CA2056299A1 - Structure de pellicule et procede de preparation connexe - Google Patents

Structure de pellicule et procede de preparation connexe

Info

Publication number
CA2056299A1
CA2056299A1 CA2056299A CA2056299A CA2056299A1 CA 2056299 A1 CA2056299 A1 CA 2056299A1 CA 2056299 A CA2056299 A CA 2056299A CA 2056299 A CA2056299 A CA 2056299A CA 2056299 A1 CA2056299 A1 CA 2056299A1
Authority
CA
Canada
Prior art keywords
frame
adhesive
pellicle film
coating layer
pellicle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2056299A
Other languages
English (en)
Other versions
CA2056299C (fr
Inventor
Minoru Fujita
Hiroaki Nakagawa
Tsutomu Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2056299A1 publication Critical patent/CA2056299A1/fr
Application granted granted Critical
Publication of CA2056299C publication Critical patent/CA2056299C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/23—Sheet including cover or casing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet
    • Y10T428/24331—Composite web or sheet including nonapertured component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24777—Edge feature
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2804—Next to metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2813—Heat or solvent activated or sealable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2813—Heat or solvent activated or sealable
    • Y10T428/2817—Heat sealable
    • Y10T428/2826—Synthetic resin or polymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2852—Adhesive compositions
    • Y10T428/2878—Adhesive compositions including addition polymer from unsaturated monomer
    • Y10T428/2891—Adhesive compositions including addition polymer from unsaturated monomer including addition polymer from alpha-beta unsaturated carboxylic acid [e.g., acrylic acid, methacrylic acid, etc.] Or derivative thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544—Addition polymer is perhalogenated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/3188—Next to cellulosic
    • Y10T428/31884—Regenerated or modified cellulose
    • Y10T428/31891—Where addition polymer is an ester or halide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31909—Next to second addition polymer from unsaturated monomers
    • Y10T428/31928—Ester, halide or nitrile of addition polymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Sealing Battery Cases Or Jackets (AREA)
  • Prostheses (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
CA002056299A 1990-11-29 1991-11-27 Structure de pellicule et procede de preparation connexe Expired - Fee Related CA2056299C (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP331499/90 1990-11-29
JP33149990A JP3037745B2 (ja) 1990-11-29 1990-11-29 ペリクル構造体

Publications (2)

Publication Number Publication Date
CA2056299A1 true CA2056299A1 (fr) 1992-05-30
CA2056299C CA2056299C (fr) 2000-07-04

Family

ID=18244323

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002056299A Expired - Fee Related CA2056299C (fr) 1990-11-29 1991-11-27 Structure de pellicule et procede de preparation connexe

Country Status (8)

Country Link
US (1) US5643654A (fr)
EP (1) EP0488788B1 (fr)
JP (1) JP3037745B2 (fr)
KR (1) KR950008845B1 (fr)
AT (1) ATE166979T1 (fr)
CA (1) CA2056299C (fr)
DE (1) DE69129525T2 (fr)
ES (1) ES2117635T3 (fr)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2915744B2 (ja) * 1993-04-13 1999-07-05 信越化学工業株式会社 ペリクル
JPH098103A (ja) * 1995-06-19 1997-01-10 Nikon Corp 投影露光装置及び投影露光方法
US5772817A (en) * 1997-02-10 1998-06-30 Micro Lithography, Inc. Optical pellicle mounting system
US6239863B1 (en) * 1999-10-08 2001-05-29 Silicon Valley Group, Inc. Removable cover for protecting a reticle, system including and method of using the same
JP4185232B2 (ja) * 2000-03-08 2008-11-26 信越化学工業株式会社 リソグラフィー用ペリクル
CN1237395C (zh) * 2000-12-27 2006-01-18 三井化学株式会社 薄膜和薄膜的制造方法以及薄膜用粘合剂
US7351503B2 (en) * 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
KR100597035B1 (ko) * 2001-03-01 2006-07-04 에이에스엠엘 네델란즈 비.브이. 마스크핸들링방법, 마스크, 그를 위한 그리퍼를 포함하는기구 또는 장치, 디바이스 제조방법 및 그 디바이스
TWI319123B (en) * 2002-02-22 2010-01-01 Asml Holding Nv System and method for using a two part cover for protecting a reticle
US7264853B2 (en) * 2003-08-26 2007-09-04 Intel Corporation Attaching a pellicle frame to a reticle
US7316869B2 (en) 2003-08-26 2008-01-08 Intel Corporation Mounting a pellicle to a frame
WO2005036604A2 (fr) * 2003-10-09 2005-04-21 E.I. Dupont De Nemours And Company Dispositif et procede permettant de maintenir un substrat souple pendant un traitement
US20050202252A1 (en) * 2004-03-12 2005-09-15 Alexander Tregub Use of alternative polymer materials for "soft" polymer pellicles
US7314667B2 (en) * 2004-03-12 2008-01-01 Intel Corporation Process to optimize properties of polymer pellicles and resist for lithography applications
EP1904894A1 (fr) * 2005-07-18 2008-04-02 Carl Zeiss SMT AG Pellicule destinee a etre utilisee dans un appareil d'exposition de projection microlithographique
JP5586387B2 (ja) * 2010-09-15 2014-09-10 旭化成イーマテリアルズ株式会社 ペリクル
JP6033619B2 (ja) * 2012-09-13 2016-11-30 テイ・エス テック株式会社 車両用シート
JP6274079B2 (ja) * 2014-11-04 2018-02-07 日本軽金属株式会社 ペリクル用支持枠および製造方法
KR102401580B1 (ko) 2015-06-04 2022-05-24 삼성전자주식회사 펠리클 조립체의 제조 방법 및 펠리클 조립체를 포함하는 포토마스크 조립체의 제조 방법
KR102363381B1 (ko) 2015-09-30 2022-02-15 삼성전자주식회사 수용성 접착제를 가진 펠리클 및 상기 펠리클이 부착된 포토마스크 어셈블리
WO2020213662A1 (fr) * 2019-04-16 2020-10-22 信越化学工業株式会社 Adhésif pour pellicule, pellicule, plaque originale d'exposition dotée d'une pellicule, procédé de fabrication de dispositif à semi-conducteur, procédé de fabrication de panneau d'affichage à cristaux liquides, procédé de régénération de plaque originale d'exposition et procédé de réduction de résidus de pelage

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219023A (ja) * 1982-06-15 1983-12-20 Daicel Chem Ind Ltd 樹脂薄膜の製造方法
JPS6083032A (ja) * 1983-10-13 1985-05-11 Asahi Chem Ind Co Ltd 光透過性に優れたフオトマスク用防塵カバ−
US4861402A (en) * 1984-10-16 1989-08-29 Du Pont Tau Laboratories, Inc. Method of making a cellulose acetate butyrate pellicle
JPS6197924A (ja) * 1984-10-19 1986-05-16 Nippon Sheet Glass Co Ltd 保護カバ−
DE3750353T2 (de) * 1986-06-12 1994-12-08 Mitsui Petrochemical Ind Verfahren zur Herstellung von Celluloseesterfolien.
EP0252574A2 (fr) * 1986-07-07 1988-01-13 YEN, Yung-Tsai Procédé et appareil pour réduire les particules sur photomasques
US5100957A (en) * 1986-12-26 1992-03-31 Tosoh Corporation Protective dust cover for photomask or reticle
US4828640A (en) * 1987-05-28 1989-05-09 Mitsui Petrochemical Industries, Ltd. Method of producing films using a peeling jig
KR960000490B1 (ko) * 1987-07-10 1996-01-08 미쓰이세키유가가쿠고교 가부시기가이샤 반사 방지형 펠리클막 및 그 제조 방법
JP2642637B2 (ja) * 1987-08-18 1997-08-20 三井石油化学工業 株式会社 防塵膜
JPH01120535A (ja) * 1987-11-02 1989-05-12 Canon Inc 強誘電性液晶素子
JP2535971B2 (ja) * 1987-11-05 1996-09-18 三井石油化学工業株式会社 ペリクル
JP2576581B2 (ja) * 1988-04-14 1997-01-29 三井石油化学工業株式会社 高光透過性防塵膜およびその製造方法
US4970099A (en) * 1989-05-19 1990-11-13 E. I. Du Pont De Nemours And Company Perfluoropolymer coated pellicles
US5061024C1 (en) * 1989-09-06 2002-02-26 Dupont Photomasks Inc Amorphous fluoropolymer pellicle films

Also Published As

Publication number Publication date
DE69129525T2 (de) 1998-11-05
JPH04199055A (ja) 1992-07-20
KR950008845B1 (ko) 1995-08-08
ES2117635T3 (es) 1998-08-16
DE69129525D1 (de) 1998-07-09
US5643654A (en) 1997-07-01
ATE166979T1 (de) 1998-06-15
EP0488788A1 (fr) 1992-06-03
JP3037745B2 (ja) 2000-05-08
KR920010787A (ko) 1992-06-27
EP0488788B1 (fr) 1998-06-03
CA2056299C (fr) 2000-07-04

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