US4377324A
(en)
*
|
1980-08-04 |
1983-03-22 |
Honeywell Inc. |
Graded index Fabry-Perot optical filter device
|
US4571603A
(en)
*
|
1981-11-03 |
1986-02-18 |
Texas Instruments Incorporated |
Deformable mirror electrostatic printer
|
US4500171A
(en)
*
|
1982-06-02 |
1985-02-19 |
Texas Instruments Incorporated |
Process for plastic LCD fill hole sealing
|
US4551197A
(en)
*
|
1984-07-26 |
1985-11-05 |
Guilmette Joseph G |
Method and apparatus for the recovery and recycling of condensable gas reactants
|
US4566935A
(en)
*
|
1984-07-31 |
1986-01-28 |
Texas Instruments Incorporated |
Spatial light modulator and method
|
US5096279A
(en)
*
|
1984-08-31 |
1992-03-17 |
Texas Instruments Incorporated |
Spatial light modulator and method
|
GB2186708B
(en)
*
|
1985-11-26 |
1990-07-11 |
Sharp Kk |
A variable interferometric device and a process for the production of the same
|
US5835255A
(en)
|
1986-04-23 |
1998-11-10 |
Etalon, Inc. |
Visible spectrum modulator arrays
|
US4852516A
(en)
*
|
1986-05-19 |
1989-08-01 |
Machine Technology, Inc. |
Modular processing apparatus for processing semiconductor wafers
|
US4900136A
(en)
*
|
1987-08-11 |
1990-02-13 |
North American Philips Corporation |
Method of metallizing silica-containing gel and solid state light modulator incorporating the metallized gel
|
DE3735449A1
(de)
*
|
1987-10-20 |
1989-05-03 |
Convac Gmbh |
Fertigungssystem fuer halbleitersubstrate
|
JPH0242761A
(ja)
*
|
1988-04-20 |
1990-02-13 |
Matsushita Electric Ind Co Ltd |
アクティブマトリクス基板の製造方法
|
JP2700903B2
(ja)
*
|
1988-09-30 |
1998-01-21 |
シャープ株式会社 |
液晶表示装置
|
EP0376252B1
(en)
*
|
1988-12-27 |
1997-10-22 |
Kabushiki Kaisha Toshiba |
Method of removing an oxide film on a substrate
|
US4982184A
(en)
*
|
1989-01-03 |
1991-01-01 |
General Electric Company |
Electrocrystallochromic display and element
|
US5287096A
(en)
*
|
1989-02-27 |
1994-02-15 |
Texas Instruments Incorporated |
Variable luminosity display system
|
US5079544A
(en)
*
|
1989-02-27 |
1992-01-07 |
Texas Instruments Incorporated |
Standard independent digitized video system
|
US5192946A
(en)
*
|
1989-02-27 |
1993-03-09 |
Texas Instruments Incorporated |
Digitized color video display system
|
US4900395A
(en)
*
|
1989-04-07 |
1990-02-13 |
Fsi International, Inc. |
HF gas etching of wafers in an acid processor
|
US5381253A
(en)
*
|
1991-11-14 |
1995-01-10 |
Board Of Regents Of University Of Colorado |
Chiral smectic liquid crystal optical modulators having variable retardation
|
JPH0818902B2
(ja)
*
|
1989-11-02 |
1996-02-28 |
シャープ株式会社 |
気相成長装置
|
US5500635A
(en)
*
|
1990-02-20 |
1996-03-19 |
Mott; Jonathan C. |
Products incorporating piezoelectric material
|
US5002631A
(en)
*
|
1990-03-09 |
1991-03-26 |
At&T Bell Laboratories |
Plasma etching apparatus and method
|
CH682523A5
(fr)
*
|
1990-04-20 |
1993-09-30 |
Suisse Electronique Microtech |
Dispositif de modulation de lumière à adressage matriciel.
|
US5083857A
(en)
*
|
1990-06-29 |
1992-01-28 |
Texas Instruments Incorporated |
Multi-level deformable mirror device
|
US5099353A
(en)
*
|
1990-06-29 |
1992-03-24 |
Texas Instruments Incorporated |
Architecture and process for integrating DMD with control circuit substrates
|
EP0467048B1
(en)
*
|
1990-06-29 |
1995-09-20 |
Texas Instruments Incorporated |
Field-updated deformable mirror device
|
US5192395A
(en)
*
|
1990-10-12 |
1993-03-09 |
Texas Instruments Incorporated |
Method of making a digital flexure beam accelerometer
|
US5602671A
(en)
*
|
1990-11-13 |
1997-02-11 |
Texas Instruments Incorporated |
Low surface energy passivation layer for micromechanical devices
|
FR2669466B1
(fr)
*
|
1990-11-16 |
1997-11-07 |
Michel Haond |
Procede de gravure de couches de circuit integre a profondeur fixee et circuit integre correspondant.
|
CA2063744C
(en)
*
|
1991-04-01 |
2002-10-08 |
Paul M. Urbanus |
Digital micromirror device architecture and timing for use in a pulse-width modulated display system
|
FR2679057B1
(fr)
*
|
1991-07-11 |
1995-10-20 |
Morin Francois |
Structure d'ecran a cristal liquide, a matrice active et a haute definition.
|
US5179274A
(en)
*
|
1991-07-12 |
1993-01-12 |
Texas Instruments Incorporated |
Method for controlling operation of optical systems and devices
|
US5358601A
(en)
*
|
1991-09-24 |
1994-10-25 |
Micron Technology, Inc. |
Process for isotropically etching semiconductor devices
|
US5296950A
(en)
*
|
1992-01-31 |
1994-03-22 |
Texas Instruments Incorporated |
Optical signal free-space conversion board
|
US5312513A
(en)
*
|
1992-04-03 |
1994-05-17 |
Texas Instruments Incorporated |
Methods of forming multiple phase light modulators
|
US5401983A
(en)
*
|
1992-04-08 |
1995-03-28 |
Georgia Tech Research Corporation |
Processes for lift-off of thin film materials or devices for fabricating three dimensional integrated circuits, optical detectors, and micromechanical devices
|
TW245772B
(pt)
*
|
1992-05-19 |
1995-04-21 |
Akzo Nv |
|
JPH0651250A
(ja)
*
|
1992-05-20 |
1994-02-25 |
Texas Instr Inc <Ti> |
モノリシックな空間的光変調器およびメモリのパッケージ
|
US5818095A
(en)
*
|
1992-08-11 |
1998-10-06 |
Texas Instruments Incorporated |
High-yield spatial light modulator with light blocking layer
|
US5293272A
(en)
*
|
1992-08-24 |
1994-03-08 |
Physical Optics Corporation |
High finesse holographic fabry-perot etalon and method of fabricating
|
US6674562B1
(en)
*
|
1994-05-05 |
2004-01-06 |
Iridigm Display Corporation |
Interferometric modulation of radiation
|
DE4317274A1
(de)
*
|
1993-05-25 |
1994-12-01 |
Bosch Gmbh Robert |
Verfahren zur Herstellung oberflächen-mikromechanischer Strukturen
|
US6199874B1
(en)
*
|
1993-05-26 |
2001-03-13 |
Cornell Research Foundation Inc. |
Microelectromechanical accelerometer for automotive applications
|
US5489952A
(en)
*
|
1993-07-14 |
1996-02-06 |
Texas Instruments Incorporated |
Method and device for multi-format television
|
US5374346A
(en)
*
|
1993-08-09 |
1994-12-20 |
Rohm And Haas Company |
Electroplating process and composition
|
JP3399040B2
(ja)
*
|
1993-09-20 |
2003-04-21 |
株式会社日立製作所 |
半導体製造装置及び半導体製造方法
|
US5497197A
(en)
*
|
1993-11-04 |
1996-03-05 |
Texas Instruments Incorporated |
System and method for packaging data into video processor
|
US5500761A
(en)
*
|
1994-01-27 |
1996-03-19 |
At&T Corp. |
Micromechanical modulator
|
JPH07253594A
(ja)
*
|
1994-03-15 |
1995-10-03 |
Fujitsu Ltd |
表示装置
|
US7297471B1
(en)
*
|
2003-04-15 |
2007-11-20 |
Idc, Llc |
Method for manufacturing an array of interferometric modulators
|
US7460291B2
(en)
*
|
1994-05-05 |
2008-12-02 |
Idc, Llc |
Separable modulator
|
US6710908B2
(en)
*
|
1994-05-05 |
2004-03-23 |
Iridigm Display Corporation |
Controlling micro-electro-mechanical cavities
|
US7550794B2
(en)
*
|
2002-09-20 |
2009-06-23 |
Idc, Llc |
Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer
|
US6680792B2
(en)
*
|
1994-05-05 |
2004-01-20 |
Iridigm Display Corporation |
Interferometric modulation of radiation
|
US6040937A
(en)
*
|
1994-05-05 |
2000-03-21 |
Etalon, Inc. |
Interferometric modulation
|
US7123216B1
(en)
*
|
1994-05-05 |
2006-10-17 |
Idc, Llc |
Photonic MEMS and structures
|
US5497172A
(en)
*
|
1994-06-13 |
1996-03-05 |
Texas Instruments Incorporated |
Pulse width modulation for spatial light modulator with split reset addressing
|
JPH07331460A
(ja)
*
|
1994-06-02 |
1995-12-19 |
Nippon Telegr & Teleph Corp <Ntt> |
ドライエッチング方法
|
US5499062A
(en)
*
|
1994-06-23 |
1996-03-12 |
Texas Instruments Incorporated |
Multiplexed memory timing with block reset and secondary memory
|
US5610624A
(en)
*
|
1994-11-30 |
1997-03-11 |
Texas Instruments Incorporated |
Spatial light modulator with reduced possibility of an on state defect
|
US5726480A
(en)
*
|
1995-01-27 |
1998-03-10 |
The Regents Of The University Of California |
Etchants for use in micromachining of CMOS Microaccelerometers and microelectromechanical devices and method of making the same
|
US5567334A
(en)
*
|
1995-02-27 |
1996-10-22 |
Texas Instruments Incorporated |
Method for creating a digital micromirror device using an aluminum hard mask
|
US5610438A
(en)
*
|
1995-03-08 |
1997-03-11 |
Texas Instruments Incorporated |
Micro-mechanical device with non-evaporable getter
|
US5641391A
(en)
*
|
1995-05-15 |
1997-06-24 |
Hunter; Ian W. |
Three dimensional microfabrication by localized electrodeposition and etching
|
JP3165348B2
(ja)
*
|
1995-05-18 |
2001-05-14 |
ワイエイシイ株式会社 |
プラズマ処理装置およびその運転方法
|
US6849471B2
(en)
*
|
2003-03-28 |
2005-02-01 |
Reflectivity, Inc. |
Barrier layers for microelectromechanical systems
|
US6969635B2
(en)
*
|
2000-12-07 |
2005-11-29 |
Reflectivity, Inc. |
Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates
|
US5773088A
(en)
*
|
1995-12-05 |
1998-06-30 |
Materials Research Group, Inc. |
Treatment system including vacuum isolated sources and method
|
US20020025553A1
(en)
*
|
1996-01-04 |
2002-02-28 |
Ying-Fei Wei |
Transforming growth factor alpha HIII
|
JPH09234672A
(ja)
*
|
1996-02-29 |
1997-09-09 |
Sony Corp |
パウダービーム加工機におけるパウダーシール装置
|
JPH09312267A
(ja)
*
|
1996-05-23 |
1997-12-02 |
Rohm Co Ltd |
半導体装置の製法およびその製造装置
|
US5710656A
(en)
*
|
1996-07-30 |
1998-01-20 |
Lucent Technologies Inc. |
Micromechanical optical modulator having a reduced-mass composite membrane
|
US5884083A
(en)
*
|
1996-09-20 |
1999-03-16 |
Royce; Robert |
Computer system to compile non-incremental computer source code to execute within an incremental type computer system
|
US5919548A
(en)
*
|
1996-10-11 |
1999-07-06 |
Sandia Corporation |
Chemical-mechanical polishing of recessed microelectromechanical devices
|
US6033919A
(en)
*
|
1996-10-25 |
2000-03-07 |
Texas Instruments Incorporated |
Method of forming sidewall capacitance structure
|
US6269898B1
(en)
*
|
1998-02-23 |
2001-08-07 |
Currie Technologies, Inc. |
Unitary power module for electric bicycles, bicycle combinations and vehicles
|
EP0877272B1
(en)
*
|
1997-05-08 |
2002-07-31 |
Texas Instruments Incorporated |
Improvements in or relating to spatial light modulators
|
GB9709659D0
(en)
*
|
1997-05-13 |
1997-07-02 |
Surface Tech Sys Ltd |
Method and apparatus for etching a workpiece
|
US5867302A
(en)
*
|
1997-08-07 |
1999-02-02 |
Sandia Corporation |
Bistable microelectromechanical actuator
|
US5972193A
(en)
*
|
1997-10-10 |
1999-10-26 |
Industrial Technology Research Institute |
Method of manufacturing a planar coil using a transparency substrate
|
EP1025711A1
(en)
*
|
1997-10-31 |
2000-08-09 |
Daewoo Electronics Co., Ltd |
Method for manufacturing thin film actuated mirror array in an optical projection system
|
US6028690A
(en)
*
|
1997-11-26 |
2000-02-22 |
Texas Instruments Incorporated |
Reduced micromirror mirror gaps for improved contrast ratio
|
US6180428B1
(en)
*
|
1997-12-12 |
2001-01-30 |
Xerox Corporation |
Monolithic scanning light emitting devices using micromachining
|
US6016693A
(en)
*
|
1998-02-09 |
2000-01-25 |
The Regents Of The University Of California |
Microfabrication of cantilevers using sacrificial templates
|
DE69932323T2
(de)
*
|
1998-03-02 |
2006-11-23 |
Anthony S. Ramona Ellsworth |
Fahrradaufhängungsvorrichtung und entsprechendes verfahren
|
US6195196B1
(en)
*
|
1998-03-13 |
2001-02-27 |
Fuji Photo Film Co., Ltd. |
Array-type exposing device and flat type display incorporating light modulator and driving method thereof
|
EP0951068A1
(en)
*
|
1998-04-17 |
1999-10-20 |
Interuniversitair Micro-Elektronica Centrum Vzw |
Method of fabrication of a microstructure having an inside cavity
|
US6136630A
(en)
*
|
1998-06-04 |
2000-10-24 |
The Regents Of The University Of Michigan |
Method of making a micromechanical device from a single crystal semiconductor substrate and monolithic sensor formed thereby
|
US6710539B2
(en)
*
|
1998-09-02 |
2004-03-23 |
Micron Technology, Inc. |
Field emission devices having structure for reduced emitter tip to gate spacing
|
JP4074714B2
(ja)
*
|
1998-09-25 |
2008-04-09 |
富士フイルム株式会社 |
アレイ型光変調素子及び平面ディスプレイの駆動方法
|
US6391675B1
(en)
*
|
1998-11-25 |
2002-05-21 |
Raytheon Company |
Method and apparatus for switching high frequency signals
|
US6194323B1
(en)
*
|
1998-12-16 |
2001-02-27 |
Lucent Technologies Inc. |
Deep sub-micron metal etch with in-situ hard mask etch
|
US6335831B2
(en)
*
|
1998-12-18 |
2002-01-01 |
Eastman Kodak Company |
Multilevel mechanical grating device
|
US6215221B1
(en)
*
|
1998-12-29 |
2001-04-10 |
Honeywell International Inc. |
Electrostatic/pneumatic actuators for active surfaces
|
WO2000045425A1
(en)
*
|
1999-02-01 |
2000-08-03 |
Tokyo Electron Limited |
Etching system and etching chamber
|
US6537427B1
(en)
*
|
1999-02-04 |
2003-03-25 |
Micron Technology, Inc. |
Deposition of smooth aluminum films
|
JP4787412B2
(ja)
*
|
1999-03-30 |
2011-10-05 |
シチズンホールディングス株式会社 |
薄膜基板の形成方法およびその方法によって形成された薄膜基板
|
US6218056B1
(en)
*
|
1999-03-30 |
2001-04-17 |
International Business Machines Corporation |
Method of making highly defined bilayer lift-off mask
|
US6201633B1
(en)
*
|
1999-06-07 |
2001-03-13 |
Xerox Corporation |
Micro-electromechanical based bistable color display sheets
|
US6645884B1
(en)
*
|
1999-07-09 |
2003-11-11 |
Applied Materials, Inc. |
Method of forming a silicon nitride layer on a substrate
|
CN100371491C
(zh)
*
|
1999-08-17 |
2008-02-27 |
东京电子株式会社 |
脉冲等离子体处理方法及其设备
|
US6107177A
(en)
*
|
1999-08-25 |
2000-08-22 |
Siemens Aktienesellschaft |
Silylation method for reducing critical dimension loss and resist loss
|
WO2003007049A1
(en)
*
|
1999-10-05 |
2003-01-23 |
Iridigm Display Corporation |
Photonic mems and structures
|
US6351329B1
(en)
*
|
1999-10-08 |
2002-02-26 |
Lucent Technologies Inc. |
Optical attenuator
|
US6960305B2
(en)
*
|
1999-10-26 |
2005-11-01 |
Reflectivity, Inc |
Methods for forming and releasing microelectromechanical structures
|
US6949202B1
(en)
*
|
1999-10-26 |
2005-09-27 |
Reflectivity, Inc |
Apparatus and method for flow of process gas in an ultra-clean environment
|
US7041224B2
(en)
*
|
1999-10-26 |
2006-05-09 |
Reflectivity, Inc. |
Method for vapor phase etching of silicon
|
US6822304B1
(en)
*
|
1999-11-12 |
2004-11-23 |
The Board Of Trustees Of The Leland Stanford Junior University |
Sputtered silicon for microstructures and microcavities
|
US8114245B2
(en)
*
|
1999-11-26 |
2012-02-14 |
Tadahiro Ohmi |
Plasma etching device
|
US6548908B2
(en)
*
|
1999-12-27 |
2003-04-15 |
Xerox Corporation |
Structure and method for planar lateral oxidation in passive devices
|
US6545335B1
(en)
*
|
1999-12-27 |
2003-04-08 |
Xerox Corporation |
Structure and method for electrical isolation of optoelectronic integrated circuits
|
US6531945B1
(en)
*
|
2000-03-10 |
2003-03-11 |
Micron Technology, Inc. |
Integrated circuit inductor with a magnetic core
|
US7491286B2
(en)
*
|
2000-04-21 |
2009-02-17 |
International Business Machines Corporation |
Patterning solution deposited thin films with self-assembled monolayers
|
US6329297B1
(en)
*
|
2000-04-21 |
2001-12-11 |
Applied Materials, Inc. |
Dilute remote plasma clean
|
US6335224B1
(en)
*
|
2000-05-16 |
2002-01-01 |
Sandia Corporation |
Protection of microelectronic devices during packaging
|
WO2004075231A1
(en)
*
|
2000-05-26 |
2004-09-02 |
Choon-Sup Lee |
Method of forming a small gap and its application to the fabrication of a lateral fed
|
EP1167566B1
(en)
*
|
2000-06-22 |
2011-01-26 |
Panasonic Electric Works Co., Ltd. |
Apparatus for and method of vacuum vapor deposition
|
KR100840827B1
(ko)
*
|
2000-07-03 |
2008-06-23 |
소니 가부시끼 가이샤 |
광학 다층 구조체, 광학 절환 장치 및 화상 디스플레이
|
US6736987B1
(en)
*
|
2000-07-12 |
2004-05-18 |
Techbank Corporation |
Silicon etching apparatus using XeF2
|
CA2352729A1
(en)
*
|
2000-07-13 |
2002-01-13 |
Creoscitex Corporation Ltd. |
Blazed micro-mechanical light modulator and array thereof
|
US6853129B1
(en)
*
|
2000-07-28 |
2005-02-08 |
Candescent Technologies Corporation |
Protected substrate structure for a field emission display device
|
US6887337B2
(en)
*
|
2000-09-19 |
2005-05-03 |
Xactix, Inc. |
Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto
|
US6522801B1
(en)
*
|
2000-10-10 |
2003-02-18 |
Agere Systems Inc. |
Micro-electro-optical mechanical device having an implanted dopant included therein and a method of manufacture therefor
|
US6775048B1
(en)
*
|
2000-10-31 |
2004-08-10 |
Microsoft Corporation |
Microelectrical mechanical structure (MEMS) optical modulator and optical display system
|
US7268081B2
(en)
*
|
2000-11-02 |
2007-09-11 |
California Institute Of Technology |
Wafer-level transfer of membranes with gas-phase etching and wet etching methods
|
US6859218B1
(en)
*
|
2000-11-07 |
2005-02-22 |
Hewlett-Packard Development Company, L.P. |
Electronic display devices and methods
|
KR100381011B1
(ko)
*
|
2000-11-13 |
2003-04-26 |
한국전자통신연구원 |
멤즈소자 제조용 미세구조체를 고착없이 띄우는 방법
|
US6791692B2
(en)
*
|
2000-11-29 |
2004-09-14 |
Lightwind Corporation |
Method and device utilizing plasma source for real-time gas sampling
|
US6794271B2
(en)
*
|
2001-09-28 |
2004-09-21 |
Rockwell Automation Technologies, Inc. |
Method for fabricating a microelectromechanical system (MEMS) device using a pre-patterned bridge
|
US7005314B2
(en)
*
|
2001-06-27 |
2006-02-28 |
Intel Corporation |
Sacrificial layer technique to make gaps in MEMS applications
|
JP4032216B2
(ja)
*
|
2001-07-12 |
2008-01-16 |
ソニー株式会社 |
光学多層構造体およびその製造方法、並びに光スイッチング素子および画像表示装置
|
JP3909812B2
(ja)
*
|
2001-07-19 |
2007-04-25 |
富士フイルム株式会社 |
表示素子及び露光素子
|
JP2003059905A
(ja)
*
|
2001-07-31 |
2003-02-28 |
Applied Materials Inc |
エッチング方法、キャパシタの製造方法、および半導体装置
|
US6930364B2
(en)
*
|
2001-09-13 |
2005-08-16 |
Silicon Light Machines Corporation |
Microelectronic mechanical system and methods
|
US20030073302A1
(en)
*
|
2001-10-12 |
2003-04-17 |
Reflectivity, Inc., A California Corporation |
Methods for formation of air gap interconnects
|
US20030073042A1
(en)
*
|
2001-10-17 |
2003-04-17 |
Cernigliaro George J. |
Process and materials for formation of patterned films of functional materials
|
KR100433091B1
(ko)
*
|
2001-10-23 |
2004-05-28 |
주식회사 하이닉스반도체 |
반도체소자의 도전배선 형성방법
|
DE60232471D1
(de)
*
|
2001-11-09 |
2009-07-09 |
Wispry Inc |
Dreischichtige Strahl-MEMS-Einrichtung und diesbezügliche Verfahren
|
US6803160B2
(en)
*
|
2001-12-13 |
2004-10-12 |
Dupont Photomasks, Inc. |
Multi-tone photomask and method for manufacturing the same
|
US6794119B2
(en)
*
|
2002-02-12 |
2004-09-21 |
Iridigm Display Corporation |
Method for fabricating a structure for a microelectromechanical systems (MEMS) device
|
US7027200B2
(en)
*
|
2002-03-22 |
2006-04-11 |
Reflectivity, Inc |
Etching method used in fabrications of microstructures
|
US6814814B2
(en)
*
|
2002-03-29 |
2004-11-09 |
Applied Materials, Inc. |
Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates
|
US7029829B2
(en)
*
|
2002-04-18 |
2006-04-18 |
The Regents Of The University Of Michigan |
Low temperature method for forming a microcavity on a substrate and article having same
|
US6741377B2
(en)
*
|
2002-07-02 |
2004-05-25 |
Iridigm Display Corporation |
Device having a light-absorbing mask and a method for fabricating same
|
WO2004005862A1
(en)
*
|
2002-07-02 |
2004-01-15 |
Thermo Electron Corporation |
Fluid flow transducer module and assembly
|
US7071289B2
(en)
*
|
2002-07-11 |
2006-07-04 |
The University Of Connecticut |
Polymers comprising thieno [3,4-b]thiophene and methods of making and using the same
|
US20040058531A1
(en)
*
|
2002-08-08 |
2004-03-25 |
United Microelectronics Corp. |
Method for preventing metal extrusion in a semiconductor structure.
|
US6674033B1
(en)
*
|
2002-08-21 |
2004-01-06 |
Ming-Shan Wang |
Press button type safety switch
|
TW544787B
(en)
*
|
2002-09-18 |
2003-08-01 |
Promos Technologies Inc |
Method of forming self-aligned contact structure with locally etched gate conductive layer
|
US6905621B2
(en)
*
|
2002-10-10 |
2005-06-14 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Method for preventing the etch transfer of sidelobes in contact hole patterns
|
US7064089B2
(en)
*
|
2002-12-10 |
2006-06-20 |
Semiconductor Energy Laboratory Co., Ltd. |
Plasma treatment apparatus and method for plasma treatment
|
TWI289708B
(en)
*
|
2002-12-25 |
2007-11-11 |
Qualcomm Mems Technologies Inc |
Optical interference type color display
|
TW594155B
(en)
*
|
2002-12-27 |
2004-06-21 |
Prime View Int Corp Ltd |
Optical interference type color display and optical interference modulator
|
TW559686B
(en)
*
|
2002-12-27 |
2003-11-01 |
Prime View Int Co Ltd |
Optical interference type panel and the manufacturing method thereof
|
TW557395B
(en)
*
|
2003-01-29 |
2003-10-11 |
Yen Sun Technology Corp |
Optical interference type reflection panel and the manufacturing method thereof
|
US20040150915A1
(en)
*
|
2003-02-05 |
2004-08-05 |
Thomas Fred C. |
Air bearing surface for a head, and a method of making it
|
US7027202B1
(en)
*
|
2003-02-28 |
2006-04-11 |
Silicon Light Machines Corp |
Silicon substrate as a light modulator sacrificial layer
|
US6913942B2
(en)
*
|
2003-03-28 |
2005-07-05 |
Reflectvity, Inc |
Sacrificial layers for use in fabrications of microelectromechanical devices
|
TW567355B
(en)
*
|
2003-04-21 |
2003-12-21 |
Prime View Int Co Ltd |
An interference display cell and fabrication method thereof
|
US6829132B2
(en)
*
|
2003-04-30 |
2004-12-07 |
Hewlett-Packard Development Company, L.P. |
Charge control of micro-electromechanical device
|
KR100470708B1
(ko)
*
|
2003-05-22 |
2005-03-10 |
삼성전자주식회사 |
금속막의 내부응력을 이용한 박막 벌크 음향 공진기제조방법 및 그에 의한 공진기
|
JP4338442B2
(ja)
*
|
2003-05-23 |
2009-10-07 |
富士フイルム株式会社 |
透過型光変調素子の製造方法
|
US7221495B2
(en)
*
|
2003-06-24 |
2007-05-22 |
Idc Llc |
Thin film precursor stack for MEMS manufacturing
|
JP3866694B2
(ja)
*
|
2003-07-30 |
2007-01-10 |
株式会社日立ハイテクノロジーズ |
Lsiデバイスのエッチング方法および装置
|
US7173314B2
(en)
*
|
2003-08-13 |
2007-02-06 |
Hewlett-Packard Development Company, L.P. |
Storage device having a probe and a storage cell with moveable parts
|
TWI305599B
(en)
*
|
2003-08-15 |
2009-01-21 |
Qualcomm Mems Technologies Inc |
Interference display panel and method thereof
|
TWI251712B
(en)
*
|
2003-08-15 |
2006-03-21 |
Prime View Int Corp Ltd |
Interference display plate
|
TW200506479A
(en)
*
|
2003-08-15 |
2005-02-16 |
Prime View Int Co Ltd |
Color changeable pixel for an interference display
|
TW593127B
(en)
*
|
2003-08-18 |
2004-06-21 |
Prime View Int Co Ltd |
Interference display plate and manufacturing method thereof
|
TWI232333B
(en)
*
|
2003-09-03 |
2005-05-11 |
Prime View Int Co Ltd |
Display unit using interferometric modulation and manufacturing method thereof
|
US6939472B2
(en)
*
|
2003-09-17 |
2005-09-06 |
Reflectivity, Inc. |
Etching method in fabrications of microstructures
|
US6982820B2
(en)
*
|
2003-09-26 |
2006-01-03 |
Prime View International Co., Ltd. |
Color changeable pixel
|
US7078337B2
(en)
*
|
2003-09-30 |
2006-07-18 |
Agere Systems Inc. |
Selective isotropic etch for titanium-based materials
|
CA2572459A1
(en)
*
|
2004-06-28 |
2006-08-17 |
Sru Biosystems, Inc. |
Integration of direct binding sensors with mass spectrometry for functional and structural characterization of molecules
|
US7256922B2
(en)
*
|
2004-07-02 |
2007-08-14 |
Idc, Llc |
Interferometric modulators with thin film transistors
|
US7195343B2
(en)
*
|
2004-08-27 |
2007-03-27 |
Lexmark International, Inc. |
Low ejection energy micro-fluid ejection heads
|