CH653372A5 - Verdampfertiegel fuer vakuum-aufdampfanlagen. - Google Patents
Verdampfertiegel fuer vakuum-aufdampfanlagen. Download PDFInfo
- Publication number
- CH653372A5 CH653372A5 CH2241/83A CH224183A CH653372A5 CH 653372 A5 CH653372 A5 CH 653372A5 CH 2241/83 A CH2241/83 A CH 2241/83A CH 224183 A CH224183 A CH 224183A CH 653372 A5 CH653372 A5 CH 653372A5
- Authority
- CH
- Switzerland
- Prior art keywords
- cooling channel
- guide device
- metal body
- evaporator
- evaporator crucible
- Prior art date
Links
- 238000001816 cooling Methods 0.000 claims description 56
- 239000002826 coolant Substances 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 238000005192 partition Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 7
- 230000000630 rising effect Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 4
- 230000001174 ascending effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Toxicology (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Crucibles And Fluidized-Bed Furnaces (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3228311A DE3228311C2 (de) | 1982-07-29 | 1982-07-29 | Verdampfertiegel für Vakuum-Aufdampfanlagen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH653372A5 true CH653372A5 (de) | 1985-12-31 |
Family
ID=6169602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH2241/83A CH653372A5 (de) | 1982-07-29 | 1983-04-27 | Verdampfertiegel fuer vakuum-aufdampfanlagen. |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4530100A (enExample) |
| JP (1) | JPS5938384A (enExample) |
| CH (1) | CH653372A5 (enExample) |
| DE (1) | DE3228311C2 (enExample) |
| FR (1) | FR2531104B1 (enExample) |
| GB (1) | GB2126255B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0345015A1 (en) * | 1988-05-31 | 1989-12-06 | The Boc Group, Inc. | Vapour deposition method and apparatus |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5111022A (en) * | 1989-08-23 | 1992-05-05 | Tfi Telemark | Cooling system for electron beam gun and method |
| JPH0765163B2 (ja) * | 1991-09-30 | 1995-07-12 | 株式会社シンクロン | ハースライナおよび蒸着方法 |
| US5473627A (en) * | 1992-11-05 | 1995-12-05 | Mdc Vacuum Products Corporation | UHV rotating fluid delivery system |
| JP2008240305A (ja) * | 2007-03-27 | 2008-10-09 | Sanwa Shutter Corp | 建具枠の躯体取付金具および躯体取付構造 |
| DE102019104988A1 (de) * | 2019-02-27 | 2020-08-27 | VON ARDENNE Asset GmbH & Co. KG | Versorgungsvorrichtung, Verfahren und Prozessieranordnung |
| KR102761515B1 (ko) * | 2019-02-27 | 2025-02-04 | 삼성디스플레이 주식회사 | 증착원 증발 장치 및 그 제조방법 |
| EP4384648A1 (en) | 2021-08-12 | 2024-06-19 | Applied Materials, Inc. | Evaporator for effective surface area evaporation |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2060936A (en) * | 1936-02-15 | 1936-11-17 | Todd Comb Equipment Inc | Heat exchange means |
| NL259959A (enExample) * | 1960-02-03 | |||
| DE1262101C2 (de) * | 1962-12-15 | 1973-10-25 | Tiegel fuer die verdampfung von stoffen im vakuum mittels elektronenstrahlen, insbesondere zur bandbedampfung | |
| US3414655A (en) * | 1966-01-26 | 1968-12-03 | Nat Res Corp | Apparatus for evaporation of low temperature semiconductor material by electron beam impingement on the material and comprising means for draining electric charge from the material |
| US3360600A (en) * | 1966-07-13 | 1967-12-26 | Air Reduction | Vapor source assembly |
| DE3010925A1 (de) * | 1980-03-21 | 1981-10-01 | Albrecht G. Prof. Dr. 4600 Dortmund Fischer | Gallium-gekuehlte elektronenstrahl-drehtiegel-vakuum-aufdampfanlage |
-
1982
- 1982-07-29 DE DE3228311A patent/DE3228311C2/de not_active Expired
-
1983
- 1983-04-27 CH CH2241/83A patent/CH653372A5/de not_active IP Right Cessation
- 1983-07-07 US US06/511,862 patent/US4530100A/en not_active Expired - Fee Related
- 1983-07-18 GB GB08319337A patent/GB2126255B/en not_active Expired
- 1983-07-21 JP JP58132021A patent/JPS5938384A/ja active Granted
- 1983-07-29 FR FR8312589A patent/FR2531104B1/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0345015A1 (en) * | 1988-05-31 | 1989-12-06 | The Boc Group, Inc. | Vapour deposition method and apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| GB8319337D0 (en) | 1983-08-17 |
| DE3228311A1 (de) | 1984-02-02 |
| FR2531104B1 (fr) | 1989-07-28 |
| FR2531104A1 (fr) | 1984-02-03 |
| JPH032948B2 (enExample) | 1991-01-17 |
| JPS5938384A (ja) | 1984-03-02 |
| GB2126255A (en) | 1984-03-21 |
| DE3228311C2 (de) | 1984-07-05 |
| GB2126255B (en) | 1985-09-04 |
| US4530100A (en) | 1985-07-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PFA | Name/firm changed |
Owner name: LEYBOLD AKTIENGESELLSCHAFT |
|
| PL | Patent ceased | ||
| PL | Patent ceased |