CH623143A5 - - Google Patents

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Publication number
CH623143A5
CH623143A5 CH1540977A CH1540977A CH623143A5 CH 623143 A5 CH623143 A5 CH 623143A5 CH 1540977 A CH1540977 A CH 1540977A CH 1540977 A CH1540977 A CH 1540977A CH 623143 A5 CH623143 A5 CH 623143A5
Authority
CH
Switzerland
Prior art keywords
treatment
room
plate
carrier
space
Prior art date
Application number
CH1540977A
Other languages
German (de)
English (en)
Inventor
Eckhard Koplin
Horst Dr Hoffmann
Siegfried Raiff
Peter Dr Richter
Helmut Kaufmann
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of CH623143A5 publication Critical patent/CH623143A5/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3085Imagewise removal using liquid means from plates or webs transported vertically; from plates suspended or immersed vertically in the processing unit
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Inking, Control Or Cleaning Of Printing Machines (AREA)
  • Coating Apparatus (AREA)
CH1540977A 1976-12-18 1977-12-14 CH623143A5 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762657558 DE2657558A1 (de) 1976-12-18 1976-12-18 Vorrichtung zum behandeln von druckplatten

Publications (1)

Publication Number Publication Date
CH623143A5 true CH623143A5 (xx) 1981-05-15

Family

ID=5995926

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1540977A CH623143A5 (xx) 1976-12-18 1977-12-14

Country Status (9)

Country Link
US (1) US4132235A (xx)
JP (1) JPS6038697B2 (xx)
CH (1) CH623143A5 (xx)
DE (1) DE2657558A1 (xx)
DK (1) DK561877A (xx)
FR (1) FR2374666A1 (xx)
GB (1) GB1590107A (xx)
IT (1) IT1090666B (xx)
SE (1) SE7714281L (xx)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2831845C2 (de) * 1978-07-20 1986-12-18 Basf Ag, 6700 Ludwigshafen Vorrichtung zum Behandeln von belichteten photopolymeren Druckplatten
DE3204912C1 (de) * 1982-02-12 1983-08-11 Fritz Dipl.-Ing. 8000 München Knollmann Vorrichtung zum Auswaschen belichteter Druckplatten, insbesondere dünner Kunststoffdruckplatten
JPS6014244A (ja) * 1983-07-06 1985-01-24 Fujitsu Ltd マスク洗浄装置
JPS60152152U (ja) * 1984-03-19 1985-10-09 日本合成化学工業株式会社 フオトレジスト基板の処理装置
US5158616A (en) * 1988-07-22 1992-10-27 Tokyo Electron Limited Apparatus for cleaning a substrate
FR2652920B1 (fr) * 1989-10-10 1992-03-27 Aramys Industry Sarl Procede de developpement automatique de supports exposes et dispositif pour la mise en óoeuvre de ce procede.
ES2025998A6 (es) * 1990-09-24 1992-04-01 Agullo Ing Maquina para el lavado por inmersion de piezas mecanizadas.
US5572760A (en) * 1995-04-06 1996-11-12 Patun; Mark Portable cleaning and scrubbing apparatus
US6050275A (en) * 1996-09-27 2000-04-18 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US5806544A (en) * 1997-02-11 1998-09-15 Eco-Snow Systems, Inc. Carbon dioxide jet spray disk cleaning system
DE19832038A1 (de) * 1997-07-17 1999-01-28 Tokyo Electron Ltd Verfahren und Einrichtung zum Reinigen und Trocknen
CN102650836A (zh) * 2012-05-09 2012-08-29 郝强 平网显影机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2566142A (en) * 1948-09-30 1951-08-28 Powers Photo Engraving Company Etching machine
US2669241A (en) * 1949-11-22 1954-02-16 Alfred F Foote Vegetable washing device
US3406697A (en) * 1966-03-04 1968-10-22 Western Technology Inc Etching mechanism
US3459202A (en) * 1967-08-17 1969-08-05 Charles F Roberson Matrix washer and drier
SE346129B (xx) * 1970-12-10 1972-06-26 Nordnero Ab

Also Published As

Publication number Publication date
GB1590107A (en) 1981-05-28
IT1090666B (it) 1985-06-26
FR2374666A1 (fr) 1978-07-13
DE2657558A1 (de) 1978-06-22
US4132235A (en) 1979-01-02
DK561877A (da) 1978-06-19
JPS5377703A (en) 1978-07-10
JPS6038697B2 (ja) 1985-09-02
SE7714281L (sv) 1978-06-19

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Legal Events

Date Code Title Description
PL Patent ceased