CH652376A5 - Vorrichtung zum zufuehren von mikroplaettchen zu einer behandlungsstation und eine anlage zum einfuehren von mikroplaettchen in eine vakuumkammer. - Google Patents

Vorrichtung zum zufuehren von mikroplaettchen zu einer behandlungsstation und eine anlage zum einfuehren von mikroplaettchen in eine vakuumkammer. Download PDF

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Publication number
CH652376A5
CH652376A5 CH9476/80A CH947680A CH652376A5 CH 652376 A5 CH652376 A5 CH 652376A5 CH 9476/80 A CH9476/80 A CH 9476/80A CH 947680 A CH947680 A CH 947680A CH 652376 A5 CH652376 A5 CH 652376A5
Authority
CH
Switzerland
Prior art keywords
plate
chamber
slide
cassette
opening
Prior art date
Application number
CH9476/80A
Other languages
German (de)
English (en)
Inventor
George L Coad
Raymond Howard Shaw
Martin Albert Hutchinson
Original Assignee
Varian Associates
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Associates filed Critical Varian Associates
Publication of CH652376A5 publication Critical patent/CH652376A5/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H10P72/3406—
    • H10P72/3411—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y10S414/138—Wafers positioned vertically within cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Physical Vapour Deposition (AREA)
CH9476/80A 1979-12-21 1980-12-22 Vorrichtung zum zufuehren von mikroplaettchen zu einer behandlungsstation und eine anlage zum einfuehren von mikroplaettchen in eine vakuumkammer. CH652376A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/106,342 US4311427A (en) 1979-12-21 1979-12-21 Wafer transfer system

Publications (1)

Publication Number Publication Date
CH652376A5 true CH652376A5 (de) 1985-11-15

Family

ID=22310897

Family Applications (1)

Application Number Title Priority Date Filing Date
CH9476/80A CH652376A5 (de) 1979-12-21 1980-12-22 Vorrichtung zum zufuehren von mikroplaettchen zu einer behandlungsstation und eine anlage zum einfuehren von mikroplaettchen in eine vakuumkammer.

Country Status (8)

Country Link
US (1) US4311427A (enExample)
JP (2) JPS56100440A (enExample)
CH (1) CH652376A5 (enExample)
DE (1) DE3047513A1 (enExample)
FR (1) FR2473022B1 (enExample)
GB (3) GB2066570B (enExample)
IT (1) IT1134852B (enExample)
NL (1) NL8006934A (enExample)

Families Citing this family (106)

* Cited by examiner, † Cited by third party
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Also Published As

Publication number Publication date
JPS6063947A (ja) 1985-04-12
GB2066570B (en) 1984-10-24
FR2473022A1 (fr) 1981-07-10
GB2135120B (en) 1985-02-27
GB8328038D0 (en) 1983-11-23
NL8006934A (nl) 1981-07-16
GB2135120A (en) 1984-08-22
GB8400423D0 (en) 1984-02-08
IT8026865A0 (it) 1980-12-22
FR2473022B1 (fr) 1985-11-29
JPH0159352B2 (enExample) 1989-12-15
JPS56100440A (en) 1981-08-12
DE3047513C2 (enExample) 1990-03-29
IT1134852B (it) 1986-08-20
US4311427A (en) 1982-01-19
GB2066570A (en) 1981-07-08
DE3047513A1 (de) 1981-08-27
JPS614188B2 (enExample) 1986-02-07

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