BRPI0715723A2 - indicadores de doses de uv - Google Patents

indicadores de doses de uv

Info

Publication number
BRPI0715723A2
BRPI0715723A2 BRPI0715723-1A2A BRPI0715723A BRPI0715723A2 BR PI0715723 A2 BRPI0715723 A2 BR PI0715723A2 BR PI0715723 A BRPI0715723 A BR PI0715723A BR PI0715723 A2 BRPI0715723 A2 BR PI0715723A2
Authority
BR
Brazil
Prior art keywords
dose indicators
indicators
dose
Prior art date
Application number
BRPI0715723-1A2A
Other languages
English (en)
Portuguese (pt)
Inventor
Katia Studer
Tunja Jung
Kurt Dietliker
Urs Lehmann
Original Assignee
Ciba Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding Inc filed Critical Ciba Holding Inc
Publication of BRPI0715723A2 publication Critical patent/BRPI0715723A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/732—Leuco dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Measurement Of Radiation (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Laminated Bodies (AREA)
BRPI0715723-1A2A 2006-08-24 2007-08-15 indicadores de doses de uv BRPI0715723A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06119455 2006-08-24
PCT/EP2007/058422 WO2008022952A1 (en) 2006-08-24 2007-08-15 Uv-dosis indicators

Publications (1)

Publication Number Publication Date
BRPI0715723A2 true BRPI0715723A2 (pt) 2013-09-17

Family

ID=38293999

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0715723-1A2A BRPI0715723A2 (pt) 2006-08-24 2007-08-15 indicadores de doses de uv

Country Status (8)

Country Link
US (1) US8049186B2 (enExample)
EP (1) EP2054769A1 (enExample)
JP (1) JP2010501655A (enExample)
KR (1) KR20090043591A (enExample)
CN (1) CN101506734B (enExample)
BR (1) BRPI0715723A2 (enExample)
RU (1) RU2453886C2 (enExample)
WO (1) WO2008022952A1 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110065203A1 (en) * 2008-02-21 2011-03-17 Basf Se Uv-dose indicator
DE102008049848A1 (de) * 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
EP2358840B1 (en) * 2008-10-02 2012-12-26 Basf Se Multi color, photoactive, color changing compositions and uv dosimeters
JP2012522084A (ja) * 2009-03-30 2012-09-20 ビーエーエスエフ ソシエタス・ヨーロピア Ｕｖ線量インジケータフィルム
US9121776B2 (en) 2009-11-13 2015-09-01 Lincoln Global, Inc. Welding arc apparel with UV or thermochromic activated images
US8284385B2 (en) * 2009-11-13 2012-10-09 Lincoln Global, Inc. Welding arc apparel with UV activated images
EP2501778A2 (en) * 2009-11-16 2012-09-26 Basf Se Multi color, photoactive, color changing compositions
CN102162997A (zh) * 2010-02-24 2011-08-24 中国科学院大连化学物理研究所 一种以太阳光为曝光光源制作微流控芯片的方法及其应用
US20120050520A1 (en) * 2010-08-24 2012-03-01 Raytheon Company Method and Apparatus for Anti-Biofouling of Optics in Liquid Environments
US8445864B2 (en) 2011-08-26 2013-05-21 Raytheon Company Method and apparatus for anti-biofouling of a protected surface in liquid environments
US9776219B2 (en) 2013-01-17 2017-10-03 Raytheon Company Method and apparatus for removing biofouling from a protected surface in a liquid environment
JP2014153259A (ja) * 2013-02-12 2014-08-25 Fuji Xerox Co Ltd 曝露量判定用媒体、曝露量判定装置、曝露量判定システム及びプログラム
TWI624890B (zh) 2013-08-22 2018-05-21 Sakura Color Prod Corp Indicator for electronic component manufacturing apparatus, and design and/or management method of the same
CN106030766B (zh) 2014-02-14 2019-05-28 株式会社樱花彩色笔 等离子体处理检测指示器
JP2015205995A (ja) 2014-04-21 2015-11-19 株式会社サクラクレパス プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ
US10180392B2 (en) 2014-05-09 2019-01-15 Sakura Color Products Corporation Plasma processing detection indicator using inorganic substance as a color-change layer
JP6686299B2 (ja) * 2014-05-22 2020-04-22 大日本印刷株式会社 積層体の製造方法及びそれに用いる接着シート
JP6567863B2 (ja) * 2014-09-16 2019-08-28 株式会社サクラクレパス プラズマ処理検知用インキ組成物及びプラズマ処理検知インジケータ
JP6567817B2 (ja) 2014-12-02 2019-08-28 株式会社サクラクレパス プラズマ処理検知インキ組成物及びそれを用いたプラズマ処理検知インジケータ
US20190142713A1 (en) * 2016-04-13 2019-05-16 Segan Industries, Inc. Optical Evanescent Color Change Compositions and Methods of Making and Using the Same
WO2018070360A1 (ja) * 2016-10-11 2018-04-19 株式会社村田製作所 揮発性有機物検知体及びその製造方法、揮発性有機物の検知方法並びに揮発性有機物検知装置
US10725002B2 (en) 2016-11-03 2020-07-28 Microsoft Technology Licensing, Llc Chemical sensors for detection and display of environmental hazards
EP3327088A1 (en) 2016-11-28 2018-05-30 Agfa-Gevaert Nv A multicolour laser marking method
EP4299691A4 (en) * 2021-02-26 2024-07-31 FUJIFILM Corporation UV RADIATION INSPECTION TOOL, UV RADIATION INSPECTION KIT, AND UV RADIATION INSPECTION METHOD
WO2022181288A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知部材、紫外線感知キット
WO2022181392A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知部材、マイクロカプセル、マイクロカプセルの製造方法、紫外線感知層形成用分散液、紫外線感知キット
WO2022181285A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知部材、マイクロカプセル、マイクロカプセルの製造方法、紫外線感知層形成用分散液、紫外線感知キット
WO2022181332A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知キット、紫外線測定方法、および、紫外線感知キット用ユニット
WO2022181321A1 (ja) * 2021-02-26 2022-09-01 富士フイルム株式会社 紫外線感知部材、マイクロカプセル、マイクロカプセルの製造方法、紫外線感知層形成用分散液、紫外線感知キット
WO2022209858A1 (ja) * 2021-03-31 2022-10-06 富士フイルム株式会社 紫外線感知部材、紫外線感知キット
GB2617847B (en) 2022-04-21 2024-05-22 Intellego Tech Ab Sweden Stable UV indicator
WO2023220461A1 (en) * 2022-05-13 2023-11-16 Quadratic 3D, Inc. Photoinitiators, compositions, and methods of forming an object
WO2023220841A1 (en) * 2022-05-19 2023-11-23 Jianguo Wen A detecting element for visualizing the intensity distribution of microwave field, and method of preparation and use thereof

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1164710A (en) * 1978-05-09 1984-04-03 Edward J. Reardon, Jr. Phototropic photosensitive compositions containing fluoran colorformer
DE2914427A1 (de) 1979-04-10 1980-10-23 Bayer Ag Beschichtung fuer thermoplasten
US4339240A (en) * 1980-05-07 1982-07-13 Allied Corporation Color changing polyacetylenic compounds
JPS6086540A (ja) * 1983-10-18 1985-05-16 Pilot Pen Co Ltd:The フオトクロミツク材料
JPS61137876A (ja) * 1984-12-07 1986-06-25 Hodogaya Chem Co Ltd キサンテン化合物、キサンテン化合物の製造方法及びキサンテン化合物を含有する画像形成組成物
DE3660255D1 (en) 1985-04-12 1988-07-07 Ciba Geigy Ag Oxime sulphonates containing reactive groups
US5028792A (en) * 1987-03-19 1991-07-02 Xytronyx, Inc. System for the visualization of exposure to ultraviolet radiation
JPH01272930A (ja) * 1988-04-26 1989-10-31 Tomoegawa Paper Co Ltd エネルギー線線量測定シート
JPH04295458A (ja) 1991-03-22 1992-10-20 Fuji Photo Film Co Ltd 光照射により酸を発生する化合物
RU2046302C1 (ru) * 1991-06-28 1995-10-20 Владимир Наумович Генкин Датчик для определения дозы облучения ультрафиолетовым излучением и фоточувствительный элемент для индикации облучения
JPH05318909A (ja) * 1992-05-15 1993-12-03 Fuji Photo Film Co Ltd 感熱記録材料
DE59309494D1 (de) * 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
US5296275A (en) * 1992-07-01 1994-03-22 Xytronyx, Inc. Phototranschromic ink
DE4338361A1 (de) 1993-11-10 1995-05-11 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung von Zusammensetzungen auf der Basis von Epoxidgruppen-haltigen Silanen
JP3456808B2 (ja) * 1995-09-29 2003-10-14 東京応化工業株式会社 ホトレジスト組成物
US20010037037A1 (en) * 1995-10-31 2001-11-01 Kurt Dietliker Oximesulfonic acid esters and the use thereof as latent sulfonic acids
MY117352A (en) * 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
DE69721019T2 (de) * 1996-09-02 2003-12-24 Ciba Speciality Chemicals Holding Inc., Basel Alkylsulfonyloxime für i-line-photoresists hoher auflösung und empfindlichkeit
DE19724396A1 (de) 1997-06-10 1998-12-24 Bayer Ag UV-Stabilisatoren für Siloxan-Systeme
RU2116634C1 (ru) * 1997-06-10 1998-07-27 Виктор Федорович Иванов Индикатор ультрафиолетового излучения
DE19724397A1 (de) 1997-06-10 1999-01-14 Bayer Ag UV-Stabilisatoren für Siloxan-Systeme
TW550439B (en) * 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
US6406914B1 (en) * 1999-03-31 2002-06-18 Nichiyu Giken Kogyo Co., Ltd. Radiation exposure dose-history indicator
SG78412A1 (en) * 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US7091257B2 (en) * 1999-07-27 2006-08-15 Alcatel Radiation-curable composition with simultaneous color formation during cure
SG98433A1 (en) * 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors
US20020022008A1 (en) * 2000-07-10 2002-02-21 Forest Susan Ellen UV indicator to signal the reduction of sunscreen efficiency
JP4226803B2 (ja) * 2000-08-08 2009-02-18 富士フイルム株式会社 ポジ型感光性組成物
GB0114265D0 (en) 2001-06-12 2001-08-01 Ciba Sc Holding Ag Polymeric material containing a latent acid
GB0114266D0 (en) * 2001-06-12 2001-08-01 Ciba Sc Holding Ag Laser marking method
US6824954B2 (en) * 2001-08-23 2004-11-30 Jsr Corporation Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same
CA2474532A1 (en) * 2002-02-06 2003-08-14 Peter Murer Sulfonate derivatives and the use therof as latent acids
EP1354640A1 (de) 2002-04-19 2003-10-22 Dürr Systems GmbH Verfahren und Vorrichtung zum Härten einer Beschichtung
MXPA04009790A (es) 2002-04-19 2004-12-13 Ciba Sc Holding Ag Curado de recubrimientos inducido por plasma.
GB0228647D0 (en) * 2002-12-09 2003-01-15 Ciba Sc Holding Ag Polyeric material containing a latent acid
MXPA05008118A (es) * 2003-02-19 2005-09-30 Ciba Sc Holding Ag Derivados de oxima halogenados y el uso de los mismos como acidos latentes.
EP1599744A2 (en) * 2003-02-27 2005-11-30 Jp Laboratories, Inc. Self-indicating radiation alert dosimeter
US7147801B2 (en) * 2003-03-13 2006-12-12 Videojet Technologies Inc. Ink jet ink composition and method for security marking
JP4231741B2 (ja) * 2003-06-27 2009-03-04 富士フイルム株式会社 光感応性高分子組成物、それを用いた着色方法及び記録方法
CN1890014B (zh) * 2003-12-03 2011-03-09 共同印刷株式会社 具指示器功能的吸湿材料、湿度指示器以及包装袋
US20050196616A1 (en) * 2004-03-04 2005-09-08 Stewart Kevin J. Photochromic optical article
KR20070012456A (ko) * 2004-04-07 2007-01-25 시바 스페셜티 케미칼스 홀딩 인크. 피복 조성물의 발색방법
WO2006008250A2 (en) * 2004-07-20 2006-01-26 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use therof as latent acids

Also Published As

Publication number Publication date
RU2453886C2 (ru) 2012-06-20
US8049186B2 (en) 2011-11-01
JP2010501655A (ja) 2010-01-21
WO2008022952A1 (en) 2008-02-28
EP2054769A1 (en) 2009-05-06
KR20090043591A (ko) 2009-05-06
US20090194708A1 (en) 2009-08-06
CN101506734A (zh) 2009-08-12
RU2009110250A (ru) 2010-09-27
CN101506734B (zh) 2012-04-11

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Legal Events

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B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 8A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2320 DE 23-06-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.