CN100375219C - 用于超紫外辐射的气体放电灯 - Google Patents
用于超紫外辐射的气体放电灯 Download PDFInfo
- Publication number
- CN100375219C CN100375219C CNB2003801049941A CN200380104994A CN100375219C CN 100375219 C CN100375219 C CN 100375219C CN B2003801049941 A CNB2003801049941 A CN B2003801049941A CN 200380104994 A CN200380104994 A CN 200380104994A CN 100375219 C CN100375219 C CN 100375219C
- Authority
- CN
- China
- Prior art keywords
- hole
- hollow cathode
- anode
- discharge lamp
- gaseous discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 13
- 230000007246 mechanism Effects 0.000 claims description 13
- 210000002381 plasma Anatomy 0.000 description 58
- 208000028659 discharge Diseases 0.000 description 26
- 238000005260 corrosion Methods 0.000 description 11
- 230000007797 corrosion Effects 0.000 description 11
- 238000010894 electron beam technology Methods 0.000 description 8
- 230000008602 contraction Effects 0.000 description 7
- 238000010884 ion-beam technique Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000002349 favourable effect Effects 0.000 description 4
- 239000010406 cathode material Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 230000004224 protection Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 235000019506 cigar Nutrition 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 208000002925 dental caries Diseases 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000003534 oscillatory effect Effects 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/09—Hollow cathodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Discharge Lamp (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
Claims (14)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10256663A DE10256663B3 (de) | 2002-12-04 | 2002-12-04 | Gasentladungslampe für EUV-Strahlung |
DE10256663.1 | 2002-12-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1720600A CN1720600A (zh) | 2006-01-11 |
CN100375219C true CN100375219C (zh) | 2008-03-12 |
Family
ID=32403701
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2003801049941A Expired - Lifetime CN100375219C (zh) | 2002-12-04 | 2003-11-28 | 用于超紫外辐射的气体放电灯 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7397190B2 (zh) |
EP (1) | EP1570507A2 (zh) |
JP (1) | JP4594101B2 (zh) |
CN (1) | CN100375219C (zh) |
AU (1) | AU2003302551A1 (zh) |
DE (1) | DE10256663B3 (zh) |
TW (1) | TW200503045A (zh) |
WO (1) | WO2004051698A2 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10238096B3 (de) * | 2002-08-21 | 2004-02-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe |
US6770895B2 (en) | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
US6919573B2 (en) | 2003-03-20 | 2005-07-19 | Asml Holding N.V | Method and apparatus for recycling gases used in a lithography tool |
DE10359464A1 (de) * | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
DE102005025624B4 (de) * | 2005-06-01 | 2010-03-18 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas |
JP4932185B2 (ja) * | 2005-06-30 | 2012-05-16 | 浜松ホトニクス株式会社 | ガス放電管、光源装置及び液体クロマトグラフ |
US7825390B2 (en) * | 2007-02-14 | 2010-11-02 | Asml Netherlands B.V. | Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus |
DE102007020742B8 (de) * | 2007-04-28 | 2009-06-18 | Xtreme Technologies Gmbh | Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung |
US8493548B2 (en) * | 2007-08-06 | 2013-07-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7872244B2 (en) * | 2007-08-08 | 2011-01-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102007060807B4 (de) * | 2007-12-18 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungsquelle, insbesondere für EUV-Strahlung |
WO2010065170A1 (en) * | 2008-08-20 | 2010-06-10 | Manhattan Technologies Ltd. | Multibeam doubly convergent electron gun |
US8304973B2 (en) * | 2010-08-23 | 2012-11-06 | Hamamatsu Photonics K.K. | Flash lamp |
DE102011113681A1 (de) * | 2011-09-20 | 2013-03-21 | Heraeus Noblelight Gmbh | Lampeneinheit für die Erzeugung optischer Strahlung |
DE102013001940B4 (de) * | 2013-02-05 | 2021-10-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur Erzeugung von EUV-und/oder weicher Röntgenstrahlung |
RU2593147C1 (ru) * | 2015-05-14 | 2016-07-27 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Устройство и способ для получения высокотемпературной плазмы и эуф излучения |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0282666A1 (en) * | 1985-10-03 | 1988-09-21 | Canadian Patents and Development Limited Société Canadienne des Brevets et d'Exploitation Limitée | Gas discharge derived annular plasma pinch x-ray source |
US5801495A (en) * | 1995-12-20 | 1998-09-01 | Heraeus Noblelight Gmbh | Low-pressure discharge lamp containing partitions therein |
WO2001091523A2 (en) * | 2000-05-22 | 2001-11-29 | Plex Llc | Extreme ultraviolet source based on colliding neutral beams |
WO2002082872A1 (de) * | 2001-04-06 | 2002-10-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5126638A (en) * | 1991-05-13 | 1992-06-30 | Maxwell Laboratories, Inc. | Coaxial pseudospark discharge switch |
US5502356A (en) * | 1994-05-02 | 1996-03-26 | Plex Corporation | Stabilized radial pseudospark switch |
US5467362A (en) * | 1994-08-03 | 1995-11-14 | Murray; Gordon A. | Pulsed gas discharge Xray laser |
DE19753696A1 (de) * | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
AU1842200A (en) * | 1998-12-07 | 2000-06-26 | E.I. Du Pont De Nemours And Company | Hollow cathode array for plasma generation |
DE19962160C2 (de) * | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung |
TWI246872B (en) * | 1999-12-17 | 2006-01-01 | Asml Netherlands Bv | Radiation source for use in lithographic projection apparatus |
US6469310B1 (en) * | 1999-12-17 | 2002-10-22 | Asml Netherlands B.V. | Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus |
DE10025443A1 (de) | 2000-05-23 | 2001-12-06 | Siemens Ag | Vorrichtung zum Bestücken von Substraten mit elektrischen Bauteilen |
US6804327B2 (en) * | 2001-04-03 | 2004-10-12 | Lambda Physik Ag | Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays |
TW589924B (en) * | 2001-04-06 | 2004-06-01 | Fraunhofer Ges Forschung | Process and device for producing extreme ultraviolet ray/weak x-ray |
US6714624B2 (en) * | 2001-09-18 | 2004-03-30 | Euv Llc | Discharge source with gas curtain for protecting optics from particles |
DE10238096B3 (de) * | 2002-08-21 | 2004-02-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe |
-
2002
- 2002-12-04 DE DE10256663A patent/DE10256663B3/de not_active Expired - Lifetime
-
2003
- 2003-11-28 WO PCT/IB2003/005496 patent/WO2004051698A2/de active Application Filing
- 2003-11-28 AU AU2003302551A patent/AU2003302551A1/en not_active Abandoned
- 2003-11-28 US US10/536,918 patent/US7397190B2/en active Active
- 2003-11-28 EP EP03812235A patent/EP1570507A2/de not_active Withdrawn
- 2003-11-28 CN CNB2003801049941A patent/CN100375219C/zh not_active Expired - Lifetime
- 2003-11-28 JP JP2004556668A patent/JP4594101B2/ja not_active Expired - Lifetime
- 2003-12-02 TW TW092133834A patent/TW200503045A/zh unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0282666A1 (en) * | 1985-10-03 | 1988-09-21 | Canadian Patents and Development Limited Société Canadienne des Brevets et d'Exploitation Limitée | Gas discharge derived annular plasma pinch x-ray source |
US5801495A (en) * | 1995-12-20 | 1998-09-01 | Heraeus Noblelight Gmbh | Low-pressure discharge lamp containing partitions therein |
WO2001091523A2 (en) * | 2000-05-22 | 2001-11-29 | Plex Llc | Extreme ultraviolet source based on colliding neutral beams |
WO2002082872A1 (de) * | 2001-04-06 | 2002-10-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung |
Also Published As
Publication number | Publication date |
---|---|
AU2003302551A8 (en) | 2010-12-09 |
WO2004051698A8 (de) | 2010-11-11 |
EP1570507A2 (de) | 2005-09-07 |
US7397190B2 (en) | 2008-07-08 |
WO2004051698A2 (de) | 2004-06-17 |
JP4594101B2 (ja) | 2010-12-08 |
CN1720600A (zh) | 2006-01-11 |
TW200503045A (en) | 2005-01-16 |
US20060138960A1 (en) | 2006-06-29 |
WO2004051698A3 (de) | 2004-09-10 |
JP2006509330A (ja) | 2006-03-16 |
AU2003302551A1 (en) | 2004-06-23 |
DE10256663B3 (de) | 2005-10-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Holland Ian Deho Finn Patentee after: KONINKLIJKE PHILIPS N.V. Address before: Holland Ian Deho Finn Patentee before: Koninklijke Philips Electronics N.V. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190805 Address after: Tokyo, Japan Patentee after: USHIO DENKI Kabushiki Kaisha Address before: Holland Ian Deho Finn Patentee before: KONINKLIJKE PHILIPS N.V. |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20080312 |