ES2117635T3 - Estructura de pelicula y procedimiento para su preparacion. - Google Patents

Estructura de pelicula y procedimiento para su preparacion.

Info

Publication number
ES2117635T3
ES2117635T3 ES91311121T ES91311121T ES2117635T3 ES 2117635 T3 ES2117635 T3 ES 2117635T3 ES 91311121 T ES91311121 T ES 91311121T ES 91311121 T ES91311121 T ES 91311121T ES 2117635 T3 ES2117635 T3 ES 2117635T3
Authority
ES
Spain
Prior art keywords
frame
film
adhesive
layer
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91311121T
Other languages
English (en)
Inventor
Minoru Fujita
Hiroaki Nakagawa
Tsutomu Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Application granted granted Critical
Publication of ES2117635T3 publication Critical patent/ES2117635T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H10P76/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/23Sheet including cover or casing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322Composite web or sheet
    • Y10T428/24331Composite web or sheet including nonapertured component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24777Edge feature
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2804Next to metal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2813Heat or solvent activated or sealable
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2813Heat or solvent activated or sealable
    • Y10T428/2817Heat sealable
    • Y10T428/2826Synthetic resin or polymer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2852Adhesive compositions
    • Y10T428/2878Adhesive compositions including addition polymer from unsaturated monomer
    • Y10T428/2891Adhesive compositions including addition polymer from unsaturated monomer including addition polymer from alpha-beta unsaturated carboxylic acid [e.g., acrylic acid, methacrylic acid, etc.] Or derivative thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/3154Of fluorinated addition polymer from unsaturated monomers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/3154Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544Addition polymer is perhalogenated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31855Of addition polymer from unsaturated monomers
    • Y10T428/3188Next to cellulosic
    • Y10T428/31884Regenerated or modified cellulose
    • Y10T428/31891Where addition polymer is an ester or halide
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31855Of addition polymer from unsaturated monomers
    • Y10T428/31909Next to second addition polymer from unsaturated monomers
    • Y10T428/31928Ester, halide or nitrile of addition polymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Sealing Battery Cases Or Jackets (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Prostheses (AREA)

Abstract

SE DISCUTE UNA ESTRUCTURA DE PELICULA QUE CONSTA DE UN BASTIDOR QUE TIENE UNA ABERTURA, UNA PELICULA EXTENDIDA ALREDEDOR DE LA ABERTURA DEL BASTIDOR TENIENDO LA PELICULA UNA CAPA DE REVESTIMIENTO FORMADA AL MENOS EN LA SUPERFICIE INTERIOR DE LA MISMA Y UNA PORCION DE UNION PARA UNIR EL BASTIDOR A LA PERIFERIA DE LA PELICULA MEDIANTE UNA CAPA ADHESIVA, EN LA QUE NO HAY NINGUNA CAPA DE REVESTIMIENTO EN LA PORCION DE LA UNION (HABIENDOSE EL REVESTIMIENTO DISUELTO O DISPERSO EN EL ADHESIVO) Y LA PELICULA SE UNE DIRECTAMENTE AL BASTIDOR MEDIANTE EL ADHESIVO. ESTA ESTRUCTURA SE PREPARA REVISTIENDO UN ADHESIVO, CAPAZ DE DISOLVER LA CAPA DE REVESTIMIENTO DE LA PELICULA DE LA ABERTURA DEL BASTIDOR, PONIENDO EN PONIENDO EN CONTACTO LA SUPERFICIE REVESTIDA DE ADHESIVO DEL BASTIDOR CON LA SUPERFICIE DE LA CAPA DE REVESTIMIENTO DE LA PELICULA DE MANERA TAL QUE DISUELVA Y EXTRAIGA LA CAPA DE REVESTIMIENTO EN LA PORCION DE UNION Y CURE EL ADHESIVO DE MANERA QUE LA PELICULA SE UNA DIRECTAMENTE AL BASTIDOR.
ES91311121T 1990-11-29 1991-11-29 Estructura de pelicula y procedimiento para su preparacion. Expired - Lifetime ES2117635T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33149990A JP3037745B2 (ja) 1990-11-29 1990-11-29 ペリクル構造体

Publications (1)

Publication Number Publication Date
ES2117635T3 true ES2117635T3 (es) 1998-08-16

Family

ID=18244323

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91311121T Expired - Lifetime ES2117635T3 (es) 1990-11-29 1991-11-29 Estructura de pelicula y procedimiento para su preparacion.

Country Status (8)

Country Link
US (1) US5643654A (es)
EP (1) EP0488788B1 (es)
JP (1) JP3037745B2 (es)
KR (1) KR950008845B1 (es)
AT (1) ATE166979T1 (es)
CA (1) CA2056299C (es)
DE (1) DE69129525T2 (es)
ES (1) ES2117635T3 (es)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2915744B2 (ja) * 1993-04-13 1999-07-05 信越化学工業株式会社 ペリクル
JPH098103A (ja) * 1995-06-19 1997-01-10 Nikon Corp 投影露光装置及び投影露光方法
US5772817A (en) * 1997-02-10 1998-06-30 Micro Lithography, Inc. Optical pellicle mounting system
US6239863B1 (en) * 1999-10-08 2001-05-29 Silicon Valley Group, Inc. Removable cover for protecting a reticle, system including and method of using the same
JP4185232B2 (ja) * 2000-03-08 2008-11-26 信越化学工業株式会社 リソグラフィー用ペリクル
CN1237395C (zh) * 2000-12-27 2006-01-18 三井化学株式会社 薄膜和薄膜的制造方法以及薄膜用粘合剂
US7351503B2 (en) * 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
DE60219844T2 (de) * 2001-03-01 2008-01-17 Asml Netherlands B.V. Verfahren zur Übernahme einer lithographischen Maske
US7304720B2 (en) * 2002-02-22 2007-12-04 Asml Holding N.V. System for using a two part cover for protecting a reticle
US7316869B2 (en) 2003-08-26 2008-01-08 Intel Corporation Mounting a pellicle to a frame
US7264853B2 (en) * 2003-08-26 2007-09-04 Intel Corporation Attaching a pellicle frame to a reticle
WO2005036604A2 (en) * 2003-10-09 2005-04-21 E.I. Dupont De Nemours And Company Apparatus and method for supporting a flexible substrate during processing
US7314667B2 (en) * 2004-03-12 2008-01-01 Intel Corporation Process to optimize properties of polymer pellicles and resist for lithography applications
US20050202252A1 (en) * 2004-03-12 2005-09-15 Alexander Tregub Use of alternative polymer materials for "soft" polymer pellicles
WO2007009543A1 (en) * 2005-07-18 2007-01-25 Carl Zeiss Smt Ag Pellicle for use in a microlithographic exposure apparatus
JP5586387B2 (ja) * 2010-09-15 2014-09-10 旭化成イーマテリアルズ株式会社 ペリクル
JP6033619B2 (ja) * 2012-09-13 2016-11-30 テイ・エス テック株式会社 車両用シート
JP6274079B2 (ja) * 2014-11-04 2018-02-07 日本軽金属株式会社 ペリクル用支持枠および製造方法
KR102401580B1 (ko) 2015-06-04 2022-05-24 삼성전자주식회사 펠리클 조립체의 제조 방법 및 펠리클 조립체를 포함하는 포토마스크 조립체의 제조 방법
KR102363381B1 (ko) 2015-09-30 2022-02-15 삼성전자주식회사 수용성 접착제를 가진 펠리클 및 상기 펠리클이 부착된 포토마스크 어셈블리
TWI740799B (zh) * 2019-04-16 2021-09-21 日商信越化學工業股份有限公司 附有黏著劑層的防塵薄膜框架、防塵薄膜組件、附有防塵薄膜組件的曝光原版、曝光方法、半導體裝置的製造方法、及液晶顯示板的製造方法

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JPS58219023A (ja) * 1982-06-15 1983-12-20 Daicel Chem Ind Ltd 樹脂薄膜の製造方法
JPS6083032A (ja) * 1983-10-13 1985-05-11 Asahi Chem Ind Co Ltd 光透過性に優れたフオトマスク用防塵カバ−
US4861402A (en) * 1984-10-16 1989-08-29 Du Pont Tau Laboratories, Inc. Method of making a cellulose acetate butyrate pellicle
JPS6197924A (ja) * 1984-10-19 1986-05-16 Nippon Sheet Glass Co Ltd 保護カバ−
EP0249476B1 (en) * 1986-06-12 1994-08-10 Mitsui Petrochemical Industries, Ltd. Process for preparation of cellulose ester films
EP0252574A2 (en) * 1986-07-07 1988-01-13 YEN, Yung-Tsai Method and apparatus for reducing particulates on photomasks
US5100957A (en) * 1986-12-26 1992-03-31 Tosoh Corporation Protective dust cover for photomask or reticle
US4828640A (en) * 1987-05-28 1989-05-09 Mitsui Petrochemical Industries, Ltd. Method of producing films using a peeling jig
KR960000490B1 (ko) * 1987-07-10 1996-01-08 미쓰이세키유가가쿠고교 가부시기가이샤 반사 방지형 펠리클막 및 그 제조 방법
JP2642637B2 (ja) * 1987-08-18 1997-08-20 三井石油化学工業 株式会社 防塵膜
JPH01120535A (ja) * 1987-11-02 1989-05-12 Canon Inc 強誘電性液晶素子
JP2535971B2 (ja) * 1987-11-05 1996-09-18 三井石油化学工業株式会社 ペリクル
JP2576581B2 (ja) * 1988-04-14 1997-01-29 三井石油化学工業株式会社 高光透過性防塵膜およびその製造方法
US4970099A (en) * 1989-05-19 1990-11-13 E. I. Du Pont De Nemours And Company Perfluoropolymer coated pellicles
US5061024C1 (en) * 1989-09-06 2002-02-26 Dupont Photomasks Inc Amorphous fluoropolymer pellicle films

Also Published As

Publication number Publication date
DE69129525D1 (de) 1998-07-09
US5643654A (en) 1997-07-01
JPH04199055A (ja) 1992-07-20
EP0488788B1 (en) 1998-06-03
JP3037745B2 (ja) 2000-05-08
CA2056299A1 (en) 1992-05-30
CA2056299C (en) 2000-07-04
ATE166979T1 (de) 1998-06-15
DE69129525T2 (de) 1998-11-05
EP0488788A1 (en) 1992-06-03
KR950008845B1 (ko) 1995-08-08
KR920010787A (ko) 1992-06-27

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