JPS54105859A - Cleaner - Google Patents

Cleaner

Info

Publication number
JPS54105859A
JPS54105859A JP1241278A JP1241278A JPS54105859A JP S54105859 A JPS54105859 A JP S54105859A JP 1241278 A JP1241278 A JP 1241278A JP 1241278 A JP1241278 A JP 1241278A JP S54105859 A JPS54105859 A JP S54105859A
Authority
JP
Japan
Prior art keywords
chamber
liquid
cleaning
float
work
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1241278A
Other languages
Japanese (ja)
Other versions
JPS612286B2 (en
Inventor
Toshio Tsuboya
Yasushi Asami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1241278A priority Critical patent/JPS54105859A/en
Publication of JPS54105859A publication Critical patent/JPS54105859A/en
Publication of JPS612286B2 publication Critical patent/JPS612286B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To recude the cleaning time while minimizing required liquid in a cleaner used, for example, in the cleaning of silicon thin plates by pure water in the manufacture of semiconductor devices.
CONSTITUTION: As a cleaning liquid (pure water) 35 is continuously supplied to a cleaning chamber in which a work 34 has been placed, and stains on the surface of the work are dissolved into the liquid to thereby gradually clean. When filling the chamber to capacity, the liquid 35 runs over the upper rim of an overflow wall 17, entering a chamber 19. As a rise of the water level in the chamber 19 allows the upward lifting of a link 26 against a spring 30 through a float 25, a shut off plate 29 closing the open end of a drain pipe 21 is caused to open on a pin 28. As a result, the liquid in the chamber 18 is discharged rapidly. The liquid 35 in the chamber 29 is discharged gradually through a clearance 24, allowing a float 25 to lower. In this manner, the drain 21 is closed again.
COPYRIGHT: (C)1979,JPO&Japio
JP1241278A 1978-02-08 1978-02-08 Cleaner Granted JPS54105859A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1241278A JPS54105859A (en) 1978-02-08 1978-02-08 Cleaner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1241278A JPS54105859A (en) 1978-02-08 1978-02-08 Cleaner

Publications (2)

Publication Number Publication Date
JPS54105859A true JPS54105859A (en) 1979-08-20
JPS612286B2 JPS612286B2 (en) 1986-01-23

Family

ID=11804539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1241278A Granted JPS54105859A (en) 1978-02-08 1978-02-08 Cleaner

Country Status (1)

Country Link
JP (1) JPS54105859A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61171588U (en) * 1985-04-11 1986-10-24
JPS61247034A (en) * 1985-04-24 1986-11-04 Nec Corp Cleaning method of semiconductor slice

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61171588U (en) * 1985-04-11 1986-10-24
JPH0319984Y2 (en) * 1985-04-11 1991-04-26
JPS61247034A (en) * 1985-04-24 1986-11-04 Nec Corp Cleaning method of semiconductor slice

Also Published As

Publication number Publication date
JPS612286B2 (en) 1986-01-23

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