JP2006509330A - Euv放射用放電灯 - Google Patents
Euv放射用放電灯 Download PDFInfo
- Publication number
- JP2006509330A JP2006509330A JP2004556668A JP2004556668A JP2006509330A JP 2006509330 A JP2006509330 A JP 2006509330A JP 2004556668 A JP2004556668 A JP 2004556668A JP 2004556668 A JP2004556668 A JP 2004556668A JP 2006509330 A JP2006509330 A JP 2006509330A
- Authority
- JP
- Japan
- Prior art keywords
- opening
- hollow cathode
- discharge lamp
- anode
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 21
- 230000003628 erosive effect Effects 0.000 description 11
- 239000007789 gas Substances 0.000 description 9
- 239000011796 hollow space material Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000010884 ion-beam technique Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000010406 cathode material Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/09—Hollow cathodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Discharge Lamp (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
作動圧力は、約1パスカル乃至100パスカルの領域にある。動作点が選択され、電極距離及び放電圧の結果物は、パッシェンカーブの左側の分岐にある。この場合、発生電圧は、一定の電極構成を前提として、減少するガス圧力を伴って上昇する。
Claims (13)
- 陽極及び中空陰極を備えたEUV放射用放電灯であって、
前記中空陰極は、少なくとも2つの開口を有し、前記陽極は貫通開口を有し、
前記中空陰極の開口の長手方向軸は、前記陽極の開口の対称の軸上にある交点Sという共有点を有することを特徴とする、
放電灯。 - 各中空陰極の開口の前記長手方向軸は、夫々の中空陰極の開口に対向して位置された中空陰極の壁の一部に対して略垂直であることを特徴とする、
請求項1記載の放電灯。 - 各中空陰極の開口は、別個の中空陰極空間と関連付けられることを特徴とする、請求項1又は2記載の放電灯。
- 中空陰極の開口は、ブラインドホールとして形成されることを特徴とする、請求項1乃至3のうちいずれか一項記載の放電灯。
- 前記対称の軸上にある前記中空陰極の開口は、ブラインドホールとして形成されることを特徴とする、請求項4記載の放電灯。
- 前記中空陰極は、前記陽極の開口の前記対称の軸上に開口を有さないことを特徴とする、請求項1乃至3のうちいずれか一項記載の放電灯。
- 前記中空陰極は、前記陽極の開口の前記対称の軸上に貫通穴を有し、前記貫通穴の直径が、他の中空陰極の開口の直径よりも小さいことを特徴とする、請求項1乃至4のうちいずれか一項記載の放電灯。
- 前記陽極は、追加的な開口を有し、当該開口の長手方向軸は、夫々の中空陰極の開口の前記長手方向軸と夫々一致することを特徴とする、請求項1乃至7のうちいずれか一項記載の放電灯。
- 前記交点Sの点から見ると、前記追加的な陽極の開口の後背部の空間領域は閉じられていることを特徴とする、請求項8記載の放電灯。
- 追加的な陽極の開口は、ブラインドホールとして形成されることを特徴とする、請求項8又は9記載の放電灯。
- 前記陽極の前記中央貫通穴は、グリッドとして形成され、当該開口領域は縞状又は格子状であることを特徴とする、請求項8乃至10のうちいずれか一項記載の放電灯。
- トリガ装置は、1つ又は複数の前記中空陰極空間に与えられ、望ましくは追加的な電極、誘電性トリガ、パルス高周波数源、1つ又は複数のグロー放電ユニット、又はパルスレーザ・ビーム源が与えられることを特徴とする、請求項1乃至11のうちいずれか一項記載の放電灯。
- 補助的陰極と連携する二重のプラズマは、前記トリガ装置として与えられることを特徴とする、請求項1乃至12のうちいずれか一項記載の放電灯。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10256663A DE10256663B3 (de) | 2002-12-04 | 2002-12-04 | Gasentladungslampe für EUV-Strahlung |
PCT/IB2003/005496 WO2004051698A2 (de) | 2002-12-04 | 2003-11-28 | Gasentladungslampe für euv-strahlung |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006509330A true JP2006509330A (ja) | 2006-03-16 |
JP4594101B2 JP4594101B2 (ja) | 2010-12-08 |
Family
ID=32403701
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004556668A Expired - Lifetime JP4594101B2 (ja) | 2002-12-04 | 2003-11-28 | Euv放射用放電灯 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7397190B2 (ja) |
EP (1) | EP1570507A2 (ja) |
JP (1) | JP4594101B2 (ja) |
CN (1) | CN100375219C (ja) |
AU (1) | AU2003302551A1 (ja) |
DE (1) | DE10256663B3 (ja) |
TW (1) | TW200503045A (ja) |
WO (1) | WO2004051698A2 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10238096B3 (de) * | 2002-08-21 | 2004-02-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe |
US6770895B2 (en) | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
US6919573B2 (en) | 2003-03-20 | 2005-07-19 | Asml Holding N.V | Method and apparatus for recycling gases used in a lithography tool |
DE10359464A1 (de) * | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
DE102005025624B4 (de) * | 2005-06-01 | 2010-03-18 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas |
JP4932185B2 (ja) * | 2005-06-30 | 2012-05-16 | 浜松ホトニクス株式会社 | ガス放電管、光源装置及び液体クロマトグラフ |
US7825390B2 (en) * | 2007-02-14 | 2010-11-02 | Asml Netherlands B.V. | Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus |
DE102007020742B8 (de) * | 2007-04-28 | 2009-06-18 | Xtreme Technologies Gmbh | Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung |
US8493548B2 (en) * | 2007-08-06 | 2013-07-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7872244B2 (en) * | 2007-08-08 | 2011-01-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102007060807B4 (de) * | 2007-12-18 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungsquelle, insbesondere für EUV-Strahlung |
US20100045160A1 (en) * | 2008-08-20 | 2010-02-25 | Manhattan Technologies Ltd. | Multibeam doubly convergent electron gun |
US8304973B2 (en) * | 2010-08-23 | 2012-11-06 | Hamamatsu Photonics K.K. | Flash lamp |
DE102011113681A1 (de) * | 2011-09-20 | 2013-03-21 | Heraeus Noblelight Gmbh | Lampeneinheit für die Erzeugung optischer Strahlung |
DE102013001940B4 (de) * | 2013-02-05 | 2021-10-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur Erzeugung von EUV-und/oder weicher Röntgenstrahlung |
RU2593147C1 (ru) * | 2015-05-14 | 2016-07-27 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Устройство и способ для получения высокотемпературной плазмы и эуф излучения |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001311799A (ja) * | 1999-12-17 | 2001-11-09 | Asm Lithography Bv | 平版投影装置用の照射源 |
WO2002082872A1 (de) * | 2001-04-06 | 2002-10-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung |
WO2002082871A1 (de) * | 2001-04-06 | 2002-10-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und vorrichtung zum erzeugen von extrem-ultravioletter strahlung oder weicher röntgenstrahlung |
JP2003503814A (ja) * | 1999-06-29 | 2003-01-28 | フラウンホッファー−ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ. | ガス放電から超紫外線および軟x線を生成する装置 |
JP2005503657A (ja) * | 2001-09-18 | 2005-02-03 | イーユーヴィー リミテッド リアビリティ コーポレーション | 光学系をデブリ粒子から保護するガスカーテンを具えた放電源 |
JP2005536844A (ja) * | 2002-08-21 | 2005-12-02 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | ガス放電ランプ |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1239486A (en) * | 1985-10-03 | 1988-07-19 | Rajendra P. Gupta | Gas discharge derived annular plasma pinch x-ray source |
US5126638A (en) * | 1991-05-13 | 1992-06-30 | Maxwell Laboratories, Inc. | Coaxial pseudospark discharge switch |
US5502356A (en) * | 1994-05-02 | 1996-03-26 | Plex Corporation | Stabilized radial pseudospark switch |
US5467362A (en) * | 1994-08-03 | 1995-11-14 | Murray; Gordon A. | Pulsed gas discharge Xray laser |
DE19547813C2 (de) * | 1995-12-20 | 1997-10-16 | Heraeus Noblelight Gmbh | Elektrodenlose Entladungslampe mit Blendenkörper |
DE19753696A1 (de) * | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
EP1141996A1 (en) * | 1998-12-07 | 2001-10-10 | E.I. Du Pont De Nemours And Company | Hollow cathode array for plasma generation |
TWI246872B (en) * | 1999-12-17 | 2006-01-01 | Asml Netherlands Bv | Radiation source for use in lithographic projection apparatus |
US6421421B1 (en) * | 2000-05-22 | 2002-07-16 | Plex, Llc | Extreme ultraviolet based on colliding neutral beams |
DE10025443A1 (de) | 2000-05-23 | 2001-12-06 | Siemens Ag | Vorrichtung zum Bestücken von Substraten mit elektrischen Bauteilen |
US6804327B2 (en) * | 2001-04-03 | 2004-10-12 | Lambda Physik Ag | Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays |
-
2002
- 2002-12-04 DE DE10256663A patent/DE10256663B3/de not_active Expired - Lifetime
-
2003
- 2003-11-28 AU AU2003302551A patent/AU2003302551A1/en not_active Abandoned
- 2003-11-28 US US10/536,918 patent/US7397190B2/en active Active
- 2003-11-28 JP JP2004556668A patent/JP4594101B2/ja not_active Expired - Lifetime
- 2003-11-28 WO PCT/IB2003/005496 patent/WO2004051698A2/de active Application Filing
- 2003-11-28 EP EP03812235A patent/EP1570507A2/de not_active Withdrawn
- 2003-11-28 CN CNB2003801049941A patent/CN100375219C/zh not_active Expired - Lifetime
- 2003-12-02 TW TW092133834A patent/TW200503045A/zh unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003503814A (ja) * | 1999-06-29 | 2003-01-28 | フラウンホッファー−ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ. | ガス放電から超紫外線および軟x線を生成する装置 |
JP2001311799A (ja) * | 1999-12-17 | 2001-11-09 | Asm Lithography Bv | 平版投影装置用の照射源 |
WO2002082872A1 (de) * | 2001-04-06 | 2002-10-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung |
WO2002082871A1 (de) * | 2001-04-06 | 2002-10-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und vorrichtung zum erzeugen von extrem-ultravioletter strahlung oder weicher röntgenstrahlung |
JP2005503657A (ja) * | 2001-09-18 | 2005-02-03 | イーユーヴィー リミテッド リアビリティ コーポレーション | 光学系をデブリ粒子から保護するガスカーテンを具えた放電源 |
JP2005536844A (ja) * | 2002-08-21 | 2005-12-02 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | ガス放電ランプ |
Also Published As
Publication number | Publication date |
---|---|
CN100375219C (zh) | 2008-03-12 |
WO2004051698A2 (de) | 2004-06-17 |
WO2004051698A3 (de) | 2004-09-10 |
AU2003302551A1 (en) | 2004-06-23 |
WO2004051698A8 (de) | 2010-11-11 |
TW200503045A (en) | 2005-01-16 |
JP4594101B2 (ja) | 2010-12-08 |
US20060138960A1 (en) | 2006-06-29 |
AU2003302551A8 (en) | 2010-12-09 |
DE10256663B3 (de) | 2005-10-13 |
US7397190B2 (en) | 2008-07-08 |
CN1720600A (zh) | 2006-01-11 |
EP1570507A2 (de) | 2005-09-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4594101B2 (ja) | Euv放射用放電灯 | |
US6408052B1 (en) | Z-pinch plasma X-ray source using surface discharge preionization | |
US20070026160A1 (en) | Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma | |
US4633129A (en) | Hollow cathode | |
US7809112B2 (en) | Method and device for generating EUV radiation and/or soft X-ray radiation | |
WO2011034086A1 (ja) | 電子銃、真空処理装置 | |
JP4563807B2 (ja) | ガス放電ランプ | |
RU2654494C1 (ru) | Вакуумный искровой разрядник | |
US7595594B2 (en) | Arrangement for switching high electric currents by a gas discharge | |
RU2333619C2 (ru) | Многолучевой генератор газоразрядной плазмы | |
CN100482030C (zh) | 用于产生远紫外线和软x射线的装置 | |
JP5321234B2 (ja) | イオン源 | |
KR20220120848A (ko) | 엑스레이 튜브 | |
RU2215383C1 (ru) | Плазменный электронный источник | |
RU2654493C1 (ru) | Вакуумный разрядник | |
RU2306683C1 (ru) | Плазменный электронный источник | |
Burdovitsin et al. | Plasma Electron Sources | |
JP3490770B2 (ja) | ターゲット装置及びx線レーザ装置 | |
JPH0864141A (ja) | 気体放電閉路スイッチ | |
KR20020004934A (ko) | 선형이온빔의 플라즈마소스 | |
Urai et al. | High-repetition-rate operation of the wire ion plasma source using a novel method | |
EP0543822B1 (en) | Discharge lamp arrangement | |
JPS5949149A (ja) | プラズマ陰極電子ビ−ム発生装置および方法 | |
RU2239257C1 (ru) | Диодный узел для генератора сверхвысокочастотного излучения | |
KR19990024229A (ko) | 플라즈마를 이용한 램프 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061127 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100317 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100323 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100618 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100824 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100916 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130924 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4594101 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |