BR9911572A - Composições de resina de termofixação fotopolimerizáveis - Google Patents
Composições de resina de termofixação fotopolimerizáveisInfo
- Publication number
- BR9911572A BR9911572A BR9911572-7A BR9911572A BR9911572A BR 9911572 A BR9911572 A BR 9911572A BR 9911572 A BR9911572 A BR 9911572A BR 9911572 A BR9911572 A BR 9911572A
- Authority
- BR
- Brazil
- Prior art keywords
- light
- c12alkyl
- benzoyl
- unsubstituted
- phenyl
- Prior art date
Links
- 229920001187 thermosetting polymer Polymers 0.000 title abstract 2
- 239000011342 resin composition Substances 0.000 title 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
- 239000004593 Epoxy Substances 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 abstract 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 abstract 1
- 125000002843 carboxylic acid group Chemical group 0.000 abstract 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract 1
- 125000004956 cyclohexylene group Chemical group 0.000 abstract 1
- 239000003085 diluting agent Substances 0.000 abstract 1
- 125000003700 epoxy group Chemical group 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/335—Radicals substituted by nitrogen atoms not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K9/00—Tenebrescent materials, i.e. materials for which the range of wavelengths for energy absorption is changed as a result of excitation by some form of energy
- C09K9/02—Organic tenebrescent materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
- Epoxy Resins (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP98810596 | 1998-06-26 | ||
| PCT/EP1999/004234 WO2000000869A1 (en) | 1998-06-26 | 1999-06-18 | Photopolymerizable thermosetting resin compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9911572A true BR9911572A (pt) | 2001-03-20 |
Family
ID=8236164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR9911572-7A BR9911572A (pt) | 1998-06-26 | 1999-06-18 | Composições de resina de termofixação fotopolimerizáveis |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US6485885B1 (https=) |
| EP (1) | EP1095313B1 (https=) |
| JP (1) | JP2002519732A (https=) |
| KR (1) | KR100563019B1 (https=) |
| CN (1) | CN1203374C (https=) |
| AT (1) | ATE388426T1 (https=) |
| AU (1) | AU751966B2 (https=) |
| BR (1) | BR9911572A (https=) |
| CA (1) | CA2333365A1 (https=) |
| DE (1) | DE69938305T2 (https=) |
| MY (1) | MY121423A (https=) |
| TW (1) | TW484034B (https=) |
| WO (1) | WO2000000869A1 (https=) |
Families Citing this family (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG77689A1 (en) * | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| AU4102100A (en) * | 1999-03-03 | 2000-09-21 | Ciba Specialty Chemicals Holding Inc. | Oxime derivatives and the use thereof as photoinitiators |
| SG97168A1 (en) | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
| JP2001302871A (ja) * | 2000-04-25 | 2001-10-31 | Taiyo Ink Mfg Ltd | 光硬化性・熱硬化性樹脂組成物とこれを用いて形成したソルダーレジスト皮膜や樹脂絶縁層を有するプリント配線板 |
| JP2002107926A (ja) * | 2000-09-29 | 2002-04-10 | Taiyo Ink Mfg Ltd | 感光性樹脂組成物 |
| US7189489B2 (en) | 2001-06-11 | 2007-03-13 | Ciba Specialty Chemicals Corporation | Oxime ester photoiniators having a combined structure |
| SG100761A1 (en) * | 2001-09-28 | 2003-12-26 | Nanya Plastics Corp | Photosensitive thermosetting resin composition |
| KR101032582B1 (ko) * | 2002-12-03 | 2011-05-06 | 시바 홀딩 인크 | 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제 |
| JP4595374B2 (ja) * | 2003-04-24 | 2010-12-08 | 住友化学株式会社 | 黒色感光性樹脂組成物 |
| JP4437651B2 (ja) | 2003-08-28 | 2010-03-24 | 新日鐵化学株式会社 | 感光性樹脂組成物及びそれを用いたカラーフィルター |
| DE10349394A1 (de) * | 2003-10-21 | 2005-05-25 | Marabuwerke Gmbh & Co. Kg | UV-härtendes Bindemittel für Farben oder Lacke zur Bedruckung von Glas und Verfahren zur Bedruckung von Glassubstraten |
| TW200519535A (en) * | 2003-11-27 | 2005-06-16 | Taiyo Ink Mfg Co Ltd | Hardenable resin composition, hardened body thereof, and printed circuit board |
| JP4384570B2 (ja) * | 2003-12-01 | 2009-12-16 | 東京応化工業株式会社 | 厚膜用ホトレジスト組成物及びレジストパターンの形成方法 |
| TWI346111B (en) * | 2004-02-09 | 2011-08-01 | Nippon Kayaku Kk | Photosensitive resin composition and products of cured product thereof |
| JPWO2006004158A1 (ja) * | 2004-07-07 | 2008-04-24 | 太陽インキ製造株式会社 | 光硬化性・熱硬化性樹脂組成物とそれを用いたドライフィルム、及びその硬化物 |
| KR100989744B1 (ko) * | 2005-07-13 | 2010-10-26 | 다이요 잉키 세이조 가부시키가이샤 | 은 페이스트 조성물, 및 그것을 이용한 도전성 패턴의 형성방법 및 그의 도전성 패턴 |
| JP4640971B2 (ja) * | 2005-09-08 | 2011-03-02 | 東京応化工業株式会社 | プラズマディスプレイの遮光性パターン形成用感光性樹脂組成物 |
| JP4650211B2 (ja) * | 2005-10-31 | 2011-03-16 | 東洋インキ製造株式会社 | 光重合性組成物 |
| JP4650212B2 (ja) * | 2005-10-31 | 2011-03-16 | 東洋インキ製造株式会社 | 光重合性組成物 |
| DE102006000867A1 (de) * | 2006-01-05 | 2007-07-12 | Marabuwerke Gmbh & Co. Kg | UV-härtende Glasdruckfarbe und UV-härtender Glasdrucklack sowie Verfahren zum Bedrucken von Glassubstraten |
| CN101024624B (zh) * | 2006-02-24 | 2013-09-11 | 富士胶片株式会社 | 肟衍生物、可光聚合的组合物、滤色片及其制造方法 |
| US8293436B2 (en) * | 2006-02-24 | 2012-10-23 | Fujifilm Corporation | Oxime derivative, photopolymerizable composition, color filter, and process for producing the same |
| JP4584164B2 (ja) * | 2006-03-08 | 2010-11-17 | 富士フイルム株式会社 | 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板 |
| JP2007286487A (ja) * | 2006-04-19 | 2007-11-01 | Fujifilm Corp | 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板 |
| JP4711886B2 (ja) * | 2006-05-26 | 2011-06-29 | 富士フイルム株式会社 | 感光性組成物、感光性フィルム及びプリント基板 |
| KR100781690B1 (ko) | 2006-08-24 | 2007-12-03 | 한국화학연구원 | 다가의 옥심 에스테르 기를 갖는 광 개시제 및 이의 제조방법 |
| JP5513711B2 (ja) * | 2007-10-01 | 2014-06-04 | 太陽ホールディングス株式会社 | 感光性樹脂組成物及びその硬化物 |
| TWI408150B (zh) | 2008-10-17 | 2013-09-11 | Taiyo Ink Mfg Co Ltd | A solder resist composition and a printed circuit board using the same |
| JP5669386B2 (ja) * | 2009-01-15 | 2015-02-12 | 富士フイルム株式会社 | 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版 |
| JP4833324B2 (ja) * | 2009-08-03 | 2011-12-07 | 新日鐵化学株式会社 | 感光性樹脂組成物及びそれを用いたカラーフィルター |
| AU2010330040B2 (en) | 2009-12-07 | 2013-12-19 | Agfa Nv | UV-LED curable compositions and inks |
| CN102639501B (zh) * | 2009-12-07 | 2015-04-29 | 爱克发印艺公司 | 用于uv-led可固化组合物和墨水的光引发剂 |
| JP2013539072A (ja) * | 2010-09-16 | 2013-10-17 | エルジー・ケム・リミテッド | 感光性樹脂組成物、ドライフィルムソルダーレジスト及び回路基板 |
| JP6157602B2 (ja) | 2012-06-01 | 2017-07-05 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 黒色着色剤混合物 |
| JP5809182B2 (ja) * | 2013-03-26 | 2015-11-10 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
| CN105531260B (zh) | 2013-09-10 | 2019-05-31 | 巴斯夫欧洲公司 | 肟酯光引发剂 |
| TWI507511B (zh) | 2013-11-05 | 2015-11-11 | Ind Tech Res Inst | 負介電異方性液晶化合物、液晶顯示器、與光電裝置 |
| US10108087B2 (en) * | 2016-03-11 | 2018-10-23 | Macdermid Graphics Solutions Llc | Method of improving light stability of flexographic printing plates featuring flat top dots |
| CN106120508A (zh) * | 2016-06-22 | 2016-11-16 | 赵传宝 | 一种彩色压模混凝土艺术地坪 |
| KR102806570B1 (ko) | 2018-06-25 | 2025-05-14 | 썬 케미칼 비.브이. | 컬러 필터용 적색 안료 조성물 |
| CN110196531B (zh) * | 2019-06-03 | 2020-12-11 | 珠海市能动科技光学产业有限公司 | 一种干膜光阻剂 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH034226A (ja) * | 1989-06-01 | 1991-01-10 | Asahi Chem Ind Co Ltd | 耐熱性を有するパターンの形成方法 |
| ES2150977T3 (es) * | 1993-08-09 | 2000-12-16 | Vantico Ag | Nuevos (met)acrilatos conteniendo grupos uretano. |
| JP2937800B2 (ja) * | 1995-03-29 | 1999-08-23 | 日華化学株式会社 | ソルダーフォトレジストインキ用組成物 |
| US5853957A (en) * | 1995-05-08 | 1998-12-29 | Tamura Kaken Co., Ltd | Photosensitive resin compositions, cured films thereof, and circuit boards |
| JP2718007B2 (ja) * | 1995-06-06 | 1998-02-25 | 太陽インキ製造株式会社 | アルカリ現像可能な一液型フォトソルダーレジスト組成物及びそれを用いたプリント配線板の製造方法 |
| US6238840B1 (en) * | 1997-11-12 | 2001-05-29 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition |
| JP4060962B2 (ja) * | 1998-02-25 | 2008-03-12 | 互応化学工業株式会社 | アルカリ現像型フォトソルダーレジストインク |
-
1999
- 1999-06-02 MY MYPI99002206A patent/MY121423A/en unknown
- 1999-06-04 TW TW088109260A patent/TW484034B/zh not_active IP Right Cessation
- 1999-06-18 US US09/720,441 patent/US6485885B1/en not_active Expired - Lifetime
- 1999-06-18 WO PCT/EP1999/004234 patent/WO2000000869A1/en not_active Ceased
- 1999-06-18 CN CNB998079227A patent/CN1203374C/zh not_active Expired - Fee Related
- 1999-06-18 DE DE69938305T patent/DE69938305T2/de not_active Expired - Fee Related
- 1999-06-18 CA CA002333365A patent/CA2333365A1/en not_active Abandoned
- 1999-06-18 AT AT99931103T patent/ATE388426T1/de not_active IP Right Cessation
- 1999-06-18 BR BR9911572-7A patent/BR9911572A/pt not_active Application Discontinuation
- 1999-06-18 JP JP2000557178A patent/JP2002519732A/ja not_active Withdrawn
- 1999-06-18 KR KR1020007014589A patent/KR100563019B1/ko not_active Expired - Fee Related
- 1999-06-18 EP EP99931103A patent/EP1095313B1/en not_active Expired - Lifetime
- 1999-06-18 AU AU47739/99A patent/AU751966B2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2000000869A1 (en) | 2000-01-06 |
| US6485885B1 (en) | 2002-11-26 |
| KR20010053101A (ko) | 2001-06-25 |
| CN1203374C (zh) | 2005-05-25 |
| ATE388426T1 (de) | 2008-03-15 |
| MY121423A (en) | 2006-01-28 |
| EP1095313A1 (en) | 2001-05-02 |
| AU751966B2 (en) | 2002-09-05 |
| TW484034B (en) | 2002-04-21 |
| EP1095313B1 (en) | 2008-03-05 |
| KR100563019B1 (ko) | 2006-03-22 |
| CA2333365A1 (en) | 2000-01-06 |
| AU4773999A (en) | 2000-01-17 |
| DE69938305T2 (de) | 2009-03-19 |
| CN1307693A (zh) | 2001-08-08 |
| DE69938305D1 (de) | 2008-04-17 |
| JP2002519732A (ja) | 2002-07-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| BR9911572A (pt) | Composições de resina de termofixação fotopolimerizáveis | |
| SG63787A1 (en) | Photogeneration of amines from alpha aminoacetophenones | |
| ATE408597T1 (de) | Aliphatische stickstoffhaltige fünfgliedrige ringverbindungen | |
| DK1077928T3 (da) | Nye substituerede cykliske forbindelser, fremgangsmåder til fremstilling heraf og farmaceutiske sammensætninger indeholdende disse | |
| DK1114076T3 (da) | Acceleratorer til hærdbare systemer | |
| DE59410446D1 (de) | Verwendung von Epoxyacrylaten | |
| NO915068L (no) | Fremgangsmaate for fremstilling av nye amino- og nitro-holdige tricykliske forbindelser | |
| EP0943660A4 (https=) | ||
| NZ224202A (en) | Aromatically substituted amines and antimicrobial compositions | |
| FI874299A0 (fi) | Foerfarande foer framstaellning av belaeggning genom straolningskorsbindning. | |
| EP0809622A4 (en) | ANTI-INFLAMMATORY DERIVATIVES OF BENZOIC ACID | |
| ES2066876T3 (es) | Copolimeros de polietersulfona o de polietercetona. | |
| TW370539B (en) | Energetic ray curing type resin composition and preparation thereof | |
| GB8324911D0 (en) | Epoxy resin compositions | |
| WO2001090054A1 (fr) | Composes produisant des amines a l'aide d'un rayonnement lumineux, compositions durcissables par la lumiere et compositions adhesives reagissant a la lumiere | |
| WO2001090054A3 (en) | Compounds generating amine by irradiation with light, photo-setting compositions and photoreactive adhesive compositions | |
| TW330944B (en) | Resin composition for powder coating | |
| TW343991B (en) | Hardener composition for epoxy resins | |
| TW353096B (en) | Pyrrolidinone-containing compatibilisers | |
| DK0393778T3 (da) | Silaner indeholdende mindst to oxazolidindele samt fremstilling og anvendelse deraf | |
| MY105717A (en) | Adhesive composition. | |
| ATE168705T1 (de) | Epoxypolyether |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |