CA2217777A1 - Method and device for the wet processing of substrates in a container - Google Patents
Method and device for the wet processing of substrates in a container Download PDFInfo
- Publication number
- CA2217777A1 CA2217777A1 CA002217777A CA2217777A CA2217777A1 CA 2217777 A1 CA2217777 A1 CA 2217777A1 CA 002217777 A CA002217777 A CA 002217777A CA 2217777 A CA2217777 A CA 2217777A CA 2217777 A1 CA2217777 A1 CA 2217777A1
- Authority
- CA
- Canada
- Prior art keywords
- container
- overflow
- substrates
- liquid
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000012545 processing Methods 0.000 title abstract description 6
- 239000007788 liquid Substances 0.000 claims abstract description 22
- 239000012530 fluid Substances 0.000 claims description 60
- 239000000126 substance Substances 0.000 description 8
- 239000000356 contaminant Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D21/00—Separation of suspended solid particles from liquids by sedimentation
- B01D21/24—Feed or discharge mechanisms for settling tanks
- B01D21/2433—Discharge mechanisms for floating particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19517573.5 | 1995-05-12 | ||
| DE19517573A DE19517573C2 (de) | 1995-05-12 | 1995-05-12 | Verfahren und Vorrichtung zur Naßbehandlung von Substraten in einem Behälter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2217777A1 true CA2217777A1 (en) | 1996-11-14 |
Family
ID=7761821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002217777A Abandoned CA2217777A1 (en) | 1995-05-12 | 1996-05-02 | Method and device for the wet processing of substrates in a container |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US5879464A (enExample) |
| EP (1) | EP0826232B1 (enExample) |
| JP (1) | JP3088466B2 (enExample) |
| KR (1) | KR100303230B1 (enExample) |
| CN (1) | CN1079988C (enExample) |
| AT (1) | ATE186423T1 (enExample) |
| CA (1) | CA2217777A1 (enExample) |
| DE (2) | DE19517573C2 (enExample) |
| TW (1) | TW303309B (enExample) |
| WO (1) | WO1996036068A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1116868A (ja) * | 1997-06-27 | 1999-01-22 | Toshiba Corp | 薬液置換装置及び薬液置換方法 |
| US6571806B2 (en) | 1998-09-04 | 2003-06-03 | Komag, Inc. | Method for drying a substrate |
| US6216709B1 (en) | 1998-09-04 | 2001-04-17 | Komag, Inc. | Method for drying a substrate |
| GB2351279B (en) * | 1999-06-22 | 2001-08-01 | John Joseph Devuyst | Draining vessel |
| US6286231B1 (en) | 2000-01-12 | 2001-09-11 | Semitool, Inc. | Method and apparatus for high-pressure wafer processing and drying |
| DE10359320A1 (de) * | 2003-12-17 | 2005-07-21 | Scp Germany Gmbh | Vorrichtung und Verfahren zum Trocknen von Substraten |
| KR101951778B1 (ko) * | 2017-07-25 | 2019-02-25 | 무진전자 주식회사 | 웨이퍼 에칭 장치 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT208307B (de) * | 1959-02-10 | 1960-03-25 | Franz Dr Ing Boehm | Zumeßvorrichtung zur proportionalen Einbringung von Chemikalienlösungen in periodisch beschickte Behälter |
| US4722752A (en) * | 1986-06-16 | 1988-02-02 | Robert F. Orr | Apparatus and method for rinsing and drying silicon wafers |
| NL8900480A (nl) * | 1989-02-27 | 1990-09-17 | Philips Nv | Werkwijze en inrichting voor het drogen van substraten na behandeling in een vloeistof. |
| CA2040989A1 (en) * | 1990-05-01 | 1991-11-02 | Ichiro Yoshida | Washing/drying method and apparatus |
-
1995
- 1995-05-12 DE DE19517573A patent/DE19517573C2/de not_active Expired - Fee Related
-
1996
- 1996-05-02 EP EP96914162A patent/EP0826232B1/de not_active Expired - Lifetime
- 1996-05-02 AT AT96914162T patent/ATE186423T1/de not_active IP Right Cessation
- 1996-05-02 KR KR1019970708031A patent/KR100303230B1/ko not_active Expired - Fee Related
- 1996-05-02 JP JP08533713A patent/JP3088466B2/ja not_active Expired - Fee Related
- 1996-05-02 DE DE59603571T patent/DE59603571D1/de not_active Expired - Fee Related
- 1996-05-02 US US08/952,708 patent/US5879464A/en not_active Expired - Fee Related
- 1996-05-02 CA CA002217777A patent/CA2217777A1/en not_active Abandoned
- 1996-05-02 CN CN96193885A patent/CN1079988C/zh not_active Expired - Fee Related
- 1996-05-02 WO PCT/EP1996/001813 patent/WO1996036068A1/de not_active Ceased
- 1996-05-03 TW TW085105340A patent/TW303309B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| KR100303230B1 (ko) | 2001-11-30 |
| DE19517573C2 (de) | 2000-11-02 |
| JP3088466B2 (ja) | 2000-09-18 |
| US5879464A (en) | 1999-03-09 |
| KR19990014690A (ko) | 1999-02-25 |
| DE59603571D1 (de) | 1999-12-09 |
| ATE186423T1 (de) | 1999-11-15 |
| CN1184557A (zh) | 1998-06-10 |
| CN1079988C (zh) | 2002-02-27 |
| DE19517573A1 (de) | 1996-11-14 |
| TW303309B (enExample) | 1997-04-21 |
| JPH10510101A (ja) | 1998-09-29 |
| EP0826232B1 (de) | 1999-11-03 |
| WO1996036068A1 (de) | 1996-11-14 |
| EP0826232A1 (de) | 1998-03-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Discontinued |