IT1232241B - Dispositivo per il caricamento veloce di substrati in impianti da vuoto - Google Patents

Dispositivo per il caricamento veloce di substrati in impianti da vuoto

Info

Publication number
IT1232241B
IT1232241B IT8948351A IT4835189A IT1232241B IT 1232241 B IT1232241 B IT 1232241B IT 8948351 A IT8948351 A IT 8948351A IT 4835189 A IT4835189 A IT 4835189A IT 1232241 B IT1232241 B IT 1232241B
Authority
IT
Italy
Prior art keywords
substrates
loading device
fast loading
vacuum plants
plants
Prior art date
Application number
IT8948351A
Other languages
English (en)
Other versions
IT8948351A0 (it
Inventor
Carlo Misiano
Enrico Simonetti
Original Assignee
Cetev Cent Tecnolog Vuoto
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cetev Cent Tecnolog Vuoto filed Critical Cetev Cent Tecnolog Vuoto
Priority to IT8948351A priority Critical patent/IT1232241B/it
Publication of IT8948351A0 publication Critical patent/IT8948351A0/it
Priority to US07/537,477 priority patent/US5135778A/en
Priority to EP19900201910 priority patent/EP0421498A3/en
Application granted granted Critical
Publication of IT1232241B publication Critical patent/IT1232241B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L1/00—Enclosures; Chambers
    • B01L1/02—Air-pressure chambers; Air-locks therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Clinical Laboratory Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IT8948351A 1989-09-11 1989-09-11 Dispositivo per il caricamento veloce di substrati in impianti da vuoto IT1232241B (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT8948351A IT1232241B (it) 1989-09-11 1989-09-11 Dispositivo per il caricamento veloce di substrati in impianti da vuoto
US07/537,477 US5135778A (en) 1989-09-11 1990-06-13 Removably attachable fore-chamber for sequentially registering substrates with an opening in a vacuum treatment chamber and process of operation
EP19900201910 EP0421498A3 (en) 1989-09-11 1990-07-13 Device for the rapid loading of substrates or other articles into vacuum plants

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8948351A IT1232241B (it) 1989-09-11 1989-09-11 Dispositivo per il caricamento veloce di substrati in impianti da vuoto

Publications (2)

Publication Number Publication Date
IT8948351A0 IT8948351A0 (it) 1989-09-11
IT1232241B true IT1232241B (it) 1992-01-28

Family

ID=11266049

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8948351A IT1232241B (it) 1989-09-11 1989-09-11 Dispositivo per il caricamento veloce di substrati in impianti da vuoto

Country Status (3)

Country Link
US (1) US5135778A (it)
EP (1) EP0421498A3 (it)
IT (1) IT1232241B (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5516732A (en) * 1992-12-04 1996-05-14 Sony Corporation Wafer processing machine vacuum front end method and apparatus
US6103069A (en) * 1997-03-31 2000-08-15 Applied Materials, Inc. Chamber design with isolation valve to preserve vacuum during maintenance

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3428197A (en) * 1966-04-13 1969-02-18 Ibm Vacuum entry mechanism
CH573985A5 (it) * 1973-11-22 1976-03-31 Balzers Patent Beteilig Ag
US4009680A (en) * 1974-09-16 1977-03-01 Fengler Werner H Apparatus for producing high wear-resistant composite seal
US4634331A (en) * 1982-05-24 1987-01-06 Varian Associates, Inc. Wafer transfer system
US4548699A (en) * 1984-05-17 1985-10-22 Varian Associates, Inc. Transfer plate rotation system
DE3912297C2 (de) * 1989-04-14 1996-07-18 Leybold Ag Katodenzerstäubungsanlage

Also Published As

Publication number Publication date
EP0421498A3 (en) 1991-09-04
US5135778A (en) 1992-08-04
EP0421498A2 (en) 1991-04-10
IT8948351A0 (it) 1989-09-11

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970404