CH570047A5 - - Google Patents
Info
- Publication number
- CH570047A5 CH570047A5 CH1814273A CH1814273A CH570047A5 CH 570047 A5 CH570047 A5 CH 570047A5 CH 1814273 A CH1814273 A CH 1814273A CH 1814273 A CH1814273 A CH 1814273A CH 570047 A5 CH570047 A5 CH 570047A5
- Authority
- CH
- Switzerland
- Prior art keywords
- emitter
- region
- base
- junction
- layer
- Prior art date
Links
- 238000009792 diffusion process Methods 0.000 claims description 30
- 239000004065 semiconductor Substances 0.000 claims description 29
- 239000000969 carrier Substances 0.000 claims description 16
- 230000007704 transition Effects 0.000 claims 3
- 239000012535 impurity Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 11
- 230000004888 barrier function Effects 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 230000000295 complement effect Effects 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 230000003321 amplification Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000000407 epitaxy Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- VMXJCRHCUWKQCB-UHFFFAOYSA-N NPNP Chemical compound NPNP VMXJCRHCUWKQCB-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D18/00—Thyristors
- H10D18/60—Gate-turn-off devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D18/00—Thyristors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D18/00—Thyristors
- H10D18/251—Lateral thyristors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/133—Emitter regions of BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/141—Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/141—Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
- H10D62/148—Cathode regions of thyristors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0112—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
- H10D84/401—Combinations of FETs or IGBTs with BJTs
- H10D84/403—Combinations of FETs or IGBTs with BJTs and with one or more of diodes, resistors or capacitors
- H10D84/406—Combinations of FETs or IGBTs with vertical BJTs and with one or more of diodes, resistors or capacitors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/611—Combinations of BJTs and one or more of diodes, resistors or capacitors
- H10D84/613—Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
- H10D84/617—Combinations of vertical BJTs and only diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/67—Complementary BJTs
- H10D84/673—Vertical complementary BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
- Debugging And Monitoring (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48000551A JPS5147584B2 (en, 2012) | 1972-12-29 | 1972-12-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH570047A5 true CH570047A5 (en, 2012) | 1975-11-28 |
Family
ID=11476845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1814273A CH570047A5 (en, 2012) | 1972-12-29 | 1973-12-27 |
Country Status (14)
| Country | Link |
|---|---|
| JP (1) | JPS5147584B2 (en, 2012) |
| BE (1) | BE809217A (en, 2012) |
| BR (1) | BR7310282D0 (en, 2012) |
| CA (1) | CA1006624A (en, 2012) |
| CH (1) | CH570047A5 (en, 2012) |
| DE (1) | DE2364753C2 (en, 2012) |
| DK (1) | DK138248C (en, 2012) |
| ES (1) | ES421873A1 (en, 2012) |
| FR (1) | FR2212644B1 (en, 2012) |
| GB (1) | GB1455260A (en, 2012) |
| IT (1) | IT1002416B (en, 2012) |
| NL (1) | NL182764C (en, 2012) |
| NO (1) | NO140843C (en, 2012) |
| SE (1) | SE398941B (en, 2012) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT377645B (de) * | 1972-12-29 | 1985-04-10 | Sony Corp | Halbleiterbauteil |
| JPS5754969B2 (en, 2012) * | 1974-04-04 | 1982-11-20 | ||
| JPS5753672B2 (en, 2012) * | 1974-04-10 | 1982-11-13 | ||
| JPS57658B2 (en, 2012) * | 1974-04-16 | 1982-01-07 | ||
| JPS5714064B2 (en, 2012) * | 1974-04-25 | 1982-03-20 | ||
| JPS5648983B2 (en, 2012) * | 1974-05-10 | 1981-11-19 | ||
| JPS5718710B2 (en, 2012) * | 1974-05-10 | 1982-04-17 | ||
| JPS5426789Y2 (en, 2012) * | 1974-07-23 | 1979-09-03 | ||
| GB2130006A (en) * | 1982-10-27 | 1984-05-23 | Vladimir Avraamovic Smolyansky | Bipolar semiconductor device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE547227A (en, 2012) * | 1955-04-21 | |||
| US2806983A (en) * | 1956-06-01 | 1957-09-17 | Gen Electric | Remote base transistor |
| NL242787A (en, 2012) * | 1958-09-05 | |||
| US3591430A (en) * | 1968-11-14 | 1971-07-06 | Philco Ford Corp | Method for fabricating bipolar planar transistor having reduced minority carrier fringing |
-
1972
- 1972-12-29 JP JP48000551A patent/JPS5147584B2/ja not_active Expired
-
1973
- 1973-12-20 GB GB5908973A patent/GB1455260A/en not_active Expired
- 1973-12-21 DK DK702173A patent/DK138248C/da not_active IP Right Cessation
- 1973-12-27 DE DE2364753A patent/DE2364753C2/de not_active Expired
- 1973-12-27 CH CH1814273A patent/CH570047A5/de not_active IP Right Cessation
- 1973-12-28 NL NLAANVRAGE7317814,A patent/NL182764C/xx not_active IP Right Cessation
- 1973-12-28 FR FR7347071A patent/FR2212644B1/fr not_active Expired
- 1973-12-28 SE SE7317519A patent/SE398941B/xx unknown
- 1973-12-28 ES ES421873A patent/ES421873A1/es not_active Expired
- 1973-12-28 BR BR10282/73A patent/BR7310282D0/pt unknown
- 1973-12-28 IT IT32382/73A patent/IT1002416B/it active
- 1973-12-28 CA CA189,081A patent/CA1006624A/en not_active Expired
- 1973-12-28 NO NO4981/73A patent/NO140843C/no unknown
- 1973-12-28 BE BE2053326A patent/BE809217A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| BR7310282D0 (pt) | 1974-08-15 |
| CA1006624A (en) | 1977-03-08 |
| NO140843C (no) | 1979-11-21 |
| FR2212644B1 (en, 2012) | 1976-10-08 |
| NL7317814A (en, 2012) | 1974-07-02 |
| GB1455260A (en) | 1976-11-10 |
| IT1002416B (it) | 1976-05-20 |
| FR2212644A1 (en, 2012) | 1974-07-26 |
| DK138248B (da) | 1978-07-31 |
| DK138248C (da) | 1979-01-08 |
| BE809217A (fr) | 1974-04-16 |
| NL182764B (nl) | 1987-12-01 |
| DE2364753A1 (de) | 1974-07-18 |
| AU6378773A (en) | 1975-06-19 |
| NL182764C (nl) | 1988-05-02 |
| JPS5147584B2 (en, 2012) | 1976-12-15 |
| DE2364753C2 (de) | 1984-01-12 |
| NO140843B (no) | 1979-08-13 |
| SE398941B (sv) | 1978-01-23 |
| ES421873A1 (es) | 1976-08-01 |
| JPS4991192A (en, 2012) | 1974-08-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE3686971T2 (de) | Lateraler transistor mit isoliertem gate mit latch-up-festigkeit. | |
| DE3788253T2 (de) | Steuerbare Tunneldiode. | |
| DE1295093B (de) | Halbleiterbauelement mit mindestens zwei Zonen entgegengesetzten Leitungstyps | |
| DE1944793C3 (de) | Verfahren zur Herstellung einer integrierten Halbleiteranordnung | |
| DE2804568A1 (de) | Schnelles, transistoraehnliches halbleiterbauelement | |
| DE3008034A1 (de) | Elektrodenvorrichtung fuer eine halbleitervorrichtung | |
| CH577750A5 (en, 2012) | ||
| DE1539079A1 (de) | Planartransistor | |
| DE2422912A1 (de) | Integrierter halbleiterkreis | |
| DE2756268C2 (de) | Temperaturkompensierte Bezugsspannungsdiode | |
| DE2842526A1 (de) | Bipolarer transistor | |
| DE2515577C2 (de) | Transistor | |
| CH570047A5 (en, 2012) | ||
| DE69512101T2 (de) | Leistungs-Bipolartransistor | |
| DE1816436A1 (de) | Halbleiterbauelement | |
| DE2047241C3 (de) | Verfahren zur Herstellung einer integrierten Halbleiterschaltung | |
| DE2418560A1 (de) | Halbleitervorrichtung | |
| DE3528562A1 (de) | Statischer induktionstransistor vom tunnelinjektionstyp und denselben umfassende integrierte schaltung | |
| DE1589891B (de) | Integrierte Halbleiterschaltung | |
| DE2547303A1 (de) | Halbleiterbauelement | |
| DE1764829B1 (de) | Planartransistor mit einem scheibenfoermigen halbleiter koerper | |
| DE2454561A1 (de) | Halbleitervorrichtung | |
| DE3874949T2 (de) | Heterouebergang-bipolartransistor. | |
| DE2458735A1 (de) | Transistor mit einem hohen stromverstaerkungsfaktor bei kleinen kollektorstroemen | |
| DE3116229A1 (de) | "steuerbare widerstandsanordnung fuer einen signalverstaerker" |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |