CA1249954A - Method of manufacturing a device having an electric resistance layer and the use of the method - Google Patents
Method of manufacturing a device having an electric resistance layer and the use of the methodInfo
- Publication number
- CA1249954A CA1249954A CA000505471A CA505471A CA1249954A CA 1249954 A CA1249954 A CA 1249954A CA 000505471 A CA000505471 A CA 000505471A CA 505471 A CA505471 A CA 505471A CA 1249954 A CA1249954 A CA 1249954A
- Authority
- CA
- Canada
- Prior art keywords
- layer
- suspension
- insulating substrate
- resistance layer
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 239000000725 suspension Substances 0.000 claims abstract description 31
- 238000010438 heat treatment Methods 0.000 claims abstract description 28
- 239000011521 glass Substances 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims abstract description 11
- VDRDGQXTSLSKKY-UHFFFAOYSA-K ruthenium(3+);trihydroxide Chemical compound [OH-].[OH-].[OH-].[Ru+3] VDRDGQXTSLSKKY-UHFFFAOYSA-K 0.000 claims abstract description 11
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000002245 particle Substances 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 9
- 239000000203 mixture Substances 0.000 claims description 12
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
- 238000007493 shaping process Methods 0.000 claims description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- 229910021529 ammonia Inorganic materials 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000002244 precipitate Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000007792 addition Methods 0.000 description 4
- 210000003298 dental enamel Anatomy 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 230000004075 alteration Effects 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000005355 lead glass Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005385 borate glass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- ZPPSOOVFTBGHBI-UHFFFAOYSA-N lead(2+);oxido(oxo)borane Chemical compound [Pb+2].[O-]B=O.[O-]B=O ZPPSOOVFTBGHBI-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 239000007966 viscous suspension Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/86—Vessels; Containers; Vacuum locks
- H01J29/867—Means associated with the outside of the vessel for shielding, e.g. magnetic shields
- H01J29/868—Screens covering the input or output face of the vessel, e.g. transparent anti-static coatings, X-ray absorbing layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
- H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
- H01C17/06513—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
- H01C17/06533—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component composed of oxides
- H01C17/0654—Oxides of the platinum group
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/58—Arrangements for focusing or reflecting ray or beam
- H01J29/62—Electrostatic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4824—Constructional arrangements of electrodes
- H01J2229/4827—Electrodes formed on surface of common cylindrical support
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49082—Resistor making
- Y10T29/49099—Coating resistive material on a base
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Non-Adjustable Resistors (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8500905A NL8500905A (nl) | 1985-03-28 | 1985-03-28 | Werkwijze voor het vervaardigen van een inrichting met een elektrische weerstandslaag en toepassing van de werkwijze. |
| NL8500905 | 1985-03-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1249954A true CA1249954A (en) | 1989-02-14 |
Family
ID=19845748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000505471A Expired CA1249954A (en) | 1985-03-28 | 1986-03-27 | Method of manufacturing a device having an electric resistance layer and the use of the method |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4713879A (OSRAM) |
| EP (1) | EP0197584B1 (OSRAM) |
| JP (1) | JPS61224402A (OSRAM) |
| KR (1) | KR940004368B1 (OSRAM) |
| CA (1) | CA1249954A (OSRAM) |
| DE (1) | DE3680015D1 (OSRAM) |
| ES (1) | ES8705696A1 (OSRAM) |
| NL (1) | NL8500905A (OSRAM) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8600391A (nl) * | 1986-02-17 | 1987-09-16 | Philips Nv | Kathodestraalbuis en werkwijze voor het vervaardigen van een kathodestraalbuis. |
| GB8701289D0 (en) * | 1987-01-21 | 1987-02-25 | Philips Nv | Electron beam device |
| GB8707170D0 (en) * | 1987-03-25 | 1987-04-29 | Philips Nv | Electron beam device |
| GB8707169D0 (en) * | 1987-03-25 | 1987-04-29 | Philips Nv | Electron beam device |
| WO1991006603A1 (en) * | 1989-10-26 | 1991-05-16 | Eastman Kodak Company | Poly(1,4-cyclohexylene dimethylene terephthalate) molding compositions |
| JP3219450B2 (ja) * | 1992-01-24 | 2001-10-15 | 旭硝子株式会社 | 導電膜の製造方法、低反射導電膜とその製造方法 |
| WO1996002932A1 (en) * | 1994-07-19 | 1996-02-01 | Philips Electronics N.V. | An electron beam device having a resistive focusing lens structure and method for making such a device |
| US5510670A (en) * | 1994-07-19 | 1996-04-23 | Philips Electronics North American Corporation | Electron beam device having a glass envelope and a focussing lens provided thereon |
| JPH09293465A (ja) * | 1995-11-28 | 1997-11-11 | Matsushita Electric Ind Co Ltd | 陰極線管用抵抗体の製造方法 |
| US6005338A (en) * | 1996-04-18 | 1999-12-21 | Matsushita Electronics Corporation | Cathode-ray tube and process for producing the same |
| JP3546729B2 (ja) * | 1998-12-21 | 2004-07-28 | 松下電器産業株式会社 | 電子銃、電子銃の製造方法、陰極線管装置 |
| JP2001093448A (ja) * | 1999-09-21 | 2001-04-06 | Matsushita Electronics Industry Corp | 陰極線管 |
| WO2019187763A1 (ja) * | 2018-03-26 | 2019-10-03 | パナソニックＩｐマネジメント株式会社 | バリスタおよびその製造方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1835582A (en) * | 1928-03-30 | 1931-12-08 | Stratford B Allen | Resistance unit |
| US3375390A (en) * | 1966-01-03 | 1968-03-26 | Gen Electric | Electron optical system having spiral collimating electrode adjacent the target |
| GB1195833A (en) * | 1966-06-14 | 1970-06-24 | Plessey Co Ltd | Improvements in or relating to Resistors |
| NL137152C (OSRAM) * | 1966-10-24 | |||
| GB1256507A (OSRAM) * | 1968-04-10 | 1971-12-08 | ||
| US3673117A (en) * | 1969-12-19 | 1972-06-27 | Methode Dev Co | Electrical resistant material |
| GB1327760A (en) * | 1969-12-22 | 1973-08-22 | Imp Metal Ind Kynoch Ltd | Electrodes |
| JPS5023591B1 (OSRAM) * | 1970-01-23 | 1975-08-08 | ||
| US3748514A (en) * | 1971-08-18 | 1973-07-24 | A Standaart | Multi-beam cathode ray tube character display |
| GB1353872A (en) * | 1972-07-05 | 1974-05-22 | Thorn Electrical Ind Ltd | Cathode ray tubes |
| JPS539400A (en) * | 1976-07-14 | 1978-01-27 | Japan Tobacco Inc | Method for increasing packing capacity of tobacco |
| JPS5915629B2 (ja) * | 1977-09-12 | 1984-04-10 | 協和醗酵工業株式会社 | 抗生物質の製造法 |
| US4130671A (en) * | 1977-09-30 | 1978-12-19 | The United States Of America As Represented By The United States Department Of Energy | Method for preparing a thick film conductor |
| US4561996A (en) * | 1977-10-05 | 1985-12-31 | Cts Corporation | Electrical resistor and method of making the same |
| US4366042A (en) * | 1981-03-25 | 1982-12-28 | The Dow Chemical Company | Substituted cobalt oxide spinels |
| JPS583201A (ja) * | 1981-06-30 | 1983-01-10 | アルプス電気株式会社 | 抵抗ペ−スト及び該抵抗ペ−ストを用いて作製した厚膜集積回路及びサ−マルヘツドとその製造方法 |
-
1985
- 1985-03-28 NL NL8500905A patent/NL8500905A/nl not_active Application Discontinuation
-
1986
- 1986-03-21 EP EP86200480A patent/EP0197584B1/en not_active Expired - Lifetime
- 1986-03-21 DE DE8686200480T patent/DE3680015D1/de not_active Expired - Lifetime
- 1986-03-24 US US06/843,329 patent/US4713879A/en not_active Expired - Fee Related
- 1986-03-25 ES ES553361A patent/ES8705696A1/es not_active Expired
- 1986-03-27 CA CA000505471A patent/CA1249954A/en not_active Expired
- 1986-03-27 JP JP61067396A patent/JPS61224402A/ja active Granted
- 1986-03-28 KR KR1019860002342A patent/KR940004368B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| ES553361A0 (es) | 1987-05-01 |
| DE3680015D1 (de) | 1991-08-08 |
| KR860007686A (ko) | 1986-10-15 |
| EP0197584A1 (en) | 1986-10-15 |
| ES8705696A1 (es) | 1987-05-01 |
| JPS61224402A (ja) | 1986-10-06 |
| NL8500905A (nl) | 1986-10-16 |
| KR940004368B1 (ko) | 1994-05-23 |
| EP0197584B1 (en) | 1991-07-03 |
| JPH0423402B2 (OSRAM) | 1992-04-22 |
| US4713879A (en) | 1987-12-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |