CA2080083A1 - Dispositif optique pour systeme d'exposition - Google Patents

Dispositif optique pour systeme d'exposition

Info

Publication number
CA2080083A1
CA2080083A1 CA2080083A CA2080083A CA2080083A1 CA 2080083 A1 CA2080083 A1 CA 2080083A1 CA 2080083 A CA2080083 A CA 2080083A CA 2080083 A CA2080083 A CA 2080083A CA 2080083 A1 CA2080083 A1 CA 2080083A1
Authority
CA
Canada
Prior art keywords
optical arrangement
exposure apparatus
respect
optical system
synchrotron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2080083A
Other languages
English (en)
Other versions
CA2080083C (fr
Inventor
Akira Miyake
Yutaka Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP28928591A external-priority patent/JP3202046B2/ja
Priority claimed from JP20252892A external-priority patent/JP3165744B2/ja
Application filed by Individual filed Critical Individual
Publication of CA2080083A1 publication Critical patent/CA2080083A1/fr
Application granted granted Critical
Publication of CA2080083C publication Critical patent/CA2080083C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CA002080083A 1991-10-08 1992-10-07 Dispositif optique pour systeme d'exposition Expired - Fee Related CA2080083C (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP28928591A JP3202046B2 (ja) 1991-10-08 1991-10-08 照明用光学装置
JP289285/1991 1991-10-08
JP20252892A JP3165744B2 (ja) 1992-07-29 1992-07-29 露光装置などの光学装置、及び半導体デバイス製造方法
JP202528/1992 1992-07-29

Publications (2)

Publication Number Publication Date
CA2080083A1 true CA2080083A1 (fr) 1993-04-09
CA2080083C CA2080083C (fr) 1998-10-06

Family

ID=26513438

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002080083A Expired - Fee Related CA2080083C (fr) 1991-10-08 1992-10-07 Dispositif optique pour systeme d'exposition

Country Status (4)

Country Link
US (1) US5394451A (fr)
EP (1) EP0537015B1 (fr)
CA (1) CA2080083C (fr)
DE (1) DE69226231T2 (fr)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5835560A (en) * 1994-05-24 1998-11-10 Canon Kabushiki Kaisha Exposure apparatus
US5548625A (en) * 1995-03-02 1996-08-20 Motorola, Inc. Method for parallel multiple field processing in X-ray lithography
JP3278317B2 (ja) * 1995-03-24 2002-04-30 キヤノン株式会社 露光装置及びデバイス製造方法
JP3267471B2 (ja) * 1995-08-02 2002-03-18 キヤノン株式会社 マスク、これを用いた露光装置やデバイス生産方法
US6038279A (en) * 1995-10-16 2000-03-14 Canon Kabushiki Kaisha X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device
JP3284045B2 (ja) * 1996-04-30 2002-05-20 キヤノン株式会社 Ｘ線光学装置およびデバイス製造方法
JP3255849B2 (ja) * 1996-07-19 2002-02-12 キヤノン株式会社 露光装置
JP3450622B2 (ja) * 1996-07-19 2003-09-29 キヤノン株式会社 露光装置およびこれを用いたデバイス製造方法
JPH113858A (ja) 1997-04-17 1999-01-06 Canon Inc Ｘ線光学装置、ｘ線露光装置および半導体デバイス製造方法
US6167111A (en) * 1997-07-02 2000-12-26 Canon Kabushiki Kaisha Exposure apparatus for synchrotron radiation lithography
JPH1184098A (ja) * 1997-07-11 1999-03-26 Canon Inc Ｘ線照明装置およびｘ線照明方法、ｘ線露光装置ならびにデバイス製造方法
JPH11233436A (ja) 1997-12-10 1999-08-27 Canon Inc Ｘ線照明装置及び方法、並びにこれを用いたｘ線露光装置やデバイス製造方法
DE69940100D1 (de) * 1998-01-27 2009-01-29 Noran Instr Inc Wellenlänge-dispersives röntgenstrahlungsspektrometer mit röntgenstrahlung-kollimatoropik für erhöhter sensitivität über einen weiten energie-bereich
EP1121584A4 (fr) 1998-09-17 2002-10-16 Noran Instr Inc Application de l'optique des rayons x a la spectroscopie dispersive d'energie
UA59495C2 (uk) 2000-08-07 2003-09-15 Мурадін Абубєкіровіч Кумахов Рентгенівський вимірювально-випробувальний комплекс
JP2002299221A (ja) * 2001-04-02 2002-10-11 Canon Inc Ｘ線露光装置
JP3782736B2 (ja) * 2002-01-29 2006-06-07 キヤノン株式会社 露光装置及びその制御方法
JP3564104B2 (ja) * 2002-01-29 2004-09-08 キヤノン株式会社 露光装置及びその制御方法、これを用いたデバイスの製造方法
JP4006251B2 (ja) * 2002-03-20 2007-11-14 キヤノン株式会社 ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法
DE102014226918A1 (de) * 2014-12-23 2016-06-23 Carl Zeiss Smt Gmbh Optische Komponente
DE102014226917A1 (de) * 2014-12-23 2015-12-17 Carl Zeiss Smt Gmbh Beleuchtungssystem für die EUV-Projektionslithographie
TWI701517B (zh) 2014-12-23 2020-08-11 德商卡爾蔡司Ｓｍｔ有限公司 光學構件

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4028547A (en) * 1975-06-30 1977-06-07 Bell Telephone Laboratories, Incorporated X-ray photolithography
US4788698A (en) * 1984-04-15 1988-11-29 Hitachi, Ltd. X-ray exposure system
DE68922306T2 (de) * 1988-03-11 1995-11-02 British Tech Group Optische vorrichtungen und methoden für ihre herstellung.
JPH03504285A (ja) * 1988-05-18 1991-09-19 シーメンス、アクチエンゲゼルシヤフト Ｘ線リソグラフイの投影スケール変更方法
US5150151A (en) * 1989-03-09 1992-09-22 Canon Kabushiki Kaisha Reflecting device and pattern transfer apparatus using the same
JP2731955B2 (ja) * 1989-09-07 1998-03-25 キヤノン株式会社 Ｘ線露光装置
DE69031897T2 (de) * 1989-10-19 1998-05-07 Canon Kk Röntgenbelichtungsvorrichtung
US5031199A (en) * 1990-06-05 1991-07-09 Wisconsin Alumni Research Foundation X-ray lithography beamline method and apparatus

Also Published As

Publication number Publication date
EP0537015B1 (fr) 1998-07-15
DE69226231T2 (de) 1998-12-17
DE69226231D1 (de) 1998-08-20
EP0537015A1 (fr) 1993-04-14
US5394451A (en) 1995-02-28
CA2080083C (fr) 1998-10-06

Similar Documents

Publication Publication Date Title
CA2080083A1 (fr) Dispositif optique pour systeme d'exposition
CA2090591A1 (fr) Generateur de faisceaux lasers
CA2141684A1 (fr) Systeme de concentration optique utilisant des reflecteurs toroidaux concaves
EP0493365A3 (en) Laser light beam homogenizer and imaging lidar system incorporating same
EP0376398A3 (fr) Système d'illumination pour un condenseur réfléchissant non imageur
CA2113357A1 (fr) Systeme d'eclairage optique
EP1724048A3 (fr) Appareil d'irradiation laser comprenant un groupe de lentilles cylindriques avec les lentilles extérieures masquées
EP0362993A3 (fr) Source de lumière ne formant pas d'images
GB2261528A (en) High power light source
JPS5754914A (en) Plural beam scanning optical system having variable magnification function
DE69312667D1 (de) Strahlformendes optisches Element, Strahlungsquelle und Abtasteinheit mit diesem Element
CA2096120A1 (fr) Projecteur de scene
EP0282593A4 (fr) Appareil formant un faisceau laser.
WO2003016982A3 (fr) Systeme de projection
WO1997025722A3 (fr) Systeme de condensateur-monochromateur pour rayonnement x
JPS55130512A (en) Semiconductor laser optical system
JPS5545074A (en) Hologram lens
NO910595D0 (no) Antenne.
EP0389259A3 (fr) Appareil pour l'exposition aux rayons X
EP0772064A3 (fr) Dispositif optique avec couche optique à angle d'incidence variable
CA2057545A1 (fr) Source lumineuse
JPS5376047A (en) Light source of optical reader
SE8604994L (sv) Sikte
JPS5270851A (en) Focal point adjusting system for rays
EP0801448A3 (fr) Dispositif laser pour générer un faisceau principal de lumière et un faisceau de référence

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed