CA2505893A1 - Oxime ester photoinitiators with heteroaromatic groups - Google Patents
Oxime ester photoinitiators with heteroaromatic groups Download PDFInfo
- Publication number
- CA2505893A1 CA2505893A1 CA002505893A CA2505893A CA2505893A1 CA 2505893 A1 CA2505893 A1 CA 2505893A1 CA 002505893 A CA002505893 A CA 002505893A CA 2505893 A CA2505893 A CA 2505893A CA 2505893 A1 CA2505893 A1 CA 2505893A1
- Authority
- CA
- Canada
- Prior art keywords
- substituted
- phenyl
- unsubstituted
- nr5r6
- halogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/333—Radicals substituted by oxygen or sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/335—Radicals substituted by nitrogen atoms not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/12—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/30—Indoles; Hydrogenated indoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to carbon atoms of the hetero ring
- C07D209/42—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
- C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D333/38—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/52—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
- C07D333/54—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
- C07D333/58—Radicals substituted by nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/06—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/06—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/06—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Plural Heterocyclic Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Indole Compounds (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Pyrrole Compounds (AREA)
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Detergent Compositions (AREA)
- Hydrogenated Pyridines (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02406054.3 | 2002-12-03 | ||
| EP02406054 | 2002-12-03 | ||
| PCT/EP2003/050880 WO2004050653A2 (en) | 2002-12-03 | 2003-11-24 | Oxime ester photoinitiators with heteroaromatic groups |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2505893A1 true CA2505893A1 (en) | 2004-06-17 |
Family
ID=32405823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002505893A Abandoned CA2505893A1 (en) | 2002-12-03 | 2003-11-24 | Oxime ester photoinitiators with heteroaromatic groups |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US7648738B2 (enExample) |
| EP (1) | EP1567518B1 (enExample) |
| JP (1) | JP4769461B2 (enExample) |
| KR (1) | KR101032582B1 (enExample) |
| CN (1) | CN1720245B (enExample) |
| AT (1) | ATE420877T1 (enExample) |
| AU (1) | AU2003294034A1 (enExample) |
| CA (1) | CA2505893A1 (enExample) |
| DE (1) | DE60325890D1 (enExample) |
| MX (1) | MXPA05005817A (enExample) |
| TW (1) | TWI326682B (enExample) |
| WO (1) | WO2004050653A2 (enExample) |
Families Citing this family (92)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4830310B2 (ja) * | 2004-02-23 | 2011-12-07 | 三菱化学株式会社 | オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター |
| JP2005300994A (ja) | 2004-04-13 | 2005-10-27 | Jsr Corp | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
| MXPA06015049A (es) * | 2004-07-08 | 2007-02-08 | Novo Nordisk As | Marcadores prolongadores de polipeptidos que comprenden una porcion tetrazol. |
| JP4492238B2 (ja) | 2004-07-26 | 2010-06-30 | Jsr株式会社 | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
| JP4864375B2 (ja) * | 2004-08-09 | 2012-02-01 | ドンジン セミケム カンパニー リミテッド | スペーサ用感光性樹脂組成物、スペーサ及び液晶表示素子 |
| US7759043B2 (en) * | 2004-08-18 | 2010-07-20 | Ciba Specialty Chemicals Corp. | Oxime ester photoinitiators |
| US7696257B2 (en) | 2004-08-20 | 2010-04-13 | Adeka Corporation | Oxime ester compound and photopolymerization initiator containing such compound |
| TWI385485B (zh) * | 2004-11-17 | 2013-02-11 | Jsr Corp | A photosensitive resin composition, a display panel spacer, and a display panel |
| JP4633582B2 (ja) * | 2005-09-06 | 2011-02-16 | 東京応化工業株式会社 | 感光性組成物 |
| JP4761923B2 (ja) * | 2005-10-20 | 2011-08-31 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及び積層体 |
| KR100763744B1 (ko) | 2005-11-07 | 2007-10-04 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 트리아진계 광활성 화합물 |
| CN102093282B (zh) * | 2005-12-01 | 2014-02-12 | 西巴控股有限公司 | 肟酯光敏引发剂 |
| US8586268B2 (en) | 2005-12-20 | 2013-11-19 | Basf Se | Oxime ester photoinitiators |
| US7909928B2 (en) * | 2006-03-24 | 2011-03-22 | The Regents Of The University Of Michigan | Reactive coatings for regioselective surface modification |
| KR101313538B1 (ko) * | 2006-04-06 | 2013-10-01 | 주식회사 동진쎄미켐 | 네가티브 감광성 수지 조성물 |
| TWI403840B (zh) | 2006-04-26 | 2013-08-01 | Fujifilm Corp | 含染料之負型硬化性組成物、彩色濾光片及其製法 |
| JP5256647B2 (ja) * | 2006-05-31 | 2013-08-07 | 三菱化学株式会社 | 保護膜用熱硬化性組成物、硬化物、及び液晶表示装置 |
| JP4586783B2 (ja) * | 2006-09-22 | 2010-11-24 | 東洋インキ製造株式会社 | 感光性着色組成物およびカラーフィルタ |
| JP4913556B2 (ja) * | 2006-11-09 | 2012-04-11 | 富士フイルム株式会社 | 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板 |
| KR101337283B1 (ko) * | 2006-12-20 | 2013-12-06 | 미쓰비시 가가꾸 가부시키가이샤 | 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치 |
| JP5179379B2 (ja) * | 2006-12-27 | 2013-04-10 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| KR101026612B1 (ko) * | 2007-01-19 | 2011-04-04 | 주식회사 엘지화학 | 옥심 에스테르기와 트리아진기를 동시에 포함하는 광활성화합물 및 이를 포함하는 감광성 조성물 |
| US8399047B2 (en) * | 2007-03-22 | 2013-03-19 | The Regents Of The Univeristy Of Michigan | Multifunctional CVD coatings |
| JP4855312B2 (ja) * | 2007-03-27 | 2012-01-18 | 東京応化工業株式会社 | 感光性組成物 |
| KR101175401B1 (ko) * | 2007-04-04 | 2012-08-20 | 히다치 가세고교 가부시끼가이샤 | 감광성 접착제 조성물, 필름상 접착제, 접착 시트, 접착제 패턴, 접착제층 부착 반도체 웨이퍼, 반도체 장치, 및, 반도체 장치의 제조방법 |
| EP2145880B1 (en) | 2007-05-09 | 2011-09-28 | Adeka Corporation | Novel epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition |
| KR101526619B1 (ko) * | 2007-05-11 | 2015-06-05 | 바스프 에스이 | 옥심 에스테르 광개시제 |
| EP2402315A1 (en) | 2007-05-11 | 2012-01-04 | Basf Se | Oxime ester photoinitiators |
| WO2008138733A1 (en) * | 2007-05-11 | 2008-11-20 | Basf Se | Oxime ester photoinitiators |
| WO2009017064A1 (ja) | 2007-08-01 | 2009-02-05 | Adeka Corporation | アルカリ現像性感光性樹脂組成物及びβ-ジケトン化合物 |
| JP2009040762A (ja) * | 2007-08-09 | 2009-02-26 | Ciba Holding Inc | オキシムエステル光開始剤 |
| JP5056301B2 (ja) * | 2007-09-20 | 2012-10-24 | Jsr株式会社 | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
| KR100830561B1 (ko) * | 2007-10-09 | 2008-05-22 | 재단법인서울대학교산학협력재단 | 다기능성 액정화합물 및 이들의 제조방법 그리고 이로부터얻어진 미세패턴 |
| US8283000B2 (en) | 2008-02-22 | 2012-10-09 | Adeka Corporation | Liquid crystal composition containing polymerizable compound and liquid crystal display using the liquid crystal composition |
| WO2009122868A1 (ja) | 2008-04-01 | 2009-10-08 | 株式会社Adeka | 三官能(メタ)アクリレート化合物及び該化合物を含有する重合性組成物 |
| KR101102248B1 (ko) | 2008-04-10 | 2012-01-03 | 주식회사 엘지화학 | 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 |
| JP2010538060A (ja) * | 2008-04-10 | 2010-12-09 | エルジー・ケム・リミテッド | 光活性化合物およびこれを含む感光性樹脂組成物 |
| WO2009147031A2 (en) | 2008-06-06 | 2009-12-10 | Basf Se | Oxime ester photoinitiators |
| JP5274151B2 (ja) * | 2008-08-21 | 2013-08-28 | 富士フイルム株式会社 | 感光性樹脂組成物、カラーフィルタ及びその製造方法、並びに、固体撮像素子 |
| JP5284735B2 (ja) | 2008-09-18 | 2013-09-11 | 株式会社Adeka | 重合性光学活性イミド化合物及び該化合物を含有する重合性組成物 |
| US8507726B2 (en) * | 2008-11-03 | 2013-08-13 | Basf Se | Photoinitiator mixtures |
| CN102203673A (zh) * | 2008-11-05 | 2011-09-28 | 东京应化工业株式会社 | 感光性树脂组合物和底材 |
| JP5344892B2 (ja) | 2008-11-27 | 2013-11-20 | 富士フイルム株式会社 | インクジェット用インク組成物、及びインクジェット記録方法 |
| US8314408B2 (en) | 2008-12-31 | 2012-11-20 | Draka Comteq, B.V. | UVLED apparatus for curing glass-fiber coatings |
| WO2010093210A2 (ko) * | 2009-02-13 | 2010-08-19 | 주식회사 엘지화학 | 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 |
| JP4344400B1 (ja) * | 2009-02-16 | 2009-10-14 | 株式会社日本化学工業所 | オキシムエステル化合物及びこれらを用いた感光性樹脂組成物 |
| CN101565472B (zh) * | 2009-05-19 | 2011-05-04 | 常州强力电子新材料有限公司 | 酮肟酯类光引发剂 |
| JP5236587B2 (ja) * | 2009-07-15 | 2013-07-17 | 太陽ホールディングス株式会社 | 光硬化性樹脂組成物 |
| CN102575167A (zh) | 2009-11-18 | 2012-07-11 | 株式会社艾迪科 | 含有聚合性化合物的液晶组合物以及使用该液晶组合物的液晶显示元件 |
| CA2780036C (en) | 2009-12-07 | 2017-08-22 | Agfa-Gevaert | Photoinitiators for uv-led curable compositions and inks |
| WO2011069943A1 (en) | 2009-12-07 | 2011-06-16 | Agfa-Gevaert | Uv-led curable compositions and inks |
| JP2012194516A (ja) * | 2010-04-27 | 2012-10-11 | Fujifilm Corp | 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ及びそれを備えた表示装置 |
| EP2388239B1 (en) | 2010-05-20 | 2017-02-15 | Draka Comteq B.V. | Curing apparatus employing angled UV-LEDs |
| US8871311B2 (en) | 2010-06-03 | 2014-10-28 | Draka Comteq, B.V. | Curing method employing UV sources that emit differing ranges of UV radiation |
| EP2418183B1 (en) | 2010-08-10 | 2018-07-25 | Draka Comteq B.V. | Method for curing coated glass fibres providing increased UVLED intensitiy |
| JP5677036B2 (ja) * | 2010-11-08 | 2015-02-25 | キヤノン株式会社 | 有機発光素子 |
| CN102020727B (zh) * | 2010-11-23 | 2013-01-23 | 常州强力先端电子材料有限公司 | 一种高感光度咔唑肟酯类光引发剂、其制备方法及应用 |
| US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
| TWI575311B (zh) * | 2011-03-08 | 2017-03-21 | 大賽璐股份有限公司 | 光阻製造用溶劑或溶劑組成物 |
| JP5944898B2 (ja) * | 2011-07-08 | 2016-07-05 | 新日鉄住金化学株式会社 | 光重合開始剤、感光性組成物及び硬化物 |
| CN103492948B (zh) * | 2011-08-04 | 2016-06-08 | 株式会社Lg化学 | 光敏化合物及包括其的光敏树脂组合物 |
| JP5646426B2 (ja) * | 2011-09-30 | 2014-12-24 | 富士フイルム株式会社 | 着色感光性組成物、カラーフィルタ及びその製造方法、並びに液晶表示装置 |
| KR101831798B1 (ko) * | 2012-05-09 | 2018-02-26 | 바스프 에스이 | 옥심 에스테르 광개시제 |
| JP2013047818A (ja) * | 2012-10-01 | 2013-03-07 | Taiyo Holdings Co Ltd | 光硬化性樹脂組成物 |
| JP5554389B2 (ja) * | 2012-11-19 | 2014-07-23 | 富士フイルム株式会社 | シアン色カラーフィルタ作製用光硬化性組成物及びその製造方法 |
| US10234761B2 (en) * | 2013-07-08 | 2019-03-19 | Basf Se | Oxime ester photoinitiators |
| CN105531260B (zh) * | 2013-09-10 | 2019-05-31 | 巴斯夫欧洲公司 | 肟酯光引发剂 |
| TWI668210B (zh) * | 2013-11-28 | 2019-08-11 | 塔可馬科技股份有限公司 | 光起始劑及包括該光起始劑之光敏性組合物 |
| KR101435652B1 (ko) * | 2014-01-17 | 2014-08-28 | 주식회사 삼양사 | 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| WO2015152153A1 (ja) * | 2014-04-04 | 2015-10-08 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| CN104910053B (zh) * | 2014-06-09 | 2017-09-12 | 北京英力科技发展有限公司 | 不对称二肟酯化合物及其制造方法与应用 |
| CN104098720B (zh) * | 2014-07-15 | 2017-01-11 | 常州强力先端电子材料有限公司 | 含杂环硫醚基团的肟酯类光引发剂及其制备方法和应用 |
| JP6169545B2 (ja) | 2014-09-09 | 2017-07-26 | 富士フイルム株式会社 | 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物 |
| JP6169548B2 (ja) | 2014-09-26 | 2017-07-26 | 富士フイルム株式会社 | 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物 |
| JP6086888B2 (ja) | 2014-09-26 | 2017-03-01 | 富士フイルム株式会社 | インクジェット記録用インク組成物、インクジェット記録方法、及び記録物 |
| JP6799540B2 (ja) * | 2015-09-25 | 2020-12-16 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する重合開始剤 |
| EP3246378B1 (en) | 2016-05-17 | 2019-03-20 | Merck Patent GmbH | Polymerisable liquid crystal material and polymerised liquid crystal film |
| CN109689840B (zh) * | 2016-09-07 | 2024-01-30 | 默克专利股份有限公司 | 液晶介质和光调制元件 |
| KR102121424B1 (ko) | 2016-12-02 | 2020-06-10 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치 |
| KR102545326B1 (ko) | 2017-03-16 | 2023-06-21 | 가부시키가이샤 아데카 | 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제 |
| TW201906729A (zh) * | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 用於保護光聚合物薄膜複合物中的全像圖之由兩層可乾燥施用之uv固化漆層構成的系統 |
| CN108069991A (zh) * | 2018-01-08 | 2018-05-25 | 深圳市佶达德科技有限公司 | 一种双核双吡唑乙酸香豆素衍生物配合物激光材料及其应用 |
| CN108690389A (zh) * | 2018-04-23 | 2018-10-23 | 河北晨阳工贸集团有限公司 | 一种led光固化水性木器漆及其制备方法 |
| WO2020252628A1 (zh) * | 2019-06-17 | 2020-12-24 | 湖北固润科技股份有限公司 | 包含五元芳杂环结构的肟酯类光引发剂及其制备和用途 |
| JP7449765B2 (ja) | 2020-04-10 | 2024-03-14 | 株式会社Dnpファインケミカル | 感光性着色樹脂組成物、硬化物、カラーフィルタ、表示装置 |
| KR20230121723A (ko) | 2020-12-17 | 2023-08-21 | 가부시키가이샤 아데카 | 화합물 및 조성물 |
| EP4375750A4 (en) | 2021-07-20 | 2025-10-08 | Adeka Corp | FILM FORMING MATERIAL FOR A SEMICONDUCTOR, ELEMENT FORMING MATERIAL FOR A SEMICONDUCTOR, PROCESSING ELEMENT FORMING MATERIAL FOR A SEMICONDUCTOR, UNDERLAYER FILM FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE |
| JPWO2024004426A1 (enExample) * | 2022-06-27 | 2024-01-04 | ||
| JPWO2024090369A1 (enExample) | 2022-10-26 | 2024-05-02 | ||
| WO2024171895A1 (ja) * | 2023-02-15 | 2024-08-22 | 富士フイルム株式会社 | 硬化性組成物、硬化物の製造方法、膜、光学素子、イメージセンサ、固体撮像素子、及び、画像表示装置 |
| CN120693352A (zh) * | 2023-02-27 | 2025-09-23 | 富士胶片株式会社 | 光固化性组合物、固化物的制造方法、膜、光学元件、图像传感器、固体摄像元件、图像显示装置及自由基聚合引发剂 |
| WO2025110009A1 (ja) * | 2023-11-22 | 2025-05-30 | 富士フイルム株式会社 | 硬化性組成物、画素の製造方法、膜、固体撮像素子、画像表示装置および光重合開始剤 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1180846A (en) * | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
| FR2393345A1 (fr) * | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
| GB2029423A (en) * | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
| US4590145A (en) * | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
| US5019482A (en) * | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
| US6001517A (en) * | 1996-10-31 | 1999-12-14 | Kabushiki Kaisha Toshiba | Positive photosensitive polymer composition, method of forming a pattern and electronic parts |
| SG77689A1 (en) * | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| MY121423A (en) * | 1998-06-26 | 2006-01-28 | Ciba Sc Holding Ag | Photopolymerizable thermosetting resin compositions |
| NL1016815C2 (nl) * | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
-
2003
- 2003-11-24 KR KR1020057010115A patent/KR101032582B1/ko not_active Expired - Fee Related
- 2003-11-24 EP EP03789449A patent/EP1567518B1/en not_active Expired - Lifetime
- 2003-11-24 CN CN2003801047043A patent/CN1720245B/zh not_active Expired - Lifetime
- 2003-11-24 JP JP2004556329A patent/JP4769461B2/ja not_active Expired - Fee Related
- 2003-11-24 AT AT03789449T patent/ATE420877T1/de not_active IP Right Cessation
- 2003-11-24 CA CA002505893A patent/CA2505893A1/en not_active Abandoned
- 2003-11-24 MX MXPA05005817A patent/MXPA05005817A/es unknown
- 2003-11-24 US US10/535,962 patent/US7648738B2/en active Active
- 2003-11-24 DE DE60325890T patent/DE60325890D1/de not_active Expired - Lifetime
- 2003-11-24 AU AU2003294034A patent/AU2003294034A1/en not_active Abandoned
- 2003-11-24 WO PCT/EP2003/050880 patent/WO2004050653A2/en not_active Ceased
- 2003-12-02 TW TW092133880A patent/TWI326682B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US7648738B2 (en) | 2010-01-19 |
| WO2004050653A3 (en) | 2004-09-16 |
| US20060241259A1 (en) | 2006-10-26 |
| EP1567518A2 (en) | 2005-08-31 |
| TW200422296A (en) | 2004-11-01 |
| AU2003294034A1 (en) | 2004-06-23 |
| ATE420877T1 (de) | 2009-01-15 |
| DE60325890D1 (de) | 2009-03-05 |
| CN1720245B (zh) | 2010-05-26 |
| KR20050084149A (ko) | 2005-08-26 |
| JP4769461B2 (ja) | 2011-09-07 |
| WO2004050653A2 (en) | 2004-06-17 |
| AU2003294034A8 (en) | 2004-06-23 |
| JP2006516246A (ja) | 2006-06-29 |
| TWI326682B (en) | 2010-07-01 |
| CN1720245A (zh) | 2006-01-11 |
| EP1567518B1 (en) | 2009-01-14 |
| MXPA05005817A (es) | 2005-08-29 |
| KR101032582B1 (ko) | 2011-05-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1567518B1 (en) | Oxime ester photoinitiators with heteroaromatic groups | |
| EP1957457B1 (en) | Oxime ester photoinitiators | |
| EP1778636B1 (en) | Oxime ester photoinitiators | |
| EP1963374B1 (en) | Oxime ester photoinitiators | |
| EP2144876B1 (en) | Oxime ester photoinitiators | |
| EP2788325B1 (en) | Oxime ester photoinitiators | |
| EP2144894B1 (en) | Oxime ester photoinitiators | |
| EP2144900B1 (en) | Oxime ester photoinitiators | |
| EP2285836B1 (en) | Photoinitiator mixtures | |
| EP2303833B1 (en) | Oxime ester photoinitiators | |
| CA2446722A1 (en) | Oxime ester photoinitiators having a combined structure | |
| CA2328376A1 (en) | Oxime ester photoinitiators | |
| EP2963015A1 (en) | Oxime ester photoinitiators | |
| WO2009019173A1 (en) | Oxime ester photoinitiators |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Discontinued |