TW200503045A - Gas discharge lamp for EUV radiation - Google Patents
Gas discharge lamp for EUV radiationInfo
- Publication number
- TW200503045A TW200503045A TW092133834A TW92133834A TW200503045A TW 200503045 A TW200503045 A TW 200503045A TW 092133834 A TW092133834 A TW 092133834A TW 92133834 A TW92133834 A TW 92133834A TW 200503045 A TW200503045 A TW 200503045A
- Authority
- TW
- Taiwan
- Prior art keywords
- discharge lamp
- gas discharge
- euv radiation
- anode
- hollow cathode
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/09—Hollow cathodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Discharge Lamp (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10256663A DE10256663B3 (de) | 2002-12-04 | 2002-12-04 | Gasentladungslampe für EUV-Strahlung |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200503045A true TW200503045A (en) | 2005-01-16 |
Family
ID=32403701
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW092133834A TW200503045A (en) | 2002-12-04 | 2003-12-02 | Gas discharge lamp for EUV radiation |
Country Status (8)
Country | Link |
---|---|
US (1) | US7397190B2 (zh) |
EP (1) | EP1570507A2 (zh) |
JP (1) | JP4594101B2 (zh) |
CN (1) | CN100375219C (zh) |
AU (1) | AU2003302551A1 (zh) |
DE (1) | DE10256663B3 (zh) |
TW (1) | TW200503045A (zh) |
WO (1) | WO2004051698A2 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10238096B3 (de) * | 2002-08-21 | 2004-02-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe |
US6770895B2 (en) | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
US6919573B2 (en) | 2003-03-20 | 2005-07-19 | Asml Holding N.V | Method and apparatus for recycling gases used in a lithography tool |
DE10359464A1 (de) * | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
DE102005025624B4 (de) * | 2005-06-01 | 2010-03-18 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas |
JP4932185B2 (ja) * | 2005-06-30 | 2012-05-16 | 浜松ホトニクス株式会社 | ガス放電管、光源装置及び液体クロマトグラフ |
US7825390B2 (en) * | 2007-02-14 | 2010-11-02 | Asml Netherlands B.V. | Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus |
DE102007020742B8 (de) * | 2007-04-28 | 2009-06-18 | Xtreme Technologies Gmbh | Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung |
US8493548B2 (en) * | 2007-08-06 | 2013-07-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7872244B2 (en) * | 2007-08-08 | 2011-01-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102007060807B4 (de) * | 2007-12-18 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungsquelle, insbesondere für EUV-Strahlung |
US20100045160A1 (en) * | 2008-08-20 | 2010-02-25 | Manhattan Technologies Ltd. | Multibeam doubly convergent electron gun |
US8304973B2 (en) * | 2010-08-23 | 2012-11-06 | Hamamatsu Photonics K.K. | Flash lamp |
DE102011113681A1 (de) * | 2011-09-20 | 2013-03-21 | Heraeus Noblelight Gmbh | Lampeneinheit für die Erzeugung optischer Strahlung |
DE102013001940B4 (de) * | 2013-02-05 | 2021-10-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur Erzeugung von EUV-und/oder weicher Röntgenstrahlung |
RU2593147C1 (ru) * | 2015-05-14 | 2016-07-27 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Устройство и способ для получения высокотемпературной плазмы и эуф излучения |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1239486A (en) * | 1985-10-03 | 1988-07-19 | Rajendra P. Gupta | Gas discharge derived annular plasma pinch x-ray source |
US5126638A (en) * | 1991-05-13 | 1992-06-30 | Maxwell Laboratories, Inc. | Coaxial pseudospark discharge switch |
US5502356A (en) * | 1994-05-02 | 1996-03-26 | Plex Corporation | Stabilized radial pseudospark switch |
US5467362A (en) * | 1994-08-03 | 1995-11-14 | Murray; Gordon A. | Pulsed gas discharge Xray laser |
DE19547813C2 (de) * | 1995-12-20 | 1997-10-16 | Heraeus Noblelight Gmbh | Elektrodenlose Entladungslampe mit Blendenkörper |
DE19753696A1 (de) * | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
CN1331836A (zh) * | 1998-12-07 | 2002-01-16 | 纳幕尔杜邦公司 | 用于产生等离子体的空心阴极阵列 |
DE19962160C2 (de) * | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung |
TWI246872B (en) * | 1999-12-17 | 2006-01-01 | Asml Netherlands Bv | Radiation source for use in lithographic projection apparatus |
US6469310B1 (en) * | 1999-12-17 | 2002-10-22 | Asml Netherlands B.V. | Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus |
US6421421B1 (en) * | 2000-05-22 | 2002-07-16 | Plex, Llc | Extreme ultraviolet based on colliding neutral beams |
DE10025443A1 (de) | 2000-05-23 | 2001-12-06 | Siemens Ag | Vorrichtung zum Bestücken von Substraten mit elektrischen Bauteilen |
US6804327B2 (en) * | 2001-04-03 | 2004-10-12 | Lambda Physik Ag | Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays |
DE10139677A1 (de) * | 2001-04-06 | 2002-10-17 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung |
TW589924B (en) * | 2001-04-06 | 2004-06-01 | Fraunhofer Ges Forschung | Process and device for producing extreme ultraviolet ray/weak x-ray |
US6714624B2 (en) * | 2001-09-18 | 2004-03-30 | Euv Llc | Discharge source with gas curtain for protecting optics from particles |
DE10238096B3 (de) * | 2002-08-21 | 2004-02-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe |
-
2002
- 2002-12-04 DE DE10256663A patent/DE10256663B3/de not_active Expired - Lifetime
-
2003
- 2003-11-28 CN CNB2003801049941A patent/CN100375219C/zh not_active Expired - Lifetime
- 2003-11-28 AU AU2003302551A patent/AU2003302551A1/en not_active Abandoned
- 2003-11-28 EP EP03812235A patent/EP1570507A2/de not_active Withdrawn
- 2003-11-28 US US10/536,918 patent/US7397190B2/en active Active
- 2003-11-28 WO PCT/IB2003/005496 patent/WO2004051698A2/de active Application Filing
- 2003-11-28 JP JP2004556668A patent/JP4594101B2/ja not_active Expired - Lifetime
- 2003-12-02 TW TW092133834A patent/TW200503045A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
EP1570507A2 (de) | 2005-09-07 |
WO2004051698A3 (de) | 2004-09-10 |
CN100375219C (zh) | 2008-03-12 |
CN1720600A (zh) | 2006-01-11 |
AU2003302551A1 (en) | 2004-06-23 |
WO2004051698A2 (de) | 2004-06-17 |
DE10256663B3 (de) | 2005-10-13 |
JP4594101B2 (ja) | 2010-12-08 |
JP2006509330A (ja) | 2006-03-16 |
US20060138960A1 (en) | 2006-06-29 |
AU2003302551A8 (en) | 2010-12-09 |
WO2004051698A8 (de) | 2010-11-11 |
US7397190B2 (en) | 2008-07-08 |
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