CA1078299A - Method and apparatus for avoiding undesirable deposits in crystal growing operations - Google Patents
Method and apparatus for avoiding undesirable deposits in crystal growing operationsInfo
- Publication number
- CA1078299A CA1078299A CA290,434A CA290434A CA1078299A CA 1078299 A CA1078299 A CA 1078299A CA 290434 A CA290434 A CA 290434A CA 1078299 A CA1078299 A CA 1078299A
- Authority
- CA
- Canada
- Prior art keywords
- crucible
- heating
- housing
- melt
- recited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 45
- 238000000034 method Methods 0.000 title abstract description 16
- 238000010438 heat treatment Methods 0.000 claims abstract description 49
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 40
- 238000005755 formation reaction Methods 0.000 claims abstract description 40
- 239000000155 melt Substances 0.000 claims abstract description 35
- 239000000463 material Substances 0.000 claims abstract description 19
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 9
- 239000010703 silicon Substances 0.000 claims abstract description 9
- 230000000153 supplemental effect Effects 0.000 claims description 12
- 210000001787 dendrite Anatomy 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 230000012010 growth Effects 0.000 abstract description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 8
- 230000003094 perturbing effect Effects 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000012768 molten material Substances 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 239000010453 quartz Substances 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/750,985 US4116642A (en) | 1976-12-15 | 1976-12-15 | Method and apparatus for avoiding undesirable deposits in crystal growing operations |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1078299A true CA1078299A (en) | 1980-05-27 |
Family
ID=25019967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA290,434A Expired CA1078299A (en) | 1976-12-15 | 1977-11-08 | Method and apparatus for avoiding undesirable deposits in crystal growing operations |
Country Status (6)
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2842605C2 (de) * | 1978-09-29 | 1983-12-08 | Georg Dr. 8521 Langensendelbach Müller | Verfahren zum Herstellen von Kristallen hoher Kristallgüte |
US4289571A (en) * | 1979-06-25 | 1981-09-15 | Energy Materials Corporation | Method and apparatus for producing crystalline ribbons |
US4478676A (en) * | 1982-09-07 | 1984-10-23 | Litton Systems, Inc. | Method for decreasing radial temperature gradients of crystal growth melts utilizing radiant energy absorptive materials and crystal growth chambers comprising such materials |
US4575401A (en) * | 1984-06-07 | 1986-03-11 | Wedtech Corp | Method of and apparatus for the drawing of bars of monocrystalline silicon |
USH520H (en) | 1985-12-06 | 1988-09-06 | Technique for increasing oxygen incorporation during silicon czochralski crystal growth | |
US4911896A (en) * | 1986-07-24 | 1990-03-27 | General Electric Company | Fused quartz member for use in semiconductor manufacture |
US20050274480A1 (en) * | 2004-05-24 | 2005-12-15 | Barsoum Michel W | Reduction of spontaneous metal whisker formation |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA729096A (en) * | 1966-03-01 | G. Herkart Paul | Method of growing crystals | |
BE562704A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1956-11-28 | |||
NL103477C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1956-11-28 | |||
US3261671A (en) * | 1963-11-29 | 1966-07-19 | Philips Corp | Device for treating semi-conductor materials by melting |
US3342559A (en) * | 1964-04-27 | 1967-09-19 | Westinghouse Electric Corp | Apparatus for producing dendrites |
GB1095587A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1965-09-24 | |||
FR1522416A (fr) * | 1967-03-14 | 1968-04-26 | Comp Generale Electricite | Perfectionnements au procédé d'obtention de cristaux par tirage |
DE1769860A1 (de) * | 1968-07-26 | 1971-11-11 | Siemens Ag | Vorrichtung zum Ziehen von versetzungsfreien Halbleitereinkristallstaeben |
GB1366532A (en) * | 1971-04-21 | 1974-09-11 | Nat Res Dev | Apparatus for the preparation and growth of crystalline material |
JPS5836498B2 (ja) * | 1976-06-09 | 1983-08-09 | 富士通株式会社 | 半導体装置 |
-
1976
- 1976-12-15 US US05/750,985 patent/US4116642A/en not_active Expired - Lifetime
-
1977
- 1977-11-08 CA CA290,434A patent/CA1078299A/en not_active Expired
- 1977-12-09 DE DE2755006A patent/DE2755006C3/de not_active Expired
- 1977-12-14 FR FR7737672A patent/FR2374081A1/fr active Granted
- 1977-12-15 GB GB52192/77A patent/GB1591670A/en not_active Expired
- 1977-12-15 JP JP14999077A patent/JPS5376176A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
US4116642A (en) | 1978-09-26 |
JPS5376176A (en) | 1978-07-06 |
DE2755006C3 (de) | 1982-04-29 |
FR2374081B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1982-01-08 |
GB1591670A (en) | 1981-06-24 |
DE2755006A1 (de) | 1978-06-29 |
JPS5633359B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-08-03 |
DE2755006B2 (de) | 1981-07-23 |
FR2374081A1 (fr) | 1978-07-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0509312B1 (en) | Czochralski method using a member for intercepting radiation from raw material molten solution and apparatus therefor | |
US4874458A (en) | Single crystal growing method having improved melt control | |
TW470787B (en) | Apparatus for fabricating single-crystal silicon | |
EP0927777A1 (en) | Semiconductor crystal, and method and apparatus of production | |
CA1078299A (en) | Method and apparatus for avoiding undesirable deposits in crystal growing operations | |
US4238274A (en) | Method for avoiding undesirable deposits in crystal growing operations | |
US5879449A (en) | Crystal growth | |
CA1090479A (en) | Method and apparatus for avoiding undesirable deposits in crystal growing operations | |
JPH06227891A (ja) | シリコン単結晶引上げ用ルツボ | |
JPS6168389A (ja) | 単結晶成長装置 | |
JPH0388794A (ja) | シリコン単結晶の引上げ方法および装置 | |
JPH0315550Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JP2783049B2 (ja) | 単結晶シリコン棒の製造方法及び製造装置 | |
US3929556A (en) | Nucleating growth of lead-tin-telluride single crystal with an oriented barium fluoride substrate | |
JP3812573B2 (ja) | 半導体結晶の成長方法 | |
JP2734820B2 (ja) | 化合物半導体単結晶の製造方法 | |
JP3788156B2 (ja) | 化合物半導体単結晶の製造方法およびそれに用いられるpbn製容器 | |
JP3079991B2 (ja) | 単結晶の製造装置および製造方法 | |
JP2755452B2 (ja) | シリコン単結晶の引上げ装置 | |
JP4117813B2 (ja) | 化合物半導体単結晶の製造方法 | |
JPS5950627B2 (ja) | 単結晶シリコン引上装置 | |
JP2829688B2 (ja) | 半導体単結晶製造装置および半導体単結晶製造方法 | |
JPH0140800B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPH07300386A (ja) | 半導体結晶の成長方法 | |
JPH08290991A (ja) | 化合物半導体単結晶の成長方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry |