CH623143A5 - - Google Patents
Download PDFInfo
- Publication number
- CH623143A5 CH623143A5 CH1540977A CH1540977A CH623143A5 CH 623143 A5 CH623143 A5 CH 623143A5 CH 1540977 A CH1540977 A CH 1540977A CH 1540977 A CH1540977 A CH 1540977A CH 623143 A5 CH623143 A5 CH 623143A5
- Authority
- CH
- Switzerland
- Prior art keywords
- treatment
- room
- plate
- carrier
- space
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3085—Imagewise removal using liquid means from plates or webs transported vertically; from plates suspended or immersed vertically in the processing unit
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
- Inking, Control Or Cleaning Of Printing Machines (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19762657558 DE2657558A1 (de) | 1976-12-18 | 1976-12-18 | Vorrichtung zum behandeln von druckplatten |
Publications (1)
Publication Number | Publication Date |
---|---|
CH623143A5 true CH623143A5 (xx) | 1981-05-15 |
Family
ID=5995926
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1540977A CH623143A5 (xx) | 1976-12-18 | 1977-12-14 |
Country Status (9)
Country | Link |
---|---|
US (1) | US4132235A (xx) |
JP (1) | JPS6038697B2 (xx) |
CH (1) | CH623143A5 (xx) |
DE (1) | DE2657558A1 (xx) |
DK (1) | DK561877A (xx) |
FR (1) | FR2374666A1 (xx) |
GB (1) | GB1590107A (xx) |
IT (1) | IT1090666B (xx) |
SE (1) | SE7714281L (xx) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2831845C2 (de) * | 1978-07-20 | 1986-12-18 | Basf Ag, 6700 Ludwigshafen | Vorrichtung zum Behandeln von belichteten photopolymeren Druckplatten |
DE3204912C1 (de) * | 1982-02-12 | 1983-08-11 | Fritz Dipl.-Ing. 8000 München Knollmann | Vorrichtung zum Auswaschen belichteter Druckplatten, insbesondere dünner Kunststoffdruckplatten |
JPS6014244A (ja) * | 1983-07-06 | 1985-01-24 | Fujitsu Ltd | マスク洗浄装置 |
JPS60152152U (ja) * | 1984-03-19 | 1985-10-09 | 日本合成化学工業株式会社 | フオトレジスト基板の処理装置 |
US5158616A (en) * | 1988-07-22 | 1992-10-27 | Tokyo Electron Limited | Apparatus for cleaning a substrate |
FR2652920B1 (fr) * | 1989-10-10 | 1992-03-27 | Aramys Industry Sarl | Procede de developpement automatique de supports exposes et dispositif pour la mise en óoeuvre de ce procede. |
ES2025998A6 (es) * | 1990-09-24 | 1992-04-01 | Agullo Ing | Maquina para el lavado por inmersion de piezas mecanizadas. |
US5572760A (en) * | 1995-04-06 | 1996-11-12 | Patun; Mark | Portable cleaning and scrubbing apparatus |
US6050275A (en) * | 1996-09-27 | 2000-04-18 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
US5806544A (en) * | 1997-02-11 | 1998-09-15 | Eco-Snow Systems, Inc. | Carbon dioxide jet spray disk cleaning system |
DE19832038A1 (de) * | 1997-07-17 | 1999-01-28 | Tokyo Electron Ltd | Verfahren und Einrichtung zum Reinigen und Trocknen |
CN102650836A (zh) * | 2012-05-09 | 2012-08-29 | 郝强 | 平网显影机 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2566142A (en) * | 1948-09-30 | 1951-08-28 | Powers Photo Engraving Company | Etching machine |
US2669241A (en) * | 1949-11-22 | 1954-02-16 | Alfred F Foote | Vegetable washing device |
US3406697A (en) * | 1966-03-04 | 1968-10-22 | Western Technology Inc | Etching mechanism |
US3459202A (en) * | 1967-08-17 | 1969-08-05 | Charles F Roberson | Matrix washer and drier |
SE346129B (xx) * | 1970-12-10 | 1972-06-26 | Nordnero Ab |
-
1976
- 1976-12-18 DE DE19762657558 patent/DE2657558A1/de active Pending
-
1977
- 1977-12-05 IT IT52068/77A patent/IT1090666B/it active
- 1977-12-14 CH CH1540977A patent/CH623143A5/de not_active IP Right Cessation
- 1977-12-15 US US05/860,871 patent/US4132235A/en not_active Expired - Lifetime
- 1977-12-15 SE SE7714281A patent/SE7714281L/xx unknown
- 1977-12-16 DK DK561877A patent/DK561877A/da unknown
- 1977-12-16 JP JP52150747A patent/JPS6038697B2/ja not_active Expired
- 1977-12-16 GB GB52396/77A patent/GB1590107A/en not_active Expired
- 1977-12-19 FR FR7738302A patent/FR2374666A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
GB1590107A (en) | 1981-05-28 |
IT1090666B (it) | 1985-06-26 |
FR2374666A1 (fr) | 1978-07-13 |
DE2657558A1 (de) | 1978-06-22 |
US4132235A (en) | 1979-01-02 |
DK561877A (da) | 1978-06-19 |
JPS5377703A (en) | 1978-07-10 |
JPS6038697B2 (ja) | 1985-09-02 |
SE7714281L (sv) | 1978-06-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |