CA2438566A1 - On-the-fly beam path error correction for memory link processing - Google Patents

On-the-fly beam path error correction for memory link processing Download PDF

Info

Publication number
CA2438566A1
CA2438566A1 CA002438566A CA2438566A CA2438566A1 CA 2438566 A1 CA2438566 A1 CA 2438566A1 CA 002438566 A CA002438566 A CA 002438566A CA 2438566 A CA2438566 A CA 2438566A CA 2438566 A1 CA2438566 A1 CA 2438566A1
Authority
CA
Canada
Prior art keywords
axis
steering mirror
laser beam
workpiece
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002438566A
Other languages
English (en)
French (fr)
Inventor
Mark Unrath
Kelly Bruland
Ho Wai Lo
Stephen Swaringen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Electro Scientific Industries Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2438566A1 publication Critical patent/CA2438566A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/49—Adaptable interconnections, e.g. fuses or antifuses
    • H10W20/493—Fuses, i.e. interconnections changeable from conductive to non-conductive
    • H10W20/494—Fuses, i.e. interconnections changeable from conductive to non-conductive changeable by the use of an external beam, e.g. laser beam or ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Lasers (AREA)
CA002438566A 2001-02-16 2002-02-15 On-the-fly beam path error correction for memory link processing Abandoned CA2438566A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US26964601P 2001-02-16 2001-02-16
US60/269,646 2001-02-16
PCT/US2002/004561 WO2002067180A1 (en) 2001-02-16 2002-02-15 On-the-fly beam path error correction for memory link processing

Publications (1)

Publication Number Publication Date
CA2438566A1 true CA2438566A1 (en) 2002-08-29

Family

ID=23028100

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002438566A Abandoned CA2438566A1 (en) 2001-02-16 2002-02-15 On-the-fly beam path error correction for memory link processing

Country Status (8)

Country Link
JP (3) JP4397163B2 (https=)
KR (1) KR100821115B1 (https=)
CN (2) CN1317667C (https=)
CA (1) CA2438566A1 (https=)
DE (1) DE10296339T5 (https=)
GB (1) GB2390699B (https=)
TW (1) TW535199B (https=)
WO (1) WO2002067180A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6706999B1 (en) * 2003-02-24 2004-03-16 Electro Scientific Industries, Inc. Laser beam tertiary positioner apparatus and method
US7363180B2 (en) * 2005-02-15 2008-04-22 Electro Scientific Industries, Inc. Method for correcting systematic errors in a laser processing system
US7297972B2 (en) * 2005-08-26 2007-11-20 Electro Scientific Industries, Inc. Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as a metrology target
US8026158B2 (en) * 2007-06-01 2011-09-27 Electro Scientific Industries, Inc. Systems and methods for processing semiconductor structures using laser pulses laterally distributed in a scanning window
US8378259B2 (en) * 2008-06-17 2013-02-19 Electro Scientific Industries, Inc. Eliminating head-to-head offsets along common chuck travel direction in multi-head laser machining systems
TWI594828B (zh) 2009-05-28 2017-08-11 伊雷克托科學工業股份有限公司 應用於雷射處理工件中的特徵的聲光偏轉器及相關雷射處理方法
JP6055414B2 (ja) * 2010-10-22 2016-12-27 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド ビームディザリング及びスカイビングのためのレーザ加工システム並びに方法
WO2014152526A1 (en) * 2013-03-15 2014-09-25 Electro Scientific Industries, Inc. Laser systems and methods for aod tool settling for aod travel reduction
JP6516722B2 (ja) * 2013-03-15 2019-05-22 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド ビームポジショナのレーザ出射に基づく制御
CN111266741A (zh) * 2018-11-19 2020-06-12 深圳市圭华智能科技有限公司 激光加工系统及激光加工方法
JP7442351B2 (ja) * 2020-03-12 2024-03-04 株式会社ディスコ レーザー加工装置
JPWO2022038682A1 (https=) * 2020-08-18 2022-02-24

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1006938B (zh) * 1985-04-01 1990-02-21 索尼公司 光信息再现设备
JPH089110B2 (ja) * 1988-03-03 1996-01-31 株式会社ニコン レーザ加工装置のレーザビーム制御方法
JP2942804B2 (ja) * 1988-03-03 1999-08-30 株式会社ニコン レーザ加工装置及びレーザ加工装置のレーザビーム制御方法
DE4000166A1 (de) * 1990-01-05 1991-07-11 Hell Rudolf Dr Ing Gmbh Verfahren und einrichtung zur korrektur von positionsfehlern eines abgelenkten lichtstrahls
US5673110A (en) * 1993-01-26 1997-09-30 Phase Metrics, Inc. Multiplexed laser interferometer for non-dispersed spectrum detection in a dynamic flying height tester
JPH08195461A (ja) * 1995-01-18 1996-07-30 Hitachi Constr Mach Co Ltd ダムバー加工方法及びダムバー加工装置
US5751585A (en) * 1995-03-20 1998-05-12 Electro Scientific Industries, Inc. High speed, high accuracy multi-stage tool positioning system
US5847960A (en) * 1995-03-20 1998-12-08 Electro Scientific Industries, Inc. Multi-tool positioning system
JPH08316396A (ja) * 1995-05-16 1996-11-29 Hitachi Constr Mach Co Ltd ダムバー切断方法及びダムバー切断装置
JPH0970679A (ja) * 1995-09-07 1997-03-18 Nikon Corp レーザ加工装置の制御方法
CN1180221A (zh) * 1996-09-30 1998-04-29 大宇电子株式会社 控制光盘播放机的跟踪平衡装置和方法
JP3769942B2 (ja) * 1997-09-02 2006-04-26 セイコーエプソン株式会社 レーザー加工方法及び装置、並びに非導電性透明基板の回路形成方法及び装置
JPH11267873A (ja) * 1998-03-23 1999-10-05 Seiko Epson Corp レーザ光の走査光学系及びレーザ加工装置
US6088107A (en) * 1998-10-20 2000-07-11 Trw Inc. High resolution positioner
JPH11245061A (ja) * 1998-12-15 1999-09-14 Nikon Corp レーザ加工装置のレーザビーム制御方法

Also Published As

Publication number Publication date
CN1317667C (zh) 2007-05-23
KR20030091990A (ko) 2003-12-03
JP2004527376A (ja) 2004-09-09
CN101172319A (zh) 2008-05-07
JP2011098394A (ja) 2011-05-19
KR100821115B1 (ko) 2008-04-11
JP5055443B2 (ja) 2012-10-24
WO2002067180A1 (en) 2002-08-29
JP4833909B2 (ja) 2011-12-07
JP4397163B2 (ja) 2010-01-13
JP2007203375A (ja) 2007-08-16
CN1491398A (zh) 2004-04-21
GB2390699A (en) 2004-01-14
GB2390699B (en) 2004-10-13
TW535199B (en) 2003-06-01
GB0318352D0 (en) 2003-09-10
DE10296339T5 (de) 2004-04-15

Similar Documents

Publication Publication Date Title
US6816294B2 (en) On-the-fly beam path error correction for memory link processing
US7245412B2 (en) On-the-fly laser beam path error correction for specimen target location processing
JP5055443B2 (ja) メモリリンク処理用の走査ビーム経路の誤差の補正
US8497450B2 (en) On-the fly laser beam path dithering for enhancing throughput
US6706999B1 (en) Laser beam tertiary positioner apparatus and method
US7176407B2 (en) Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site
JP4860870B2 (ja) アッベ誤差補正装置及び方法
US8049135B2 (en) Systems and methods for alignment of laser beam(s) for semiconductor link processing
JPH06501590A (ja) 高精度、高柔軟性エネルギー・ビーム加工システム
JPS62267093A (ja) 焦点合わせ方法

Legal Events

Date Code Title Description
FZDE Discontinued