CH573985A5 - - Google Patents

Info

Publication number
CH573985A5
CH573985A5 CH1660273A CH1660273A CH573985A5 CH 573985 A5 CH573985 A5 CH 573985A5 CH 1660273 A CH1660273 A CH 1660273A CH 1660273 A CH1660273 A CH 1660273A CH 573985 A5 CH573985 A5 CH 573985A5
Authority
CH
Switzerland
Application number
CH1660273A
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH1660273A priority Critical patent/CH573985A5/xx
Priority to NL7400848.A priority patent/NL165224C/xx
Priority to GB4882374A priority patent/GB1466790A/en
Priority to US524865A priority patent/US3915117A/en
Priority to DE19742454544 priority patent/DE2454544C4/de
Priority to FR7503019A priority patent/FR2252419B1/fr
Publication of CH573985A5 publication Critical patent/CH573985A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH1660273A 1973-11-22 1973-11-22 CH573985A5 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
CH1660273A CH573985A5 (ja) 1973-11-22 1973-11-22
NL7400848.A NL165224C (nl) 1973-11-22 1974-01-22 Inrichting voor het onder vacuuem aanbrengen van oppervlaktelagen op voorwerpen.
GB4882374A GB1466790A (en) 1973-11-22 1974-11-12 Deposition of layers in a vacuum
US524865A US3915117A (en) 1973-11-22 1974-11-18 Vacuum coating apparatus
DE19742454544 DE2454544C4 (de) 1973-11-22 1974-11-18 Vakuumbeschichtungsanlage
FR7503019A FR2252419B1 (ja) 1973-11-22 1975-01-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1660273A CH573985A5 (ja) 1973-11-22 1973-11-22

Publications (1)

Publication Number Publication Date
CH573985A5 true CH573985A5 (ja) 1976-03-31

Family

ID=4418700

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1660273A CH573985A5 (ja) 1973-11-22 1973-11-22

Country Status (6)

Country Link
US (1) US3915117A (ja)
CH (1) CH573985A5 (ja)
DE (1) DE2454544C4 (ja)
FR (1) FR2252419B1 (ja)
GB (1) GB1466790A (ja)
NL (1) NL165224C (ja)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2740129A1 (de) * 1976-09-18 1978-03-23 Claude John Lancelot Hunt Verfahren und vorrichtung zur metallbedampfung
US4226208A (en) * 1977-08-04 1980-10-07 Canon Kabushiki Kaisha Vapor deposition apparatus
DE2847632A1 (de) * 1977-11-19 1979-05-23 Claude John Lancelot Hunt Vakuummetallisierungsvorrichtung
US4313815A (en) * 1978-04-07 1982-02-02 Varian Associates, Inc. Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor
DE2940064A1 (de) * 1979-10-03 1981-04-16 Leybold-Heraeus GmbH, 5000 Köln Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer
US5024747A (en) * 1979-12-21 1991-06-18 Varian Associates, Inc. Wafer coating system
US4756815A (en) * 1979-12-21 1988-07-12 Varian Associates, Inc. Wafer coating system
JPS58197262A (ja) * 1982-05-13 1983-11-16 Canon Inc 量産型真空成膜装置及び真空成膜法
US4500407A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Disk or wafer handling and coating system
DE3448599B4 (de) * 1983-11-28 2004-04-08 Hitachi, Ltd. Verfahren zur Durchführung einer Behandlung unter Vakuum
JPS60184678A (ja) * 1984-03-02 1985-09-20 Canon Inc 真空処理装置
US4534314A (en) * 1984-05-10 1985-08-13 Varian Associates, Inc. Load lock pumping mechanism
JPS61291032A (ja) * 1985-06-17 1986-12-20 Fujitsu Ltd 真空装置
CA1287594C (en) * 1986-04-04 1991-08-13 Miroslav Eror Method and apparatus for handling and processing wafer like materials
US4676884A (en) * 1986-07-23 1987-06-30 The Boc Group, Inc. Wafer processing machine with evacuated wafer transporting and storage system
DE3716498C2 (de) * 1987-05-16 1994-08-04 Leybold Ag Vorrichtung zum Ein- und Ausschleusen von Werkstücken in eine Beschichtungskammer
DE3735284A1 (de) * 1987-10-17 1989-04-27 Leybold Ag Vorrichtung nach dem karussell-prinzip zum beschichten von substraten
US4951603A (en) * 1988-09-12 1990-08-28 Daidousanso Co., Ltd. Apparatus for producing semiconductors
DE4009603A1 (de) * 1989-03-30 1990-10-04 Leybold Ag Vorrichtung zum ein- und ausschleusen eines werkstuecks in eine vakuumkammer
EP0389820B1 (de) * 1989-03-30 1993-06-16 Leybold Aktiengesellschaft Vorrichtung zum Ein- und Ausschleusen eines Werkstücks in eine Vakuumkammer
US5259942A (en) * 1989-03-30 1993-11-09 Leybold Aktiengesellschaft Device for transferring a workpiece into and out from a vacuum chamber
IT1232241B (it) * 1989-09-11 1992-01-28 Cetev Cent Tecnolog Vuoto Dispositivo per il caricamento veloce di substrati in impianti da vuoto
JP3466607B2 (ja) * 1989-09-13 2003-11-17 ソニー株式会社 スパッタリング装置
US5002010A (en) * 1989-10-18 1991-03-26 Varian Associates, Inc. Vacuum vessel
DE59001807D1 (de) * 1990-03-26 1993-07-22 Leybold Ag Vorrichtung zum ein- und ausschleusen eines werkstuecks in eine vakuumkammer.
ATE119948T1 (de) * 1990-03-30 1995-04-15 Sony Corp Sputteranlage.
JP2913745B2 (ja) * 1990-04-10 1999-06-28 松下電器産業株式会社 真空蒸着装置
DE4117969C2 (de) * 1991-05-31 2000-11-09 Balzers Ag Liechtenstein Vakuumkammer
CH691377A5 (de) * 1992-10-06 2001-07-13 Unaxis Balzers Ag Kammeranordnung für den Transport von Werkstücken und deren Verwendung.
EP1179611B1 (de) * 1992-10-06 2004-09-15 Unaxis Balzers Aktiengesellschaft Kammer für den Transport von Werkstücken
DE4235674C2 (de) * 1992-10-22 2000-12-28 Balzers Ag Liechtenstein Kammer für den Transport von Werkstücken in Vakuumatmosphäre, Kammerkombination und Verfahren zum Transportieren eines Werkstückes
DE4235676C2 (de) * 1992-10-22 1997-08-28 Balzers Hochvakuum Vakuumkammer zum Transport scheibenförmiger Werkstücke in einer Vakuumanlage
DE4235677C2 (de) * 1992-10-22 1996-10-31 Balzers Hochvakuum Vakuumkammer, Vakuumbehandlungsanlage mit einer solchen Kammer sowie Transportverfahren
DE4302851A1 (de) * 1993-02-02 1994-08-04 Leybold Ag Vorrichtung zum Anbringen und/oder Entfernen einer Maske an einem Substrat
DE4341635C2 (de) * 1993-12-07 2002-07-18 Unaxis Deutschland Holding Vakuumbeschichtungsanlage
NL1000138C2 (nl) * 1995-04-13 1996-10-15 Od & Me Bv Inrichtingen voor het bewerken van een substraat alsmede werkwijze geschikt voor toepassing bij dergelijke inrichtingen.
US5773088A (en) * 1995-12-05 1998-06-30 Materials Research Group, Inc. Treatment system including vacuum isolated sources and method
DE19624609B4 (de) * 1996-06-20 2009-04-16 Leybold Optics Gmbh Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren
DE19626861B4 (de) * 1996-07-04 2009-04-16 Leybold Optics Gmbh Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren
DE19642852A1 (de) 1996-10-17 1998-04-23 Leybold Systems Gmbh Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf dreidimensionale, schalenförmige oder prismatische Substrate
DE19742923A1 (de) 1997-09-29 1999-04-01 Leybold Systems Gmbh Vorrichtung zum Beschichten eines im wesentlichen flachen, scheibenförmigen Substrats
DE19807031A1 (de) * 1998-02-19 1999-08-26 Leybold Systems Gmbh Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
DE59810465D1 (de) 1998-02-19 2004-01-29 Applied Films Gmbh & Co Kg Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
US6184132B1 (en) * 1999-08-03 2001-02-06 International Business Machines Corporation Integrated cobalt silicide process for semiconductor devices
US6193804B1 (en) * 1999-10-02 2001-02-27 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus and method for sealing a vacuum chamber
US20030029833A1 (en) * 2000-03-20 2003-02-13 Johnson Wayne L High speed photoresist stripping chamber
US6413381B1 (en) 2000-04-12 2002-07-02 Steag Hamatech Ag Horizontal sputtering system
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
US6620252B2 (en) * 2001-10-29 2003-09-16 Thomson Licensing S.A. Metallization module for cathode-ray tube (CRT) applications
JP2008192642A (ja) * 2007-01-31 2008-08-21 Tokyo Electron Ltd 基板処理装置
DE102009018700B4 (de) * 2008-09-01 2020-02-13 Singulus Technologies Ag Beschichtungsanlage und Verfahren zum Beschichten
KR102027108B1 (ko) * 2009-03-18 2019-10-01 에바텍 아크티엔게젤샤프트 진공처리 장치
US10689753B1 (en) * 2009-04-21 2020-06-23 Goodrich Corporation System having a cooling element for densifying a substrate
DE102009037290A1 (de) * 2009-04-24 2010-11-11 Singulus Technologies Ag Transporteinrichtung mit einem auslenkbaren Dichtrahmen
DE102009060649A1 (de) * 2009-12-22 2011-06-30 EISENMANN Anlagenbau GmbH & Co. KG, 71032 Anlage zur Oberflächenbehandlung von Gegenständen
DE102011114593B4 (de) 2011-09-30 2016-11-03 Manz Ag Transporteinrichtung zum Transportieren mehrerer Substrate in den Bereich einer Substrat-Behandlungseinrichtung sowie eine derart ausgestaltete Vakuumbehandlungseinrichtung
EP2641665A1 (en) * 2012-03-19 2013-09-25 Deceuninck NV Multi-step process for fully coloured construction elements
CN110218976A (zh) * 2019-07-17 2019-09-10 南通职业大学 一种零部件自动镀膜装置
CN112206947B (zh) * 2020-10-16 2021-09-28 泰安市力华液压设备有限公司 一种柱塞液压油缸喷漆加工工序用挂具及其使用方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1118869A (en) * 1914-11-24 Carl Kugel Annealing furnace.
US1073235A (en) * 1912-06-19 1913-09-16 Hermann Hillebrand Jr Annealing apparatus.
US1617056A (en) * 1926-04-10 1927-02-08 Charles F Kenworthy Inc Furnace
CH311812A (de) * 1951-11-05 1955-12-15 Zeiss Carl Fa Aufdampfeinrichtung.
US2799600A (en) * 1954-08-17 1957-07-16 Noel W Scott Method of producing electrically conducting transparent coatings on optical surfaces
US3473954A (en) * 1965-12-08 1969-10-21 Ethyl Corp Method and apparatus for tunnel plating
US3568632A (en) * 1969-03-24 1971-03-09 Gary F Cawthon Lens coating apparatus
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
US3749383A (en) * 1971-04-29 1973-07-31 Rca Corp Apparatus for processing semiconductor devices
US3856654A (en) * 1971-08-26 1974-12-24 Western Electric Co Apparatus for feeding and coating masses of workpieces in a controlled atmosphere

Also Published As

Publication number Publication date
GB1466790A (en) 1977-03-09
US3915117A (en) 1975-10-28
DE2454544C4 (de) 1992-07-16
NL7400848A (nl) 1975-05-26
DE2454544B2 (de) 1978-07-13
NL165224B (nl) 1980-10-15
DE2454544C3 (de) 1979-03-29
FR2252419A1 (ja) 1975-06-20
FR2252419B1 (ja) 1980-06-06
NL165224C (nl) 1981-03-16
DE2454544A1 (de) 1975-07-31

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Legal Events

Date Code Title Description
PL Patent ceased