TWI232333B - Display unit using interferometric modulation and manufacturing method thereof - Google Patents

Display unit using interferometric modulation and manufacturing method thereof Download PDF

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Publication number
TWI232333B
TWI232333B TW92124388A TW92124388A TWI232333B TW I232333 B TWI232333 B TW I232333B TW 92124388 A TW92124388 A TW 92124388A TW 92124388 A TW92124388 A TW 92124388A TW I232333 B TWI232333 B TW I232333B
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layer
item
method
scope
patent application
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TW92124388A
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Chinese (zh)
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TW200510832A (en
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Wen-Jian Lin
Hsiung-Kuang Tsai
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Prime View Int Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B26/00Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
    • G02B26/001Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating based on interference in an adjustable optical cavity

Abstract

A hydrophobic layer covers the surface facing the cavity of the bottom electrode of the display unit using interferometric modulation. Therefore, the hydrophobic layer can protect the hydrophilic surface of the bottom electrode for preventing the absorption of water molecules. Hence, the top electrode does not fall on the bottom electrode.

Description

I232333 2. Description of the invention [Technical field to which the invention belongs] The present invention relates to a flat display element and a method for manufacturing the same, and more particularly to an interference adjustment display element and a method for manufacturing the same. [Previous technology] Due to its small size and light weight, flat panel displays are extremely advantageous in the display market of portable display devices and small space applications. In addition to the liquid crystal display (Uquid Crysui Display; LCD), organic electroluminescent diodes (electro-Luminescent Display; OLED) and plasma display (PDP), etc. Reflective interference adjustment planar display modes have been proposed. This display, which is made of light-reflective interference-adjusted variable-color daylight element arrays, has characteristics of low power consumption, fast response time, and bi-stable characteristics. It can be applied to the panel of the display, especially in portable products, such as mobile phones, personal digital assistants (Pda), portable computers (Portable Computer), and so on. Visible Spectrum Modulation Arrays (Visible Spectrum Modulation Arrays) of visible light are disclosed in U.S. Patent No. 5,835,255. The constituent unit is a variable color daylight unit, which can be used as a flat display 6 02G412 1232333 =. Please refer to FIG. 1A. FIG. 1A is a schematic diagram showing the surface structure of a conventional variable-color diurnal plant. Each variable color element 7C 100 on the transparent substrate 11 includes a lower electrode 102 and an upper electrode ⑺4, and a cavity is formed between the lower electrode i and the upper electrode 104 by a support 106. favuy) 108. The distance between the lower electrode 102 and the upper electrode ι04, that is, the length of the cavity 108 is 0, and the length of the cavity 108 is generally smaller than i V m. The lower electrode i 〇2 is a light incident. The electrode has a light absorption rate and can absorb " visible light. The upper electrode 104 is a light reflecting electrode, which can be deformed by voltage driving. White light is generally used as the incident light source of the variable-color daylight unit 100. The white light system is composed of various wavelengths (wave lengths (represented by crosses)) in the visible spectrum. When the incident light passes through the lower electrode 102 and enters the chamber 108, only the incident light that meets the wavelength limitation in formula M will cause constructive interference in the chamber 108 and be reflected and output ', where N is natural number. In other words, 2D — N λ 1 (11) when the cavity 108 is twice as long as the length of 2D, it satisfies the wavelength of incident light! When it is a multiple of multiple, the incident light wavelength λ 1 can cause constructive interference in the cavity 108, and the reflected light of the wavelength λ 1 can be output. At this time, the observer's eyes observe the direction of the incident light incident on the lower electrode 102, and can see the reflected light having a wavelength of 11; therefore, the variable color pixel unit 100 is in an "on" state, that is, It is a bright state. 020413 * 1232333 Figure 1B is a schematic cross-sectional view of the variable-color daylight unit 100 in Figure 1A after voltage is applied. Referring to FIG. 1B, under the driving of the voltage, the upper electrode 104 will be deformed due to the electrostatic attractive force, and will fall toward the lower electrode 102. At this time, the distance between the lower electrode 102 and the upper electrode 104, that is, the length of the cavity 108 is d, and this d may be equal to zero. In other words, D in the formula i J will be replaced by d. Among all the wavelengths of the incident light, only the wavelength (λ 2) that conforms to Formula 1.1 can produce constructive interference in the cavity 108. The reflection from the upper electrode 104 penetrates the lower electrode 102 and is output. In this variable-color daylight unit 100, the lower electrode 102 is designed to have a high light absorption rate for light having a wavelength of 2, so all light rays in the incident light are eliminated. Observers who observe the direction of the electrode 丨 02 will not see any light reflected out. Therefore, at this time, the variable color daylight unit 100 is in an "off" state, that is, a dark state. As described above, under the driving of voltage, the upper electrode 104 will deform due to electrostatic attraction, and the direction of the lower electrode 102 will collapse. "To" Off ". When the variable color daylight unit it 100 is to be switched from the "off" state to the "on" state, the voltage that is to be driven to drive the 104 deformation of the upper electrode must be removed first. Then, relying on its own deformation recovery force, the upper electrode 104 that has lost its electrostatic attractive force will be restored to the original state as shown in FIG. 1A, so that the variable color pixel unit i 00 assumes an "on" state. It can be known from the above that this variable color daylight unit 100 is integrated with the optical film 1232333 interference principle, the reflection plate process and the micro-electro-mechanical system architecture process. In the MEMS architecture, the cavity 108 is formed by etching a sacrificial layer between the upper electrode 104 and the lower electrode 102. After the sacrificial layer is removed by etching, water molecules in the air are very easily adsorbed in the chamber 108, generating unnecessary electrostatic attraction between the two electrodes. When the variable-color daylight element 100 is to be in an "on" state, the two electrodes are attracted to each other due to the electrostatic attraction of water molecules, which makes the variable-color daylight element 100 present an "open" state. Off "status. How to prevent the chamber 108 from adsorbing moisture and generating unnecessary electrostatic attraction has become an important issue. [Summary of the Invention] The purpose of the present invention is to provide an interference adjustment display element and a method for manufacturing the same. A water-repellent layer is formed on the optical film of an electrode below the interference adjustment display element to protect the interference adjustment display element. The surface of the electrode does not adsorb moisture. Another purpose of the present invention is to provide a lithographic display device, a toast, + ^ but Dingfu display device and its method, in the optical adjustment of the optical film of a hemp red electrode in the interference adjustment display element. A layer of water layer is formed on the top surface, so that the distance of the interference adjustment display element will not collapse due to the adsorption of moisture. Urgently, another object of the present invention is to provide a method for making a t-shirt, a scholar, a shanghai / budiaolang Yuanyuan, and a method for improving the quality of a reflective element. According to the above-mentioned purpose of the present invention, a method for manufacturing an interference adjustment display element of magic neodymium is provided. The manufacturing method includes at least the following steps of V3. A first transparent conductive layer, a light absorbing layer, an insulating layer, and a sacrificial layer are sequentially formed on the transparent substrate. Then, at least two straight first openings are formed among the sacrificial layer, the insulating layer, the light absorbing layer and the _th transparent conductive layer, and the lower electrode is defined. Layer, light absorbing layer and insulating layer. Then 'coat a layer of photosensitive material on the transparent substrate, fill it with the first opening and cover it on the sacrificial and hunger layer, and then pattern this photosensitive material' so that it forms a point in the first opening. * T 仏 or support. Then, a second conductive layer is formed on the sacrificial layer and the support, and then at least two straight stripe-shaped openings are formed in the basin φ to define at least one upper electrode, wherein the upper electrode is defined by the posthumous The second conductive layer is formed, and the extending direction of the second opening and the m extending direction are perpendicular to each other. Then, the sacrificial layer is removed, and a water-repellent layer is formed on the sacrificial layer. According to the above object of the present invention, another method for manufacturing a reflective interference adjustment display element is proposed by the 楹 φ hallucinator. This method of manufacturing an ancient watch includes at least the following steps. A first transparent conductive layer, a light absorbing layer, an insulating layer, a water-repellent layer, and a sacrificial layer are sequentially formed on the transparent substrate. Then form at least two straight first openings in # 文 仕 裉 livestock layer, water repellent layer, insulation layer, light absorbing layer, and the first transparent lightning conducting wind + upper spear far moon and other electrical layers to define The lower electrode, the straight middle, and the T lower electrode 堆叠 are formed by stacking a first transparent conductive layer, a light absorbing layer, an insulating layer, and a 4-foot repellent layer. Next, a layer of photosensitive material is coated on the transparent substrate. Please fill the first opening and cover the sacrificial layer, and then try to tease the photosensitive material so that a support is formed in the first opening. Thing. Then form a second guide on the M M + u / ', the sacrificial layer and the support 10

02G41S 1232333 electrical layer, and then form at least two second openings with at least _, bitter, and conformal shape to define the upper electrode of the channel, wherein the upper electrode is composed of the defined layer and the second opening described above The extending directions of the extensional conductive ports are perpendicular to each other. As a matter of course, if the sacrifice layer is directly removed, the α water repellent layer protects the insulation layer from damage during removal. According to the above aspect of the present invention, an interference adjustment display element is provided. The display element includes at least a lower electrode, an upper electrode, a support, and a water-repellent layer. The upper electrode is parallel to the lower electrode, and the cut is located between the lower electrode and the upper electrode to form a cavity for incident light to interfere with. The water-repellent layer = covers the surface of the lower electrode facing the cavity. The above-mentioned water-repellent layer is used for the surface of the lower electrode so that it does not adsorb moisture and cause the upper electrode to collapse to the lower electrode. According to a preferred embodiment of the present invention, the material of the water repellent layer is preferably a silane compound, for example, hexamethylbissilane. In the invention, the surface of the lower electrode is covered with a water-repellent layer, so that the hydrophilic layer on the surface can no longer adsorb water molecules in the air. Therefore, the distance between the upper and lower electrodes does not collapse due to the adsorption of moisture, so as to provide high-quality image display. [Embodiment] The lower electrode of the conventional interference adjustment display element is a stack of a transparent conductive layer, a light absorbing layer, and an inorganic insulating layer containing silicon. The material of the inorganic insulating layer containing silicon is usually silicon oxide or silicon oxide. Silicon nitride, so its surface 02G417 a Ϊ232333 & electric poly surname engraving method. The precursors of the etching electropolymerization used in the end-of-line electropolymerization method are fluorine-based or gas-based etchants, such as xenon difluoride, four-gasification human ~ gasification shed, two-rat nitrogen, six Sulfur or any combination thereof. Then, in the absence of moisture or vacuum in the environment, a water-repellent layer 250 is formed on the surface of the insulating layer 215 immediately. The method for forming the water-repellent layer 25 can be performed by, for example, introducing a water-repellent organic substance gas' into the reaction chamber of the machine to allow a surface of the insulating layer 2 1 5 to adsorb a layer of a water-repellent organic compound. However, the organic compound must contain hydrogen atoms that can form hydrogen bonds with the oxygen or nitrogen atoms of the insulating layer 215, so that the oxygen or nitrogen atoms on the surface of the silicon oxide or silicon nitride of the insulating layer 2 i 5 are lone pairs of electrons. (lone pair) occupy so that it will not generate hydrogen bonds with water molecules and adsorb a bunch of water vapor. Such organic compounds may be, for example, silane-based or silanol (RjiOH) compounds, wherein the silane-based compound may be, for example, hexamethyl diSilane, and the silanol-based compound may be, for example, trimethyl methyl. Silanol. Embodiment 2 «Refer to Figs. 3A-3D, which is a cross-sectional view showing a manufacturing process of an interference adjustment display element according to another preferred embodiment of the present invention. In FIG. 3A, a first transparent conductive layer 305, a light absorbing layer 310, an insulating layer 315, a water repellent layer 32, and a sacrificial layer 325 are sequentially formed on a transparent substrate 300. The material can be, for example, Indium Zinc Oxide (Indium Zinc, the above-mentioned first transparent conductive layer 305 Tin (Indium Tin Oxide; ITO),! 232333

Oxide; IZO), zinc oxide or indium oxide, and the material of the light absorbing layer 31 can be metal, such as aluminum, silver, or chromium. The material of the insulating layer 315 may be, for example, silicon oxide or silicon nitride, and the material of the sacrificial layer 325 may be, for example, metal, amorphous silicon, or polysilicon. The material of the water-repellent layer 320 may be, for example, a water-repellent organic resin. In FIG. 3B, at least two straight first openings 330 are formed in the sacrificial layer 325, the water repellent layer 32, the insulating layer 315, the light absorption layer 310, and the first transparent conductive layer 305. The position of the lower electrode is between the two first openings 330. Next, a layer of photosensitive material 335 is coated on the sacrificial layer 325 and the first opening 330. The direction of the first opening 3 30 is a vertical paper surface, and a method for forming the first opening 3 30 may be, for example, a photolithography method. The lower electrode is formed by stacking the first transparent conductive layer 305, the light absorbing layer 310, and the insulating layer 315 after the definition. The above-mentioned photosensitive material 331 may be, for example, a positive photoresist, a negative photoresist, or various photopolymers, such as polyimide, acrylic resin, or epoxy resin. In FIG. 3C, the photosensitive material 335 located in the first opening 330 is chemically reacted to form a support 3 40 in the first opening 330 by a method of exposure and development. Then, a second conductive layer 345 is formed on the sacrificial layer 325 and the support 34. Then, at least two straight second openings (not shown in the figure) are formed in the second conductive layer 345 to define At least one upper electrode is located between two second openings. The method for forming the second opening may be, for example, a lithographic etching method, and the extending direction of the second opening is perpendicular to the extending direction of the first opening, that is, parallel to the paper surface. The upper electrode is generally a reflective electrode that can be moved up and down by deformation. It is composed of 15 026421 1232333. [Schematic description] In order to make the above and other objects, features, and advantages of the present invention more obvious and easy to understand. A preferred embodiment is described in detail with the accompanying drawings as follows: Fig. 1A shows a cross-sectional structure of a conventional variable-color daylight unit. Fig. 1B shows a variable-color daylight in Fig. 1A. A schematic cross-sectional view of the element unit ιoo after voltage is applied. Figures 2A-2D are cross-sectional views illustrating a manufacturing process of an interference-adjusting display element according to one of the preferred embodiments of the present invention # 1 l 4 I. 3A-3D are cross-sectional views showing a manufacturing process of an interference-adjusting display element according to another preferred embodiment of the present invention. A brief description of the symbol of the component 100: Variable color pixel unit 102: Lower electrode 104: Upper electrode 106: Support 108: Chamber 11 〇: Transparent substrate 200, 300

17 1232333 205, 305: first transparent conductive layer 2 1 0, 3 10: light absorbing layer 21 5, 3 1 5: insulating layer 220, 325: sacrificial layer 225, 330: first opening 230, 335: photosensitive material 235 340: Supports 245, 345: Second conductive layer 250, 320: Water-repellent layer

18

Claims (1)

1232333
Patent application scope-1 · A manufacturing method of an interference adjustment display element, the manufacturing method at least includes: forming a first transparent conductive layer on a transparent substrate; forming a light absorbing layer on the transparent conductive layer Forming an insulating layer on the light absorbing layer; forming a sacrificial layer on the insulating layer; forming at least two straight first openings in the sacrificial layer, the insulating layer, the light absorbing layer and the first In a transparent conductive layer, at least one first electrode is defined. The first electrode is formed by stacking the first transparent conductive layer, the light absorption layer, and the insulating layer after the definition; coating a photosensitive material on On the transparent substrate, the photosensitive material fills the first openings and covers the sacrificial layer; patterning the photosensitive material so that the photosensitive material forms a support in the first openings; forming a second conductive layer Forming at least two straight second openings in the second conductive layer on the sacrificial layer and the support to define at least one second electrode, wherein the second electrode is defined by It composed of the second conductive layer, and the plurality of second openings extending in the direction of the extending direction of the plurality of first openings are perpendicular to each other; a removal of the sacrificial layer; and forming a water-repellent layer on the insulating layer. 1232333 2 · As described in item 丨 of the scope of the patent application, the system of “i”, “u” means “the good and bad method”, in which the first transparent conductive tin, Contains indium zinc oxide, indium zinc oxide, zinc oxide, or indium oxide. 3. The manufacturing method described in item 丨 of the patent application 4 shows no known methods, wherein the light absorbing layer includes a metal layer. 4. As described in item 丨 of the scope of the patent application, the dry manufacturing method, + ^ TV will be displayed in 7 weeks, and the insulation layer contains silicon oxide or silicon nitride. 5. If the scope of patent application The interference described in item 1 is lacking. _ Manufactured by Sun Li, Ding ^ Shoulder display element Shi Xi / ', where the material of the sacrificial layer f contains metal, day after day, or amorphous 6 · The method for interfering with the plant T sand withering as described in item 1 of the scope of the patent application, the method for forming the first element and the first opening and the lithography-containing method. The method of interference adjustment display element k described in the first item of the patent scope, 'the light material includes a photoresist Photosensitive polymer. 8. The shear "Please patentable scope of the item interferometer method to adjust the display element. The manufacturing method 'wherein the method of patterning the photosensitive material includes exposure and development 1232333 4 9. The manufacturing method of the interference adjustment display element as described in item 1 of the scope of the patent application, wherein the material of the second conductive layer includes a metal. • 1 10. The method for manufacturing an interference-adjusting display element according to item 丨 of the patent application scope, wherein the method of forming the water-repellent layer includes allowing the insulating layer to absorb a layer of a water-repellent organic compound. U. The method for manufacturing an interference adjustment display device according to item 10 of the scope of the patent application, wherein the organic compound has a hydrogen atom capable of forming a hydrogen bond with an oxygen atom or a nitrogen atom. 12. The method for manufacturing an interference adjustment display device according to item 丨 丨 in the scope of the patent application, wherein the organic compound comprises a silane-based compound or a silane-based compound. . 13. The method for manufacturing an interference adjustment display device according to item 12 of the scope of the patent application, wherein the silane compound includes hexamethylbissilane. 14. The method for manufacturing an interference adjustment display element according to item 12 of the scope of the patent application, wherein the silanol compound comprises trimethylphosphosilanol. 15. A method for manufacturing a reflection-type interference adjustment display element, the manufacturing method includes at least: forming a first conductive layer on a transparent substrate; forming a light absorbing layer on the transparent conductive layer; Forming an insulating layer on the light absorbing layer; forming a water-repellent layer on the insulating layer; forming a sacrificial layer on the water-repellent layer; forming to 4 straight strips: first opening on the sacrificial Layer, the water-repellent layer, the insulating layer, the light absorption layer, and the first transparent conductive layer to define at least a first electrode, and the first electrode is defined by the first transparent conductive layer, the A light absorbing layer, an insulating layer, and a water repellent layer; a photosensitive material is coated on the transparent substrate so that the photosensitive material fills the first openings and covers the sacrificial layer; patterning the photosensitive material So that the photosensitive material forms a support in the first openings; forming a second conductive layer on the sacrificial layer and the support; forming at least two straight second openings in the second conductive layer 'To define At least one second electrode, wherein the second electrode is composed of the second conductive layer after definition, and an extension direction of the second openings and an extension direction of the first openings are perpendicular to each other; and removing the A sacrificial layer, wherein the water-repellent layer protects the insulating layer from damage when the sacrificial layer is removed. ^ 16. The method of manufacturing reflective elements as described in Item 15 of the scope of the patent application, wherein the material of the first transparent conductive layer includes 22 1232333 indium tin oxide, indium zinc oxide, zinc oxide or Indium oxide. 1 7. The manufacturing method of the reflective interference adjustment device as described in item 15 of the scope of patent application, wherein the light absorption layer includes a metal layer. 18. As described in item 15 of the scope of patent application The manufacturing method of the reflective interference adjustment display 7L described above, wherein the insulating layer includes silicon oxide or nitride. The manufacturing method of the reflective interference adjustment display described in item 15 of the patent application scope, wherein The material of the water-repellent layer includes a water-repellent tree. 0__20 'The manufacturing method of the reflective interference adjustment display element described in item 15 of the Shenjing patent scope', wherein the material of the sacrificial layer includes metal, Crystal or amorphous. 21 The manufacturing method of the reflection-type interference adjustment Ding Wu cattle as described in item 15 of the scope of patent application, wherein the method of forming these pieces includes the lithography method. U mouth = if the towel please patent The method of manufacturing the reflective interference modulation described in item 15 above, wherein the photosensitive material contains a photoresist 4π I compound. Nine resists or photosensitive 23 1232333 23 · If the method of manufacturing a patent application display element, exposure The development method. The method of reflective interference adjustment described in item 15 above, wherein the method of patterning the photosensitive material includes 24. The reflection interference adjustment genus described in item 15 of the main scope of the patent, including the patent scope of item 15. Method, wherein the material of the second conductive layer comprises a gold interference adjustment display element, the display element including at least a first electrode; 6 a first electrode arranged in parallel with the first electrode; a support 'located on the first electrode A cavity is formed between the second electrode and the second electrode; and a water-repellent layer covering the surface of the first electrode facing the cavity so that the surface of the first electrode does not adsorb water molecules. The interference-adjusting display element according to item 25, wherein the water-repellent layer includes a layer of a water-repellent organic compound or a water-repellent resin. Argon atom 27. The interference as described in item 26 of the patent scope Section display element 'wherein the organic compound has a hydrogen bond with an oxygen atom or a nitrogen atom 24 1232333 28 · The interference-adjusting display element described in item 26 of the patent application range' wherein the organic compound includes a silane compound or a silanol 29. The interference-adjusting display device according to item 28 of the scope of patent application, wherein the silane-based compound contains hexamethylbissilane.-30. The interference-adjusting device as described in item 28 of the patent scope Members ... Spring pieces, in which the silanol compounds include trimethylphosphonium silanol .... ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, (L), Item 25 of the scope of the patent application Contains a movable electrode. °, staff indicator 25
TW92124388A 2003-09-03 2003-09-03 Display unit using interferometric modulation and manufacturing method thereof TWI232333B (en)

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TW92124388A TWI232333B (en) 2003-09-03 2003-09-03 Display unit using interferometric modulation and manufacturing method thereof
JP2004100510A JP3923953B2 (en) 2003-09-03 2004-03-30 Interferometric modulation pixel and manufacturing method thereof
US10/815,905 US20050046922A1 (en) 2003-09-03 2004-03-31 Interferometric modulation pixels and manufacturing method thereof
KR20040036474A KR100639172B1 (en) 2003-09-03 2004-05-21 Interferometric modulation pixels and manufacturing method thereof

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TWI232333B true TWI232333B (en) 2005-05-11

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JP3923953B2 (en) 2007-06-06
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KR20050025060A (en) 2005-03-11
JP2005078068A (en) 2005-03-24
US20050046922A1 (en) 2005-03-03

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