(环己基)2,9,16,23-SO<sub>2</sub>-(4-异丁酰基氨基苯基)2,9,16-SO<sub>2</sub>-(3,5-二氯苯基)2,9,16-SO<sub>2</sub>CH<sub>2</sub>CO<sub>2</sub>-CH<sub>2</sub>CH(Et)C<sub>4</sub>H<sub>9</sub>3,10,17,24-Me2,9,16,23-SO<sub>2</sub>-(2-甲氧基苯基)1,8,15,22-SO<sub>2</sub>N(C<sub>3</sub>H<sub>7</sub>)<sub>2</sub>1,8,15,22-OCH(CHMe<sub>2</sub>)<sub>2</sub>1,8,15,22-OCHMe(苯基)1,4,8,11,15,18,22,26-异丙氧基2,3,9,10,16,17,23,24-(2-甲氧基乙氧基)2,9,16,23-叔戊基2,9,16,23-(2,6-二甲氧基苯基)1,8,15,22-(1-萘基)2,9,16,23-枯基2,9,16,23-(4-枯基苯氧基)1,8,15,22-仲丁氧基2,9,16,23-Cl   CuCuCuNiNiNiPdPdCoFeCuCuNiCoCuPdCuNiPdMgZnCuNiZnCuSiCl<sub>2</sub>NiZnPdCuCoPd
本发明中使用的酞菁衍生物可通过例如白井-小林合著,(株)Aipisee发行的“酞菁-化学和机能-”(P.1~62),C.C.Leznoff-A.B.P.Lever合著,VCH发行的“酞菁染料-性质和应用”(P.1~54)等中记载的方法、引用的方法或与其类似的方法进行合成。
(苯并三唑衍生物)
另外,作为在本发明的光信息记录介质的有机物记录层中使用的前述苯并三唑衍生物,优选下述通式(II)所示的化合物。
通式(II)
Figure C0211852000171
[式(II)中,h和k分别独立地表示1~3的整数。R3和R4表示取代基,r和s表示0~3的整数。其中,h=1且r≠0时,R3表示选自碳原子数2~16的烷基,碳原子数6~14的芳基,碳原子数7~15的芳烷基,碳原子数1~16的烷氧基,碳原子数6~14的芳氧基,碳原子数2~17的烷氧基羰基,碳原子数1~10的氨基甲酰基,碳原子数1~10的酰胺基,碳原子数2~17的酰基氧基和卤素原子的取代基。]
通式(II)所示的苯并三唑化合物是苯环至少被羟基和1,2,3-苯并三唑基的2位氮原子取代的化合物。
通式(II)中,h表示1,2,3-苯并三唑基的个数。h是1~3的整数,优选1或2,特别优选1。k表示羟基的个数。k是1~3的整数,优选1或2,特别优选1。另外,优选1,2,3-苯并三唑基和羟基相邻在苯环中取代的情况。
在通式(II)中,R3是苯环的取代基,R4是1,2,3-苯并三唑环的取代基。r表示取代基R3的个数。r是0~3的整数,优选1或2,特别优选1。s表示取代基R4的个数。s是0~3的整数,优选0或1,特别优选0。即,优选被羟基取代的苯环具有其他取代基,优选1,2,3-苯并三唑环无取代。
在通式(II)中,作为R3或R4所示的取代基的例子,可列举以下记载的例子。
碳原子数1~20的链状或环状烷基(例如,甲基、乙基、异丙基、环己基),碳原子数6~18的芳基(例如,苯基、氯苯基、2,4-二叔戊基苯基、1-萘基),碳原子数7~18的芳烷基(例如,苄基、茴香基),碳原子数2~20的链烯基(例如,乙烯基、2-甲基乙烯基),碳原子数2~20的炔基(例如,乙炔基、2-甲基乙炔基、2-苯基乙炔基),卤素原子(例如,F、Cl、Br、I),氰基、羟基、羧基、碳原子数2~20的酰基(例如,乙酰基、苯甲酰基、水杨酰基、三甲基乙酰基)、碳原子数1~20的烷氧基(例如,甲氧基、丁氧基、环己氧基),碳原子数6~20的芳氧基(例如,苯氧基、1-萘氧基、甲苯甲酰基),碳原子数1~20的烷硫基(例如,甲硫基、丁硫基、苄基硫基、3-甲氧基丙基硫基),碳原子数6~20的芳硫基(例如,苯基硫基、4-氯苯基硫基),碳原子数1~20的烷基磺酰基(例如,甲磺酰基、丁磺酰基),碳原子数6~20的芳基磺酰基(例如,苯磺酰基、对甲苯磺酰基),碳原子数1~17的氨基甲酰基(例如,无取代的氨基甲酰基、甲基氨基甲酰基、乙基氨基甲酰基、正丁基氨基甲酰基、二甲基氨基甲酰基),碳原子数1~16的酰胺基(例如,乙酰胺基、苯酰胺基),碳原子数2~20的酰基氧基(例如,乙酰氧基,苯甲酰氧基),碳原子数2~20的烷氧基羰基(例如,甲氧基羰基、乙氧基羰基),5或6元杂环基(例如,吡啶基、噻吩基、呋喃基、噻唑基、咪唑基、吡唑基等芳香族杂环,吡咯烷环、哌啶环、吗啉环、吡喃环、硫代吡喃环、二氧六环、二硫戊环等杂环)。其中,R1所示的取代基中,从1,3-二甲基巴比土酸衍生的基团除外。
作为R3或R4所示的取代基,优选碳原子数2~16的链状或环状烷基,碳原子数6~14的芳基,碳原子数7~15的芳烷基,碳原子数1~16的烷氧基,碳原子数6~14的芳氧基,卤素原子,碳原子数2~17的烷氧基羰基,碳原子数1~10的氨基甲酰基,碳原子数1~10的酰胺基,其中优选碳原子数2~10的链状或环状烷基,碳原子数7~13的芳烷基,碳原子数6~10的芳基,碳原子数2~10的烷氧基,碳原子数2~17的酰基氧基,碳原子数6~10的芳氧基,氯原子,碳原子数2~11的烷氧基羰基,碳原子数2~7的氨基甲酰基,碳原子数2~8的酰胺基,特别优选碳原子数3~10的链状分枝或环状烷基,碳原子数7~11的芳烷基,碳原子数2~8的烷氧基,碳原子数3~9的烷氧基羰基,苯基和氯原子。
其中,h=1且r≠0时,作为R3所示的取代基,特别优选碳原子数2~16的烷基,碳原子数6~14的芳基,碳原子数7~15的芳烷基,碳原子数1~16的烷氧基,碳原子数6~14的芳氧基,碳原子数2~17的烷氧基羰基,碳原子数1~10的氨基甲酰基,碳原子数1~10的酰胺基,碳原子数2~17的酰基氧基或卤素原子。
R3或R4所示的取代基可进-步具有取代基,作为此时的取代基的例子,可列举作为上述R3或R4所示的取代基的例子。另外,R3可以是2价或3价连接基团,也可取代多个苯环。此时,被R3取代的多个苯环可被不同的取代基取代。
通式(II)所示的化合物可在任意位置直接或间接连接形成多倍体,此时的各单元可相同,也可不同。另外,在任意位置间接结合形成多倍体时,包括将前述R1或R3所示的取代基作为连接基团结合的情况。另外,也可与聚苯乙烯、聚甲基丙烯酸酯、聚乙烯基醇、纤维素等聚合物链结合。
下面列举本发明中使用的苯并三唑化合物的优选具体例,但本发明并不限于这些具体例。
Figure C0211852000201
Figure C0211852000211
Figure C0211852000221
Figure C0211852000231
Figure C0211852000241
Figure C0211852000251
Figure C0211852000261
本发明中使用的苯并三唑化合物可通过例如特公昭54-41038号公报、特公昭60-14062号公报、特公平2-33709号公报、特登2858940号公报、特登2864468号公报、英国专利第1,239,258号公报、美国专利第4,587,346号公报、Poymer 1985,26卷,1288和Monatsh.Chem.1981,112,1279等中记载或引用的方法或与其类似的方法进行合成,作为涂料或聚合物的稳定剂也可使用市售的产品。
苯并三唑化合物可单独使用,也可2种以上合并使用。另外,也可以将苯并三唑化合物和除此以外的有机物化合物作为记录物质合并使用。作为可并用的有机物化合物的例子,可列举花青苷类有机物、氧杂菁类有机物、偶氮金属络合物、酞菁类有机物、吡喃类有机物、硫代吡喃类有机物、甘菊蓝(アズレニウム)类有机物、角鲨(スクワリリウム)类有机物、萘醌类有机物、三苯基甲烷类有机物和三烯丙基甲烷类有机物等。
(记录介质基板)
本发明的光信息记录介质是在基板上的反射层上的记录层上设置片材层构成的,该基板的特征为槽深(图1的a)为15~45nm,轨道间距(图1的b)为250~400nm,槽的半值宽度(图1的c)为60~200nm,槽的倾斜角(图1的d)为40~80°,除此之外没有特别的限制,可适用于各种结构的光信息记录介质中。这里,所谓槽的半值宽度(d)是指该槽深一半处的槽的半值宽度。
本发明的光信息记录介质由于具有上述结构,因而高水准地保持感光度或反射率等作为记录介质的基本性能,同时可进一步提高记录容量和记录密度。
本发明的光信息记录介质的基板可从以前作为光信息记录介质基板使用的各种材料中任意选择。作为基板材料,可列举例如玻璃、聚碳酸酯、聚甲基丙烯酸甲酯等丙烯酸树脂,聚氯乙烯、氯乙烯共聚物等氯乙烯类树脂,环氧树脂,非晶类聚烯烃和聚酯等,可单独使用每种,也可根据需要并用。另外,这些材料可作为薄膜状或有刚性的基板使用。在上述材料中,从耐湿性、尺寸稳定性和经济性等观点考虑,优选使用聚碳酸酯树脂。
在本发明的光信息记录介质中,为了提高记录密度,使用形成比CD-R或DVD-R狭窄的250~400nm轨道间距的凹槽的基板。基板的该轨道间距更优选在260~380nm的范围,特别优选在280~350nm的范围。如果该轨道间距比250mn窄,则不能得到所需的感光度(C/N),另一方面,如果比400nm宽,则不能达到高密度、大容量化。
另外,本发明的光信息记录介质中,基板的槽半值宽度在60~200nm的范围。该基板的槽半值宽度更优选在80~200nm的范围,特别优选在80~150nm的范围。该槽半值宽度如果比60nm小,或比200nm宽,则任一种情况下,槽信号的输出功率过小,不能达到所需的追踪。
另外,本发明的光信息记录介质中,基板的槽深在15~45nm的范围内。该基板的槽深更优选在15~40nm的范围内,特别优选在20~40nm的范围内。该槽深如果比15nm浅,则由于相位差过小,因而跟踪信号变小,不能进行所希望的跟踪。另一方面,该槽深如果比45nm深,由于相位差的关系,反射率变小,感光度(C/N)降低,变得不能正确地再现。
另外,本发明的光信息记录介质中,基板的槽倾斜角在40~80°的范围。该基板的槽倾斜角更优选50~80°的范围,特别优选60~80°的范围。该槽倾斜角如果比40°小,则由于相位差的关系,凹槽反射率降低,感光度(C/N)降低,变得不能正确地再现。另一方面,该槽倾斜角如果比80°大,则在基板成形时从模具脱模变得困难,在槽中容易发生云样缺陷,感光度(C/N)降低,变得不能正确再现。
另外,本发明的光信息记录介质中,使前述基板的槽深为a(nm)、轨道间距为b(nm)、槽的半值宽度为c(nm)、槽的倾斜角为d(°)时,该3个变量之间满足下列不等式,
c+(a/2)×tan(d)<b/2
在维持作为记录介质的性能,实现大容量且高密度化方面优选。
本发明的设置有反射层一侧的基板表面上,为了改善平面性、提高粘接力和防止反射层或记录层变质,可设置底涂层。作为底涂层的材料,可列举例如聚甲基丙烯酸甲酯、丙烯酸·甲基丙烯酸共聚物、苯乙烯·马来酸酐共聚物、聚乙烯醇、N-羟甲基丙烯酰胺、苯乙烯·乙烯基甲苯共聚物、氯磺酰化聚乙烯、硝化纤维素、聚氯乙烯、氯化聚烯烃、聚酯、聚酰亚胺、醋酸乙烯基酯-氯乙烯共聚物、乙烯-醋酸乙烯基酯共聚物、聚乙烯、聚丙烯、聚碳酸酯等高分子物质,以及硅烷偶合剂等表面改性剂。本发明的底涂层可通过将上述物质溶解或分散于适当的溶剂中制成涂布液后,将该涂布液采用旋转涂布、浸渍涂布、挤压涂布等涂布方法涂布在基板表面形成。该底涂层的层厚一般优选在0.005~20μm的范围,更优选0.01~10μm的范围。
(反射层)
本发明的光信息记录介质中,在前述基板上且前述有机物记录层下面,为了提高信息再现时的反射率,可设置反射层。作为反射层材料的光反射性物质只要是对激光的反射率在70%以上的物质都可以,优选反射率高的物质,作为其例子,可列举Mg、Se、Y、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Mn、Re、Fe、Co、Ni、Ru、Rh、Pd、Ir、Pt、Cu、Ag、Au、Zn、Cd、Al、Ga、In、Si、Ge、Te、Pb、Po、Sn、Bi等金属和准金属或不锈钢。
这些物质可单独使用,也可两种以上混合使用,或形成合金使用。其中优选Cr、Ni、Pt、Cu、Ag、Au、Al和不锈钢。特别优选Au金属、Ag金属、Al金属或它们的合金,最优选Ag金属、Al金属或它们的合金。本发明的反射层例如可通过在基板或记录层上进行蒸镀、溅射或离子喷镀上述光反射性物质形成。反射层的厚度一般在10~300nm的范围内,优选50~200nm的范围。
(记录层的形成)
本发明的光信息记录介质中,在上述反射层上可设置含有用于记录光信息的有机物(已述构成记录层的有机物)的记录层。
本发明的该有机物记录层的形成可通过蒸镀、溅射、CVD或溶剂涂布等方法进行,优选溶剂涂布。涂布温度只要在23℃以上50℃以下就没问题,优选24℃~40℃,更优选25℃~37℃的范围。通过溶剂涂布形成记录层时,除了前述酞菁衍生物或苯并三唑衍生物的有机物以外,可根据需要在溶剂中再溶解猝灭剂、粘合剂等,制成涂布液,然后在基板表面涂布该涂布液形成涂膜,然后干燥形成的涂布膜。
作为涂布液的溶剂,可列举乙酸丁酯、乳酸乙酯、溶纤剂醋酸酯等酯;甲基乙基酮、环己酮、甲基异丁基酮等酮类;二氯甲烷、1,2-二氯乙烷、氯仿等氯代烃;二甲基甲酰胺等酰胺;甲基环己烷等烃;丁醚、乙醚、四氢呋喃、二氧六环等醚;乙醇、正丙醇、异丙醇、正丁醇、二丙酮醇等醇;2,2,3,3-四氟丙醇等氟类溶剂;乙二醇单甲醚、乙二醇单乙醚、丙二醇单甲醚等二醇醚类等。上述溶剂考虑到使用的有机物的溶解性,可单独使用或两种以上组合使用。可根据目的在涂布液中进一步添加防氧化剂、UV吸收剂、可塑剂、润滑剂等各种添加剂。
在前述有机物记录层中使用粘合剂时,作为粘合剂的例子,可列举明胶、纤维素衍生物、葡聚糖、松香、橡胶等天然有机高分子物质;和聚乙烯、聚丙烯、聚苯乙烯、聚异丁烯等烃类树脂、聚氯乙烯、聚偏氯乙烯、聚氯乙烯-聚乙酸乙烯基酯共聚物等乙烯类树脂、聚丙烯酸甲酯、聚甲基丙烯酸甲酯等丙烯酸树脂、聚乙烯醇、氯化聚乙烯、环氧树脂、丁缩醛树脂、橡胶衍生物、酚醛树脂等热固化性树脂的初期缩合物等合成有机高分子。作为记录层的材料合并使用粘合剂时,粘合剂的使用量一般相对于前述有机物,优选在0.01~50倍质量的范围,更优选0.1~5倍质量的范围。在这样制备的涂布液中前述有机物的浓度一般在0.01~10质量%的范围内,优选在0.1~5质量%的范围内。
作为前述有机物记录层的涂布方法,可列举喷雾法、旋转涂布法、浸渍法、辊涂法、刮板涂布法、刮刀辊法、丝网印刷法等。该记录层可以是单层,也可以是多层。另外,记录层的层厚一般在20~500nm的范围,优选30~300nm的范围,更优选50~100nm的范围。
本发明的有机物记录层中,为了提高记录层的耐光性,可含有各种褪色防止剂。作为这样的褪色防止剂,一般使用单态氧猝灭剂。作为单态氧猝灭剂,可使用公知的专利说明书等刊物中记载的物质。作为其具体例,可列举特开昭58-175693号、特开昭59-81194号、特开昭60-18387号、特开昭60-19586号、特开昭60-19587号、特开昭60-35054号、特开昭60-36190号、特开昭60-36191号、特开昭60-44554号、特开昭60-44555号、特开昭60-44389号、特开昭60-44390号、特开昭60-54892号、特开昭60-47069号、特开昭63-209995号、特开平4-25492号、特公平1-38680号和特公平6-26028号等各公报、德国专利350399号说明书以及日本化学会志1992年10月号第1141页等中记载的物质。作为优选的单态氧猝灭剂的例子,可列举下述通式(III)所示的化合物。
通式(III)
Figure C0211852000311
(式(III)中,R21表示可具有取代基的烷基,另外,Q-表示阴离子。)
在通式(III)中,R21一般为可被取代的碳原子数1~8的烷基,优选无取代的碳原子数1~6的烷基。作为烷基的取代基,可列举卤素原子(例如F,Cl),烷氧基(例如,甲氧基,乙氧基),烷硫基(例如,甲硫基、乙硫基),酰基(例如,乙酰基,丙酰基),酰基氧基(例如,乙酰氧基,丙酰氧基),羟基、烷氧基羰基(例如,甲氧基羰基、乙氧基羰基),链烯基(例如乙烯基),芳基(例如,苯基、萘基)。其中,优选卤素原子、烷氧基、烷硫基、烷氧基羰基。作为Q-阴离子的优选例子,可列举ClO4 -、AsF6 -、BF4 -和SbF6 -
通式(III)所示化合物的例子记载在表2中。
表2
化合物序号 R<sup>21</sup> Q
  II-1II-2II-3II-4II-5II-6II-7II-8   CH<sub>3</sub>C<sub>2</sub>H<sub>5</sub>n-C<sub>3</sub>H<sub>7</sub>n-C<sub>4</sub>H<sub>9</sub>n-C<sub>5</sub>H<sub>11</sub>n-C<sub>4</sub>H<sub>9</sub>n-C<sub>4</sub>H<sub>9</sub>n-C<sub>4</sub>H<sub>9</sub>   ClO<sub>4</sub><sup>-</sup>ClO<sub>4</sub><sup>-</sup>ClO<sub>4</sub><sup>-</sup>ClO<sub>4</sub><sup>-</sup>ClO<sub>4</sub><sup>-</sup>SbF<sub>6</sub><sup>-</sup>BF<sub>4</sub><sup>-</sup>AsF<sub>6</sub><sup>-</sup>
前述单态氧猝灭剂等褪色防止剂的使用量相对于前述有机物的量,通常在0.1~50质量%的范围,优选0.5~45质量%的范围,更优选3~40质量%的范围,特别优选5~25质量%的范围。
(片材层)
在本发明的光信息记录介质中,为了物理和化学保护该记录层等,在上述有机物记录层上设置片材层。作为该片材层,只要是透光性材料都可以,作为本发明中使用的片材层材料的例子,可列举SiO、SiO2、MgF2、SnO2、Si3N4等无机物,热塑性树脂、热固化性树脂、UV固化性树脂等有机物。特别优选聚碳酸酯或三乙酸纤维素那样的热塑性树脂,更优选在温度23℃相对湿度50%的环境中,吸湿率在5%以下的热塑性树脂。
片材层例如可通过将塑料挤出加工得到的薄膜通过粘合剂层压在反射层上形成。或者也可以通过真空蒸镀、溅射、涂布等方法设置。另外,热塑性树脂、热固化性树脂时,也可通过将它们溶于适当的溶剂中制备涂布液,然后涂布该涂布液,进行干燥形成。UV固化性树脂时,也可以通过原样或将其溶于适当的溶剂中制备涂布液,然后涂布该涂布液,照射紫外光使之固化而形成。这些涂布液中,根据目的可进一步添加带电防止剂、防氧化剂、UV吸收剂等各种添加剂。片材层的层厚一般在0.1μm~1mm的范围。通过以上工序,可制造在基板上设置了反射层、记录层和片材层的本发明光信息记录介质用层压体。
另外,上述片材层可通过中间层、粘接层等设置在记录层上。为了提高记录层的保存性并提高记录层和薄膜片材层的粘接性可设置中间层。作为中间层中使用的材料,可列举SiO、SiO2、MgF2、SnO2、Si3N4等无机物。另外,该中间层可通过蒸镀、溅射等真空成膜形成。粘接层中优选使用含有光固化性树脂的粘合剂。例如,将光固化性树脂原样或溶于适当的溶剂中制备涂布液后,将该涂布液涂布在中间层上,在涂布膜上层压例如塑料挤出加工得到的树脂薄膜,从层压的树脂薄膜上进行光照,使涂布膜固化,从而可将树脂薄膜粘接在中间层上。这样形成薄膜片材层。
(信息记录方法)
本发明的信息记录方法使用上述光信息记录介质,例如,可如下进行。首先,使光信息记录介质以定线速度(CD格式时为1.2~1.4m/秒)或定角速度旋转,同时从基板侧或保护层侧通过NA(透镜数值孔径)0.7以上的透镜照射含有波长380~500nm光的半导体激光器等的记录用光。通过该光照射,有机物记录层吸收该光,局部升温,发生物理或化学变化(例如产生坑),改变其照射处的光学特性,从而可记录信息。
作为具有波长380~500nm范围振荡波长的激光光源,可列举具有波长380~500nm范围振荡波长的蓝色半导体激光器。从提高记录密度的观点考虑,特别优选使用蓝色半导体激光器。
另外,如上所述记录的信息的再现可通过使光信息记录介质在与上述同样的定线速度下旋转,同时从片材侧照射激光,检测其反射光进行。
本发明的光信息记录介质例如可在形成一定轨道间距的预凹槽的圆盘状基板上依次层压反射层、记录层和片材层构成。这样的光信息记录介质,在给定厚度(CD-R时为1.2mm)的基板对侧设置薄膜片材层,从该薄膜片材层侧照射光,进行记录,从而可缩小照射激光的束径,可用波长500nm以下的短波长光进行高密度的记录。
实施例
下面通过实施例对本发明进行更具体地说明,但是本发明并不限于这些实施例。另外,以下的%、份分别表示质量%、质量份。
实施例1
将聚碳酸酯树脂(帝人化成(株)制,商品名Panrit AD5503)注射模塑成形,制成具有螺旋状凹槽(深度100nm、半值宽度120nm、轨道间距0.3μm)且厚度1.1mm、直径120mm的基板。然后,在上述基板具有凹槽的一面上通过溅射法形成具有100nm膜厚的Ag膜构成的反射层。
将在340nm和680mn具有极大吸收的酞菁类有机物A(CibaspesiaritieChemical社制、Orazol Blue-GN)2g混合在2,2,3,3-四氟丙醇100ml中,进行超声波处理2小时,使之溶解,制备有机物涂布液。
在Ag反射层上,采用旋转涂布法,在23℃·50%RH的条件下,使旋转数从300rpm变化到4000rpm,同时涂布前述有机物涂布液,之后,在23℃·50%RH下保持2小时,形成80nm的记录层。
在有机物膜上,通过旋转涂布法以200rpm涂布紫外线固化粘合剂(大日本油墨化学工业(株)制,商品名SD-347),在其上叠加由0.07mm厚的聚碳酸酯树脂片(帝人(株)制,商品名Piuaes)构成的覆盖层,使之从300rpm变化到4000rpm,同时将粘合剂扩展至整个面上后,通过紫外线照射灯照射紫外线,使之固化,进行粘接。
在上述覆盖层上,再通过旋转涂布法以200rpm涂布紫外线固化粘合剂(大日本油墨化学工业(株)制,商品名SD-347,在有机物中的溶解性为0.05%),使之从300rpm变化到4000rpm,同时将粘合剂扩展至整个面上后,通过紫外线照射灯照射紫外线,使之固化,制成样品。
实施例2
在实施例1样品制作中,除了将有机物换为在330nm和730nm有极大吸收的酞菁类有机物B(Cibaspesiaritie Chemical社制、Super Green)以外,与实施例1同样制造样品。
实施例3
在实施例1样品制作中,除了将有机物换为在340nm和680nm有极大吸收的酞菁类有机物C(和光纯药(株)制,FOM0561)以外,与实施例1同样制造样品。
比较例1
将聚碳酸酯树脂(帝人化成(株)制,商品名Panrit AD5503)注射模塑成形,制成具有螺旋状凹槽(深度40nm、半值宽度140nm、轨道间距0.3μm)且厚度1.1mm、直径120mm的基板。然后,在基板具有凹槽的一面上,通过溅射法形成具有100nm膜厚的Ag膜构成的反射层。
在反射层上,通过溅射法依次形成ZnS-SiO2形成的厚度170nm的下部耐热保护层、AgInSbTe形成的厚度25nm的记录层、ZnS-SiO2形成的厚度35nm的上部耐热保护层。
然后,在上部耐热保护层上,通过旋转涂布法以200rpm涂布紫外线固化粘合剂(大日本油墨化学工业(株)制,商品名SD-347),在其上叠加由0.07mm厚的聚碳酸酯树脂片(帝人(株)制,商品名Piuaes)构成的覆盖层,使之从300rpm变化到4000rpm,同时将粘合剂扩展至整个面上后,通过紫外线照射灯照射紫外线,使之固化,进行粘接。
在上述覆盖层上,再通过旋转涂布法以200rpm涂布紫外线固化粘合剂(大日本油墨化学工业(株)制,商品名SD-347),使之从300rpm变化到4000rpm,同时将粘合剂扩展至整个面上后,通过紫外线照射灯照射紫外线,使之固化,制作样品。
比较例2
除了将比较例1样品的记录层换为SbTe之外,与比较例1同样进行,制造样品。
比较例3
除了将实施例1样品的基板凹槽换为深度40nm、半值宽度120nm、轨道间距0.30μm以外,与实施例1同样进行,制作样品。
比较例4
除了将实施例1样品的基板凹槽换为深度160nm、半值宽度120nm、轨道间距0.30μm以外,与实施例1同样进行,制作样品。
比较例5
在实施例1的样品中,除了将有机物换为400nm以下的λmax为360nm的氨基丁二烯类有机物a之外,与实施例1进行同样的操作,制备样品。
对实施例1~3和比较例1~5的样品进行如下评价。
<C/N>
对制作的光盘使用405nm激光、装载有NA0.85拾波器的记录再现评价机(Barstec社制,DDU1000),在时钟频率66MHz、线速度5.6m/s下,用单一频率信号(2T=0.13μm)进行记录、再现,通过频谱解析器测定C/N。
<再现耐久性>
对制作的光盘使用405nm激光、装载有NA0.85拾波器的记录再现评价机(Barstec社制,DDU1000),在时钟频率66MHz、线速度5.6m/s下,记录1-7PP调制信号(激光功率6mW),在静止状态下连续再现100万次(激光功率0.4mW),将初期的调制度作为100%,测定100万次再现后调制的劣化。结果如表3所示。
表3
  记录层   槽深   C/N   再现耐久性
  实施例1   有机物A   100nm   55dB(○)   98%(○)
  实施例2   有机物B   100nm   51dB(○)   99%(○)
  实施例3   有机物C   100nm   53dB(○)   99%(○)
  比较例1   AgInSbTe   40nm   45dB(○)   60%(×)
  比较例2   SbTe   40nm   52dB(○)   40%(×)
  比较例3   有机物A   40nm   40dB(×)   98%(○)
  比较例4   有机物A   160nm   30dB(×)   95%(○)
  比较例5   有机物a   40nm   35dB(×)   60%(×)
  实施例<sup>*</sup>   有机物A   70nm   51dB(○)   100%(○)
从表3可知,在记录层中使用本发明的在特定波长具有极大吸收的有机物,且凹槽的槽深在本发明范围内时,C/N和再现耐久性都优秀,但是,即是具有含有前述特定有机物的记录层,凹槽的槽深超出本发明范围时,C/N变差。另外,凹槽的槽深小于50nm且记录层是利用相变化的物质时,再现耐久性非常差。另外,作为有机物使用λmax为360nm的物质,且凹槽的槽深小于50nm时,C/N和再现耐久性都很差。
本发明的光记录介质通过在形成了特定凹槽的基板上,使用含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物的记录层作为记录层,C/N和再现耐久性都优秀,可无障碍进行高密度记录。
实施例4
作为基板,使用将聚碳酸酯树脂(帝人(株)制,商品名Panrit AD5503)注射模塑成形制作的,具有螺旋状凹槽(深度100nm、半值宽度120nm、轨道间距0.34μm)且厚度0.6mm、直径120mm的基板。
将在340nm和680nm具有极大吸收的酞菁类有机物A(CibaspesiaritieChemical社制、Orazol Blue-GN)2g混合在2,2,3,3-四氟丙醇100ml中,进行超声波处理2小时,使之溶解,制备有机物涂布液。
在前述基板具有凹槽的面上,采用旋转涂布法,在23℃·50%RH条件下,使旋转数从300rpm变化到4000rpm,同时涂布前述有机物涂布液,之后,在23℃·50%RH下保持2小时,在凹槽内形成80nm的记录层。
接着,在记录层上通过溅射法形成具有膜厚100nm的Ag膜构成的反射层。
之后,在40℃下,通过旋转涂布法以200rpm涂布紫外线固化粘合剂(大日本油墨化学工业(株)制,商品名SD-640),在其上叠加0.6mm厚的聚碳酸酯树脂基板,使之从300rpm变化到4000rpm,同时将粘合剂扩展至整个面上后,通过紫外线照射灯照射紫外线,使之固化,制成样品。
实施例5
在实施例4样品制作中,除了将有机物换为在330nm和730nm有极大吸收的酞菁类有机物B(Cibaspesiaritie Chemical社制、Super Green)以外,与实施例4同样制造样品。
实施例6
在实施例4样品制作中,除了将有机物换为在340nm和680nm有极大吸收的酞菁类有机物C(和光纯药(株)制,FOM0561)以外,与实施例4同样制造样品。
比较例6
将聚碳酸酯树脂(帝人(株)制,商品名Panrit AD5503)注射模塑成形,制成具有螺旋状凹槽(深度40nm、半值宽度120nm、轨道间距0.34μm)且厚度0.6mm、直径120mm的基板。然后,在基板具有凹槽的一面上,分别通过溅射法形成ZnS-SiO2形成的厚度170nm的下部耐热保护层、AgInSbTe形成的厚度25nm的记录层、ZnS-SiO2形成的厚度35nm的上部耐热保护层和Ag膜形成的厚度100nm的反射层。
然后,在反射层上,在40℃下,通过旋转涂布法以200rpm涂布紫外线固化粘合剂(大日本油墨化学工业(株)制,商品名SD-640),在其上叠加0.6mm厚的聚碳酸酯树脂基板,使之从300rpm变化到4000rpm,同时将粘合剂扩展至整个面上后,通过紫外线照射灯照射紫外线,使之固化,进行粘接。
比较例7
除了将比较例6样品的记录层换为SbTe之外,与比较例6同样进行,制造样品。
比较例8
除了将实施例4样品的基板凹槽换为深度40nm、半值宽度120nm、轨道间距0.34μm以外,与实施例4同样进行,制作样品。
比较例9
除了将实施例4样品的基板凹槽换为深度160nm、半值宽度120nm、轨道间距0.34μm以外,与实施例4同样进行,制作样品。
比较例10
在实施例4的样品中,除了将有机物换为400nm以下的λmax为360nm的氨基丁二烯类有机物a之外,与实施例4进行同样的操作,制备样品。
对实施例4~6和比较例6~10的样品如下进行评价。
<C/N>
对制作的光盘使用405nm激光、装载有NA0.65拾波器的记录再现评价机(Barstec社制,DDU1000),在时钟频率20MHz、线速度2.0m/s下,用单一频率信号(3T=0.29μm)进行记录(激光功率1.0mW)、再现(激光功率0.6mW),通过频谱解析器测定C/N。
<再现耐久性>
对制作的光盘使用405nm激光、装载有NA0.65拾波器的记录再现评价机(Barstec社制,DDU1000),在时钟频率20MHz、线速度2.0m/s下,记录(激光功率1.0mW)、再现(激光功率0.6mW)EMF调制信号,将初期的调制度作为100%,测定在静止状态下连续再现100万次后调制的劣化。结果如表4所示。
表4
  记录层   槽深   C/N   再现耐久性
  实施例4   有机物A   100nm   55dB(○)   100%(○)
  实施例5   有机物B   100nm   51dB(○)   99%(○)
  实施例6   有机物C   100nm   53dB(○)   99%(○)
  比较例6   AgInSbTe   40nm   49dB(○)   40%(×)
  比较例7   GeSbTe   40nm   45dB(△)   45%(×)
  比较例8   有机物A   40nm   35dB(×)   98%(○)
  比较例9   有机物A   160nm   30dB(×)   95%(○)
  比较例10   有机物a   40nm   35dB(×)   50%(×)
从表4可知,在记录层中使用本发明的在特定波长具有极大吸收的有机物,且凹槽的槽深在本发明范围内时,C/N和再现耐久性都优秀,但是,即是具有含有前述特定有机物的记录层,凹槽的槽深超出本发明范围时,C/N变差。另外,凹槽的槽深小于50nm且记录层是利用相变化的物质时,再现耐久性非常差。另外,作为有机物使用λmax为360nm的物质且凹槽的槽深小于50nm时,C/N和再现耐久性都很差。
本发明的光记录介质通过在形成了特定凹槽的基板上,使用含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物的记录层作为记录层,C/N和再现耐久性都优秀,可无障碍进行高密度记录。
<A:酞菁类有机物记录层的例子>
[实施例7~11、15~18;比较例11、12、15、16]
在厚度1.2mm、直径120mm的具有螺旋状凹槽(表5中表示各槽深、轨道间距、槽的半值宽度、槽的倾斜角)的注射模塑成形聚碳酸酯树脂((株)帝人制的商品名“Panrit AD5503”)基板的具有凹槽的一面上,溅射Ag形成膜厚100nm的反射层。另外,将CIBA spesiaritie Chemical社制的酞菁“Orazol Blue GN”与2,2,3,3-四氟丙醇混合,用超声波处理2小时使之溶解,得到记录层形成用涂布液(浓度2质量%)。用旋转涂布法,在温度23℃相对湿度50%的条件下,使旋转数从300rpm变化到4000rpm,同时涂布该有机物涂布液。之后,在温度23℃相对湿度50%下保存1小时后,溅射ZnS-SiO2,使膜厚为5nm,通过旋转涂布法在旋转数100~300rpm下涂布UV固化粘合剂(大日本油墨化学社制的“SD-640”),叠加聚碳酸酯片((株)帝人制的“Piuaes”,70微米),之后使旋转数从300rpm变化到4000rpm,同时将粘合剂扩展至整个面上后,用紫外线照射灯照射紫外线,使之固化,制成本发明的实施例7~11、15~18和比较例11、12、15、16的光信息记录介质(光盘)样品。
<B:苯并三唑类有机物记录层的例子>
[实施例12~14、19~23;比较例13、14、17、18]
在厚度1.2mm、直径120mm的具有螺旋状凹槽(表3中表示各槽深、轨道间距、槽的半值宽度、槽的倾斜角)的注射模塑成形聚碳酸酯树脂((株)帝人制的商品名“Panrit AD5503”)基板的具有凹槽的一面上,溅射Ag形成膜厚100nm的反射层。另外,将下述化合物1(苯并三唑)与2,2,3,3-四氟丙醇混合,用超声波处理2小时,使之溶解,得到记录层形成用涂布液(浓度2质量%)。用旋转涂布法,在温度23℃相对湿度50%的条件下,使旋转数从300rpm变化到4000rpm,同时涂布该有机物涂布液。之后,在温度23℃相对湿度50%下保存1小时后,溅射ZnS-SiO2,使膜厚5nm,通过旋转涂布法在旋转数100~300rpm下涂布UV固化粘合剂(大日本油墨化学社制的“SD-640”),叠加聚碳酸酯片((株)帝人制的“Piuaes”,70微米),之后使旋转数从300rpm变化到4000rpm,同时将粘合剂扩展至整个面上后,用紫外线照射灯照射紫外线,使之固化,制成本发明的实施例12~14、19~23和比较例13、14、17、18的光信息记录介质(光盘)样品。
化合物1
Figure C0211852000421
<作为光盘的评价>
对于上述制作的光信息记录介质(光盘),在线速度3.5m/秒下,使用振荡波长405nm的蓝色半导体激光器通过数值孔径(NA)0.85的透镜系统记录3T-EFM信号后,再现记录的信号。使用波长405nm的蓝色半导体激光器和装载有数值孔径(NA)0.85的透镜系统的Barstec社制“DDU1000”,测定未记录的凹槽反射率。另外,以8mW记录3T信号,测定其感光度(C/N)。评价结果如下面表5所示。
表5
  有机物   槽深(nm)   轨道间距(nm)   槽的半值宽度(nm)   槽的倾斜角(°)   未记录凹槽反射率(%)   C/N
  比较例11   D   10   300   100   70   31   33
  实施例7   D   15   300   100   70   61   53
  实施例8   D   20   300   100   70   70   54
  实施例9   D   30   300   100   70   65   56
  实施例10   D   40   300   100   70   64   55
  实施例11   D   45   300   100   70   59   51
  比较例12   D   50   300   100   70   29   36
  比较例13   E   30   240   100   70   26   36
  实施例12   E   30   250   100   70   57   58
  实施例13   E   30   300   100   70   59   60
  实施例14   E   30   400   100   70   55   56
  比较例14   E   30   410   100   70   25   36
  比较例15   D   30   300   50   70   38   35
  实施例15   D   30   300   60   70   53   50
  实施例16   D   30   300   80   70   61   52
  实施例17   D   30   300   150   70   64   54
  实施例18   D   30   300   200   70   64   51
  比较例16   D   30   300   220   70   15   34
  比较例17   E   30   300   80   35   16   37
  实施例19   E   30   300   80   40   50   53
  实施例20   E   30   300   80   50   53   54
  实施例21   E   30   300   80   60   56   58
  实施例22   E   30   300   80   70   58   59
  实施例23   E   30   300   80   80   51   52
  比较例18   E   30   300   80   85   33   33
备注:D:酞菁类有机物
E:苯并三唑类有机物
从表5的结果可知,本发明的光盘(实施例7~23)与比较例11~18的光盘相比,对于通过数值孔径(NA)0.85的透镜聚光的波长405nm的激光显示高反射率,而且是高感光度。因此可知,通过使用本发明的光信息记录介质,可得到对于通过数值孔径(NA)0.7以上透镜的波长380~500nm的短波长激光具有高记录特性的光盘。
本发明的光信息记录介质通过使记录层为含有有机物的层,基板的槽深为15~45nm,轨道间距为250~400nm,槽的半值宽度为60~200nm,槽的倾斜角为40~80°,从而照射波长380~500nm的短波长激光,可进行信息的高密度记录和再现,且达到具有所谓高感光度、高反射率的良好记录再现特性的效果。即,比现有的CD-R或DVD-R可高密度记录信息,可更大容量地记录信息。

Claims (8)

1.一种光记录介质,是使用450nm以下的激光和数值孔径0.7以上的物镜进行记录再现的光记录介质,其特征在于,在形成了轨道间距为200~400nm、槽深为50~150nm、槽半值宽度为90~200nm的凹槽的基板上,依次设置有反射层、记录层和覆盖层,且前述记录层含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物,
前述有机物是选自花青苷有机物、氨基丁二烯有机物、苯并三唑有机物、酞菁有机物和玫红花青苷有机物。
2.权利要求1记载的光记录介质,其特征在于,前述有机物是在600~700nm和300~400nm分别具有极大吸收在1以上的酞菁有机物。
3.权利要求1记载的光记录介质,其特征在于,前述基板是聚碳酸酯。
4.权利要求1记载的光记录介质,其特征在于,前述反射层含有选自Au或Ag金属。
5.一种光记录介质,是使用450nm以下的激光和数值孔径0.5以上0.7以下的物镜进行记录再现的光记录介质,其特征在于,在形成了轨道间距为200~400nm、槽深为50~150nm、槽半值宽度为90~200nm的凹槽的基板上,依次设置记录层和反射层,且前述记录层含有在600~800nm和300~400nm分别具有极大吸收在1以上的有机物,
前述有机物是选自花青苷有机物、氨基丁二烯有机物、苯并三唑有机物、酞菁有机物和玫红花青苷有机物。
6.权利要求5记载的光记录介质,其特征在于,前述有机物是在600~700nm和300~400nm分别具有极大吸收在1以上的酞菁有机物。
7.权利要求5记载的光记录介质,其特征在于,前述基板是聚碳酸酯。
8.权利要求5记载的光记录介质,其特征在于,前述反射层含有选自Au或Ag金属。
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JP2001076343A (ja) * 1999-07-05 2001-03-23 Mitsubishi Chemicals Corp 光記録媒体及び光記録方式

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EP1253586A3 (en) 2008-12-24
EP1253586A2 (en) 2002-10-30

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